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| Application No. | Application Title | Issue Date |
| 20110075139 | OPTICAL INSPECTION METHOD AND OPTICAL INSPECTION SYSTEM An optical semiconductor wafer inspection system and a method thereof are provided for classifying and inspecting defects such as scratches, voids and particles produced in a flattening process by a polishing or grinding technique used for semiconductor manufacturing. T... | 03/31/2011 |
| 20110075138 | External beam delivery system using catadioptric objective with aspheric surfaces An inspection system including a catadioptric objective that facilitates dark-field inspection is provided. The objective includes an outer element furthest from the specimen having an outer element partial reflective surface oriented toward the specimen, an inner eleme... | 03/31/2011 |
| 20110073982 | Inspection system using back side illuminated linear sensor An improved inspection system using back-side illuminated linear sensing for propagating charge through a sensor is provided. Focusing optics may be used with a back side illuminated linear sensor to inspect specimens, the back side illuminated linear sensor operating t... | 03/31/2011 |
| 20110069306 | Referenced Inspection Device A tool for investigating a substrate, where the tool has a tool head for investigating the substrate, a chuck for disposing an upper surface of the substrate in proximity to the tool head, and an air bearing disposed on the tool head adjacent the substrate. The air bear... | 03/24/2011 |
| 20110051132 | Method and apparatus for producing and Measuring dynamically focussed, steered, and shaped oblique laser illumination for spinning wafer inspection system A method and apparatus for producing high frequency dynamically focused oblique laser illumination for a spinning wafer inspection system. The focus is changed by changing the beam direction incidence angle so as to bring focal spot onto the wafer surface. 03/03/2011 | |
| 20110043798 | OPTICAL INSPECTION SYSTEM AND METHOD An inspection system includes optics, an object support for mounting an object in a region of an object plane of the optics, a bright-field light source, and a dark-field light source. The inspection system also includes an image detector having a radiation sensitive su... | 02/24/2011 |
| 20110043811 | MASK DEFECT MEASUREMENT METHOD, MASK QUALITY DETERMINATION METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE A method for measuring a shape of a phase defect existing on an exposure mask includes making inspection light incident on the mask, measuring the intensity of light scattered in an angular range in which the width of an scattering area on the phase defect can be predic... | 02/24/2011 |
| 20110043797 | Image Collection An inspection system for creating images of a substrate. A light source directs an incident light onto the substrate, and a light source timing control controls a pulse timing of the incident light. A stage holds the substrate and moves the substrate under the incident ... | 02/24/2011 |
| 20110026017 | SURFACE INSPECTING METHOD AND SURFACE INSPECTING APPARATUS Provided is a surface inspecting method for inspecting a surface of a semiconductor substrate having linear line patterns repeatedly arranged and hole-shaped hole patterns formed on the line patterns. The surface inspecting method has a setting step (S101) of set... | 02/03/2011 |
| 20100328655 | Diffraction Based Overlay Metrology Tool and Method A method for determining overlay between a first grating (110) and a second grating (120) on a substrate (100), the second grating (120) on top of the first grating (110), the second grating (120) having substantially identical ... | 12/30/2010 |
| 20100321679 | MEASUREMENT SYSTEM AND METHOD A multi-station measurement system concept is presented, particularly based on an X-Y stage and plurality of horizontal load/unload units. The system allows loading/unloading of wafers from several load/unload units by the direct action of the X-Y stage, thus creating a... | 12/23/2010 |
| 20100321680 | CIRCUIT PATTERN DEFECT DETECTION APPARATUS, CIRCUIT PATTERN DEFECT DETECTION METHOD, AND PROGRAM THEREFOR The present invention provides a defect detection apparatus for a circuit pattern, including: an illumination optical system that irradiates illumination light, having a predetermined polarization condition, onto a detection subject having a circuit pattern formed there... | 12/23/2010 |
| 20100321678 | SOLID IMMERSION LENS OPTICS ASSEMBLY A solid immersion lens optics assembly, a test station for probing and testing of integrated circuits on a semiconductor wafer, and a method of landing a SIL on an object. The optics assembly comprises an objective lens housing for receiving an objective lens, and a sol... | 12/23/2010 |
| 20100265496 | APPARATUS AND METHOD FOR INSPECTING DEFECTS A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate... | 10/21/2010 |
| 20100265494 | SURFACE DEFECT INSPECTION METHOD AND APPARATUS A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and whe... | 10/21/2010 |
| 20100245812 | DEFECT INSPECTING METHOD AND DEFECT INSPECTING APPARATUS Provided is a method and apparatus for inspecting a defect of a shape formed on a substrate. Primary inspection is sequentially performed on specific patterns in a plurality of divided regions of the substrate by using an optical method, and one or more regions on which... | 09/30/2010 |
| 20100245813 | MULTI-MODAL IMAGING A method for scanning a surface with a number of different illumination configurations, the method comprises capturing a plurality of images in a sequential manner during a single sweep, each image including one or more lines of pixels, sequentially altering an illumina... | 09/30/2010 |
| 20100233594 | SYSTEM AND METHOD FOR QUALITY ASSURANCE FOR RETICLES USED IN MANUFACTURING OF INTEGRATED CIRCUITS System and method for quality assurance for reticles used in manufacturing of integrated circuits. According to an embodiment, the present invention provides a method for inspecting one or more blanks For example, the blanks are prepared to be used as reticles for manuf... | 09/16/2010 |
| 20100225905 | INSPECTION METHOD AND INSPECTION APPARATUS FOR SEMICONDUCTOR SUBSTRATE An inspection method for a semiconductor substrate includes irradiating an inspection beam on wires formed on a semiconductor substrate, detecting a secondary beam emitted from the semiconductor substrate, generating a contrast image, which indicates a state of an inspe... | 09/09/2010 |
| 20100225907 | SURFACE INSPECTION WITH VARIABLE DIGITAL FILTERING A semiconductor wafer, which is an inspection object, is stuck by vacuum on a chuck and this chuck is mounted on an inspection object movement stage consisting of a rotational stage and a translational stage, located on a Z-stage. The rotational stage provides a rotatio... | 09/09/2010 |
| 20100225906 | Surface inspection apparatus and surface inspection method A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate... | 09/09/2010 |
| 20100214561 | DEFECT INSPECTING APPARATUS A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due... | 08/26/2010 |
| 20100208251 | INSPECTION APPARATUS AND INSPECTION METHOD An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage,a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage ... | 08/19/2010 |
| 20100201976 | WAFER SURFACE MEASURING APPARATUS A wafer surface measuring apparatus which measures a surface of the wafer by irradiating a laser beam on a wafer comprising a measuring stage that supports the outer edge of the wafer and loads the wafer in a manner not contacting the rear surface of the wafer and the s... | 08/12/2010 |
| 20100195096 | HIGH EFFICIENCY MULTI WAVELENGTH LINE LIGHT SOURCE Embodiments of the present invention provide apparatus and method for inspecting a substrate. Particularly, embodiments of the present invention provide apparatus and method for detecting pinholes in one or more light absorbing films deposited on a substrate. One embodi... | 08/05/2010 |
| 20100195097 | Inspection device and inspection method for the optical examination of object surfaces, particularly of wafer surfaces An inspection device and a method of inspection, for optical examination of object surfaces, particularly wafer surfaces, wherein the object surface is illuminated by a first illumination device and a second illumination device, wherewith the light reflected and/or scat... | 08/05/2010 |
| 20100188657 | SYSTEMS AND METHODS FOR DETECTING DEFECTS ON A WAFER Systems and methods for detecting defects on a wafer are provided. One method includes generating output for a wafer by scanning the wafer with an inspection system using first and second optical states of the inspection system. The first and second optical states are d... | 07/29/2010 |
| 20100188658 | HIGH RESOLUTION WAFER INSPECTION SYSTEM A method for inspecting a region, including irradiating the region via an optical system with a pump beam at a pump wavelength. A probe beam at a probe wavelength irradiates the region so as to generate returning probe beam radiation from the region. The beams are scann... | 07/29/2010 |
| 20100177312 | SURFACE INSPECTION METHOD AND SURFACE INSPECTION DEVICE A surface inspection method inspects a surface of a wafer having a repeated pattern formed by double patterning. The method includes: a first step (S121) which applies an inspection light to a surface of a wafer; a second step (S122) which detects a diffra... | 07/15/2010 |
| 20100171947 | PATTERN INSPECTION DEVICE AND METHOD A pattern inspection device has a light irradiator configured to irradiate a light on an inspection area set in a pattern forming location on a semiconductor wafer and an adjustment area set different from the inspection area in association with the inspection area on t... | 07/08/2010 |
| 20100150695 | Method and System for Centering Wafer on Chuck A wafer handling mechanism is operated to place a wafer on a chuck. A chucking force is then applied to the wafer, whereby wafer support features of the chuck transfer a defect pattern onto a surface of the wafer. The surface of the wafer is analyzed by a defect metrolo... | 06/17/2010 |
| 20100141937 | APPARATUS TO PERFORM A NON-CONTACT TEST OF A SEMICONDUCTOR PACKAGE An apparatus to test a semiconductor package includes a vertical illuminator to supply vertical illumination in the same axial direction as a measurement target and a vertical image unit to capture a vertical image of the measurement target so that a testing apparatus m... | 06/10/2010 |
| 20100118297 | MICROSCOPE HAVING MULTIPLE IMAGE-OUTPUTTING DEVICES AND PROBING APPARATUS FOR INTEGRATED CIRCUIT DEVICES USING THE SAME A microscope includes an object splitter configured to split the object image into a first optical path and a second optical path, a first imaging module positioned on the first path and a second imaging module positioned on the second path. The object splitter includes... | 05/13/2010 |
| 20100118311 | METHOD OF DETECTING AN ABNORMAL SEMICONDUCTOR DEVICE USING A STANDARD OPTICAL CRITICAL DIMENSION DATABASE In a method of detecting an abnormal semiconductor device, a pattern on a semiconductor substrate may be irradiated by a light. A reflected light from the pattern may be detected. Spectrum data of the reflected light may be compared with a predetermined reference spectr... | 05/13/2010 |
| 20100112730 | OPTICAL INSPECTION METHODS Inspection methods. A method includes adhering an optical blocking layer directly onto and in direct mechanical contact with a semiconductor process wafer, the blocking layer being substantially opaque to a range of wavelengths of light; applying at least one layer over... | 05/06/2010 |
| 20100103419 | Defect inspection apparatus, defect inspection method and method of inspecting hole pattern A defect inspection apparatus for inspecting a defect of a substrate as an object to be inspected comprises an illumination optical system for illuminating the substrate, a receiving optical system for receiving diffracted light from the substrate and a polarizing eleme... | 04/29/2010 |
| 20100085749 | Lighting Device A method of examining an object containing a polycrystalline material, in which at least one part of the surface of the object is illuminated with substantially isotropic light, as well as a illumination device for carrying out the method. In this manner, the polycrysta... | 04/08/2010 |
| 20100085561 | LASER SCATTERING DEFECT INSPECTION SYSTEM AND LASER SCATTERING DEFECT INSPECTION METHOD A laser scattering defect inspection system includes: a stage unit that rotates a workpiece W and transports the workpiece W in one direction; a laser light source that emits a laser beam LB toward the workpiece W mounted on the stage unit; an optical deflector that sca... | 04/08/2010 |
| 20100079758 | Inspection device, inspection method, and program An illuminating optical system of an inspection device selects an arbitrary wavelength region from the light source, and epi-illuminates the sample via the polarizer and the objective lens. A detecting optical system includes an analyzer having a polarization plane inte... | 04/01/2010 |
| 20100079748 | Inspection Apparatus, Lithographic Apparatus and Method for Sphero-Chromatic Aberration Correction A semiconductor inspection system and method are described. The system includes an illumination system transmitting light at a given wavelength and an optical system receiving light from the illumination system and transmit light at the given wavelength to a surface. Th... | 04/01/2010 |
