Famous Patents
The ice cream cone was invented at the St. Louis Worlds Fair by Ernest Hamwi in 1904. His waffle booth was next to an ice cream vendor who ran short of dishes. Hamwi rolled a waffle to hold ice cream and the cone was born.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Application No. | Application Title | Issue Date |
| 20120127454 | PATTERN FORMING METHOD According to one embodiment, a pattern including first and second block phases is formed by self-assembling a block copolymer onto a film to be processed. The entire block copolymer present in a first region is removed under a first condition by carrying out energy beam... | 05/24/2012 |
| 20120127452 | METHOD FOR COARSE WAFER ALIGNMENT IN A LITHOGRAPHIC APPARATUS A method for alignment of a substrate, in which the substrate includes a mark in a scribe lane, and the scribe lane extends along a longitudinal direction as a first direction. The mark has a periodic structure in the first direction. The method includes providing an il... | 05/24/2012 |
| 20120127453 | MOVABLE BODY DRIVE METHOD AND MOVABLE BODY DRIVE SYSTEM, PATTERN FORMATION METHOD AND APPARATUS, EXPOSURE METHOD AND APPARATUS, DEVICE MANUFACTURING METHOD, AND CALIBRATION METHOD A controller measures positional information of a stage within an XY plane using three encoders which at least include one each of an X encoder and a Y encoder of an encoder system, and the stage is driven in the XY plane, based on measurement results of the positional ... | 05/24/2012 |
| 20120127445 | ISOLATION SYSTEM FOR AN OPTICAL ELEMENT OF AN EXPOSURE APPARATUS An optical isolation assembly (30) for reducing the transmission of vibration from an optical barrel (25) to an optical element assembly (28) includes an optical mover assembly (256), a first measurement system (258), a second measurem... | 05/24/2012 |
| 20120127440 | OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY An optical assembly for projection lithography has an optical component to guide imaging or illumination light. The optical component has a reflective substrate that contains a fluorescent component. An excitation light source is used to produce fluorescence excitation ... | 05/24/2012 |
| 20120127446 | LIGHT EXPOSURE METHOD, AND LIGHT EXPOSURE APPARATUS There is provided an EUV exposure apparatus which restrains its optical systems or a mask used therein from being polluted by contaminations generated in its chamber. An energy beam generating source is arranged near a wafer stage set in the chamber of the EUV exposure ... | 05/24/2012 |
| 20120127450 | MOVABLE BODY DRIVE METHOD AND MOVABLE BODY DRIVE SYSTEM, AND PATTERN FORMATION METHOD AND PATTERN FORMATION APPARATUS A first positional information of a wafer stage is measured using an interferometer system such as, for example, a Z interferometer. At the same time, a second positional information of the wafer stage is measured using a surface position measurement system such as, for... | 05/24/2012 |
| 20120105820 | VIBRATION CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE A vibration control apparatus includes a first spring mechanism to support a first object as part of a first system. To control vibration of the first object, a first actuator applies a force to the first object via a command value generated by a first computing based o... | 05/03/2012 |
| 20120081682 | MASKLESS EXPOSURE APPARATUS AND METHOD TO DETERMINE EXPOSURE START POSITION AND ORIENTATION IN MASKLESS LITHOGRAPHY According to an example embodiment, a method to determine an exposure start position and orientation includes loading a substrate on a moving table. The substrate includes at least one alignment mark of a first set of alignment marks of a first pattern layer patterned t... | 04/05/2012 |
| 20120081683 | Lithographic Apparatus And Detector Apparatus A detector including a layer of scintillation material, a layer of spacer material on the scintillation material, and a spectral purity filter layer on the spacer material. A method includes directing EUV radiation through a spectral purity filter layer, directing the E... | 04/05/2012 |
| 20120081689 | METHOD FOR DETERMINING EXPOSURE CONDITION AND COMPUTER-READABLE STORAGE MEDIA STORING PROGRAM FOR DETERMINING EXPOSURE CONDITION A method for determining an exposure condition for use in projecting an image of a pattern of an original on a substrate includes a setting step of setting an exposure condition, an image calculating step of calculating a dimension of an image to be projected on the sub... | 04/05/2012 |
| 20120081688 | APPARATUS AND METHOD FOR PREPARING LENTICULAR SHEET An apparatus for preparing a lenticular sheet includes a photoconductor, a light emitting section for forming an electrostatic latent image on the photoconductor, a developing section for forming a transparent toner layer by applying a transparent toner to the electrost... | 04/05/2012 |
| 20120082940 | PHOTOLITHOGRAPHY PROCESS FOR SEMICONDUCTOR DEVICE Provided is a non-transitory computer readable medium including instructions to generate a level sensor map and create a compensation map from the level sensor map. The level sensor map includes a first determination of a first height above a reference plane of a featur... | 04/05/2012 |
| 20120069309 | FLUID HANDLING STRUCTURE, MODULE FOR AN IMMERSION LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from th... | 03/22/2012 |
| 20120069314 | IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS OF THIS TYPE An imaging optics has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. A pupil plane is arranged in the imaging beam path between the object field and the image field. A stop is arranged in the pupil plane. The p... | 03/22/2012 |
| 20120070985 | EXPOSURE METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE According to one embodiment, an exposure method is disclosed. The method can include applying light to a photomask by an illumination. The method can include converging diffracted beams emitted from the photomask by a lens. In addition, the method can include imaging a ... | 03/22/2012 |
| 20120069312 | IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field an... | 03/22/2012 |
| 20120069315 | IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between t... | 03/22/2012 |
| 20120069318 | PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE SYSTEM THEREFOR The disclosure provides a projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask. The mask has a first pattern area with a first subpattern, and at least one second pattern area, arranged laterally offset f... | 03/22/2012 |
| 20120069317 | LITHOGRAPHY SYSTEM ARRANGED ON A FOUNDATION, AND METHOD FOR ARRANGING A LITHOGRAPHY SYSTEM ON SAID FOUNDATION The invention relates to a vibration isolation requiring system, such as a lithography system, arranged on a foundation, for example part of the floor in the room where the lithography system is arranged, and a method for arranging a lithography system on a foundation. ... | 03/22/2012 |
| 20120069313 | EUV MICROLITHOGRAPHY ILLUMINATION OPTICAL SYSTEM AND EUV ATTENUATOR FOR SAME An illumination optical system for EUV microlithography is used to direct an illumination light beam from a radiation source to an object field. At least one EUV mirror has a reflective face with a nonplanar mirror topography for forming the illumination light beam. The... | 03/22/2012 |
| 20120050703 | EUV COLLECTOR An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also ... | 03/01/2012 |
| 20120050708 | Source-collector module with GIC mirror and tin rod EUV LPP target system A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system ... | 03/01/2012 |
| 20120050705 | PHOTOLITHOGRAPHY SYSTEM A photolithography system is equipped with a light modulator that comprises a plurality of regularly arrayed light modulation elements; a scanning mechanism configured to move an exposure area relative to an object in a main scanning direction, in a state in which the e... | 03/01/2012 |
| 20120050710 | METHOD OF MEASURING MARK POSITION AND MEASURING APPARATUS A method and an apparatus are provided to measure a position of a mark with a less measurement error caused by a variation in a wafer process condition. The mark is illuminated with light and an image of the mark is formed, via an optical system, in a light receiving su... | 03/01/2012 |
| 20120044471 | Lithographic Apparatus and Method A method of projecting a patterned beam onto a substrate using an EUV lithographic apparatus having a projection system including a plurality of mirrors. The method includes the following steps. Using the projection system to project the patterned beam onto the substrat... | 02/23/2012 |
| 20120044468 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradient... | 02/23/2012 |
| 20120044470 | Substrate for Use in Metrology, Metrology Method and Device Manufacturing Method A pattern from a patterning device is applied to a substrate. The applied pattern includes device functional areas and metrology target areas. Each metrology target area comprises a plurality of individual grating portions, which are used for diffraction based overlay m... | 02/23/2012 |
| 20120044474 | OPTICAL MODULE FOR GUIDING A RADIATION BEAM An optical module is used to guide an EUV radiation beam. The optical module has a chamber that can be evacuated and at least one mirror accommodated in the chamber. The mirror has a plurality of individual mirrors, the reflection faces of which complement one another t... | 02/23/2012 |
| 20120038896 | Maskless Vortex Phase Shift Optical Direct Write Lithography The present invention provides methods and apparatus for accomplishing optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is configured to generate vortex phase shift optical patterns that are directed onto ... | 02/16/2012 |
| 20120038895 | LENS HEATING COMPENSATION IN PHOTOLITHOGRAPHY Photolithographic apparatus and methods are disclosed. One such apparatus includes an optical path configured to provide a first diffraction pattern in a portion of an optical system and to provide a second diffraction pattern to the portion of the optical system after ... | 02/16/2012 |
| 20120038898 | Lithographic Apparatus and Alignment Method A lithographic apparatus comprising a source collector module including a collector, configured to collect radiation from a radiation source; an illuminator configured to condition the radiation collected by the collector and to provide a radiation beam; and a detector ... | 02/16/2012 |
| 20120033194 | DECISION METHOD AND STORAGE MEDIUM The present invention provides a decision method of causing a computer to decide an exposure condition to be set in an exposure apparatus including an illumination optical system that illuminates a pattern including a plurality of pattern elements, and a projection opti... | 02/09/2012 |
| 20120026478 | System and Method for Manufacturing Three Dimensional Integrated Circuits System and method for manufacturing three-dimensional integrated circuits are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel a... | 02/02/2012 |
| 20120026474 | Reticle Cooling in a Lithographic Apparatus An apparatus and method reduce temperature variation across a reticle so as to reduce the expansion variation of the reticle. One method for realizing reduced temperature variation is to fill an inner space with backfill gas under pressure, using distribution trenches a... | 02/02/2012 |
| 20120026480 | Image-Compensating Addressable Electrostatic Chuck System An electrostatic chuck including a substrate, a support layer to support an object, an electrode layer comprising an electrode and being disposed between the substrate and the support layer configured to apply an electrostatic attraction force on the object upon energiz... | 02/02/2012 |
| 20120019793 | EXPOSURE APPARATUS INCLUDING THE EXPOSURE HEAD AND CONTROL METHOD THEREOF According to example embodiments, a method of operating an exposure apparatus including a stage having a plurality of beam measurement devices, and an exposure head unit having a first set of exposure heads and a second set of exposure heads includes measuring a positio... | 01/26/2012 |
| 20120019795 | LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND DEVICE MANUFACTURING METHOD Disclosed is a device manufacturing method and associated apparatus, the method comprising transferring a pattern from a patterning device onto a substrate. The method relates to the alignment of said patterning device and said substrate, and comprises imparting a radia... | 01/26/2012 |
| 20120019803 | CLEANING METHOD, LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM A liquid immersion member in an immersion exposure apparatus, which exposes a substrate with exposure light which transits an exposure liquid, has a first recovery port, which is capable of recovering the exposure liquid and that is disposed at least partly around an op... | 01/26/2012 |
| 20120019805 | CALCULATION METHOD, GENERATION METHOD, PROGRAM, EXPOSURE METHOD, AND MASK FABRICATION METHOD The present invention provides a calculation method of calculating, by a computer, a light intensity distribution formed on an image plane of a projection optical system, comprising a step of dividing an effective light source formed on a pupil plane of the projection o... | 01/26/2012 |
