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| Application No. | Application Title | Issue Date |
| 20120081687 | INTERFERENCE PROJECTION EXPOSURE SYSTEM AND METHOD OF USING SAME An exemplary embodiment of the present invention provides an interference projection exposure system comprising a beam-providing subsystem and an objective lens subsystem that can provide a plurality of light beams which intersect and interfere at an image plane to prod... | 04/05/2012 |
| 20120038898 | Lithographic Apparatus and Alignment Method A lithographic apparatus comprising a source collector module including a collector, configured to collect radiation from a radiation source; an illuminator configured to condition the radiation collected by the collector and to provide a radiation beam; and a detector ... | 02/16/2012 |
| 20110310375 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD According to an embodiment, the illumination optical system for illuminating an illumination target surface with light from a light source is provided with a polarization converting member which converts a polarization state of incident light so as to form a pupil inten... | 12/22/2011 |
| 20110299056 | System and Method Configured to Provide Predetermined Depth Of Focus and to Control Irradiance Distribution A system and method for illuminating an imaging optical system are provided, designed to spread the irradiance distribution at a pupil located at a mirror, to decrease the maximum irradiance on the mirror in the pupil, while maintaining a predetermined depth of focus of... | 12/08/2011 |
| 20110285979 | PROJECTION OBJECTIVE WITH DIAPHRAGMS A projection objective for imaging an object arranged in an object plane of the projection objective into an image of the object lying in an image plane of the projection objective has a multiplicity of transparent optical elements and holding devices for holding the op... | 11/24/2011 |
| 20110273697 | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially... | 11/10/2011 |
| 20110273698 | Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical material with optical activity, for forming a first region distribution of ... | 11/10/2011 |
| 20110255068 | EUV mirror module An EUV mirror module is disclosed that comprises a substrate with a curved upper surface and a curved electroformed mirror. A self-adjusting bonding material is disposed between the substrate and the electroformed mirror. The bonding material is flowable at a melting te... | 10/20/2011 |
| 20110242517 | PROJECTION EXPOSURE SYSTEM, METHOD FOR MANUFACTURING A MICRO-STRUCTURED STRUCTURAL MEMBER BY THE AID OF SUCH A PROJECTION EXPOSURE SYSTEM AND POLARIZATION-OPTICAL ELEMENT ADAPTED FOR USE IN SUCH A SYSTEM The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source for producing light in the EUV region. The projection exposure system further comprises a first... | 10/06/2011 |
| 20110245898 | LASER APPARATUS, LIGHT THERAPY APPARATUS, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND OBJECT INSPECTION APPARATUS A fundamental wavelength light generating unit generates light of a fundamental wavelength in accordance with an output wavelength instruction signal. An optical amplifier unit amplifies the light of the fundamental wavelength. A wavelength converting part includes nonl... | 10/06/2011 |
| 20110235015 | ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY An illumination optics for EUV microlithography illuminates an object field with the aid of an EUV used radiation beam. Preset devices preset illumination parameters. An illumination correction device corrects the intensity distribution and/or the angular distribution o... | 09/29/2011 |
| 20110228247 | ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at l... | 09/22/2011 |
| 20110222041 | APPARATUS, METHOD, AND LITHOGRAPHY SYSTEM An apparatus which can measure an aerial image is provided. The apparatus includes an aperture configured to transmit light of the aerial image, a detector configured to detect the transmitted light at a plurality of first relative positions to the aperture, a controlle... | 09/15/2011 |
| 20110222043 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in o... | 09/15/2011 |
| 20110222042 | OPTICAL DEVICE AND DEVICE MANUFACTURING METHOD An optical device includes a wavelength separation filter configured to separate incident light into light having a first wavelength and light having a second wavelength, the wavelength separation filter including a blazed grating whose cross-sectional shape is a saw-to... | 09/15/2011 |
| 20110211185 | Spectral Purity Filter, Radiation Source, Lithographic Apparatus, and Device Manufacturing Method A spectral purity filter is configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation. The spectral purity filter may be part of a source module and/or a lithographic apparatus.... | 09/01/2011 |
| 20110205519 | POLARIZATION CONVERTING UNIT, ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD According to one embodiment, a polarization converting unit, for converting incident light into light in a predetermined polarization state and emitting the converted light, has a first optically rotatory member having a first thickness distribution of thicknesses in an... | 08/25/2011 |
| 20110194093 | POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT AND AN OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS A polarization-influencing optical arrangement includes a pair, which includes a first lambda/2 plate and a second lambda/2 plate. The first and second lambda/2 plates partially overlap each other forming an overlap region and at least one non-overlap region.... | 08/11/2011 |
| 20110188019 | POLARIZATION-MODULATING OPTICAL ELEMENT The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projecti... | 08/04/2011 |
| 20110188020 | Overlay Measurement Apparatus, Lithographic Apparatus and Device Manufacturing Method Using Such Overlay Measurement Apparatus An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarizatio... | 08/04/2011 |
| 20110181860 | Cooled spider and method for grazing-incidence collectors A cooled spider for grazing-incidence collectors includes an outer ring, an inner ring and spokes that mechanically and fluidly connect the inner and outer rings. Cooling channels in the outer and inner rings and in the spokes define a general cooling-fluid flow path th... | 07/28/2011 |
| 20110170083 | Lithographic Apparatus and Device Manufacturing Method A system and method are used to detect thermal radiation from a mask. Debris particles on the mask heat up, but do not cool down as quickly as the surrounding mask. Due to the temperature difference, the wavelength of radiation emitted by particles and the mask differs.... | 07/14/2011 |
| 20110170084 | LIGHT EXPOSURE MASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME The present invention provides a light exposure mask which can form a photoresist layer in a semi-transmissive portion with uniform thickness, and a method for manufacturing a semiconductor device in which the number of photolithography steps (the number of masks) neces... | 07/14/2011 |
| 20110164237 | SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures configured to transmit extreme ultraviolet radiation and to suppress transmission of a second... | 07/07/2011 |
| 20110157574 | Endoscope Provided is an endoscope that is capable of improving the ease of insertion by reducing the size of a distal end of an inserted portion, while ensuring a preferable observation field of view by improving the light distribution of illumination light. The endoscope employ... | 06/30/2011 |
| 20110149261 | OPTICAL SYSTEM, IN PARTICULAR OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS An optical system, in particular of a microlithographic projection exposure apparatus, includes an optical system axis and a polarization-influencing optical arrangement, wherein said arrangement has a polarization-influencing optical element which includes an optically... | 06/23/2011 |
| 20110149262 | SPECTRAL PURITY FILTER AND LITHOGRAPHIC APPARATUS A spectral purity filter is configured to reflect extreme ultraviolet radiation. The spectral purity filter includes a substrate, and an anti-reflective coating on a top surface of the substrate. The anti-reflective coating is configured to transmit infrared radiation. ... | 06/23/2011 |
| 20110143269 | RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of materia... | 06/16/2011 |
| 20110134409 | Actuator, stage device, and exposure apparatus An actuator according to example embodiments may be relatively compact and may be driven with 2 degrees of freedom with less spatial constraints. The actuator may include a base member, a ball screw member including a ball screw coupled to the base member and a ball nut... | 06/09/2011 |
| 20110134410 | SPECTRAL PURITY FILTER FOR MULTI-LAYER MIRROR, LITHOGRAPHIC APPARATUS INCLUDING SUCH MULTI-LAYER MIRROR, METHOD FOR ENLARGING THE RATIO OF DESIRED RADIATION AND UNDESIRED RADIATION, AND DEVICE MANUFACTURING METHOD A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion of ... | 06/09/2011 |
| 20110123934 | SCANNING EXPOSURE APPARATUS A scanning exposure apparatus includes a light source, a stage configured to move while having a substrate mounted thereon, a control unit configured to control the light source and the stage such that the substrate is exposed to radiant energy while the speed of the st... | 05/26/2011 |
| 20110122390 | EXPOSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND EXPOSURE APPARATUS According to one embodiment, on a substrate, a resist layer is laminated on an upper side of a pattern formation layer on which a desired pattern is formed. A diffraction pattern that diffracts exposure light irradiated on the substrate is formed further on the upper si... | 05/26/2011 |
| 20110122391 | OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MICROLITHOGRAPHIC EXPOSURE METHOD The disclosure relates to an optical system of a microlithographic projection exposure apparatus and to a microlithographic exposure method. An optical system of a microlithographic projection exposure apparatus includes an image rotator, which is arranged in the optica... | 05/26/2011 |
| 20110122392 | MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINATION OPTICAL UNIT An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs ... | 05/26/2011 |
| 20110116069 | COMPUTER GENERATED HOLOGRAM, EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD The present invention provides a computer generated hologram including a plurality of anisotropic cells having different refractive indices with respect to linearly polarized light in a first direction and linearly polarized light in a second direction perpendicular to ... | 05/19/2011 |
| 20110109894 | POLARIZATION-MODULATING OPTICAL ELEMENT AND METHOD FOR MANUFACTURING THEREOF The disclosure relates to a method of manufacturing a polarization-modulating optical element, wherein the element causes, for light passing through the element and due to stress-induced birefringence, a distribution of retardation between orthogonal states of polarizat... | 05/12/2011 |
| 20110109893 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS A projection exposure apparatus has a projection lens with an object plane, an image plane, an optical axis and a non-telecentric entrance pupil. The apparatus further comprises an illumination system having an intermediate field plane and a field stop. The field stop i... | 05/12/2011 |
| 20110096317 | COMPONENT FOR SETTING A SCAN-INTEGRATED ILLUMINATION ENERGY IN AN OBJECT PLANE OF A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS A component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus is disclosed. The component includes a plurality of diaphragms which are arranged alongside one another with respect to a direction perpe... | 04/28/2011 |
| 20110091813 | DYNAMIC PROJECTION METHOD FOR MICRO-TRUSS FOAM FABRICATION A system for fabricating a radiation-cured component is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate with exposure to radiation, and at least one radiation source configured to ... | 04/21/2011 |
| 20110080569 | OPTICAL ELEMENT AND METHOD The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as rela... | 04/07/2011 |
