Famous Patents
In 1608, Dutch eyeglass maker Hans Lipperhey filed the first patent for a working telescope. The patent was denied.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Application No. | Application Title | Issue Date |
| 20120129083 | METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACTURING REFLECTIVE MASK According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can includ... | 05/24/2012 |
| 20120127442 | DETERMINING LITHOGRAPHIC SET POINT USING OPTICAL PROXIMITY CORRECTION VERIFICATION SIMULATION The subject matter disclosed herein relates to determining a lithographic set point using simulations of optical proximity correction verification. In one embodiment, a computer-implemented method of determining a lithographic tool set point for a lithographic process i... | 05/24/2012 |
| 20120127443 | METHOD OF PRODUCING A RELIEF IMAGE FOR PRINTING The present invention involves a method for making a relief image. A film that includes a carrier sheet and an imageable material is used to form a mask image that is opaque to a curing radiation. In one embodiment, the mask image is formed on the carrier sheet while in... | 05/24/2012 |
| 20120108072 | SHOWERHEAD CONFIGURATIONS FOR PLASMA REACTORS Apparatus, devices, and methods for increasing the ion energy in a plasma processing devices are provided. In various embodiments, the surface area of a showerhead facing the work piece includes a plurality of features. The plurality of features increases the surface ar... | 05/03/2012 |
| 20120081681 | DRAWING DEVICE AND DRAWING METHOD A drawing device draws a pattern on a substrate by radiating light from an optical head part on a target object (for example, substrate) which relatively moves with respect to the optical head part. Here, the optical head part has a spatial modulating unit which spatial... | 04/05/2012 |
| 20120069311 | Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography A reflector structure suitable for extreme ultraviolet lithography (EUVL) is provided. The structure comprises a substrate having a multi-layer reflector. A capping layer is formed over the multi-layer reflector to prevent oxidation. In an embodiment, the capping layer ... | 03/22/2012 |
| 20120052419 | PHOTOMASK, MANUFACTURING APPARATUS AND METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND PHOTOMASK FEATURE LAYOUT METHOD A photomask is provided which can have a large depth of focus even if four main features are annularly arranged at random. The photomask has four annularly arranged main features based on design information of a circuit feature to be formed... | 03/01/2012 |
| 20120050705 | PHOTOLITHOGRAPHY SYSTEM A photolithography system is equipped with a light modulator that comprises a plurality of regularly arrayed light modulation elements; a scanning mechanism configured to move an exposure area relative to an object in a main scanning direction, in a state in which the e... | 03/01/2012 |
| 20120050704 | Source-collector module with GIC mirror and xenon liquid EUV LPP target system A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system ... | 03/01/2012 |
| 20120044471 | Lithographic Apparatus and Method A method of projecting a patterned beam onto a substrate using an EUV lithographic apparatus having a projection system including a plurality of mirrors. The method includes the following steps. Using the projection system to project the patterned beam onto the substrat... | 02/23/2012 |
| 20120044470 | Substrate for Use in Metrology, Metrology Method and Device Manufacturing Method A pattern from a patterning device is applied to a substrate. The applied pattern includes device functional areas and metrology target areas. Each metrology target area comprises a plurality of individual grating portions, which are used for diffraction based overlay m... | 02/23/2012 |
| 20120040280 | Simultaneous Optical Proximity Correction and Decomposition for Double Exposure Lithography A mechanism is provided for simultaneous optical proximity correction (OPC) and decomposition for double exposure lithography. The mechanism begins with two masks that are equal to each other and to the target. The mechanism simultaneously optimizes both masks to obtain... | 02/16/2012 |
| 20120028192 | CONTROL METHOD AND CONTROL SYSTEM FOR EXPOSURE APPARATUS According to one embodiment, a control method for an exposure apparatus is disclosed. The method can include retrieving, from a database, a correction amount of alignment correction at a time of exposure of a wafer and an inclination amount of a wafer stage with respect... | 02/02/2012 |
| 20120026477 | Lithographic Apparatus, Aberration Detector and Device Manufacturing Method An aberration detector for a lithographic apparatus is used. An imaging device captures an image of at least one pinhole feature of a target projected onto the imaging device by the projection system of the lithographic apparatus at two different locations separated in ... | 02/02/2012 |
| 20120026479 | OPTICAL IMAGING DEVICE AND METHOD FOR REDUCING DYNAMIC FLUCTUATIONS IN PRESSURE DIFFERENCE There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part... | 02/02/2012 |
| 20120026478 | System and Method for Manufacturing Three Dimensional Integrated Circuits System and method for manufacturing three-dimensional integrated circuits are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel a... | 02/02/2012 |
| 20120019793 | EXPOSURE APPARATUS INCLUDING THE EXPOSURE HEAD AND CONTROL METHOD THEREOF According to example embodiments, a method of operating an exposure apparatus including a stage having a plurality of beam measurement devices, and an exposure head unit having a first set of exposure heads and a second set of exposure heads includes measuring a positio... | 01/26/2012 |
| 20120013864 | LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM A liquid immersion member is disposed inside an immersion exposure apparatus and at least partly around an optical member and around an optical path of exposure light that passes through a liquid between the optical member and an object. The liquid immersion member comp... | 01/19/2012 |
| 20120008121 | ACTUATOR INCLUDING MAGNET FOR A PROJECTION EXPOSURE SYSTEM AND PROJECTION EXPOSURE SYSTEM INCLUDING A MAGNET The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by microtechnical production methods so that a moving manipulator surface is held ... | 01/12/2012 |
| 20120008120 | Exposure method, color filter manufacturing method, and exposure device An exposure method is provided, in which when exposure is performed using a photomask having a plurality of mask patterns, various mask patterns corresponding to various different color filters are exposed in different regions on a substrate, without moving the photomas... | 01/12/2012 |
| 20120002182 | Lithographic Apparatus and Method A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprise... | 01/05/2012 |
| 20110317140 | PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY INCLUDING AN ACTUATOR SYSTEM The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the... | 12/29/2011 |
| 20110310338 | PRODUCTION METHOD OF LIQUID CRYSTAL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE To provide a production method of a liquid crystal display device and a liquid crystal display device, in which generation of a joint line on a display screen is suppressed and yield can be improved even if a substrate is subjected to an alignment treatment by completin... | 12/22/2011 |
| 20110310369 | LITHOGRAPHIC METHOD AND APPARATUS A lithographic method for irradiating resist on a substrate, the resist filling a region located between a first element located on the substrate, and a second element located on the substrate, the first element having a first length, a first width, and a first height, ... | 12/22/2011 |
| 20110310370 | Device And Method For Processing Light-Polymerizable Material For Building Up An Object In Layers A method and a device for processing light-polymerizable material for the assembly of a mold, utilizing a lithography-based generative manufacturing technique wherein a layer of a light-polymerizable material, the material being located in at least one trough (4)... | 12/22/2011 |
| 20110310371 | SYSTEM AND METHOD EMPLOYING SECONDARY BACK EXPOSURE OF FLEXOGRAPHIC PLATE A system for forming a relief image on a flexographic print plate comprises a laminator configured to laminate an imaged mask having a mask image to a front surface of a flexographic printing plate precursor. The mask image has mask image areas, each having a highlight ... | 12/22/2011 |
| 20110310368 | METHOD AND SYSTEM FOR THERMALLY CONDITIONING AN OPTICAL ELEMENT A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning... | 12/22/2011 |
| 20110299052 | Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method Position information of a movable body within an XY plane is measured with high accuracy by an encoder system whose measurement values have favorable short-term stability, without being affected by air fluctuations, and also position information of the movable body in a... | 12/08/2011 |
| 20110279797 | APPARATUS AND METHOD FOR CALIBRATING LITHOGRAPHY PROCESS A calibration wafer may bear one or more different mark types to facilitate inspection of a lithography process. A first mark type may be located on the outer peripheral portion of the wafer to indicate the desired boundary of an edge bead removal (EBR) region. A second... | 11/17/2011 |
| 20110279800 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.... | 11/17/2011 |
| 20110279798 | Method of exposing a semiconductor wafer and exposure apparatus An exposure method includes the following processes. An autofocus scan process is performed to detect a defocused portion of a first resist film over a semiconductor wafer and to generate a detection signal that indicates the defocused portion detected. A first exposure... | 11/17/2011 |
| 20110279799 | EUV Lithography Device and Method For Processing An Optical Element An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device... | 11/17/2011 |
| 20110273686 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE A scanning exposure apparatus measures levels of a substrate at a predetermined position on the substrate at a first measurement point during the acceleration period and a second measurement point during the constant velocity period, obtains a correction value for a mea... | 11/10/2011 |
| 20110273676 | IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING MICROCHANNEL NOZZLES A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid fl... | 11/10/2011 |
| 20110273684 | NANO-IMPRINT METHOD AND APPARATUS There is provided a nanoimprint method for pressing a template having a pattern of a rugged or uneven shape, to a substrate coated with a curable resin the method including a measuring step for measuring positions of preselected sample measurement points of a predetermi... | 11/10/2011 |
| 20110273685 | PRODUCTION OF AN ALIGNMENT MARK A method of production of alignment marks uses a self-aligned double patterning process. An alignment mark pattern is provided with first and second sub-segmented elements. After selecting the dipolar illumination orientation, dipole-X is used to illuminate the pattern ... | 11/10/2011 |
| 20110273688 | METHOD AND DEVICE FOR IMAGING A RADIATION-SENSITIVE SUBSTRATE A method and apparatus for imaging a radiation-sensitive substrate, wherein a programmable template is projected onto the radiation-sensitive substrate using coherent radiation having a wavelength at which the substrate is radiation sensitive. An overall image of the pr... | 11/10/2011 |
| 20110273687 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD In a solid immersion lithography apparatus, the final element of the projection system is maintained at a distance of less than about 50 nm from the substrate by an actuator system. The final element may be formed as two parts, with a fluid, e.g. a liquid, confined betw... | 11/10/2011 |
| 20110261338 | MICROLITHOGRAPHY PROJECTION SYSTEM WITH AN ACCESSIBLE DIAPHRAGM OR APERTURE STOP The invention relates to a microlithography projection lens for wavelengths <=248 nm <=, preferably <=193 mm, in particular EUV lithography for wavelengths ranging from 1-30 nm for imaging an object field in an object plane onto an image field in an image plane... | 10/27/2011 |
| 20110261337 | Photosensing device for digital stereo spliced picture projection imaging and operation method thereof A photosensing device for digital stereo spliced picture projection imaging comprises a base (16), a front (43) and a back (25) wall plates located on the base (16), an light sensing platform (24) located slidably on the base (16 | 10/27/2011 |
