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| Application No. | Application Title | Issue Date |
| 20120127441 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.... | 05/24/2012 |
| 20120127440 | OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY An optical assembly for projection lithography has an optical component to guide imaging or illumination light. The optical component has a reflective substrate that contains a fluorescent component. An excitation light source is used to produce fluorescence excitation ... | 05/24/2012 |
| 20120069310 | SEMICONDUCTOR MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS The disclosure relates to an optical correction arrangement including at least one optical element and at least one irradiation mechanism for the targeted local irradiation of the optical element with electromagnetic heating radiation for the targeted local heating of t... | 03/22/2012 |
| 20120069309 | FLUID HANDLING STRUCTURE, MODULE FOR AN IMMERSION LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from th... | 03/22/2012 |
| 20120050703 | EUV COLLECTOR An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also ... | 03/01/2012 |
| 20120052447 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a seco... | 03/01/2012 |
| 20120044468 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradient... | 02/23/2012 |
| 20120044469 | Exposure method, exposure apparatus, and device manufacturing method A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system ... | 02/23/2012 |
| 20120038894 | Lens Cleaning Module A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is disclosed. The lens cleaning module includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module is provided adjacent to the sca... | 02/16/2012 |
| 20120033192 | Exposure apparatus, exposure method, and device producing method An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism (10). The exposure apparatus (EX) has a pressure adjustment m... | 02/09/2012 |
| 20120026474 | Reticle Cooling in a Lithographic Apparatus An apparatus and method reduce temperature variation across a reticle so as to reduce the expansion variation of the reticle. One method for realizing reduced temperature variation is to fill an inner space with backfill gas under pressure, using distribution trenches a... | 02/02/2012 |
| 20120026475 | Exposure apparatus, exposure method, and device producing method An exposure apparatus EX is provided with a measuring unit 60 which measures at least one of property and components of a liquid LQ in a state that a liquid immersion area LR is formed on an object different from a substrate P to be exposed. There is provided an ... | 02/02/2012 |
| 20120026476 | DEVICE FOR CONTROLLING TEMPERATURE OF AN OPTICAL ELEMENT A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A ... | 02/02/2012 |
| 20120019792 | Liquid jet and recovery system for immersion lithography A liquid immersion lithography apparatus includes a stage on which a wafer is held. A projection system projects a pattern image to an exposure region through an immersion liquid to expose the wafer on the stage. A plurality of supply openings are arranged to surround t... | 01/26/2012 |
| 20120013865 | LITHOGRAPHIC APPARATUS AND METHOD A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the ... | 01/19/2012 |
| 20120013860 | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with: a first opening; a gap portion that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first... | 01/19/2012 |
| 20120013868 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confineme... | 01/19/2012 |
| 20120013863 | LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM A liquid immersion member is disposed inside an immersion exposure apparatus and at least partly around an optical member and an optical path of exposure light that passes through a liquid between the optical member and an object. The liquid immersion member comprises: ... | 01/19/2012 |
| 20120013869 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and th... | 01/19/2012 |
| 20120013864 | LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM A liquid immersion member is disposed inside an immersion exposure apparatus and at least partly around an optical member and around an optical path of exposure light that passes through a liquid between the optical member and an object. The liquid immersion member comp... | 01/19/2012 |
| 20120013870 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiati... | 01/19/2012 |
| 20120013866 | LITHOGRAPHIC APPARATUS, FLUID COMBINING UNIT AND DEVICE MANUFACTURING METHOD A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be co... | 01/19/2012 |
| 20120013871 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.... | 01/19/2012 |
| 20120013867 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system ... | 01/19/2012 |
| 20120013872 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to ... | 01/19/2012 |
| 20120013861 | Apparatus and method for providing fluid for immersion lithography An apparatus and method provide fluid for immersion lithography. A nozzle member that can move in a direction, is arranged to encircle a space under the optical element. The nozzle member can have an input to supply the immersion liquid to the space under the optical el... | 01/19/2012 |
| 20120013873 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.... | 01/19/2012 |
| 20120013874 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiati... | 01/19/2012 |
| 20120013862 | LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM A liquid immersion member is disposed inside an immersion exposure apparatus and at least partly around an optical member and around an optical path of exposure light that passes through a liquid between the optical member and an object. The liquid immersion member comp... | 01/19/2012 |
| 20120008115 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substan... | 01/12/2012 |
| 20120008116 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outle... | 01/12/2012 |
| 20120008114 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.... | 01/12/2012 |
| 20120008117 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to ... | 01/12/2012 |
| 20120008118 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outle... | 01/12/2012 |
| 20120008112 | Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liqui... | 01/12/2012 |
| 20120008119 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate... | 01/12/2012 |
| 20120008113 | LITHOGRAPHIC APPARATUS, CONTROL SYSTEM AND DEVICE MANUFACTURING METHOD An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or ... | 01/12/2012 |
| 20120008111 | Exposure apparatus, and device manufacturing method A support structure of a lithographic projection apparatus is configured to hold a patterning device, the patterning device being configured to pattern a beam of radiation according to a desired pattern. A substrate table is configured to hold a substrate. A projection ... | 01/12/2012 |
| 20120002181 | EXPOSURE CONTROL SYSTEM AND EXPOSURE CONTROL METHOD According to one embodiment, an exposure control system includes an overlap judgment unit that judges whether a position of a foreign matter that adheres to a back surface of a photomask overlaps a position of a chuck that holds the photomask when the photomask is held ... | 01/05/2012 |
| 20110317139 | EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD An exposure apparatus includes: a supply port through which a liquid is supplied to an optical path space of exposure light; and a supply passage in which the liquid flows and which is in fluid communication with the supply port. An amount of a predetermined substance m... | 12/29/2011 |
