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| Application No. | Application Title | Issue Date |
| 20120104950 | METHODS FOR CALIBRATING RF POWER APPLIED TO A PLURALITY OF RF COILS IN A PLASMA PROCESSING SYSTEM Methods for calibrating RF power applied to a plurality of RF coils are provided. In some embodiments, a method of calibrating RF power applied to a first and second RF coil of a process chamber having a power divider to control a first ratio equal to a first magnitude ... | 05/03/2012 |
| 20120104290 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM An apparatus for generating extreme ultraviolet light by exciting a target material to turn the target material into plasma may include: a frame; a chamber in which the extreme ultraviolet light is generated; a target supply unit for supplying the target material into t... | 05/03/2012 |
| 20120081006 | DEVICE FOR GENERATING PLASMA AND FOR DIRECTING AN FLOW OF ELECTRONS TOWARDS A TARGET Various embodiments include a device for generating plasma and for directing an flow of electrons towards a specific target; the device comprises a hollow cathode; a main electrode at least partially placed inside the cathode; a resistor, electrically earthing the main ... | 04/05/2012 |
| 20120068602 | ELECTRODE AND PLASMA GUN CONFIGURATION FOR USE WITH A CIRCUIT PROTECTION DEVICE A circuit protection device includes a plasma gun configured to emit an ablative plasma along an axis, and a plurality of electrodes, wherein each electrode is electrically coupled to a respective conductor of a circuit and is arranged substantially along a plane that i... | 03/22/2012 |
| 20120043890 | PROACTIVE ARC MANAGEMENT OF A PLASMA LOAD Proactive arc management systems and methods are disclosed. In many implementations, proactive arc management is accomplished by executing an arc handling routine in response to an actual arc occurring in the plasma load and in response to proactive arc handling request... | 02/23/2012 |
| 20120038277 | POWER SUPPLY CONTROL DEVICE, PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD According to one embodiment, a power supply control device of a plasma processing device having a plasma generation unit which generates plasma in a process chamber. The power supply control device includes a radio frequency power supply, a storage unit, and a matching ... | 02/16/2012 |
| 20120032596 | PLASMA SOURCE FOR LARGE SIZE SUBSTRATE A plasma source for a substrate is provided. The plasma source may include a source electrode and an impedance box. The source electrode receives a source Radio Frequency (RF) from the external and generates plasma based on capacitive coupling within a vacuum chamber. T... | 02/09/2012 |
| 20120019143 | Plasma Generator and Method for Controlling a Plasma Generator A plasma generator having a housing surrounding an ionization chamber, at least one working-fluid supply line leading into the ionization chamber, the ionization chamber having at least one outlet opening, at least one electric coil arrangement which surrounds at least ... | 01/26/2012 |
| 20120018410 | Microwave Plasma Generating Plasma and Plasma Torches The invention relates to a plasma generating device that comprises at least one very high frequency source (>100 MHz) connected via an impedance adaptation device to an elongated conductor attached on a dielectric substrate, at least one means for cooling said conduc... | 01/26/2012 |
| 20120013253 | Phase And Frequency Control Of A Radio Frequency Generator From An External Source Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit contr... | 01/19/2012 |
| 20120000606 | PLASMA UNIFORMITY SYSTEM AND METHOD A plasma processing tool comprises a plasma chamber configured to generate a plasma from a gas introduced into the chamber where the generated plasma has an electron plasma frequency. A plurality of electrodes disposed within the chamber. Each of the electrodes configur... | 01/05/2012 |
| 20120001549 | PLASMA SOURCE ELECTRODE An electrode tile configuration is disclosed. The tile has contoured edges dimensioned to control any coupling effects. A plurality of tiles in a matrix configuration is also described.... | 01/05/2012 |
| 20110309748 | RF MATCHING NETWORK OF A VACUUM PROCESSING CHAMBER AND CORRESPONDING CONFIGURATION METHODS A RF matching network is described, and which includes a 1st to nth RF generators, and wherein each RF generator has a different frequency, and wherein the frequencies of the 1st to the nth RF input ports decline in sequence, and wherein between th... | 12/22/2011 |
| 20110309749 | METHOD AND APPARATUS FOR OPERATING TRAVELING SPARK IGNITER AT HIGH PRESSURE An ignition circuit and a method of operating an igniter (preferably a traveling spark igniter) in an internal combustion engine, including a high pressure engine. A high voltage is applied to electrodes of the igniter, sufficient to cause breakdown to occur between the... | 12/22/2011 |
| 20110291566 | Multi-Wavelength Pumping to Sustain Hot Plasma A method of sustaining a plasma, by focusing a first wavelength of electromagnetic radiation into a gas within a volume, where the first wavelength is substantially absorbed by a first species of the gas and delivers energy into a first region of a plasma having a first... | 12/01/2011 |
| 20110284774 | TARGET OUTPUT DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predet... | 11/24/2011 |
| 20110273094 | PLASMA PROCESSING APPARATUS A plasma processing apparatus includes a vacuum chamber, a plasma processing execution portion, a discharge state detecting unit, a window portion, a camera, a first storing portion, a second storing portion and an image data extracting unit. When an abnormal discharge ... | 11/10/2011 |
| 20110260621 | LOW-POWER GASEOUS PLASMA SOURCE A plasma source includes a first rod forming a quarterwave antenna, surrounded by at least one parallel rod forming a coupler and which is substantially the same length as the first rod, set to a reference potential, the coupler rods being evenly distributed radially ab... | 10/27/2011 |
| 20110254448 | METHOD AND SYSTEM FOR INCREASING THE LIFESPAN OF A PLASMA A method and a system for increasing the lifespan of a plasma obtained in the atmosphere. The method includes the following steps: emitting a femtosecond laser pulse, referred to as a first pulse, generating a column of plasma by the filamentation phenomenon, and emitti... | 10/20/2011 |
| 20110248633 | METHODS AND APPARATUS FOR APPLYING PERIODIC VOLTAGE USING DIRECT CURRENT Methods and apparatus for applying pulsed DC power to a plasma processing chamber are disclosed. In some implementations, frequency of the applied power is varied to achieve desired processing effects such as deposition rate, arc rate, and film characteristics. In addit... | 10/13/2011 |
| 20110251604 | NANO DISCHARGES IN LIQUIDS The present invention is direct to a nano-probe corona tool and uses thereof. A nano-probe corona tool is disclosed having a tip with a diameter in the nano-scale, typically around 100 nm. The nano-probe corona tool is constructed of electrically conductive material. On... | 10/13/2011 |
| 20110241547 | PLASMA PROCESSING APPARATUS A plasma processing device includes a first electrode plate (3), a second electrode plate (4), a matching device (8), a power distribution device (9) and a power supply device (1). The first electrode plate (3) includes at least... | 10/06/2011 |
| 20110234100 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE A processing speed may be easily controlled over the wide range within the impedance variation range. A substrate processing apparatus includes: a processing chamber configured to process a substrate; a substrate support unit configured to support the substrate in the p... | 09/29/2011 |
| 20110234102 | APPARATUS FOR NORMAL PRESSURE PLASMA IGNITION AND METHOD FOR NORMAL PRESSURE PLASMA IGNITION USING SAME Provided are an apparatus for normal pressure plasma ignition and a method for normal pressure plasma ignition using the same. The apparatus for normal pressure plasma ignition of the present invention comprises a wave guide tube wherein microwaves are applied, a dielec... | 09/29/2011 |
| 20110234101 | Induction switch The invention relates to an induction switch comprising a discharge container filled with gas and a coaxially interleaved electrode device, and to a corresponding method for commutating high voltages. The inductive production of a dense plasma and the subsequent floodin... | 09/29/2011 |
| 20110234099 | PLASMA GENERATION APPARATUS Provided is an apparatus, such as an arc mitigating device, which can include a first plasma generation device and a second plasma generation device. The second plasma generation device can include a pair of opposing and spaced apart electrodes and a low voltage, high c... | 09/29/2011 |
| 20110203543 | MONITORING OF THE EXCITATION FREQUENCY OF A RADIOFREQUENCY SPARK PLUG A radiofrequency plasma generating device, including: a control module generating a control signal at a control frequency, a power supply circuit including a breaker switch controlled by the control signal, the breaker switch applying an excitation signal to an output o... | 08/25/2011 |
| 20110192348 | RF Hollow Cathode Plasma Generator An RF hollow cathode plasma source consists of a vacuum chamber, a pipe, a hollow cathode, at least two compartments, a conduit and input electrodes. The pipe is inserted into the chamber for introducing working gas into the chamber. The hollow cathode is disposed in th... | 08/11/2011 |
| 20110193483 | Methods for Inductively-Coupled RF Power Source A method for tracking a variable resonance condition in a plasma coil during creation of plasma from a gas flowing in a plasma torch adjacent to the plasma coil comprises: providing a radio-frequency (RF) power source comprising a power amplifier that generates a radio-... | 08/11/2011 |
| 20110180149 | SINGLE DIELECTRIC BARRIER DISCHARGE PLASMA ACTUATORS WITH IN-PLASMA catalysts AND METHOD OF FABRICATING THE SAME A single dielectric barrier plasma actuator is disclosed which includes a pair of offset electrodes and a dielectric barrier therebetween which includes a catalyst at least in the area adjacent one of the electrodes for enhancing the force created in the background gas ... | 07/28/2011 |
| 20110175531 | PLASMA GENERATION DEVICE WITH SPLIT-RING RESONATOR AND ELECTRODE EXTENSIONS A plasma generation device includes: a substrate having a first surface and a second surface; a stripline resonant ring disposed on the first surface of the substrate, and defining a discharge gap; a pair of electrode extensions connected to the stripline resonant ring ... | 07/21/2011 |
| 20110163673 | DEVICE FOR GENERATING RADIOFREQUENCY PLASMA A device for generating a radiofrequency plasma, that includes a voltage generator, and at least one ignition assembly that includes an ignition plug and a switch provided between a supply terminal of the plug and an output of the generator adapted for electrically conn... | 07/07/2011 |
| 20110148303 | EFFICIENT ACTIVE SOURCE IMPEDANCE MODIFICATION OF A POWER AMPLIFIER A system, method, and apparatus for stabilizing interactions between an electrical generator and a nonlinear load are described. One illustrative embodiment includes an impedance element that is coupled to an output of the generator and a power source coupled to the imp... | 06/23/2011 |
| 20110140607 | SYSTEM, METHOD AND APPARATUS FOR GENERATING PLASMA A plasma generating system, related method and device are disclosed. The plasma generation system includes a plasma generation device, a source of ionizable gas and a driver network. The plasma generation device includes a housing, an electrode, and a resonant circuit. ... | 06/16/2011 |
| 20110134405 | RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A radiation source is configured to generate radiation. The radiation source includes a first electrode and a second electrode configured to produce an electrical discharge during use to generate radiation-emitting plasma from a plasma fuel. The radiation source also in... | 06/09/2011 |
| 20110133650 | APPARATUS FOR GENERATING PLASMA An apparatus for generating plasma is provided. The apparatus may include a vacuum chamber and a plasma source part. The plasma source part may include a dielectric part, an upper electrode, and an inductive coil. The dielectric part may be installed to protrude upward ... | 06/09/2011 |
| 20110133651 | Methods And Apparatus For Generating Strongly-Ionized Plasmas With Ionizational Instabilities A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output ... | 06/09/2011 |
| 20110121735 | TISSUE RESURFACING In an electonic key associated with a device for skin treatment there is a housing and an integrated circuit, the integrated circuit is positioned within the housing, wherein the device for treating human tissue comprises a surgical instrument having a gas conduit termi... | 05/26/2011 |
| 20110115379 | CURRENT CONTROL IN PLASMA PROCESSING SYSTEMS A plasma processing system for generating plasma to process at least a wafer. The plasma processing system includes a coil for conducting a current for sustaining at least a portion of the plasma. The plasma processing system also includes a sensor coupled with the coil... | 05/19/2011 |
| 20110114115 | TUNING HARDWARE FOR PLASMA ASHING APPARATUS AND METHODS OF USE THEREOF A continuously variable microwave circuit capable of being tuned to operate under a plurality of distinct operating conditions, comprising: a waveguide comprising an adjustable tuning element having a core configured to protrude into the waveguide; an actuator in operat... | 05/19/2011 |
