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| Application No. | Application Title | Issue Date |
| 20120104286 | METHOD FOR RESIZING PATTERN TO BE WRITTEN BY LITHOGRAPHY TECHNIQUE, AND CHARGED PARTICLE BEAM WRITING METHOD A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing reg... | 05/03/2012 |
| 20120104252 | Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein i... | 05/03/2012 |
| 20120068089 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD A charged particle beam writing apparatus includes a unit calculating a total charge amount of charged particle beams irradiating each minimum deflection region in deflection regions having different deflection sizes respectively deflected by deflectors of a plurality o... | 03/22/2012 |
| 20120040279 | METHOD, DEVICE, AND SYSTEM FOR FORMING CIRCULAR PATTERNS ON A SURFACE A stencil for character projection (CP) charged particle beam lithography and a method for manufacturing the stencil is disclosed, where the stencil contains two circular characters, where each character is capable of forming patterns on a surface in a range of sizes by... | 02/16/2012 |
| 20120025108 | Method for Fracturing and Forming a Pattern Using Curvilinear Characters with Charged Particle Beam Lithography In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined fo... | 02/02/2012 |
| 20120012760 | Laser irradiation apparatus A laser irradiation apparatus provides a laser beam along a scan direction to a semiconductor layer including a plurality of pixel areas. The laser irradiation apparatus includes at least one laser mask including a plurality of slit groups respectively facing portions o... | 01/19/2012 |
| 20120007002 | CHARGED PARTICLE BEAM PATTERN FORMING APPARATUS AND CHARGED PARTICLE BEAM PATTERN FORMING METHOD A charged particle beam pattern forming apparatus, includes a charge amount distribution calculation unit configured to calculate a charge amount distribution charged by vertical incidence of a charged particle beam on a pattern forming region of a target object; a posi... | 01/12/2012 |
| 20120001097 | CHARGED PARTICLE BEAM DRAWING APPARATUS AND CONTROL METHOD THEREOF A charged particle beam drawing apparatus applies a predetermined dose of a charged particle beam for drawing patterns corresponding to figures included in a drawing data, in a whole of a drawing area of a workpiece, before a result of calculation of a fogging effect co... | 01/05/2012 |
| 20110300711 | METHOD AND SYSTEM FOR PATTERNING A SUBSTRATE A method of patterning a substrate comprises providing an array of resist features defined by a first pitch and a first gap width between adjacent resist features. Particles are introduced into the array of resist features, wherein the array of resist features becomes h... | 12/08/2011 |
| 20110287345 | ELECTRON BEAM DRAWING APPARATUS, ELECTRON BEAM DRAWING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING TEMPLATE MANUFACTURING METHOD According to one embodiment, there is provided a electron beam drawing apparatus includes an irradiation module which irradiates a resist coated onto a substrate with a electron beam, and a control module which controls the irradiation module and which acquires the rela... | 11/24/2011 |
| 20110253912 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD A beam writing apparatus according to an embodiment includes a selection unit configured to select a dose equation from a plurality of dose equations for calculating a dose of a beam, for each small region of a plurality of small regions made by virtually dividing a wri... | 10/20/2011 |
| 20110226970 | SYSTEM AND METHOD FOR GENERATING DIRECT-WRITE PATTERN A direct-write system is provided which includes a stage for holding a substrate, a processing module for processing pattern data and generating instructions associated with the pattern data, and an exposure module that includes beams that are focused onto the substrate... | 09/22/2011 |
| 20110207053 | EXPOSURE METHOD AND METHOD OF MAKING A SEMICONDUCTOR DEVICE An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating... | 08/25/2011 |
| 20110195226 | WORK PIECE WITH CONCEALED SURFACE DEFECTS Methods for removing random or uncontrolled surface defects from a work piece surface are provided, by applying a plurality of induced controlled defects over the random defects to alter the surface texture.... | 08/11/2011 |
| 20110192994 | SYSTEM AND METHOD OF ELECTRON BEAM WRITING A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received informat... | 08/11/2011 |
| 20110155930 | SUBSTRATE COVER AND CHARGED PARTICLE BEAM WRITING METHOD USING SAME A substrate cover 40 includes a conductive portion 41 having a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portions 47 each formed of a light transmissive member... | 06/30/2011 |
| 20110140007 | SEMICONDUCTOR MANUFACTURING APPARATUS To project a rectangular laser spot having a predetermined size and a high laser power density onto the surface of an object, a semiconductor manufacturing apparatus comprises a control unit for controlling power of a laser light source, an optical waveguide unit (1<... | 06/16/2011 |
| 20110138342 | Retargeting for Electrical Yield Enhancement A mechanism is provided for electrical yield enhancement retargeting of photolithographic layouts. Optical proximity correction is performed on a set of target patterns in order to produce a set of optical proximity correction mask shapes. A set of lithographic contours... | 06/09/2011 |
| 20110121208 | CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFFECT CORRECTION METHOD THEREOF A charged particle beam drawing apparatus calculates a pattern area density distribution by using a central processing unit, calculates a dose distribution by using the central processing unit, calculates an irradiation amount distribution by using the central processin... | 05/26/2011 |
| 20110114856 | ALL-OPTICAL CONTROL OF THZ RADIATION IN PARALLEL PLATE WAVEGUIDES The invention relates to control of THz radiation in parallel plate waveguides (PPWG) by forming components in the waveguide by use of optical radiation pulses. Patterns of excited regions induced in the PPWG by an optical excitation pulses changes the electromagnetic p... | 05/19/2011 |
| 20110089344 | Method for Fracturing a Pattern for Writing with a Shaped Charged Particle Beam Writing System Using Dragged Shots In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a shot determined for a shaped charged particle beam writer system c... | 04/21/2011 |
| 20110089346 | METHOD AND SYSTEM FOR PATTERN WRITING WITH CHARGED-PARTICLE BEAM Irradiation position errors of a first charged-particle-beam writing apparatus are calculated by scanning a charged-particle beam across a calibration substrate on which two films having different reflectances are formed, with the calibration substrate being placed insi... | 04/21/2011 |
| 20110089345 | METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING CHARGED PARTICLE BEAM LITHOGRAPHY In the field of semiconductor production using shaped beam charged particle beam lithography, a pattern is formed on a surface by dragging a charged particle beam across the surface in a single extended shot to form a track. In some embodiments, the track may form a str... | 04/21/2011 |
| 20110073782 | METHOD OF AND SYSTEM FOR EXPOSING A TARGET The invention relates to a method of exposing a target by means of a plurality of beamlets. First, a plurality of beamlets is provided. The beamlets are arranged in an array. Furthermore, a target to be exposed is provided. Subsequently, relative movement in a first dir... | 03/31/2011 |
| 20110068281 | CHARGED PARTICLE BEAM DRAWING APPARATUS AND PROXIMITY EFFECT CORRECTION METHOD THEREOF A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particl... | 03/24/2011 |
| 20110053093 | METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE BEAM BLUR A charged particle beam writer system is disclosed comprising a generator for a charged particle beam having a beam blur radius, wherein the beam blur radius may be varied from shot to shot, or between two or more groups of shots. A method for fracturing or mask data pr... | 03/03/2011 |
| 20110042588 | Semiconductor manufacturing apparatus Disclosed herein is a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus precisely adjusts the position and size of a light spot formed on a substrate, enabling formation of a target pattern or elimination of an unnecessary pattern in an ac... | 02/24/2011 |
| 20110017926 | SEMICONDUCTOR INTRA-FIELD DOSE CORRECTION A system and method are provided for automatic dose-correction recipe generation, the system including a dose-correction recipe generator, a reticle data unit in signal communication with the recipe generator, a slit data unit in signal communication with the recipe gen... | 01/27/2011 |
| 20110012035 | Method for Precision Symbolization Using Digital Micromirror Device Technology A programmed, circuit-controlled digital micro-mirror device (DMD, 202) guides the laser light (201) to create on the surface (211) of an object (210) two-dimensional finely detailed symbolization sets, including bar codes, for a plurality of... | 01/20/2011 |
| 20100279505 | METHOD FOR FABRICATING PATTERNS ON A WAFER THROUGH AN EXPOSURE PROCESS A method for forming patterns on a wafer includes forming a fence having a sloped face in an edge portion of the wafer. The sloped face is direct to an inside of the wafer. A first photoresist layer is formed which extends to cover the fence on the wafer. First photores... | 11/04/2010 |
| 20100237256 | CHARGED PARTICLE BEAM WRITING METHOD, METHOD FOR DETECTING POSITION OF REFERENCE MARK FOR CHARGED PARTICLE BEAM WRITING, AND CHARGED PARTICLE BEAM WRITING APPARATUS The reference mark has steps and is formed on a sample. A stage moves in X and Y directions. The sample M is placed on the stage. An optical lever type height position sensor emits light to detect the reference mark FM′ by the stage being scanned. The spot position of... | 09/23/2010 |
| 20100237469 | PHOTOMASK, SEMICONDUCTOR DEVICE, AND CHARGED BEAM WRITING APPARATUS A photomask has a pattern formed by writing of a charged beam on basis of a charged beam control data. The charged beam control data is produced by: setting a plurality of correction points in a writing area on pattern data; performing a simulation of writing with a cha... | 09/23/2010 |
| 20100181479 | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein i... | 07/22/2010 |
| 20100178602 | CHARGED PARTICLE BEAM WRITING APPARATUS AND DEVICE PRODUCTION METHOD A charged particle beam writing apparatus includes an aperture array configured to be capable of forming a plurality of charged particle beams using a plurality of openings, an element array including a plurality of main elements and a plurality of auxiliary elements di... | 07/15/2010 |
| 20100155625 | Methods for concealing surface defects Methods for removing random or uncontrolled surface defects from a work piece surface are provided, by applying a plurality of induced controlled defects over the random defects to alter the surface texture.... | 06/24/2010 |
| 20100127185 | METHOD FOR MASKLESS PARTICLE-BEAM EXPOSURE In a maskless particle multibeam processing apparatus, a particle beam is projected through a pattern definition system producing a regular array of beamlets according to a desired pattern, which is projected onto a target which moves at continuous speed along a scannin... | 05/27/2010 |
| 20100102255 | METHOD OF TRANSFERRING PATTERN OF RETICLE, COMPUTER READABLE STORAGE MEDIUM, AND METHOD OF MANUFACTURING DEVICE A method includes setting a target pattern to be formed on a substrate using a reticle, obtaining a first pattern using the reticle and a first illumination condition, calculating, a second illumination condition under which the target pattern is transferred onto the su... | 04/29/2010 |
| 20100072403 | PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD A pattern forming apparatus using lithography technique includes a stage configured to allow a target object to be placed thereon; a plurality of columns configured to form patterns on the target object by using a charged particle beam while moving relatively to the sta... | 03/25/2010 |
| 20100068830 | MARKER STRUCTURE AND METHOD FOR CONTROLLING ALIGNMENT OF LAYERS OF A MULTI-LAYERED SUBSTRATE The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength.... | 03/18/2010 |
| 20100062349 | Stencil, Stencil Design System and Method for Cell Projection Particle Beam Lithography Stencil masks, particle beam lithography characters and methods for designing the same for use in particle beam lithography are disclosed. The masks, characters and methods for designing them allows for more accurately writing images by reducing various chemical and phy... | 03/11/2010 |
