Bizarre Patents
Crispy Chip Sandwich and Process of Producing a Sandwich Product
A food product comprising a multilayer cookie or snack having outer layers formed from a crispy type edible food product such as a potato chip or corn chip, etc. with an intermediate marshmallow layer being in contact with the inner surface of each crispy chip and one or more filler substances.
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| Application No. | Application Title | Issue Date |
| 20110220810 | ION DOPING APPARATUS AND DOPING METHOD THEREOF An ion doping apparatus and a doping method are disclosed. In one embodiment, the apparatus includes a chamber, and a substrate driving unit configured to support and move a substrate in the chamber, wherein the substrate has a plurality of long sides and a plurality of... | 09/15/2011 |
| 20110186748 | Systems And Methods For Scanning A Beam Of Charged Particles Systems and methods of an ion implant apparatus include an ion source for producing an ion beam along an incident beam axis. The ion implant apparatus includes a beam deflecting assembly coupled to a rotation mechanism that rotates the beam deflecting assembly about the... | 08/04/2011 |
| 20110174985 | LITHOGRAPHY SYSTEM WITH LENS ROTATION The invention relates to a charged particle based lithography system for projecting an image on a target using a plurality of charged particle beamlets for transferring said image to said target, said system comprising a charged particle column comprising: 07/21/2011 | |
| 20110168911 | DEMAGNIFICATION MEASUREMENT METHOD FOR CHARGED PARTICLE BEAM EXPOSURE APPARATUS, STAGE PHASE MEASUREMENT METHOD FOR CHARGED PARTICLE BEAM EXPOSURE APPARATUS, CONTROL METHOD FOR CHARGED PARTICLE BEAM EXPOSURE APPARATUS, AND CHARGED PARTICLE BEAM EXPOSURE APPARATUS A method for measuring a demagnification of a charged particle beam exposure apparatus includes measuring a first stage position of a mask stage in accordance with a mask stage coordinate system, irradiating a first charged particle beam to a first irradiation position ... | 07/14/2011 |
| 20110147609 | ION BEAM DEVICE An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being... | 06/23/2011 |
| 20110001059 | Use of Beam Scanning to Improve Uniformity and Productivity of a 2D Mechanical Scan Implantation System An ion implantation system includes a beamline configured to direct an ion beam toward an end station configured to hold or support a workpiece, and a scanning system. The scanning system is configured to scan the end station past the ion beam in a two-dimensional fashi... | 01/06/2011 |
| 20100243911 | CHARGED PARTICLE IRRADIATION SYSTEM AND IRRADIATION PLANNING EQUIPMENT In a charged particle irradiation system, forming a uniform dose distribution is required by irradiating a moving irradiation object through beam scanning and energy stacking. The charged particle irradiation system includes an ion beam generator 1 from which an ... | 09/30/2010 |
| 20100237253 | CHARGED PARTICLE BEAM DRAWING METHOD AND APPARATUS A charged particle beam drawing apparatus includes a charged particle beam gun, a first forming aperture member having an opening, wherein a charged particle beam emitted from the charged particle beam gun is passed through the opening of the first forming aperture memb... | 09/23/2010 |
| 20100224790 | Global Point Spreading Function in Multi-Beam Patterning In a particle multi-beam structuring apparatus for forming a pattern on a target's surface using a beam of electrically charged particles, during exposure steps the particle beam is produced, directed through a pattern definition means producing a patterned particle bea... | 09/09/2010 |
| 20100213385 | DEVICE AND METHOD FOR ADMINISTERING PARTICLE BEAM THERAPY A device for circumscribing a target site with a beam. The target site is located within a target body. The path of the beam is varied rotationally so as to form a cone with an isocenter at the cone's apex. The isocenter is fixed on the approximate center of the target ... | 08/26/2010 |
| 20100213386 | FOCUSED ION BEAM SYSTEM AND SAMPLE PROCESSING METHOD USING THE SAME A focused ion beam system includes a sample holder having a fixing plane for fixing a sample, a sample base on which the sample holder is provided, a focused ion beam irradiating mechanism that irradiates a focused ion beam to the sample, microtweezers that hold the sam... | 08/26/2010 |
| 20100172229 | DRAWING METHOD, DRAWING DEVICE, AND INFORMATION RECORDING MEDIUM In a drawing method and device, an electron beam is radiated to a surface of an object to draw a pattern along scan lines on the surface of the object. A pattern is drawn along the scan lines on the surface of the object by the electron beam through relative movement of... | 07/08/2010 |
| 20090032726 | ION IMPLANTER HAVING COMBINED HYBRID AND DOUBLE MECHANICAL SCAN ARCHITECTURE A system and method are provided for implanting ions into a workpiece in a plurality of operating ranges. A desired dosage of ions is provided, and a spot ion beam is formed from an ion source and mass analyzed by a mass analyzer. Ions are implanted into the workpiece i... | 02/05/2009 |
| 20090032725 | APPARATUS AND METHODS FOR TREATING A WORKPIECE USING A GAS CLUSTER ION BEAM Embodiments of an apparatus and methods of forming isolated islands of modified material with a gas cluster ion beam are generally described herein. Other embodiments may be described and claimed.... | 02/05/2009 |
| 20080142726 | Multi-directional mechanical scanning in an ion implanter This invention relates to a scanning arm assembly for multi-directional mechanical scanning of a semiconductor wafer or other substrate to be implanted. The present invention provides a scanning arm assembly comprising a pair of drive arms connected by two linkage arms ... | 06/19/2008 |
| 20080142728 | Mechanical scanner A mechanical scanner for ion implantation of a substrate, the mechanical scanner comprising a hexapod with a movable platform for holding the substrate, wherein the hexapod is arranged to have six degrees of freedom to allow the movable platform to be traversed relative... | 06/19/2008 |
| 20080142727 | Ion beam diagnostics This invention relates to a method of measuring a property of an ion beam, for example an ion beam current profile or the emittance of an ion beam. A Faraday array comprising an array of ion beam current sensors is employed. The array can provide an ion beam current pro... | 06/19/2008 |
| 20080135748 | Spherical Aberration Corrected Electrostatic Lens, Input Lens, Electron Spectrometer, Photoemission Electron Microscope And Measuring System A mesh (M) having an ellipsoid shape or a shape close to the ellipsoid shape is attached to an electrode (EL1) among electrodes (EL1 to ELn). Voltages of the later-stage electrodes (EL2 to ELn) are appropriately set. With this arrangement, a local negative spherical abe... | 06/12/2008 |
| 20080078944 | COMPUTER CONTROLLED ACTIVE FEEDBACK SYSTEM FOR LDI/ES ION SOURCE WITH ELECTRO-PNEUMATIC SUPERPOSITION This invention relates to systems and methods of optimizing the control and performance of Laser Desorption and Ionization (LDI) ion sources or Electro Spray (ES) ion sources employing electro-pneumatic superposition, the ion sources being operably connected to a mass s... | 04/03/2008 |
| 20080067338 | CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND METHOD FOR EVALUATING THE SAME In the charged particle beam lithography system, a pattern area to be drawn is divided into a plurality of frames, a main deflection positions a charged particle beam to a subfield within the frame, and an auxiliary deflection draws a pattern in units of the subfield. T... | 03/20/2008 |
| 20080054188 | ELECTRON BEAM LITHOGRAPHY APPARATUS AND METHOD FOR COMPENSATING FOR ELECTRON BEAM MISALIGNMENT Linear movement direction of the stage and the actual deflection direction of the electron beam deflected by the first command signal for deflecting the electron beam in the linear movement direction of the stage do not necessarily align with each other for reasons such... | 03/06/2008 |
| 20080023644 | System for the Delivery of Proton Therapy A process for an intensity-modulated proton therapy of a predetermined volume within an object includes discretising the predetermined volume into a number of iso-energy layers each corresponding to a determined energy of the proton beam. A final target dose distributio... | 01/31/2008 |
| 20080017807 | DEFLECTOR ARRAY, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD This invention discloses a deflector array in which a plurality of deflectors which deflect charged particle beams are arrayed on a substrate. Each deflector includes an opening formed on the substrate, and a pair of electrodes opposing each other through the opening. T... | 01/24/2008 |
| 20080006778 | LITHOGRAPHY SYSTEM AND LITHOGRAPHY METHOD USING THE SAME The window-frame judgment unit judges that a section to be drawn has entered a window-frame area according to the main deflector data and the stage position information to output judgment signal. The main deflector calculator receives the main deflector data and calcula... | 01/10/2008 |
| 20070200071 | Coupling output from a micro resonator to a plasmon transmission line A device for coupling output from a resonant structure to a plasmon transmission line includes a transmission line formed adjacent at least one element of the light-emitting resonant structure; a detector microcircuit disposed adjacent to the transmission line and where... | 08/30/2007 |
| 20070164230 | PATIENT ALIGNMENT SYSTEM WITH EXTERNAL MEASUREMENT AND OBJECT COORDINATION FOR RADIATION THERAPY SYSTEM A patient alignment system for a radiation therapy system. The alignment system includes multiple external measurement devices which obtain position measurements of components of the radiation therapy system which are movable and/or are subject to flex or other position... | 07/19/2007 |
| 20070114434 | MULTI-PIXEL ELECTRON MICROBEAM IRRADIATOR SYSTEMS AND METHODS FOR SELECTIVELY IRRADIATING PREDETERMINED LOCATIONS Multi-pixel electron microbeam irradiator systems and methods are provided with particular applicability for selectively irradiating predetermined cells or cell locations. A multi-pixel electron microbeam irradiator system can include a plurality of individually address... | 05/24/2007 |
| 20070080303 | Inductive load broadband RF system Many applications in scientific experimentation or industrial production require the generation and shaping of charged particle bunches. A particle bunch shaper can use less expensive and smaller electrical waveform generators when the particle bunch shaper uses a nanoc... | 04/12/2007 |
| 20070075263 | Ultra-small resonating charged particle beam modulator A method and apparatus for modulating a beam of charged particles is described in which a beam of charged particles is produced by a particle source and a varying electric field is induced within an ultra-small resonant structure. The beam of charged particles is modula... | 04/05/2007 |
| 20070075265 | Coupled nano-resonating energy emitting structures A coupled nano-resonating structure includes a plurality of a nano-resonating substructures constructed and adapted to couple energy from a beam of charged particles into said nano-resonating structure and to transmit the coupled energy outside said nano-resonating stru... | 04/05/2007 |
| 20070075264 | Electron beam induced resonance We describe an ultra-small structure that produces visible light of varying frequency, from a single metallic layer. In one example, a row of metallic posts are etched or plated on a substrate according to a particular geometry. When a charged particle beam passed close... | 04/05/2007 |
| 20060237661 | Charge particle beam accelerator The invention relates to charged particle beam accelerators, in particular electron beam accelerators, and can be used for physics, chemistry and medicine. The inventive charged particle beam accelerator comprises a metallic shell fitted with a dielectric material layer... | 10/26/2006 |
| 20060076503 | Optical coupling apparatus for a dual column charged particle beam tool for imaging and forming silicide in a localized manner An optical coupling apparatus for a dual column charged particle beam tool allowing both optical imaging of an area of an integrated circuit, as well as localized heating of the integrated circuit to form silicide. In one embodiment, optical paths from a whitelight sour... | 04/13/2006 |
| 20050281374 | Path planning and collision avoidance for movement of instruments in a radiation therapy environment A patient positioning system for use with a radiation therapy system that monitors the location of fixed and movable components and pre-plans movement of the movable components so as to inhibit movement if a collision would be indicated. The positioning system can also ... | 12/22/2005 |
| 20050194543 | Methods and apparatus for controlling ion current in an ion transmission device The invention provides apparatus and methods for controlling ion current in an ion transmission device. An apparatus of the present invention comprises an ion source, an ion transmission device, and a controller. The ion source and the ion transmission device are in ion... | 09/08/2005 |
| 20050194542 | Ion source with controlled superpositon of electrostatic and gas flow fields Ion source devices with controlled superposition of electrostatic and gas flow fields to effect rapid collisional cooling with improved ion collection and collimation, analytical apparatus comprising such ion source devices, and methods for use are presented. ... | 09/08/2005 |
| 20050167610 | Laser driven ion accelerator A system and method of accelerating ions in an accelerator to optimize the energy produced by a light source. Several parameters may be controlled in constructing a target used in the accelerator system to adjust performance of the accelerator system. These parameters i... | 08/04/2005 |
| 20050167608 | Method and apparatus for magnetic focusing of off-axis electron beam Axially symmetric magnetic fields are provided about the longitudinal axis of each beam of a multi-beam electron beam device. The magnetic field symmetry is independent of beam voltage, beam current and applied magnetic field strength. A flux equalizer assembly is dispo... | 08/04/2005 |
