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| Application No. | Application Title | Issue Date |
| 20110309264 | DEVICE FOR GENERATING AN ION BEAM WITH MAGNETIC FILTER The invention relates to a device (2) for generating an ion beam (4), comprising a support (6), an ion source (18), this ion source having a lower end (8) connected to the support (6) and an upper end (10) opposite the lo... | 12/22/2011 |
| 20110186747 | Systems And Methods For Scanning A Beam Of Charged Particles Systems and methods of an ion implant apparatus include an ion source for producing an ion beam along an incident beam axis. The ion implant apparatus includes a beam deflecting assembly coupled to a rotation mechanism that rotates the beam deflecting assembly about the... | 08/04/2011 |
| 20110147609 | ION BEAM DEVICE An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being... | 06/23/2011 |
| 20110147200 | Ion Beam Generator, and Substrate Processing Apparatus and Production Method of Electronic Device Using The Ion Beam Generator An ion beam generator generates plasma in a discharge tank 2, leads out an annular ion beam by a lead-out electrode 7, and deflects the ion beam in an annular center direction by a deflecting electrode 30 to enter a substrate W from the inclined dir... | 06/23/2011 |
| 20110108737 | PARTICLE BEAM IRRADIATION APPARATUS In order to obtain a particle beam irradiation apparatus that enlarges the dose distribution of beam spots while suppressing a decrease of the maximum available range of a charged particle beam, the particle beam irradiation apparatus includes a particle beam accelerati... | 05/12/2011 |
| 20110089334 | ION IMPLANTER WITH VARIABLE APERTURE AND ION IMPLANT METHOD THEREOF An ion implanter and an ion implant method are disclosed. The ion implanter has an aperture assembly with a variable aperture and is located between an ion source of an ion beam and a holder for holding a wafer. At least one of the size and the shape of the variable ape... | 04/21/2011 |
| 20110084216 | METHOD FOR TREATING NON-PLANAR STRUCTURES USING GAS CLUSTER ION BEAM PROCESSING A method for treating a structure is described. One embodiment includes forming a structure on a substrate, wherein the structure has a plurality of surfaces including one or more first surfaces lying substantially parallel to a first plane parallel with said substrate ... | 04/14/2011 |
| 20110031408 | MASK HEALTH MONITOR USING A FARADAY PROBE In an ion implanter, an ion current measurement device is disposed behind a mask co-planarly with respect to a surface of a target substrate as if said target substrate was positioned on a platen. The ion current measurement device is translated across the ion beam. The... | 02/10/2011 |
| 20100320394 | METHODS AND SYSTEMS FOR INCREASING THE ENERGY OF POSITIVE IONS ACCELERATED BY HIGH-POWER LASERS The energy of positive ions accelerated in laser-matter interaction experiments can be significantly increased by providing a plurality of laser pulses, e.g., through the process of splitting the incoming laser pulse, to form multiple laser-matter interaction stages. Fr... | 12/23/2010 |
| 20100320393 | OFF-AXIS ION MILLING DEVICE FOR MANUFACTURE OF MAGNETIC RECORDING MEDIA AND METHOD FOR USING THE SAME A tool for patterning a disk such as a magnetic media disk for use in a disk drive system. The tool includes a chamber and a first and second series of magnets, each evenly spaced about the chamber wall. An ion beam source at an end of the chamber emits an ion beam towa... | 12/23/2010 |
| 20100224592 | CHARGED PARTICLE BEAM PROCESSING Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably... | 09/09/2010 |
| 20100224789 | CHARGED PARTICLE BEAM WRITING APPARATUS AND OPTICAL AXIS DEVIATION CORRECTING METHOD FOR CHARGED PARTICLE BEAM A charged particle beam writing apparatus includes a stage on which a target object is placed; an emitting unit configured to emit a charged particle beam to the stage side; a blocking unit arranged between the emitting unit and the stage and configured to block the cha... | 09/09/2010 |
| 20100193472 | MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESSING SYSTEM AND METHOD OF OPERATING A gas cluster ion beam (GCIB) processing system using multiple nozzles for forming and emitting at least one GCIB and methods of operating thereof are described. The GCIB processing system may be configured to treat a substrate, including, but not limited to, doping, gr... | 08/05/2010 |
| 20100187435 | PARTICLE BEAM IRRADIATION APPARATUS AND PARTICLE BEAM IRRADIATION METHOD A particle beam irradiation apparatus includes: a beam generation unit that generates a particle beam; a beam emission control unit that controls emission of the particle beam; a beam scanning instruction unit that sequentially two-dimensionally instructs a position of ... | 07/29/2010 |
| 20100181494 | REDUCING THE WIDENING OF A RADIATION BEAM The present embodiments relate to lowering the widening of a radiation beam, for example, using a chamber arranged between a beam output and an object to be irradiated. The chamber is filled with a gas or a gas mixture, the average atomic number of which is smaller than... | 07/22/2010 |
| 20100140494 | COLLIMATOR MAGNET FOR ION IMPLANTATION SYSTEM A collimator magnet (CM) usable in an ion implantation system provides an exit ion beam with a large aperture, substantially parallel in one plane or orthogonal planes. The CM includes identical poles, defined by an incident edge receiving an ion beam, and an exit edge ... | 06/10/2010 |
| 20100127185 | METHOD FOR MASKLESS PARTICLE-BEAM EXPOSURE In a maskless particle multibeam processing apparatus, a particle beam is projected through a pattern definition system producing a regular array of beamlets according to a desired pattern, which is projected onto a target which moves at continuous speed along a scannin... | 05/27/2010 |
| 20100090123 | SCANNING IRRADIATION DEVICE OF CHARGED PARTICLE BEAM An inexpensive scanning irradiation device of a particle beam is obtained without using a rotating gantry. A first scanning electromagnet and a second scanning electromagnet, whose deflection surfaces of the particle beam are the same, and which bend the particle beam h... | 04/15/2010 |
| 20100065753 | CHARGED PARTICLE BEAM APPARATUS With a multi-beam type charged particle beam apparatus, and a projection charged particle beam apparatus, in the case of off-axial aberration corrector, there is the need for preparing a multitude of multipoles, and power supply sources in numbers corresponding to the n... | 03/18/2010 |
| 20100044578 | Charged Particle Beam Lithography System and Target Positioning Device The invention relates to a charged particle beam lithography system comprising:
| 02/25/2010 |
| 20100015537 | BEAM DOSE COMPUTING METHOD AND WRITING METHOD AND RECORD CARRIER BODY AND WRITING APPARATUS A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regio... | 01/21/2010 |
| 20100001204 | Open-ended electromagnetic corrector assembly and method for deflecting, focusing, and controlling the uniformity of a traveling ion beam The present invention is an electromagnetic controller assembly for use in ion implantation apparatus, and provides a structural construct and methodology which can be employed for three recognizably separate and distinct functions: (i) To adjust the trajectory of charg... | 01/07/2010 |
| 20090140160 | Charged particle beam exposure system and beam manipulating arrangement A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients w... | 06/04/2009 |
| 20090134340 | CHARGED PARTICLE BEAM APPARATUS, AND IMAGE GENERATION METHOD WITH CHARGED PARTICLE BEAM APPARATUS The present invention has a subject to provide an apparatus that optimizes scanning in accordance with circumstances or purposes, reduces distortion of images, and improves throughput, image quality, and defect detection rate by controlling deflection of a charged parti... | 05/28/2009 |
| 20090101832 | DEFLECTING A BEAM OF ELECTRICALLY CHARGED PARTICLES ONTO A CURVED PARTICLE PATH A device for deflecting a beam of electrically charged particles onto a curved particle path is provided. The device includes at least one beam guidance magnet having a coil system which has at least one coil that is curved along the particle path for the purpose of def... | 04/23/2009 |
| 20090101833 | GANTRY, PARTICLE THERAPY SYSTEM, AND METHOD FOR OPERATING A GANTRY The present embodiments relate to a gantry for the beam guidance of a particle beam with at least one beam guidance element. A carrier device is rotatably mounted in such a way that the particle beam can be directed by a rotation of the carrier device with the beam guid... | 04/23/2009 |
| 20090032724 | FOCUSED NEGATIVE ION BEAM FIELD SOURCE An apparatus for producing negative ions including an emitter coated with an ionic liquid room-temperature molten salt, an electrode positioned downstream relative to the emitter, a power supply that applies a voltage to the emitter with respect to the electrode. The po... | 02/05/2009 |
| 20080315113 | BEAM GUIDANCE MAGNET A beam guidance magnet for deflecting a beam of electrically charged particles along a curved particle path is provided. The beam guidance magnet includes a coil system that does not include a ferromagnetic material affecting the beam guidance and has curved coils stret... | 12/25/2008 |
| 20080315120 | Focusing and positioning device for a particle-optical raster microscope The invention relates to a focusing and positioning ancillary device for a particle-optical scanning microscope, a particle-optical scanning microscope including a corresponding positioning aid, and a method for focusing and positioning an object in a particle-optical s... | 12/25/2008 |
| 20080296509 | Phase-shifting element and particle beam device having a phase-shifting element A phase-shifting element for shifting a phase of at least a portion of a particle beam is described, as well as a particle beam device having a phase-shifting element of this type. In the phase-shifting element and the particle beam device having a phase-shifting elemen... | 12/04/2008 |
| 20080265174 | CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD A charged particle beam writing apparatus includes an unit configured to irradiate a beam, a deflector configured to deflect the beam, a stage, on which a target is placed, configured to perform moving continuously, an lens configured to focus the beam onto the target, ... | 10/30/2008 |
| 20080230694 | Beam Optical Component Having a Charged Particle Lens The present invention relates to a beam optical component including a charged particle lens for focusing a charged particle beam, the charged particle lens comprising a first element having a first opening for focusing the charged particle beam; a second element having ... | 09/25/2008 |
| 20080217554 | CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD A charged particle beam writing apparatus includes an irradiation part configured to irradiate a charged particle beam; a first shaping aperture member having passing areas, that the charged particle beam passes through, on both sides of an area blocking the charged par... | 09/11/2008 |
| 20080179536 | Changed particle beam emitting device and method for adjusting the optical axis A charged-particle beam emitting device which includes the following configuration devices so that a lowering in the image resolution will be suppressed even if a primary beam is tilted relative to a sample: A device for causing orbit of the primary beam to pass through... | 07/31/2008 |
| 20080149846 | PARTICLE-BEAM APPARATUS WITH IMPROVED WIEN-TYPE FILTER In a particle-beam apparatus for irradiating a target, a pattern defined in a pattern definer is projected onto the target through a projection system by a beam of energetic electrically charged particles of, largely, a species of a nominal mass having a nominal kinetic... | 06/26/2008 |
| 20080142725 | INERTIAL ELECTROSTATIC CONFINEMENT FUSION A device for accelerating ions between a potential towards a central point in space is disclosed. The device can be used to accelerate ions along a collision path with other accelerated ions or other present particles resulting in a nuclear fusion reaction. The device i... | 06/19/2008 |
| 20080099693 | Charged-particle exposure apparatus In a particle-beam projection processing apparatus a target (41) is irradiated by means of a beam (pb) of energetic electrically charged particles, using a projection system (103) to image a pattern presented in a pattern definition means (102) onto... | 05/01/2008 |
| 20080073553 | ION BEAM PROFILER In one aspect, an ion beam profiler for use in an ion implanter is disclosed that includes a Faraday cup disposed in an end-station of the ion implanter in a path of an ion beam traveling from a source to the end-station. The Faraday cup comprises an aperture that is ad... | 03/27/2008 |
| 20080073552 | Method and apparatus for confining, neutralizing, compressing and accelerating an ion field An apparatus and method of use for injection, confinement, neutralization, acceleration and compression of an ion field using a solenoid having an axis of symmetry and supported within a vacuum space. A pair of magnetizable elements are positioned initially in spaced ap... | 03/27/2008 |
| 20080073550 | Methods and apparatus for beam density measurement in two dimensions A beam density measurement system includes a shield, a beam sensor, and an actuator. The beam sensor is positioned downstream from the shield in a direction of travel of a beam. The beam sensor is configured to sense an intensity of the beam, and the beam sensor has a l... | 03/27/2008 |
