Did You Know...
...that the video game, Pong, was invented by a guy who graduated at the bottom of his engineering class? Nolan Bushnell spent more time running the games at a local amusement park than he did on his studies at the University of Utah. His dreams of working for Disney's amusement empire were dashed when the company wouldn't hire him. Taking a boring job, Nolan daydreamed about electronic versions of popular games. He invented Pong, the first video game, and went on to found Atari Co.
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| Application No. | Application Title | Issue Date |
| 20120126116 | PATTERN SHAPE SELECTION METHOD AND PATTERN MEASURING DEVICE The present invention has an object to propose a method and an apparatus for selecting a pattern shape, wherein, when estimating a shape based on comparison between an actual waveform and a library, the method and the apparatus can appropriately estimate the shape. As a... | 05/24/2012 |
| 20120126119 | Charged-Particle-Beam Device To automatically measure patterns arranged symmetrically with respect to the axis of rotation on a sample by following predetermined procedures, a charged-particle-beam device of the present invention automatically rotates a template image to be used for template matchi... | 05/24/2012 |
| 20120126118 | CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR STABLY OBTAINING CHARGED PARTICLE BEAM IMAGE Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be ins... | 05/24/2012 |
| 20120126117 | SCANNING ELECTRON MICROSCOPE AND METHOD FOR PROCESSING AN IMAGE OBTAINED BY THE SCANNING ELECTRON MICROSCOPE In the case where a specimen is imaged by a scanning electron microscope, it is intended to acquire an image of a high quality having a noise component reduced, thereby to improve the precision of an image processing. The intensity distribution of a beam is calculated o... | 05/24/2012 |
| 20120104251 | SCANNING ELECTRON MICROSCOPE DEVICE, EVALUATION POINT GENERATING METHOD, AND PROGRAM An image acquisition condition necessary to so arrange FOV's as not to overlap along a device shape so that all constituent arreas necessary for electric characteristic measurement may be confined in the FOV's is determined from device shape information (including circu... | 05/03/2012 |
| 20120104250 | Microscope System, Method for Operating a Charged-Particle Microscope A method of operating a charged-particle microscope, the method comprising: recording a first image of a first region of an object in a first setting; recording a second image of a second region of the object using the charged-particle microscope in a second setting; re... | 05/03/2012 |
| 20120104254 | CHARGED PARTICLE BEAM DEVICE A charged particle beam device enabling prevention of degradation of reproducibility of measurement caused by an increase of the beam diameter attributed to an image shift and having a function of dealing with device-to-device variation. The charged particle beam device... | 05/03/2012 |
| 20120104252 | Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein i... | 05/03/2012 |
| 20120104253 | CHARGED PARTICLE BEAM MICROSCOPE AND MEASURING METHOD USING SAME A charged particle beam device is equipped with a function of: obtaining an approximation function of a sample drift from a visual field shift amount among plural images (S1); capturing a save image while correcting the drift on the basis of the approximation fun... | 05/03/2012 |
| 20120080597 | APPARATUS AND METHOD TO INSPECT DEFECT OF SEMICONDUCTOR DEVICE An apparatus and method to inspect a defect of a substrate. Since a recess of an under layer of a substrate is darker than a projection of a top layer, a ratio of a value of a secondary electron signal (of an SEM) of the under layer to a value of the top layer may be in... | 04/05/2012 |
| 20120068065 | PATTERN DEFECT INSPECTION APPARATUS AND PATTERN DEFECT INSPECTION METHOD A pattern defect inspection method includes generating electron beam irradiation point track data on the basis of first data on an inspection target pattern, irradiating the electron beam to the inspection target pattern in accordance with the electron beam irradiation ... | 03/22/2012 |
| 20120049064 | Charged Particle Apparatus An electromagnetic compound objective lens is provided for charged particle device, especially as an objective lens of low-voltage scanning electron microscope (LVSEM), which comprises a magnetic immersion lens and an electrostatic immersion lens. The magnetic immersion... | 03/01/2012 |
| 20120049063 | SAMPLE SURFACE INSPECTION APPARATUS AND METHOD The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspec... | 03/01/2012 |
| 20120052601 | Method and System for Extracting Samples After Patterning of Microstructure Devices Analysis of chemical and physical characteristics of polymer species and etch residues caused in critical plasma-assisted etch processes for patterning material layers in semiconductor devices may be accomplished by removing at least a portion of these species on the ba... | 03/01/2012 |
| 20120043462 | METHOD AND APPARATUS FOR CHARGED PARTICLE BEAM INSPECTION A method, apparatus and computer readable medium for charged particle beam inspection of a sample comprising at least one sampling region and at least one skip region is disclosed. The method, apparatus and computer readable medium comprise receiving an imaging recipe w... | 02/23/2012 |
| 20120043463 | COMPOSITE CHARGED PARTICLE RADIATION DEVICE A composite charged particle beams apparatus of the present invention allows a sample (5)'s cross-section or edge plane to be observed by using an electron beam (2b), the sample (5)'s cross-section or edge plane being fabricated by using an i... | 02/23/2012 |
| 20120037802 | Distributed Potential Charged Particle Detector A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly co... | 02/16/2012 |
| 20120032078 | Backscatter Reduction in Thin Electron Detectors In a direct electron detector, backscattering of electrons into the detector volume from below the sensor is prevented. In some embodiments, an empty space is maintained below the sensor. In other embodiments, a structure below the sensor includes geometry, such as mult... | 02/09/2012 |
| 20120032079 | INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTURING DEVICES USING THE SYSTEM An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image ... | 02/09/2012 |
| 20120025078 | Particle Beam System A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray dete... | 02/02/2012 |
| 20120025076 | DETECTOR DEVICE A detector device detects the penetration depth of a particle beam applied to a target volume. The detector device includes a first detection device and a second detection device. The second detection device is configured to detect photons that are formed in the target ... | 02/02/2012 |
| 20120025074 | ELECTRON DETECTOR INCLUDING AN INTIMATELY-COUPLED SCINTILLATOR-PHOTOMULTIPLIER COMBINATION, AND ELECTRON MICROSCOPE AND X-RAY DETECTOR EMPLOYING SAME A charged particle beam device includes an electron source structured to generate an electron beam, the electron source being coupled to an electron column that at least partially houses a system structured to direct the electron beam toward a specimen positioned in a s... | 02/02/2012 |
| 20120025077 | Particle Beam System A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray dete... | 02/02/2012 |
| 20120018630 | Nonoparticulate Assisted Nanoscale Molecular Imaging by Mass Spectrometery Methods and devices for mass spectrometry are described, specifically the use of nanoparticulate implantation as a matrix for secondary ion and more generally secondary particles. A photon beam source or a nanoparticulate beam source can be used a desorption source or a... | 01/26/2012 |
| 20120002787 | Method for determining the quantitative composition of a powder sample A method for automatic determination of the quantitative composition of a powder sample, comprises the following steps: (a) predetermining a list of phases; (b) calculating a theoretical diffraction diagram or theoretical energy-dispersive spectrum; (c) fitting the theo... | 01/05/2012 |
| 20120001070 | Magnifying Observation Apparatus Work to obtain an optical and an electron microscope images at an identical display size is facilitated. A magnifying observation apparatus includes: an electron beam imaging device that obtains an electron microscope image in a chamber; an optical imaging device that o... | 01/05/2012 |
| 20120001069 | Magnifying Observation Apparatus Observation fields of an electron microscope image and an optical magnifying observation image are smoothly switched. A magnifying observation apparatus includes: a pair of end-face plates closes end faces of a body portion; an electron beam imaging device mounted on a ... | 01/05/2012 |
| 20110315877 | Electron Microscope Device The present invention provides an electron microscope device, comprising a scanning electron microscope 2 and an optical microscope 3, wherein the scanning electron microscope has scanning means 10 for scanning an electron beam and an electron detec... | 12/29/2011 |
| 20110303845 | ELECTRON BEAM DEVICE AND SAMPLE HOLDING DEVICE FOR ELECTRON BEAM DEVICE An object of the invention is to provide an electron beam device and a sample holding device for the electron beam device that can observe the reaction between a sample and a gas at high resolution while a gas atmosphere is maintained even by using thin diaphragms. ... | 12/15/2011 |
| 20110297826 | CHARGED PARTICLE BEAM DEVICE AND METHOD FOR CORRECTING POSITION WITH RESPECT TO CHARGED PARTICLE BEAM An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the... | 12/08/2011 |
| 20110297827 | CHARGED PARTICLE BEAM DEVICE An object of the present invention is related to detecting of a detection signal at an optimum position in such a case that a sample plane is inclined with respect to a charged particle beam. The present invention is related to a charged pa... | 12/08/2011 |
| 20110295555 | Method and System for Determining a Lithographic Process Parameter The present invention relates to a method for determining parameter value related to a lithographic process by which a marker structure has been applied on a product substrate based on obtaining calibration measurement data, with an optical detection apparatus, from a c... | 12/01/2011 |
| 20110291010 | CHARGED PARTICLE RADIATION DEVICE The present invention provides a scanning charged particle beam device including a sample chamber (8) and a detector. The detector has: a function of detecting light at least ranging from the vacuum ultraviolet region to the visible light region, of light (17<... | 12/01/2011 |
| 20110291009 | SEMICONDUCTOR INSPECTION METHOD AND DEVICE THAT CONSIDER THE EFFECTS OF ELECTRON BEAMS Disclosed is a device capable of probing with minimal effect from electron beams. Rough probing is made possible using a lower magnification than the magnification usually viewed. When target contact of semiconductor is detected, measurement position is set in the cente... | 12/01/2011 |
| 20110284745 | Sample Holder, Inspection Apparatus, and Inspection Method A sample holder, inspection apparatus, and an inspection method using the sample holder having a film including a first surface and a second surface. A liquid sample may be held on the first surface. The film is made of two or more layers. A primary beam irradiation dev... | 11/24/2011 |
| 20110284746 | CHARGED PARTICLE BEAM DEVICE A charged particle beam device has a tilt detection unit that detects a tilt of a sample surface and an E×B deflector in which an electric field and a magnetic field are overlapped with each other and which causes, according to the detected tilt of the sample surface, ... | 11/24/2011 |
| 20110284744 | METHOD AND SYSTEM FOR 4D TOMOGRAPHY AND ULTRAFAST SCANNING ELECTRON MICROSCOPY A 4D electron tomography system includes a stage having one or more degrees of freedom, an electron source, and electron optics operable to direct electron pulses to impinge on a sample supported on the stage. A pulse of the electron pulses impinges on the sample at a f... | 11/24/2011 |
| 20110278452 | PATTERN CHECK DEVICE AND PATTERN CHECK METHOD Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (I) which generat... | 11/17/2011 |
| 20110282021 | Apparatus and Method for Modifying Physical Properties of Nanostructure Using Focused Electron Beam, and Nano-Barcode and Serial-Junction Nanowire Fabricated Thereby According to one embodiment of the present invention, a portion of a light-emitting polymer material or a conductive polymer material can be irradiated with a focused electron beam, so that the physical properties of that portion can be modified. For this purpose, one e... | 11/17/2011 |
| 20110278453 | Tool-To-Tool Matching Control Method And Its System For Scanning Electron Microscope A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron im... | 11/17/2011 |
