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| Application No. | Application Title | Issue Date |
| 20120126115 | SPECIMEN HOLDER HAVING ALIGNMENT MARKS For the microscopy of an object or a specimen with a combination of optical microscopy and particle beam microscopy, an electrically conducting specimen carrier (1) is used which is configured for use in a particle beam microscope as well as in an optical microsc... | 05/24/2012 |
| 20120126116 | PATTERN SHAPE SELECTION METHOD AND PATTERN MEASURING DEVICE The present invention has an object to propose a method and an apparatus for selecting a pattern shape, wherein, when estimating a shape based on comparison between an actual waveform and a library, the method and the apparatus can appropriately estimate the shape. As a... | 05/24/2012 |
| 20120104252 | Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein i... | 05/03/2012 |
| 20120104250 | Microscope System, Method for Operating a Charged-Particle Microscope A method of operating a charged-particle microscope, the method comprising: recording a first image of a first region of an object in a first setting; recording a second image of a second region of the object using the charged-particle microscope in a second setting; re... | 05/03/2012 |
| 20120104253 | CHARGED PARTICLE BEAM MICROSCOPE AND MEASURING METHOD USING SAME A charged particle beam device is equipped with a function of: obtaining an approximation function of a sample drift from a visual field shift amount among plural images (S1); capturing a save image while correcting the drift on the basis of the approximation fun... | 05/03/2012 |
| 20120104251 | SCANNING ELECTRON MICROSCOPE DEVICE, EVALUATION POINT GENERATING METHOD, AND PROGRAM An image acquisition condition necessary to so arrange FOV's as not to overlap along a device shape so that all constituent arreas necessary for electric characteristic measurement may be confined in the FOV's is determined from device shape information (including circu... | 05/03/2012 |
| 20120080596 | Laser Atom Probe and Laser Atom Probe Analysis Methods A laser atom probe system and a method for analysing a specimen by laser atom probe tomography are disclosed. The system includes a specimen holder whereon a specimen to be analyzed may be mounted, the specimen having a tip shape. The system further includes a detector,... | 04/05/2012 |
| 20120080595 | NON-CONTACT DETERMINATION OF JOINT INTEGRITY BETWEEN A TSV DIE AND A PACKAGE SUBSTRATE A non-contact voltage contrast (VC) method of determining TSV joint integrity after partial assembly. A TSV die is provided including TSVs that extend from a frontside of the TSV die to TSV tips on a bottomside of the TSV die. At least some TSVs (contacting TSVs) are at... | 04/05/2012 |
| 20120070848 | TUMOR CELL-DERIVED MICROVESICLES The present invention relates to a method for diagnosis of cancer and for monitoring the progression of cancer and/or the therapeutic efficacy of an anti-cancer treatment in a sample of a subject by detecting oncogenic proteins in microvesicles, and to the use of an age... | 03/22/2012 |
| 20120068067 | GAS FIELD ION MICROSCOPES HAVING MULTIPLE OPERATION MODES The disclosure relates to ion beams systems, such as gas field ion microscopes, having multiple modes of operation, as well as related methods. In some embodiments, the disclosure provides a method of operating a gas field ion microscope system that includes a gas field... | 03/22/2012 |
| 20120068065 | PATTERN DEFECT INSPECTION APPARATUS AND PATTERN DEFECT INSPECTION METHOD A pattern defect inspection method includes generating electron beam irradiation point track data on the basis of first data on an inspection target pattern, irradiating the electron beam to the inspection target pattern in accordance with the electron beam irradiation ... | 03/22/2012 |
| 20120068066 | DISPLACEMENT MEASURING DEVICE AND DISPLACEMENT MEASURING METHOD A displacement measuring device is provided which can directly measure a position and shape of a target object with high precision even if the target object has a minute shape with a high aspect ratio. A displacement measuring device 100 for measuring a change in a dist... | 03/22/2012 |
| 20120068068 | CHARGED PARTICLE DETECTORS Disclosed are devices, systems, and methods are disclosed that include: (a) a first material layer positioned on a first surface of a support structure and configured to generate secondary electrons in response to incident charged particles that strike the first layer, ... | 03/22/2012 |
| 20120049063 | SAMPLE SURFACE INSPECTION APPARATUS AND METHOD The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspec... | 03/01/2012 |
| 20120049061 | Detector System for Transmission Electron Microscope In a transmission electron microscope detector system, image data is read out from the pixels and analyzed during an image acquisition period. The image acquisition process is modified depending on the results of the analysis. For example, the analyses may indicate the ... | 03/01/2012 |
| 20120049062 | PHASE CONTRAST ELECTRON MICROSCOPE A phase contrast electron microscope has an objective with a back focal plane, a first diffraction lens, which images the back focal plane of the objective magnified into a diffraction intermediate image plane, a second diffraction lens whose principal plane is mounted ... | 03/01/2012 |
| 20120049060 | Detector System for Use with Transmission Electron Microscope Spectroscopy A detector system for a transmission electron microscope includes a first detector for recording a pattern and a second detector for recording a position of a feature of the pattern. The second detector is preferably a position sensitive detector that provides accurate,... | 03/01/2012 |
| 20120043462 | METHOD AND APPARATUS FOR CHARGED PARTICLE BEAM INSPECTION A method, apparatus and computer readable medium for charged particle beam inspection of a sample comprising at least one sampling region and at least one skip region is disclosed. The method, apparatus and computer readable medium comprise receiving an imaging recipe w... | 02/23/2012 |
| 20120037802 | Distributed Potential Charged Particle Detector A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly co... | 02/16/2012 |
| 20120032078 | Backscatter Reduction in Thin Electron Detectors In a direct electron detector, backscattering of electrons into the detector volume from below the sensor is prevented. In some embodiments, an empty space is maintained below the sensor. In other embodiments, a structure below the sensor includes geometry, such as mult... | 02/09/2012 |
| 20120032076 | METHOD FOR INSPECTING EUV RETICLE AND APPARATUS THEREOF A method of inspecting an EUV reticle is proposed, which uses an electron beam (EB) with low density and high energy to scan the surface of an EUV reticle for inspecting the EUV reticle. A step of conditioning surface charge is followed by a step of inspecting surface o... | 02/09/2012 |
| 20120032077 | Pattern measuring apparatus and pattern measuring method A pattern measurement apparatus and a pattern measurement method are capable of easily distinguishing a line pattern and a space pattern from one another, without being affected by the luminance of the pattern. The pattern measurement apparatus includes: irradiation uni... | 02/09/2012 |
| 20120025073 | ORIENTATION IMAGING USING WIDE ANGLE CONVERGENT BEAM DIFFRACTION IN TRANSMISSION ELECTRON MICROSCOPY Methods of orientation imaging microscopy (OIM) techniques generally performed using transition electron microscopy (TEM) for nanomaterials using dynamical theory is presented. Methods disclosed may use a wide angle convergent beam electron diffraction for performing OI... | 02/02/2012 |
| 20120027650 | METHODS AND DEVICES FOR PREPARING MICROSCOPY SAMPLES A system for preparing and holding specimens for microscopic analysis including a capsule having an open end, an opposite end including at least one aperture and a reservoir. The system also includes an insert with a base including at least one aperture. The insert fits... | 02/02/2012 |
| 20120025075 | METHOD AND APPARATUS FOR ACQUIRING SIMULTANEOUS AND OVERLAPPING OPTICAL AND CHARGED PARTICLE BEAM IMAGES This disclosure relates to a method and apparatus for producing multiple pixel-by-pixel simultaneous and overlapping images of a sample in a microscope with multiple imaging beams. A scanning electron microscope, a focused ion-beam microscope, or a microscope having bot... | 02/02/2012 |
| 20120025074 | ELECTRON DETECTOR INCLUDING AN INTIMATELY-COUPLED SCINTILLATOR-PHOTOMULTIPLIER COMBINATION, AND ELECTRON MICROSCOPE AND X-RAY DETECTOR EMPLOYING SAME A charged particle beam device includes an electron source structured to generate an electron beam, the electron source being coupled to an electron column that at least partially houses a system structured to direct the electron beam toward a specimen positioned in a s... | 02/02/2012 |
| 20120025076 | DETECTOR DEVICE A detector device detects the penetration depth of a particle beam applied to a target volume. The detector device includes a first detection device and a second detection device. The second detection device is configured to detect photons that are formed in the target ... | 02/02/2012 |
| 20120012747 | Contrast for Scanning Confocal Electron Microscope A scanning confocal transmission electron microscope includes a descan deflector and a corrector below the sample. The microscope uses a detector that is preferably significantly larger than the resolution of the microscope and is positioned in the real image plane, whi... | 01/19/2012 |
| 20120006984 | METHOD OF CONTROLLING PARTICLE ABSORPTION ON A WAFER SAMPLE BEING INSPECTED BY A CHARGED PARTICLE BEAM IMAGING SYSTEM A method of controlling particle absorption on a wafer sample and charged particle beam imaging system thereof prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.... | 01/12/2012 |
| 20120001068 | Method of Electron Diffraction Tomography The invention relates to a method for electron diffraction tomography in a Transmission Electron Microscope. Known methods involve using Scanning Transmission Electron Microscope, and use the scanned beam for STEM diffraction. The invention proposes to form the diffract... | 01/05/2012 |
| 20110315876 | Blocking Member for Use in the Diffraction Plane of a TEM The invention relates to a blocking member to be placed in the diffraction plane of a TEM. It resembles the knife edge used for single sideband imaging, but blocks only electrons deflected over a small angle. As a result the Contrast Transfer Function of the TEM accordi... | 12/29/2011 |
| 20110309245 | SPECIMEN PREPARATION DEVICE, AND CONTROL METHOD IN SPECIMEN PREPARATION DEVICE Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means... | 12/22/2011 |
| 20110303843 | SAMPLE OBSERVING METHOD AND SCANNING ELECTRON MICROSCOPE Provided is a sample observing method wherein the effect on throughput is minimized, and a pattern profile can be obtained at high accuracy even in a complicated LSI pattern, regardless of the scanning direction of an electron beam. In the sample observing method, the p... | 12/15/2011 |
| 20110303844 | ELECTRON MICROSCOPE, AND SPECIMEN HOLDING METHOD It is an object of the present invention to provide an electron microscope for properly applying a retarding voltage to a sample which is brought into electrical conduction. In order to accomplish the above-described object, the following e... | 12/15/2011 |
| 20110301869 | Method and System for Spectroscopic Data Analysis A method of analyzing spectroscopic data, the method comprising collecting spatially resolved measurement spectroscopic data of a sample for a series of measurements spots, assigning the measurement spots into a predefined set of spectral categories, based on characteri... | 12/08/2011 |
| 20110297826 | CHARGED PARTICLE BEAM DEVICE AND METHOD FOR CORRECTING POSITION WITH RESPECT TO CHARGED PARTICLE BEAM An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the... | 12/08/2011 |
| 20110292385 | Producing images of a specimen Producing images of a specimen includes introducing a specimen into a specimen chamber of a particle-beam device, selecting a specific position on the surface of the specimen, supplying a contrast-agent precursor on the specific position, providing a particle beam and/o... | 12/01/2011 |
| 20110291007 | Movable Detector for Charged Particle Beam Inspection or Review The present invention generally relates to a detection unit of a charged particle imaging system. More particularly, portion of the detection unit can move into or out of the detection system as imaging condition required. With the assistance of a Wein filter (also know... | 12/01/2011 |
| 20110291009 | SEMICONDUCTOR INSPECTION METHOD AND DEVICE THAT CONSIDER THE EFFECTS OF ELECTRON BEAMS Disclosed is a device capable of probing with minimal effect from electron beams. Rough probing is made possible using a lower magnification than the magnification usually viewed. When target contact of semiconductor is detected, measurement position is set in the cente... | 12/01/2011 |
| 20110291008 | ELECTRON MICROSCOPE SPECIMEN AND METHOD FOR PREPARING THE SAME A method for preparing an electron microscope specimen is provided. The method includes providing a wafer sample with an analysis region disposed thereon. A dicing process is performed to cut a sample piece from the wafer sample. The sample piece includes a target pilla... | 12/01/2011 |
