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| Application No. | Application Title | Issue Date |
| 20110284506 | HEAT TREATMENT APPARATUS The present invention relates to a heat treatment apparatus that performs activation annealing or defect repair annealing and surface oxidization which succeed impurity doping intended to control the conductive property of a semiconductor substrate. In the present inven... | 11/24/2011 |
| 20110284505 | APPARATUS AND METHOD FOR TEMPERATURE CONTROL OF A SEMICONDUCTOR SUBSTRATE SUPPORT A recirculation system of a substrate support on which a semiconductor substrate is subjected to a multistep process in a vacuum chamber, the system comprising a substrate support having at least one liquid flow passage in a base plate thereof, an inlet and an outlet in... | 11/24/2011 |
| 20110240610 | METHODS OF AND APPARATUSES FOR MAINTENANCE, DIAGNOSIS, AND OPTIMIZATION OF PROCESSES A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at l... | 10/06/2011 |
| 20110155703 | UNIVERSAL INPUT POWER SUPPLY UTILIZING PARALLEL POWER MODULES A universal power supply for use in a plasma arc system is disclosed. The power supply can include a plurality of power modules for providing a DC output from an AC input. Each of the power modules can include a rectifier, a converter, an inverter, an isolation transfor... | 06/30/2011 |
| 20110042357 | PLASMA TORCH WITH ELECTRODE WEAR DETECTION SYSTEM A plasma arc torch is provided that includes a wear stop designed to detect wear of an electrode and prevent the use of the electrode once the electrode has experienced a certain amount of wear. Either the electrode or the nozzle is movable with respect to the main torc... | 02/24/2011 |
| 20100243620 | PLASMA PROCESSING APPARATUS A plasma processing apparatus performs plasma processing on a processing target in a processing chamber. The apparatus includes: an object to be heated provided near a periphery of a mounting table disposed in the processing chamber; and a heating electrode disposed adj... | 09/30/2010 |
| 20100140231 | ARC RECOVERY WITH OVER-VOLTAGE PROTECTION FOR PLASMA-CHAMBER POWER SUPPLIES A system and method for managing power delivered to a processing chamber is described. In one embodiment current is drawn away from the plasma processing chamber while initiating an application of power to the plasma processing chamber during an initial period of time, ... | 06/10/2010 |
| 20100051593 | DEVICE FOR MACHINING WORKPIECES The invention relates to a device for machining, particularly for cutting, of electrically conductive workpieces using a machining tool (10), which can be displaced back and forth toward and away from a workpiece by means of a drive unit and which comprises an el... | 03/04/2010 |
| 20100025384 | FIELD ENHANCED INDUCTIVELY COUPLED PLASMA (FE-ICP) REACTOR Embodiments of field enhanced inductively coupled plasma reactors and methods of use of same are provided herein. In some embodiments, a field enhanced inductively coupled plasma processing system may include a process chamber having a dielectric lid and a plasma source... | 02/04/2010 |
| 20090294414 | METHOD OF PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRANSIENTS BY SYNCHRONIZED MODULATION OF A SOURCE POWER OR BIAS POWER RF GERERATOR A method processing a workpiece in a plasma reactor chamber in which a first one of plural applied RF plasma powers is modulated in accordance with a time-varying modulation control signal corresponding to a desired process transient cycle. The method achieves a reducti... | 12/03/2009 |
| 20090266799 | Method for Operating a Steam Plasma Burner and Steam Cutting Device The invention relates to a method for operation of a steam plasma burner (6), comprising a cathode (22) and an anode (24) in the form of a nozzle (23) for machining a workpiece (20), wherein during the operation a current is applied be... | 10/29/2009 |
| 20090271024 | Cutting Apparatus A cutting apparatus (1) includes a base (5) having upwardly extending first and second ends (10, 15) between which spaced elongate sides extend (20, 25). The ends and sides (10, 15, 20, 25) being located in a plane. The plane being inc... | 10/29/2009 |
| 20090230098 | METHOD FOR DETECTING CURRENT TRANSFER IN A PLASMA ARC Methods and systems for transferring a plasma arc from between an electrode and a tip to between an electrode and a workpiece and back as dictated by the conditions at the cutting arc are provided. The present disclosure allows for arc transfer detection without use of ... | 09/17/2009 |
| 20090218324 | DIRECT REAL-TIME MONITORING AND FEEDBACK CONTROL OF RF PLASMA OUTPUT FOR WAFER PROCESSING A method and apparatus for controlling power output of a capacitatively-coupled plasma are provided. A detector is disposed on the power delivery conduit carrying power to one electrode to detect fluctuations in power output to the electrode. The detector is coupled to ... | 09/03/2009 |
| 20090212027 | Binary Signal Detection A system and method for identifying a torch assembly associated with a thermal processing system can include a detector that detects a multi-bit binary signal based on a plurality of open circuits or closed circuits with the thermal processing system. Each representativ... | 08/27/2009 |
| 20090200276 | WATER-VAPOR PLASMA TORCH, AND WEAR-DETECTION AND PROCESS-CONTROL METHOD TO BE USED WITH SUCH A WATER-VAPOR PLASMA TORCH The invention relates to a water-vapor plasma torch (7) for cutting a workpiece (21), comprising a feed line (8) for a liquid (9), a heating device (22), and an evaporator (23) for forming a gas (20) from the liquid (9... | 08/13/2009 |
| 20090159571 | Plasma Cutter Having High Power Density Systems and methods are provided for a torch power system having a high power density. In one embodiment, a system is provided that includes a torch power unit having a compressor and power electronics that include one or more power converters, wherein the torch power u... | 06/25/2009 |
| 20090159576 | Automatic Compressor Adjustment System and Method for a Portable Cutting Torch System A system is provided that includes a torch power unit that includes a compressor and a controller configured to adjust output of the compressor in response to feedback comprising compressor output, or altitude, or atmospheric pressure, or a combination thereof. A method... | 06/25/2009 |
| 20090159575 | Plasma Cutter Having Microprocessor Control A system is provided that includes a torch power unit, wherein the torch power unit includes a motor and a digital device coupled to the motor and configured to control the motor. A method of operation is provided that includes controlling one or more aspects of a torch... | 06/25/2009 |
| 20090026181 | RADIO FREQUENCY POWER SUPPLY A plasma supply device includes a full bridge circuit that is connected to a DC power supply and that has two half bridges each with two series connected switching elements. The plasma supply device further includes a primary winding of a power transformer connected to ... | 01/29/2009 |
| 20090008369 | PROCESSING DEVICE In a processing apparatus for performing a specified process on a target object at a predetermined process pressure, the apparatus includes an evacuable processing chamber having a gas exhaust port formed in a bottom portion thereof; a mounting table provided within the... | 01/08/2009 |
| 20080257869 | RESPONDING TO ARC DISCHARGES For responding to an arc discharge in a plasma process (PP), a parameter of the plasma process is monitored to detect arc discharges occurring in the plasma. After detection of an arc discharge, a first countermeasure for the suppression of arc discharges is executed. A... | 10/23/2008 |
| 20080237201 | PORTABLE AUTONOMOUS MATERIAL PROCESSING SYSTEM A portable plasma arc torch system can be used for processing materials. The system includes a replaceable or rechargeable power source and replaceable or rechargeable gas source. A controller communicates with at least one of the power source or the gas source. A plasm... | 10/02/2008 |
| 20080173621 | Plasma Assisted Oxygen Decontaminant Generator and Sprayer An atomic oxygen generator/sprayer is invented. An array of three magnetized torches running at 60 Hz is used to generate non-thermal plasma; thus, the plasma effluent has relatively low temperature (touchable) and yet contains high energy electrons (>5 eV) capable to d... | 07/24/2008 |
| 20080149603 | Arc detector for plasma processing system An arc detector is provided for a plasma processing system including a HF power source, a plasma processor, and a voltage/current signal detector. The arc detector includes a calculator for the phase difference between the AC voltage signal and the AC current signal, a ... | 06/26/2008 |
| 20080121625 | DETECTING ARC DISCHARGES To detect arc discharges occurring in a plasma, a parameter of the plasma process is determined, and after a first period of time following the detection of an arc discharge the parameter is again determined. In the event that after the first period of time no arc disch... | 05/29/2008 |
| 20080116180 | METHODS AND SYSTEMS FOR CONTROLLING ELECTRIC HEATERS Systems and methods for controlling a heater to drive a load temperature to approximate a setpoint. At the beginning of each ½ AC cycle, a sigma delta modulation algorithm is computed to determine whether the AC cycle should be turned on or off. The running estimate of... | 05/22/2008 |
| 20080093347 | Plasma cutter, and plasma cutter power supply system In a main circuit 11 of the plasma cutter power supply device 6, a plurality of DC power units 14-1, . . . 14-n of low capacity are connected in parallel on their DC output sides, and are connected to a plasma torch 20. Each pow... | 04/24/2008 |
| 20080023448 | Plasma processing apparatus capable of adjusting temperature of sample stand A plasma processing apparatus is provided which processes a sample held on a sample table arranged in a process chamber in a vacuum container by using a plasma formed in the process chamber. The plasma processing apparatus comprises: paths arranged in the sample table i... | 01/31/2008 |
| 20070284348 | GAP DETECTION DEVICE FOR LASER BEAM MACHINE, LASER BEAM MACHINING SYSTEM AND GAP DETECTION METHOD FOR LASER BEAM MACHINE A signal processing portion obtains the reciprocal of a composite impedance of gap static capacitance and a plasma impedance, obtains composite static capacitance which is the sum of the gap static capacitance and a static capacitance component included in the plasma im... | 12/13/2007 |
| 20070284344 | HIGH AC CURRENT HIGH RF POWER AC-RF DECOUPLING FILTER FOR PLASMA REACTOR HEATED ELECTROSTATIC CHUCK An RF blocking filter isolates a two-phase AC power supply from at least 2 kV p-p of power of an HF frequency that is reactively coupled to a resistive heating element, while conducting several kW of 60 Hz AC power from the two-phase AC power supply to the resistive hea... | 12/13/2007 |
