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...that the inventor of the electric motor was a blacksmith named Thomas Davenport? Described as "a brilliantly unsuccessful inventor", Davenport invented the first rotary electric motor. In 1836 he headed out -- on foot -- from his Vermont home to file a patent application at the Patent Office in Washington, D.C. By the time he got there, he had squandered away his money and couldn't afford the $30 filing fee so he turned around and went home. When he later mailed in his application with money he'd raised, the Patent office was destroyed in a fire. He did finally get credit for his invention on Feb. 5, 1837.

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Class 204/192.3 - With sputter etching


Subclass of Class 204 - Chemistry: electrical and wave energy
Definition: Processes wherein a sputter etching step is included in
No. of applications: 12
Last issue date: 04/18/2013


Application No.Application TitleIssue Date
20130092527Method for Manufacturing Shielding
A method for manufacturing shielding which uses multiple vacuum sputtering methods to produce shielding on single IC chip. The method comprises the following steps: using covering fixtures to cover a plurality of IC chips and fixing these IC chips on a work support; vac...
04/18/2013
20120118627ELECTROMAGNETIC SHIELDING ARTICLE AND METHOD FOR MANUFACTURING SAME
An electromagnetic shielding article includes a plastic substrate; an aluminum layer deposited on the plastic substrate; an electromagnetic shielding layer deposited on the aluminum layer; and a protection layer deposited on the electromagnetic shielding layer....
05/17/2012
20110180388Plasma Processing Method and Plasma Processing Apparatus
[Object] To provide a plasma processing method and a plasma processing apparatus having high coverage property and excellent in-plane uniformity.

[Solving Means] When sputtered particles that are beat out from a target by plasma are deposit...

07/28/2011
20110031107METHOD OF BURYING METAL AND APPARATUS OF DEPOSITING METAL IN CONCAVE PORTION
The present invention provides the technology for burying metal even in a fine concave portion such as trench and via. According to an embodiment of the present invention, a vapor of the metal as the objective material, a gas containing halogen for etching the metal, an...
02/10/2011
20100279084Superhydrophobic Surface and Method of Forming Same
A superhydrophobic surface and method for forming same. In one embodiment, the method has the steps of preparing a surface of a substrate of a first material, modifying the surface through an etching process to generate a plurality of nucleation sites, and depositing a ...
11/04/2010
20100155223Electromagnet array in a sputter reactor
A multi-step process performed in a plasma sputter chamber including sputter deposition from the target and argon sputter etching of the substrate. The chamber includes a quadruple electromagnetic coil array coaxially arranged in a rectangular array about a chamber axis...
06/24/2010
20100089620Electronic Component Module and Method for the Production Thereof
An electronic component module comprising: at least one multilayer ceramic circuit carrier (2, 3); at least one cooling device comprising at least one heat sink; a composite layer (5, 6) arranged at least in regions between the ceramic circuit carrier (...
04/15/2010
20100078314METHOD FOR COATING FUEL SYSTEM COMPONENTS
The present disclosure includes a method of producing a fuel system component. The method includes providing a substrate and a coating, wherein the substrate comprises steel and the coating comprises a metal nitride. The method also includes applying the coating to at l...
04/01/2010
20090272641SPUTTER TARGET, METHOD FOR MANUFACTURING A LAYER, PARTICULARLY A TCO (TRANSPARENT CONDUCTIVE OXIDE) LAYER, AND METHOD FOR MANUFACTURING A THIN LAYER SOLAR CELL
In the present invention a sub-stoichiometric ceramic ZnOx:Al target, with 0.3<x<1, is used for depositing a ZnO:Al layer in a reactive sputtering process. The process is carried out in an Ar/O2 atmosphere. The diagram depicts the deposition ...
11/05/2009
20090229657Transparent conductive layer and method
The photovoltaic structure comprises a thin film coating on a transparent substrate, the thin film comprising an effective amount of nanocrystalline silicon embedded in a matrix of amorphous and/or microcrystalline silicon. A transparent conducting oxide layer on a laye...
09/17/2009
20090127095Method for forming fine particles, method for forming concavities and convexities, and device for forming fine particles
A method of the present invention for forming fine particles includes forming fine particles on a substrate by supplying, in the presence of inert gas, to the substrate, atoms or molecules of a supply material capable of being combined with a material constituting a sur...
05/21/2009
20090011217Method for applying a porous glass layer
The invention relates to a method for applying a porous glass layer. It is proposed to apply a porous glass layer by means of a PVD method. Porosity factor and average pore size can be varied by means of the process parameters such as pressure and deposition rate, as we...
01/08/2009
 
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