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Class 204/192.15 - Specified deposition material or use


Subclass of Class 204 - Chemistry: electrical and wave energy
Definition: Processes wherein the target or deposition material has
No. of applications: 528
Last issue date: 05/24/2012


1                      
Application No.Application TitleIssue Date
20120128948COATED ARTICLE AND METHOD FOR MANUFACTURING SAME
A coated article includes a substrate; a color layer deposited on the substrate; and a pattern layer deposited on the surface of the color layer opposite to the substrate. A network of metal nuclei groups forms the pattern layer. The network of metal nuclei groups inclu...
05/24/2012
20120128895CARBON FILM FORMING METHOD, MAGNETIC-RECORDING-MEDIUM MANUFACTURING METHOD, AND CARBON FILM FORMING APPARATUS
A carbon film forming method including a step in which, inside a film formation chamber provided with a filamentous cathode electrode, an anode electrode disposed around the perimeter of the cathode electrode, and a substrate holder disposed at a position that is separa...
05/24/2012
20120107643COATED ARTICLE AND METHOD FOR MAKING SAME
A coated article includes a substrate, an anti-corrosion layer formed on the substrate, and a decorative layer formed on the anti-corrosion layer. The substrate is made of magnesium or magnesium alloy. The anti-corrosion layer is a magnesium layer. The coated article ha...
05/03/2012
20120107606ARTICLE MADE OF ALUMINUM OR ALUMINUM ALLOY AND METHOD FOR MANUFACTURING
An article includes a substrate made of aluminum or aluminum alloy, an insulating coating formed on the substrate, and an anticorrosive coating formed on the insulating coating. The insulating coating is composed of electrically insulating ceramic material or polymer. T...
05/03/2012
20120103794METHOD OF COATING AN RF DEVICE AND SPUTTERING APPARATUS USED IN THE SAME
A method of coating an RF device for reducing cost of manufacture and coating period of time and a sputtering apparatus used in the same are disclosed. The sputtering apparatus used for coating of an RF device includes a supporting member on which an object to be coated...
05/03/2012
20120067717Method of co-sputtering alloys and compounds using a dual C-MAG cathode arrangement and corresponding apparatus
Certain example embodiments of this invention relate to techniques for sputter-depositing a thin film(s) including two or more materials using targets such as rotating cylindrical sputtering targets, including a method and apparatus. Magnet bar assemblies in first and s...
03/22/2012
20120070653COATED ARTICLE AND METHOD FOR MAKING THE SAME
A coated article is provided. The coated article includes a substrate, and an anti-fingerprint layer formed on the substrate. The anti-fingerprint layer is a nano aluminum-oxygen-carbon-nitrogen (Al—O—C—N) layer. A method for making the coated article is also desc...
03/22/2012
20120052291ARTICLE AND METHOD FOR MANUFACTURING SAME
An article includes a substrate; and a color layer deposited on the substrate, wherein the color layer is a chromium oxide-carbon layer; the color layer has an L* value between about 28 to about 32, an a* value between about −1 to about 1, and a b* value between about...
03/01/2012
20120049183ELECTRONIC DEVICE, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND SPUTTERING TARGET
A film formation is performed using a target in which a material which is volatilized more easily than gallium when heated at 400° C. to 700° C., such as zinc, is added to gallium oxide by a sputtering method with high mass-productivity which can be applied to a large...
03/01/2012
20120049128TRANSPARENT CONDUCTIVE ZINC OXIDE DISPLAY FILM AND PRODUCTION METHOD THEREFOR
The present invention concerns a method for the generation of a transparent conductive oxide display coating (TCO display layer), in particular a transparent conductive oxide display coating as a transparent contact for flat panel displays and the like. The TCO display ...
03/01/2012
20120052280COATING, ARTICLE COATED WITH COATING, AND METHOD FOR MANUFACTURING ARTICLE
A coating includes a titanium aluminum silicon carbon-nitride layer including a first surface and an opposite second surface. The atomic carbon content and/or the atomic nitrogen content in the titanium aluminum silicon carbon-nitride layer gradually increases from the ...
03/01/2012
20120052323PROCESS FOR SURFACE TREATING ALUMINUM OR ALUMINUM ALLOY AND ARTICLE MADE WITH SAME
A method for surface treating aluminum or aluminum alloy, the method comprising the following steps of: providing a substrate made of aluminum or aluminum alloy; forming a TiON coating on the substrate by magnetron sputtering, using aluminum as a target, and nitrogen an...
03/01/2012
20120050173INTEGRATED TOUCH PANEL AND MANUFACTURING METHOD THEREOF
The present invention proposes a surface capacitive integrated touch panel and manufacturing method thereof. The touch panel comprises a transparent substrate, an icon or artwork layer coated on the periphery of one side face of the transparent substrate, and the inner ...
03/01/2012
20120047953GLASS-FORMING TOOLS AND METHODS
Refractory glass-forming tools, including glass-forming molds incorporating protective metal nitride surface coatings, with optional alumina barrier layers disposed between the mold bodies and coating for high-temperature nitride coating stability, offering particular a...
03/01/2012
20120052290ARTICLE AND METHOD FOR MANUFACTURING SAME
An article includes a substrate; and a color layer deposited on the substrate, wherein the color layer is a zirconium carbon-nitride layer; the color layer has an L* value between about 28 to about 32, an a* value between about −1 to about 1, and a b* value between ab...
03/01/2012
20120045640ARTICLE AND METHOD FOR MANUFACTURING SAME
An article includes a substrate; and a color layer deposited on the substrate, wherein the color layer has an L* value between about 28 to about 32, an a* value between about −1 to about 1, and a b* value between about −1 to about 1 in the CIE L*a*b* color space....
02/23/2012
20120045654SILVERY WHITE FILM STRUCTURE, METHOD FOR MAKING THE SAME, AND ELECTRONIC DEVICE HAVING THE SAME
A white film structure includes a combining layer and a color layer. The combining layer is formed on a surface of a substrate and is made of chromium nitride. The color layer is formed on the combining layer and is made of a mixture of alumina and titanium oxide. A wei...
02/23/2012
20120045614COATING, ARTICLE COATED WITH COATING, AND METHOD FOR MANUFACTURING ARTICLE
A coating includes an anti-fingerprint layer. The anti-fingerprint layer comprises tin dioxide-aluminum oxide, and defines a plurality of nano scale concavities therein....
02/23/2012
20120045621COATING, ARTICLE COATED WITH COATING, AND METHOD FOR MANUFACTURING ARTICLE
A coating includes a anti-fingerprint layer. The anti-fingerprint layer comprises zinc oxide-aluminum oxide, the anti-fingerprint layer comprises a plurality of nano scale concavities therein....
02/23/2012
20120045659PROCESS FOR SURFACE TREATING ALUMINUM OR ALUMINUM ALLOY AND ARTICLE MADE WITH SAME
An article, includes a substrate made of aluminum or aluminum alloy and a AlON coating formed on the substrate. The AlON coating comprises, between about 50% and about 80% of atomic Al; between about 15% and about 40% of atomic O; and between about 5% and about 10% atom...
02/23/2012
20120042991PROCESS FOR SURFACE TREATING ALUMINUM OR ALUMINUM ALLOY AND HOUSING MADE BY SAME
A housing includes a substrate made of aluminum or aluminum alloy, an ion implantation layer formed on the substrate, and a vacuum coated layer formed on the ion implantation layer. The ion implantation layer is implanted with one or more ion species selected from the g...
02/23/2012
20120040163COATING, ARTICLE COATED WITH COATING, AND METHOD FOR MANUFACTURING ARTICLE
A coating includes a zirconium yttrium carbon-nitride layer including a first surface and an opposite second surface, the atomic carbon content and the atomic nitrogen content in the zirconium yttrium carbon-nitride layer gradually increasing from the first surface to t...
02/16/2012
20120034438COATED ARTICLE AND METHOD FOR MANUFACTURING SAME
A coated article comprises a substrate; a bonding layer deposited on the substrate; and a composite layer deposited on the bonding layer. The composite layer includes an equal number of alternating chromium-nitride layers and aluminum-nitride layers....
02/09/2012
20120031749REACTIVE SPUTTERING WITH MULTIPLE SPUTTER SOURCES
The apparatus (1) for coating a substrate (14) by reactive sputtering comprises an axis (8), at least two targets (11,12) in an arrangement symmetrically to said axis (8) and a power supply connected to the targets (11,12), wher...
02/09/2012
20120028012MULTILAYER COATING
A coating and a method of forming the same on a substrate is provided. The coating is provided with at least one ceramic material layer and at least one metal material layer. At least one of the materials used is a shape memory alloy so as to provide elasticity in the c...
02/02/2012
20120028011SELF-PASSIVATING MECHANICALLY STABLE HERMETIC THIN FILM
A hermetic thin film includes a first inorganic layer and a second inorganic layer contiguous with the first inorganic layer, wherein the second inorganic layer is formed as a reaction product of the first inorganic layer with oxygen and has a molar volume that is about...
02/02/2012
20120024192Sputtering Target of Sintered Ti-Nb Based Oxide, Thin Film of Ti-Nb Based Oxide, and Method of Producing the Thin Film
Provided is a sputtering target of sintered Ti—Nb based oxide, wherein the sputtering target consists of titanium (Ti), niobium (Nb), and remainder being oxygen and unavoidable impurities, and the atomic ratio of Ti and Nb is 0.39≦(Nb/(Ti+Nb))≦0.79. The sputtering...
02/02/2012
20120028072COATING, ARTICLE COATED WITH COATING, AND METHOD FOR MANUFACTURING ARTICLE
A coating includes a deposited layer. The deposited layer is a nickel-titanium carbonitride layer....
02/02/2012
20120028030COATED ARTICLE AND METHOD FOR MANUFACTURING SAME
A coated article includes a substrate, and a coating deposited on the substrate by magnetron sputtering. The coating includes micropores, and each micropore is sealed by a sealing element....
02/02/2012
20120018296CONTINUOUS VACUUM SPUTTERING METHOD
A continuous vacuum sputtering method includes the steps of providing a substrate; providing a continuous vacuum sputtering machine comprising a depositing chamber. The depositing chamber comprising at least one vacuum chamber, each vacuum chamber having a cathodic arc ...
01/26/2012
20120018340DEVICE HOUSING AND METHOD FOR MAKING THE SAME
A device housing is provided. The device housing includes a substrate, a silicon dioxide film formed on the substrate, and a zinc oxide film formed on the silicon dioxide film. The silicon dioxide film has micrometer sized structures. The zinc oxide film has nanometer s...
01/26/2012
20120021210ARTICLE AND METHOD FOR MANUFACTURING SAME
A article made by vacuum deposition, includes a substrate; and a color layer deposited on the substrate, wherein the color layer has an L* value between about 75 to about 80, a a* value between about −5 to about −10, and a b* value between about 15 to about 20 in th...
01/26/2012
20120006676POTASSIUM/MOLYBDENUM COMPOSITE METAL POWDERS, POWDER BLENDS, PRODUCTS THEREOF, AND METHODS FOR PRODUCING PHOTOVOLTAIC CELLS
A method for producing a composite metal powder according to one embodiment of the invention may comprise: Providing a supply of molybdenum metal powder; providing a supply of a potassium compound; combining the molybdenum metal powder and the potassium compound with a ...
01/12/2012
20120009398HOUSING AND METHOD FOR MANUFACTURING HOUSING
A housing includes a substrate; a corrosion resistance layer deposited on the substrate; a bonding layer deposited on the corrosion resistance layer; and an abrasion resistance layer deposited on the bonding layer...
01/12/2012
20120003486MOLYBDENUM CONTAINING TARGETS
The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of niobium or vanadium, and a third metal element selected from the group consisting of titanium, chromium, niobium, vanadium, and tantalum, wherein the third m...
01/05/2012
20120003489DECORATION FILM, DECORATION DEVICE AND METHOD FOR FABRICATING DECORATION FILM
A decoration film, a decoration device, and a method for fabricating the decoration film are provided. The decoration film includes a substrate, an adhesion layer disposed on the substrate, and a metal layer with low conductivity disposed between the substrate and the a...
01/05/2012
20120000766METHOD FOR MANUFACTURING SCANDIUM ALUMINUM NITRIDE FILM
A method for manufacturing a scandium aluminum nitride film includes: sputtering a scandium aluminum alloy target under atmosphere including nitrogen gas so that a thin film is deposited on a substrate. Since the scandium aluminum nitride film is manufactured with using...
01/05/2012
20120000767METHODS AND APPARATUS OF ARC PREVENTION DURING RF SPUTTERING OF A THIN FILM ON A SUBSTRATE
Methods of arc prevention during sputtering of a thin film from a semiconducting target onto a substrate are provided. An alternating current (e.g., having a frequency of about 500 kHz to 15 MHz) can be applied from an electrical power supply to the semiconducting targe...
01/05/2012
20110318652SOLID ELECTROLYTE BATTERY AND PROCESS FOR PRODUCING SOLID ELECTROLYTE BATTERY
A solid electrolyte battery using a solid electrolyte capable of realizing high conductivity, and a process for producing a solid electrolyte battery are provided. The solid electrolyte battery is structured as a laminate of a positive electrode collector layer, a posit...
12/29/2011
20110309349ANODE STRUCTURE FOR USE IN ORGANIC EL DEVICE, PRODUCTION METHOD THEREOF AND ORGANIC EL DEVICE
The present invention relates to an anode structure for use in a top-emission type organic EL device which comprises a laminated structure comprising an anode layer made of at least one selected from the group consisting of aluminum, aluminum alloys, silver and silver a...
12/22/2011
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