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| Application No. | Application Title | Issue Date |
| 20120128971 | Coated Member A coated member includes a base material and a coating film formed on the surface thereof. At least one layer in the coating film is a hard film of a cubic metal compound including at least one element selected from the group consisting of the group 4 elements (Ti, Zr, ... | 05/24/2012 |
| 20120128948 | COATED ARTICLE AND METHOD FOR MANUFACTURING SAME A coated article includes a substrate; a color layer deposited on the substrate; and a pattern layer deposited on the surface of the color layer opposite to the substrate. A network of metal nuclei groups forms the pattern layer. The network of metal nuclei groups inclu... | 05/24/2012 |
| 20120103794 | METHOD OF COATING AN RF DEVICE AND SPUTTERING APPARATUS USED IN THE SAME A method of coating an RF device for reducing cost of manufacture and coating period of time and a sputtering apparatus used in the same are disclosed. The sputtering apparatus used for coating of an RF device includes a supporting member on which an object to be coated... | 05/03/2012 |
| 20120104616 | METHOD FOR DEPOSITING A THIN FILM ELECTRODE AND THIN FILM STACK A method for depositing at least one thin-film electrode onto a transparent conductive oxide film is provided. At first, the transparent conductive oxide film is deposited onto a substrate to be processed. Then, the substrate and the transparent conductive oxide film ar... | 05/03/2012 |
| 20120080309 | SYSTEMS AND METHODS FOR FORMING A LAYER OF SPUTTERED MATERIAL The present disclosure describes a method of coating a substrate, the method including forming a layer of sputtered material on the substrate. Forming the layer of sputtered material may include: sputtering material from at least one target over the substrate; varying t... | 04/05/2012 |
| 20120067717 | Method of co-sputtering alloys and compounds using a dual C-MAG cathode arrangement and corresponding apparatus Certain example embodiments of this invention relate to techniques for sputter-depositing a thin film(s) including two or more materials using targets such as rotating cylindrical sputtering targets, including a method and apparatus. Magnet bar assemblies in first and s... | 03/22/2012 |
| 20120052288 | FILM STRUCTURE AND METHOD FOR MANUFACTURING THE SAME A film structure is described. The film structure includes a substrate and a metal film. The film structure is formed on the substrate by a physical vapor deposition method. A bottom diameter of particles forming the metal film is substantially between 0.05 μm and 2 μ... | 03/01/2012 |
| 20120048724 | Cylindrical Magnetron Sputter Source Utilizing Halbach Magnet Array A cylindrical magnetron sputtering cathode comprises a rotatable cylindrical sputtering target, a magnet assembly that includes a plurality of Halbach magnet arrays disposed within the rotatable cylindrical sputtering target and a magnetic magnet support and field shape... | 03/01/2012 |
| 20120048723 | SPUTTER TARGET FEED SYSTEM An apparatus includes an arc chamber housing defining an arc chamber, and a feed system configured to feed a sputter target into the arc chamber. A method includes feeding a sputter target into an arc chamber defined by an arc chamber housing, and ionizing a portion of ... | 03/01/2012 |
| 20120048725 | NON-BONDED ROTARY SEMICONDUCTING TARGETS AND METHODS OF THEIR SPUTTERING A rotary sputtering cathode, including a tubular member having a length in a longitudinal direction and defining an external surface, a first longitudinal bracket extending in the longitudinal direction along the length of the tubular member, and a second longitudinal b... | 03/01/2012 |
| 20120031749 | REACTIVE SPUTTERING WITH MULTIPLE SPUTTER SOURCES The apparatus (1) for coating a substrate (14) by reactive sputtering comprises an axis (8), at least two targets (11,12) in an arrangement symmetrically to said axis (8) and a power supply connected to the targets (11,12), wher... | 02/09/2012 |
| 20120028074 | COATING, ARTICLE COATED WITH COATING, AND METHOD FOR MANUFACTURING ARTICLE A coating includes a nano-composite base comprising a number of films, the films stacked together one after another. Each film includes a nickel-titanium carbonitride layer and a titanium carbonitride layer.... | 02/02/2012 |
| 20120024694 | Triangular Scanning Magnet in Sputtering Tool Moving Over Larger Triangular Target A sputtering chamber contains a plurality of substantially triangular targets supported by a top wall. The targets have narrow ends pointing toward a center of the top wall. Above each target is a relatively small substantially triangular magnet. Each magnet is connecte... | 02/02/2012 |
| 20120028030 | COATED ARTICLE AND METHOD FOR MANUFACTURING SAME A coated article includes a substrate, and a coating deposited on the substrate by magnetron sputtering. The coating includes micropores, and each micropore is sealed by a sealing element.... | 02/02/2012 |
| 20120021201 | ANTI-STATIC WRAPPER FOR ELECTRONIC COMPONENT WRAPPING, COATED WITH NANO FILM AND MANUFACTURING METHOD THEREOF The invention is upon anti-static wrapper; specifically upon a new technology to manufacture anti-static wrapper using new materials which is different from those manufacture by spreading a surfactant or metallic materials. The aim of this ... | 01/26/2012 |
| 20120018296 | CONTINUOUS VACUUM SPUTTERING METHOD A continuous vacuum sputtering method includes the steps of providing a substrate; providing a continuous vacuum sputtering machine comprising a depositing chamber. The depositing chamber comprising at least one vacuum chamber, each vacuum chamber having a cathodic arc ... | 01/26/2012 |
| 20120012455 | Apparatus and Method for Detecting a State of a Deposition Apparatus Apparatuses for deposition of one or more layers. In one aspect, an apparatus for deposition of one or more layers includes an anode; a cathode; a vacuum chamber including the anode and the cathode; a sensor configured to detect an electric potential between a section o... | 01/19/2012 |
| 20120000767 | METHODS AND APPARATUS OF ARC PREVENTION DURING RF SPUTTERING OF A THIN FILM ON A SUBSTRATE Methods of arc prevention during sputtering of a thin film from a semiconducting target onto a substrate are provided. An alternating current (e.g., having a frequency of about 500 kHz to 15 MHz) can be applied from an electrical power supply to the semiconducting targe... | 01/05/2012 |
| 20120000765 | METHODS OF ARC DETECTION AND SUPPRESSION DURING RF SPUTTERING OF A THIN FILM ON A SUBSTRATE Methods and systems of arc suppression during RF sputtering of a thin film from a semiconducting target onto a substrate are provided. During sputtering, an alternating current of RF frequency can be applied to a semiconducting target to form a plasma. Upon formation of... | 01/05/2012 |
| 20120003565 | ANODE-SUPPORTED SOLID OXIDE FUEL CELL COMPRISING A NANOPOROUS LAYER HAVING A PORE GRADIENT STRUCTURE, AND A PRODUCTION METHOD THEREFOR The present invention relates to a solid oxide fuel cell having a gradient structure in which pore size becomes gradually smaller from a porous electrode to an electrolyte thin film in order to form a dense electrolyte thin film of less than about 2 microns and preferab... | 01/05/2012 |
| 20120001535 | LUMINESCENT GLASS ELEMENT, PRODUCING METHOD THEREOF AND LUMINESCING METHOD THEREOF The present invention relates to a luminescent glass element comprising a luminescent glass substrate, which a metal layer is positioned on a surface thereof. The metal layer is provided with a metal microstructure. The luminescent glass substrate has composite oxides r... | 01/05/2012 |
| 20120003426 | DECORATION DEVICE AND METHOD FOR FABRICATING DECORATION DEVICE A decoration device including a housing, an anti-fingerprint layer, an easy-cleaning layer, and an adhesion layer is provided. The anti-fingerprint layer is disposed on the housing and exposed. The easy-cleaning layer is disposed between the housing and the anti-finger ... | 01/05/2012 |
| 20110318534 | Low Viscosity Monomer for Patterning Optical Tape A method for forming an optical tape for data storage from a substrate film includes a step of patterning a curable liquid composition onto a side of the substrate film. Characteristically, the curable liquid composition includes a free radical photoinitiator and a poly... | 12/29/2011 |
| 20110318506 | Optical Tape Media Patterning Using Cationic Polymerizable Monomers A method for forming an optical tape for data storage from a substrate film includes a step of patterning a curable liquid composition onto a side of the substrate film. Characteristically, the curable liquid composition includes a cationic photoinitiator and a polymeri... | 12/29/2011 |
| 20110318714 | IMPLANT MATERIAL AND METHOD FOR MANUFACTURING THE SAME An implant material includes a base material, and a silicon-containing carbon thin film formed on a surface of the base material. The carbon thin film contains a C—C component in which carbon atoms are bonded, and a SiC component in which carbon and silicon atoms are ... | 12/29/2011 |
| 20110305833 | APPARATUS FOR TREATING AND/OR COATING THE SURFACE OF A SUBSTRATE COMPONENT Apparatus for treating and/or coating the surface of substrate components by deposition from the gas phase. A plurality of substrate carriers and a plurality of coating and/or treating units are arranged in a deposition or treatment chamber which can be evacuated. The s... | 12/15/2011 |
| 20110305912 | Coating apparatus and method The invention is directed toward a method and apparatus which can be used to allow the sputter deposition of material onto at least one article to form a coating on the same. The new form of magnetron described herein allows an increase in sputter deposition rates to be... | 12/15/2011 |
| 20110281023 | SELF-ALIGNED BEVELS FOR WRITE POLES A method of depositing material onto a base portion of a wafer is disclosed. The method includes forming a bevel into a portion of a surface of the base portion of the wafer and depositing a first layer of conductive material onto the beveled portion of the base portion... | 11/17/2011 |
| 20110281106 | GAS BARRIER SHEET AND MANUFACTURING METHOD THEREOF A gas barrier sheet improved in a gas barrier property and a manufacturing method thereof are provided. A gas barrier sheet 1 includes at least a base material 2 and a gas barrier film 3 provided on the base material | |
| 20110266139 | FILM FORMING APPARATUS AND METHOD OF PRODUCING SUBSTRATE USING SAME The present invention provides a film forming apparatus that forms a film on a substrate (s) 1 being conveyed continuously in a vacuum chamber 7 under supply of a gas, wherein two film forming regions 14a and 14b can be readily ... | 11/03/2011 |
| 20110259732 | METHODS FOR HIGH-RATE SPUTTERING OF A COMPOUND SEMICONDUCTOR ON LARGE AREA SUBSTRATES Methods are generally provided for sputtering thin films on individual substrates. Individual substrates can be conveyed into a vacuum chamber to draw a sputtering pressure that is less than about 50 mTorr. Then, the individual substrates can be conveyed into a sputteri... | 10/27/2011 |
| 20110259733 | MAGNETIC FIELD CONTROL FOR UNIFORM FILM THICKNESS DISTRIBUTION IN SPUTTER APPARATUS When a film is formed by using a sputter method, distribution variation due to a progress of target erosion generated during the film formation is suppressed, and film thickness distribution and resistance value distribution are corrected to an optimal state. In order t... | 10/27/2011 |
| 20110253674 | Method and Chamber for Inductively Coupled Plasma Processing for Cylinderical Material With Three-Dimensional Surface The present invention relates to an inductively coupled plasma processing chamber and method for a cylindrical workpiece with a three-dimensional profile, and more particularly to an inductively coupled plasma processing reactor and method for a cylindrical workpiece wi... | 10/20/2011 |
| 20110247928 | SPUTTERING APPARATUS AND SPUTTERING METHOD The sputtering apparatus has: a vacuum chamber in which a substrate is disposed; a cathode unit which is disposed inside the vacuum chamber so as to lie opposite to the substrate. The cathode unit has mounted a bottomed cylindrical target material 4 from a bottom side t... | 10/13/2011 |
| 20110240118 | METHOD AND DEVICE FOR SCRIBING A THIN FILM PHOTOVOLTAIC CELL The present invention is a method for scribing a thin film solar cell that includes a soda lime glass substrate, a film of molybdenum (Mo), a film of copper indium gallium diselenide (GIGS), a buffering layer, a layer of zinc oxide (i-ZnO), a layer of aluminum doped zin... | 10/06/2011 |
| 20110240461 | DEPOSITION SYSTEM AND METHODS HAVING IMPROVED MATERIAL UTILIZATION A method for substrate processing includes producing a magnetic field by a magnetron across the full width of a sputtering surface of a target in a first direction. The magnetron can produce two erosion grooves separated by a distance S on the sputtering surface. The me... | 10/06/2011 |
| 20110232749 | LAYERED ELEMENT AND PHOTOVOLTAIC DEVICE COMPRISING SUCH AN ELEMENT This layered element, in particular for a photovoltaic device, includes a polymer layer, a moisture-sensitive layer, and a protective coating forming a moisture barrier inserted between the polymer layer and the moisture-sensitive layer. The protective coating includes ... | 09/29/2011 |
| 20110233049 | SPUTTERING SYSTEM The invention relates to a device (10) for sputtering at least one selected materialonto a substrate (5) and bringing about a reaction of this material, comprising a vacuum chamber (11), in which a substrate holder (12) is arranged, at least ... | 09/29/2011 |
| 20110233050 | MAGNETIC LENSING TO IMPROVE DEPOSITION UNIFORMITY IN A PHYSICAL VAPOR DEPOSITION (PVD) PROCESS A physical vapor deposition (PVD) system includes a chamber and a plurality of electromagnetic coils arranged around the chamber. First and second annular bands of permanent magnets are arranged around the chamber with poles oriented perpendicular to a magnetic field im... | 09/29/2011 |
| 20110226612 | METHOD AND DEVICE FOR REVERSING THE FEEDING OF SPUTTER COATING SYSTEMS IN CLEAN ROOMS The invention relates to a method and to a device for reversing the feeding of a sputter coating system, particularly when coating a photovoltaic module, in clean rooms, having the following characteristics: a) a transport frame (11) for receiving a substrate waf... | 09/22/2011 |
