U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Icon_funbox Quotables

"It is my heart-warmed and world-embracing Christmas hope and aspiration that all of us, the high, the low, the rich, the poor, the admired, the despised, the loved, the hated, the civilized, the savage (every man and brother of us all throughout the whole earth), may eventually be gathered together in a heaven of everlasting rest and peace and bliss, except the inventor of the telephone. "

Mark Twain ; Christmas greetings, 1890

Newsletter  PatentStorm News

Make the Most of Our Site

See this month's Top Inventors and Most Cited Patents.

Stay on top of the latest innovations by subscribing to an RSS feed.

Registered users: Manage your profile.

 

Class 204/164 - Electrostatic field or electrical discharge


Subclass of Class 204 - Chemistry: electrical and wave energy
Definition: Chemical processes which have for their purpose the preparation
No. of applications: 255
Last issue date: 03/22/2012


1              
Application No.Application TitleIssue Date
20120067716Method and Apparatus for Detecting Ionisable Gases in Particular Organic Molecules, Preferably Hydrocarbons
The invention relates to a method for detecting gases that can be ionized wherein an atmospheric plasma jet is produced, wherein a gas mixture is brought into interaction with the plasma jet, and wherein an electrical quantity is measured as a measure of the concentrati...
03/22/2012
20120018294SYSTEM AND METHOD FOR PROCESSING MATERIAL TO GENERATE SYNGAS USING WATER INJECTION
The present invention is directed to system and method for processing material to generate syngas. A reactor chamber is implemented with a plurality of electrodes that can generate an arc within the chamber when electricity is applied to them. The arc can be used to cre...
01/26/2012
20120018295SYSTEM AND METHOD FOR PROCESSING MATERIAL TO GENERATE SYNGAS USING PLURALITY OF GAS REMOVAL LOCATIONS
The present invention is directed to system and method for processing material to generate syngas. A reactor chamber is implemented with a plurality of electrodes that can generate an arc within the chamber when electricity is applied to them. The arc can be used to cre...
01/26/2012
20120012453METHODS OF ELECTROSPRAY CHEMICAL SYNTHESIS AND DEVICE FOR USE THEREIN
The present invention relates to methods of production of chemical bonds and subsequent molecules by electrospray ionization and the design of an electrospray chemical synthesizer, for use in chemical synthesis and expedited organic chemical reactions....
01/19/2012
20120009111ENERGY GENERATION PROCESS
High energy reaction of halogen-containing carbon, boron, silicon and nitrogen compounds, with base component comprising at least one atom selected from Groups IA to VIA, transition metals, lanthanides and actinides of the Periodic Table of the Elements, excluding alumi...
01/12/2012
20110297532APPARATUS AND METHOD FOR PRODUCING PLASMA DURING MILLING FOR PROCESSING OF MATERIAL COMPOSITIONS
An apparatus, such as a plasma generation system, is provided. The apparatus can include a chamber that may be formed, for example, substantially of insulating material. The chamber can be configured to establish therein a stable glow discharge plasma having a pressure ...
12/08/2011
20110290637SENSING AND CONTROL FOR PLASMA-ASSISTED WASTE GASIFICATION
A plasma-assisted waste gasification system including a sensing mechanism and process for converting waste stream reaction residues into a clean synthesis gas (syngas) is disclosed. The gasification system includes a first sensor located between a gas quench unit and a ...
12/01/2011
20110278155ELECTROCHEMICAL CONTROL OF CHEMICAL CATALYSIS USING SINGLE MOLECULE MOTORS AND DIGITAL LOGIC
Methods for controlling catalysis of a chemical reaction generally includes electrostatically controlling position of a first linear single-molecule polymer inside at least one nanopore fluidly coupled to a reaction chamber comprising a reaction medium and at least one ...
11/17/2011
20110259731METHOD AND APPARATUS FOR DISSOCIATING HYDROGEN AND OXYGEN FROM WATER
Water is dissociated into hydrogen and oxygen preferably using an adjacent plasma at or near atmosphere pressure and ambient temperature and generated preferably by a caduceus coil driving a frequency that creates a plasma shear and/or induces resonance in the water mol...
10/27/2011
20110259730DEVICE AND METHOD FOR MICROSTRUCTURED PLASMA TREATMENT
The invention relates to a device for the microstructured plasma treatment of a film substrate, especially of a plastic film Said device comprises a rotatably received cylindrical electrode the surface of which contains or consists of metal, especially chromium, the sur...
10/27/2011
20110240460DEVICE AND METHOD FOR GENERATING A PLASMA FLOW
The invention relates to a device generating a plasma flow comprising an electrically conductive housing, tubular in shape, forming a central channel traversed by a vortex gas, a central electrode arranged coaxially in said channel and an electric power source intended ...
10/06/2011
20110235032Chiral Plasmonic Structures For Mediating Chemical Transformation And Detection Of Molecules With Spatial Chirality
Three-dimensional metal dielectric structures are disclosed with chiral symmetry that elicit surface plasmons. The plasmons may have propagational circular polarization wherein the frequency of such propagating plasmons may be tuned by design to couple with the electron...
09/29/2011
20110216262LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE
To prevent occurrence of display roughness in a liquid crystal display device, a liquid crystal display device of the present invention, which has a plurality of pixels arranged along a first direction and a second direction, includes: a TFT substrate which includes a s...
09/08/2011
20110214284HIGHLY CONDUCTIVE COMPOSITES
Domain segregation of polymer blends or block copolymers in the presence of thermal conducting high aspect ratio nanocrystals leads to preferential placement of conductive filler either inside one domain, which promote the self-assembly of a thermal and/or electrical co...
09/08/2011
20110206591Plasma Processes for Producing Silanes and Derivatives Thereof
The invention is generally related to process for generating one or more molecules having the formula SixHy, SixDy, SixHyDz, and mixtures thereof, where x,y and z are integers ≧1, H is hydrog...
08/25/2011
20110206592LOW COST ROUTES TO HIGH PURITY SILICON AND DERIVATIVES THEREOF
The present invention is directed to a method for providing an agricultural waste product having amorphous silica, carbon, and impurities; extracting from the agricultural waste product an amount of the impurities; changing the ratio of carbon to silica; and reducing th...
08/25/2011
20110188206THERMAL INTERFACE
Various embodiments include apparatus and method having a heat source, a thermal management device, and an interface disposed between the thermal management device and the heat source. The interface includes nanostructures to facilitate heat transfer and adhesion betwee...
08/04/2011
20110186419Apparatus for synthesizing nano particles, and method for synthesizing the nano particles using the same
Disclosed herein is an apparatus for synthesizing nano particles. The apparatus for synthesizing nano particles is configured to include: a plasma generator that generates plasma; a recovery device that recovers the synthesized nano particles; and a cooler that is dispo...
08/04/2011
20110180387PLASMA TREATMENT APPARATUS AND METHOD
A plasma treated gas permeable material is produced by applying an alternating voltage between spaced electrodes, at least one of which is covered with a dielectric barrier and at least one of which comprises a plurality of discrete electrode segments, to generate plasm...
07/28/2011
20110174606Apparatus and Method for Improving Photoresist Properties Using a Quasi-Neutral Beam
The invention can provide apparatus and methods of processing a substrate in real-time using a Quasi-Neutral Beam (Q-NB) curing system to improve the etch resistance of photoresist layer. In addition, the improved photoresist layer can be used to more accurately control...
07/21/2011
20110171111BENT CARBON NANOTUBES AND METHODS OF PRODUCTION
A method of producing carbon nanotubes includes directing a flow of a gas over a substrate to provide growth of at least one carbon nanotube in a carbon-nanotube-growth region of the substrate; applying an electric field to the carbon-nanotube-growth region of the subst...
07/14/2011
20110108435SYSTEM AND METHOD FOR CHEMICAL POTENTIAL ENERGY PRODUCTION
The present invention relates to a system comprising a heat source to provide heat at the desired temperature and energy field (e.g. a solar concentrator); an electron source configured and operable to emit electrons; an electric field generator generating an electric f...
05/12/2011
20110108011FUEL PRETREATER
A fuel pretreater apparatus for pretreating fuel for combustion is provided. A conversion tube is provided for vaporized fuel to flow therethrough. The conversion tube includes an intake end for receiving the vaporized fuel and an outlet end for dispersing the vaporized...
05/12/2011
20110091789MATERIAL FOR AN ELECTROCHEMICAL DEVICE
The present invention relates to a material for an electrochemical device, especially a fuel cell, an electrolyzer or a storage battery, comprising a matrix and activated boron nitride contained in the matrix....
04/21/2011
20110079506CASCADE SOURCE AND A METHOD FOR CONTROLLING THE CASCADE SOURCE
A cascade source provided with a cathode housing, a number of cascade plates insulated from each other and stacked on top of each other which together bound at least one plasma channel, and an anode plate provided with an outflow opening connecting to the plasma channel...
04/07/2011
20110062014PLASMA REACTOR
A plasma reactor (10) is provided. The plasma reactor (10) includes a reaction chamber (12) formed by a wall (13). Proximate to the first end of the reaction chamber, the plasma reactor includes a feed gas inlet (14) for creating a rev...
03/17/2011
20110044884HYDROGEN PRODUCTION FROM HYDROGEN SULFIDE
The present subject matter is directed to plasma dissociation of fluidic hydrogen sulfide to hydrogen and sulfur. A reactor is configured to have a plasma discharge and a vortex flow pattern. The plasma discharge provides energy to the hydrogen sulfide disassociation re...
02/24/2011
20110020213TITANIUM OXIDE AND METHOD OF PRODUCING THE SAME
An object is to provide a novel anatase titanium oxide having especially high photocatalytic activity as a photocatalyst useful as a material for environmental clean-up, such as removal of toxic substances, deodorization and decomposition of malodorous substances, preve...
01/27/2011
20110011729Method and apparatus for inductive amplification of ion beam energy
Accelerated charged particles are provided by inductive amplification of particle energy in connection with a deflagration-mode plasma discharge. The deflagration mode discharge tends to increase particle energy relative to other operating modes. Inductive amplification...
01/20/2011
20110005917METHOD FOR PURIFYING SILICON FOR PHOTOVOLTAIC APPLICATIONS
The disclosure relates to a method for purifying silicon by exposing liquid silicon to a plasma, wherein the silicon flows continuously into a channel so that the free surface thereof is exposed to the plasma. The disclosure also relates to a device for implementing the...
01/13/2011
20110008025METHOD AND APPARATUS FOR GENERATING COMPOUND PLASMA, AND ELECTRO-THERMAL COOKING APPARATUS USING THE COMPOUND PLASMA
Disclosed are method and apparatus for generating compound plasma and electro-thermal cooking apparatus using the compound plasma. An electro-thermal cooking apparatus has an evaporator for generating water vapor by heating water therein with electric energy, a blast no...
01/13/2011
20100320142ATMOSPHERIC PRESSURE MICROWAVE PLASMA TREATED POROUS MEMBRANES
Versions of the invention include compositions and methods for making them that include a polymeric porous membrane with one or more atmospheric pressure microwave plasma modified surfaces. The modified porous membrane is stable, non-dewetting, and retains its mechanica...
12/23/2010
20100320426METHOD OF PRODUCING GROUP II-VI COMPOUND SEMICONDUCTOR, METHOD OF PRODUCING GROUP II-VI COMPOUND SEMICONDUCTOR PHOSPHOR, AND HEXAGONAL GROUP II-VI COMPOUND SEMICONDUCTOR
An object of the invention is to provide a method for the stable production of a high-purity Group II-VI compound semiconductor on an industrial scale, and also a hexagonal crystal of Group II-VI compound semiconductor in which a metal can be doped easily. Another objec...
12/23/2010
20100300871PRESSURIZED PLASMA ENHANCED REACTOR
The present invention is a vitrification and gasification system that operates at elevated pressures. The system includes a processing chamber having numerous penetrations, and seals for effectively sealing the penetrations to the processing chamber....
12/02/2010
20100300872Methods for Low Temperature Hydrogen Sulfide Dissociation
A method of H2S dissociation which comprises generating radicals or ions. The H2S dissociation is initiated at relatively low temperature, e.g., of less than 1875 K. The residence time for dissociation generally ranges from about 0.01 s to 10 s. In...
12/02/2010
20100304146ENHANCING PLASMA SURFACE MODIFICATION USING HIGH INTENSITY AND HIGH POWER ULTRASONIC ACOUSTIC WAVES
This invention relates to a plasma surface modification process (and a corresponding a system) of a solid object (100) comprising creating plasma (104) by a plasma source (106), application of the plasma (104) to at least a part of a surface ...
12/02/2010
20100282321Silicon microspheres and photonic sponges, production process and their applications
The invention describes a microsphere with diameter from 0.1 to 50 micrometers, made of a material selected from the group consisting of: silicon, doped silicon, SixGe1-x wherein 0≦x≦1, and SixH1-x wherein 0.5≦x≦1, tha...
11/11/2010
20100282597METHOD FOR CONTROLLING PLASMA DENSITY DISTRIBUTION IN PLASMA CHAMBER
A method for controlling plasma density distribution in a plasma chamber in order to control a critical dimension (CD) and obtain uniformity of an etching rate. The plasma density distribution control method is used to fabricate a semiconductor device in the plasma cham...
11/11/2010
20100270141Detecting and Preventing Instabilities in Plasma Processes
Systems, methods and apparatus for reducing instabilities in a plasma-based processing system are disclosed. An exemplary method includes applying power to a plasma with a power amplifier; determining whether low frequency instability oscillations are present or high fr...
10/28/2010
20100266668Manufacturing Dissolvable Dosage Forms
A method of manufacturing a dosage form is described wherein a liquid solution of a biologically compatible polymer containing a suspension of particulate material that is insoluble in the polymer is supplied to a liquid supply tube (2) having an outlet (2...
10/21/2010
1              
 
Sign InRegister
Username  
Password   
forgot password?