Celebrity Inventors
Comic actor Danny Kaye received patent D166,807 for the co-design of "Blowout Toy or the Like". It's similar to one of those toys that unravels when you blow into at a birthday party except Kaye's has three blowouts going in different directions, not just one.
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| Application No. | Application Title | Issue Date |
| 20120125891 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD Provided are a plasma processing apparatus and a plasma processing method wherein particles generated due to the inner potential of an inner cylinder disposed inside of a vacuum container are reduced. The plasma processing apparatus has, inside of a metal vacuum chamber... | 05/24/2012 |
| 20120103518 | FILM FORMATION APPARATUS A film formation apparatus includes a gas supply mechanism for supplying an aminosilane-based gas, and a silane-based gas that does not include an amino group. Processes of forming a seed layer on a surface of the insulation film having the opening reaching the conducti... | 05/03/2012 |
| 20120070988 | METHODS AND APPARATUSES FACILITATING FLUID FLOW INTO VIA HOLES, VENTS, AND OTHER OPENINGS COMMUNICATING WITH SURFACES OF SUBSTRATES OF SEMICONDUCTOR DEVICE COMPONENTS A method for removing material from surfaces of at least a portion of at least one recess or at least one aperture extending into a surface of a substrate includes pressurizing fluid so as to cause the fluid to flow into the at least one recess or at least one aperture.... | 03/22/2012 |
| 20120043021 | ADJUSTABLE CONFINEMENT RING ASSEMBLY A plasma confinement assembly for a semiconductor processing chamber is provided. The assembly includes a plurality of confinement rings disposed over each other, and each of the plurality of confinement rings is separated by a space. A plunger moveable in a plane subst... | 02/23/2012 |
| 20120045867 | ANTI-REFLECTIVE PHOTOVOLTAIC MODULE An anti-reflective surface on a photovoltaic can reduce optical reflection.... | 02/23/2012 |
| 20120037491 | ANTENNA FOR INDUCTIVELY COUPLED PLASMA GENERATION, INDUCTIVELY COUPLED PLASMA GENERATOR, AND METHOD OF DRIVING THE SAME In one embodiment, the antenna for inductively coupled plasma generation includes a first end connected to an alternating current (AC) power supply, a second end connected to a ground terminal, and an antenna coil unit connected to the first end and the second end and c... | 02/16/2012 |
| 20120024449 | PARASITIC PLASMA PREVENTION IN PLASMA PROCESSING CHAMBERS Parasitic plasma in voids in a component of a plasma processing chamber can be eliminated by covering electrically conductive surfaces in an interior of the voids with a sleeve. The voids can be gas holes, lift pin holes, helium passages, conduits and/or plenums in cham... | 02/02/2012 |
| 20120018094 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD A plasma processing apparatus for applying an etching processing to a wafer by using at least two steps of the etching processing which operate with plasma formed within a pressure-reduced processing chamber, the wafer being located within the processing chamber inside ... | 01/26/2012 |
| 20120018096 | PROCESS CHAMBER HAVING MODULATED PLASMA SUPPLY The invention relates to a plasma chamber (10, 20, 30) having a first receiving device for a substrate (14, 24, 34) fastened to a first side and having a plasma generation unit for generating a plasma in the plasma chamber, wherein the plasma generation un... | 01/26/2012 |
| 20120012254 | GATE VALVE CLEANING METHOD AND SUBSTRATE PROCESSING SYSTEM A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about ... | 01/19/2012 |
| 20120009829 | ELECTRICAL JOINT MEMBER FOR REDUCING AN ELECTRICAL RESISTANCE BETWEEN CONDUCTIVE MEMBERS IN A PLASMA PROCESSING APPARATUS In a plasma processing apparatus, a member for propagating high frequency from a high frequency power supply and/or to which the high frequency is applied. A power feed rod is electromagnetically shielded between a matching unit and a bottom plate of a chamber by a coax... | 01/12/2012 |
| 20120000886 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD The substrate processing apparatus includes a process chamber which accommodates a wafer and performs a plasma etching process on the wafer, an exhaust chamber which communicates with the process chamber, an exhaust plate which divides the process chamber from the exhau... | 01/05/2012 |
| 20120000610 | Microwave Plasma Processing Apparatus In accordance with example embodiments, a plasma processing apparatus includes a chamber configured to perform a plasma process, an upper plate on the chamber, an antenna under the upper plate and the antenna is configured to generate plasma in the chamber, an upper ins... | 01/05/2012 |
| 20120000605 | CONSUMABLE ISOLATION RING FOR MOVABLE SUBSTRATE SUPPORT ASSEMBLY OF A PLASMA PROCESSING CHAMBER A consumable isolation ring of a movable substrate support assembly is described. The consumable isolation ring is configured to be supported on a step of a movable ground ring fit around a fixed ground ring. The consumable isolation ring is configured to electrically i... | 01/05/2012 |
| 20120000606 | PLASMA UNIFORMITY SYSTEM AND METHOD A plasma processing tool comprises a plasma chamber configured to generate a plasma from a gas introduced into the chamber where the generated plasma has an electron plasma frequency. A plurality of electrodes disposed within the chamber. Each of the electrodes configur... | 01/05/2012 |
| 20110308732 | Electrode Carrier Assemblies In accordance with one embodiment of the present disclosure, an electrode carrier assembly is provided including an electrode carrying annulus and a plurality of electrode mounting members. The electrode carrying annulus includes an electrode containment sidewall that f... | 12/22/2011 |
| 20110312157 | WAFER DICING USING FEMTOSECOND-BASED LASER AND PLASMA ETCH Methods of dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. A method includes forming a mask above the semiconductor wafer. The mask is composed of a layer covering and protecting the integrated circuits. The mask is patt... | 12/22/2011 |
| 20110306213 | OZONE PLENUM AS UV SHUTTER OR TUNABLE UV FILTER FOR CLEANING SEMICONDUCTOR SUBSTRATES A quartz window with an interior plenum is operable as a shutter or UV filter in a degas chamber by supplying the plenum with an ozone-containing gas. Pressure in the plenum can be adjusted to block UV light transmission into the degas chamber or adjust transmittance of... | 12/15/2011 |
| 20110303361 | Outside Air Shut-Off Container and Pressure-Reducible Processing Apparatus Because an O-ring of synthetic resin is pyrolyzed in the atmosphere at a high temperature of 150° C. or more, the airtightness cannot be maintained. In an outside air shut-off container according to the present invention, an inert gas is supplied between an O-ring, whi... | 12/15/2011 |
| 20110303634 | METHOD AND SYSTEM FOR MANUFACTURING NANOSTRUCTURES A method and a system for manufacturing two-dimensional and three-dimensional nanostructures and nanodevices are described, wherein the formation of the nanostructure (of the nanodevice) on a target substrate is made, at a millimetric or super-millimetric distance from ... | 12/15/2011 |
| 20110300714 | PLASMA PROCESSING CHAMBER COMPONENT HAVING ADAPTIVE THERMAL CONDUCTOR An assembly comprises a component of a plasma process chamber, a thermal source and a polymer composite therebetween exhibiting a phase transition between a high-thermal conductivity phase and a low-thermal conductivity phase. The temperature-induced phase change polyme... | 12/08/2011 |
| 20110297640 | METHOD FOR PRODUCING MOLD AND ELECTRODE STRUCTURE USED THEREFOR A motheye mold fabrication method of an embodiment of the present invention includes: (a) anodizing a surface of an aluminum film or aluminum base via an electrode that is in contact with the surface, thereby forming a porous alumina layer which has a plurality of very ... | 12/08/2011 |
| 20110294249 | METHOD FOR CLEANING A SUBSTRATE OF SOLAR CELL Disclosed is a method for cleaning the substrate of a solar cell. The method includes: providing a single or poly crystalline substrate; performing a wet etching process such that the surface of the substrate is textured; performing an atmospheric pressure plasma cleani... | 12/01/2011 |
| 20110284166 | LOWER LINER WITH INTEGRATED FLOW EQUALIZER AND IMPROVED CONDUCTANCE A plasma processing chamber has a lower liner with an integrated flow equalizer. In an etching process, the processing gases may be unevenly drawn from the processing chamber which may cause an uneven etching of the substrate. The integrated flow equalizer is configured... | 11/24/2011 |
| 20110284163 | PLASMA PROCESSING APPARATUS A plasma processing apparatus includes a chamber for processing a substrate. A plasma generator is provided to generate plasma within the chamber. A window is provided in a sidewall of the chamber, and the window transmits light from the plasma within the chamber. A pho... | 11/24/2011 |
| 20110275220 | LOW TEMPERATURE METAL ETCHING AND PATTERNING The present invention is directed to a method and apparatus for etching various metals that may be used in semiconductor or integrated circuit processing through the use of non-halogen gases such as hydrogen, helium, or combinations of hydrogen and helium with other gas... | 11/10/2011 |
| 20110265950 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND TARGET SUBSTRATE PROCESSING SYSTEM A semiconductor device manufacturing method includes removing copper deposits, by use of an organic acid gas and an oxidizing gas, from a surface of a second interlayer insulation film having a groove formed therein and reaching a copper-containing electric connector me... | 11/03/2011 |
| 20110265951 | TWIN CHAMBER PROCESSING SYSTEM Methods and apparatus for twin chamber processing systems are disclosed, and, in some embodiments, may include a first process chamber and a second process chamber having independent processing volumes and a plurality of shared resources between the first and second pro... | 11/03/2011 |
| 20110259519 | COATING METHOD FOR GAS DELIVERY SYSTEM A method of coating the inner surfaces of gas passages of a gas delivery system for a plasma process system such as a plasma etching system includes (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the ... | 10/27/2011 |
| 20110253310 | METHODS AND APPARATUS FOR AN INDUCTION COIL ARRANGEMENT IN A PLASMA PROCESSING SYSTEM An antenna arrangement in a plasma processing system for providing plasma uniformity across a substrate during substrate processing is provided. The arrangement includes a plurality of circular antenna assemblies. Each circular antenna assembly of the plurality of circu... | 10/20/2011 |
| 20110247649 | Method and an apparatus for cleaning and/or sterilization of an object provided in a sealed enclosure The invention relates to a method of cleaning and/or sterilization of an object provided in a hermetically sealed enclosure, providing a pressure difference between an internal volume of the enclosure and surroundings and generating a plasma solely inside the enclosure ... | 10/13/2011 |
| 20110240223 | SUBSTRATE PROCESSING SYSTEM There is provided a substrate processing system having high maintainability by widening a gap between various processing apparatuses connected with side surfaces of transfer modules and capable of achieving sufficient productivity by avoiding deterioration in throughput... | 10/06/2011 |
| 20110232847 | QUARTZ GLASS MEMBER FOR PLASMA ETCHING Provided is a doped quartz glass member for plasma etching, which is used in a plasma etching process and is free from any problematic fluoride accumulation during use. The quartz glass member for plasma etching is used as a jig for semiconductor production in a plasma ... | 09/29/2011 |
| 20110232843 | SUBSTRATE PROCESSING APPARATUS WITH COMPOSITE SEAL A seal for sealing an interface between a container and a lid of a process chamber. The seal comprises a first seal element and a second seal element that are arranged to seal the interface in series, with the second seal element being situated to encounter processing a... | 09/29/2011 |
| 20110226280 | PLASMA MEDIATED ASHING PROCESSES A plasma ashing process for removing photoresist, polymers and/or residues from a substrate comprises placing the substrate including the photoresist, polymers, and/or residues into a reaction chamber; generating a plasma from a gas mixture comprising oxygen gas (O... | 09/22/2011 |
| 20110226418 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE In a dry cleaning process, breakage of a gas supply pipe can be prevented, and maintenance efficiency can be increased. There is provided a substrate processing apparatus comprising: a process chamber configured to process a substrate; a heater configured to heat an ins... | 09/22/2011 |
| 20110220285 | METHODS AND SYSTEMS FOR TEXTURING CERAMIC COMPONENTS Embodiments of the present invention provide methods for forming a hardened and roughened ceramic component. Specific steps include forming a sintered ceramic component, texturing the surface of the sintered ceramic component, and firing the component to harden it. The ... | 09/15/2011 |
| 20110220143 | Device for Treating an Inner Surface of a Work Piece A device for cleaning an inner surface of a workpiece includes a beam of radiation, at least one generating unit for generating the beam, a drive unit for rotating the at least one generating unit about an axis of rotation, where the at least one generating unit is conf... | 09/15/2011 |
| 20110211817 | METHOD FOR HEATING PART IN PROCESSING CHAMBER OF SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUS There is provided a method for heating a part within a processing chamber of a semiconductor manufacturing apparatus having a substrate in the processing chamber and performing a process on the substrate. The heating method includes generating heating lights which is ge... | 09/01/2011 |
| 20110209826 | SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM The substrate processing system includes a measuring apparatus that measures any of film thickness, a refractive index, an absorption coefficient, and warpage. The system includes an apparatus for performing photolithography on the substrate to form a resist pattern and... | 09/01/2011 |
