Bizarre Patents
Method and apparatus for making a drink hop along a bar or counter
A method for generating a drink which appears to hop from a remote spot on the bar or counter and take one or more leaps, before landing in a patron's glass.
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| Application No. | Application Title | Issue Date |
| 20120125375 | Method and Apparatus for Removing Contaminants from Substrate A cleaning material is applied to a surface of a substrate. The cleaning material includes one or more polymeric materials for entrapping contaminants present on the surface of the substrate. A rinsing fluid is applied to the surface of the substrate at a controlled vel... | 05/24/2012 |
| 20120125377 | STETHOSCOPE CLEANING ASSEMBLY An assembly structured to clean the head portion of a stethoscope comprising a housing including a path of travel along which the head portion passes during cleaning. A supply of cleaning fluid associated with a dispenser assembly is cooperatively disposed relative to a... | 05/24/2012 |
| 20120080060 | TURRET-TYPE CLEANING APPARATUS A turret-type cleaning apparatus for using cleaning liquids, and deburring and cleaning a workpiece includes: cleaning tools for spraying one of the liquids onto the workpiece and deburring and/or cleaning it; a turnable turret head where the tools are attached; a turre... | 04/05/2012 |
| 20120042912 | CLEANING DEVICE FOR SPRAY GUN A cleaning apparatus for cleaning a spray gun of the type having at least one paint inlet, and a fluid outlet, the cleaning apparatus has at least one support structure, a fluid feed head (3) carried by the structure (2), and removal elements for removing ... | 02/23/2012 |
| 20120006364 | FLUX CLEANING APPARATUS A flux cleaning apparatus for cleaning an object with flux by removing impurities that include flux from the object with flux includes a body, a mount, at least one steam spraying nozzle, and a steam supplying unit. The mount is coupled with the body for mounting the ob... | 01/12/2012 |
| 20120000492 | SYSTEM FOR TREATING AND/OR PROCESSING LIQUID PRODUCTS AND METHOD FOR CLEANING COMPONENTS OF SUCH SYSTEMS System for treating and/or processing liquid products, in particular beverages, having at least two system components, having a cleaning and rinsing system for cleaning and rinsing of at least product-carrying regions of the system components with at least one liquid cl... | 01/05/2012 |
| 20110094543 | MULTIPLE-ADDITION VALVE FOR A SYSTEM FOR METERING LIQUID OR PASTE-LIKE AUXILIARY WASHING AGENTS A system for automatically metering liquid or paste-like auxiliary washing agents stored in reservoirs for automatically controlled washing machines. It has a central fluid line disposed in a housing bottom and a plurality of nozzles disposed in the housing bottom on a ... | 04/28/2011 |
| 20100307533 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND COMPUTER-READABLE MEDIUM STORING PROGRAM Disclosed is a substrate processing apparatus, a substrate processing method and a computer-readable medium capable of recovering an extended amount of discharged solution from a processing unit thereby reducing the amount of deionized water for the processing and the c... | 12/09/2010 |
| 20100307541 | PROCESS AND A DEVICE TO CLEAN SUBSTRATES In particular a porous substrate (FS) like a fabric. Process to clean a substrate, comprising a step of subjecting the substrate to an air-water spray (SPR), generated using a spraying means (N) comprising an air passage (OPA) and a water passage (OPW), wherein air is g... | 12/09/2010 |
| 20100269869 | SIMPLE OZONE VEGETABLE AND FRUIT WASHING MACHINE An ozone vegetable and fruit washing machine utilizes ozone water to wash the vegetables and fruits. A tub is provided in a casing. A water pump and an ozone generator module are sandwiched between the casing and the tub. The water pump is connected with nozzles toward ... | 10/28/2010 |
| 20100200163 | APPARATUS AND METHOD FOR WET TREATMENT OF DISC-LIKE ARTICLES Disclosed is an apparatus for wet treatment of a disc-like article, which comprises: a spin chuck for holding and rotating the disc-like article, and an inner edge nozzle dispensing treatment liquid directed towards a first peripheral region of the first surface of the ... | 08/12/2010 |
| 20100186773 | CLEANING DEVICE AND GRAFFITI REMOVAL A cleaning device is provided for cleaning a surface comprising a base unit having a rotating brush. The cleaning device is efficient, economic and environment friendly through recuperative use of a cleaning agent.... | 07/29/2010 |
| 20100108095 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE CLEANING METHOD Disclosed are a substrate processing apparatus and a substrate cleaning method to satisfactorily clean the entire circumferential periphery of a substrate, including an upper surface circumferential periphery, an end, and a lower surface circumferential periphery of the... | 05/06/2010 |
| 20100071723 | Reusable filter and regeneration station A combination of a reusable fluid filter and a cleaning/regeneration apparatus that cleans a used filter and returns it to like-new condition for reuse. The filter comprises a container and a filter medium, the latter of which is a combination of coarse and fine wire me... | 03/25/2010 |
| 20100037916 | TREATMENT DEVICE, TREATMENT METHOD, AND SURFACE TREATMENT JIG The treatment device 100 of the present invention is a treatment device for carrying out treatment to a treatment object 18 whose treatment surface includes a second treatment surface 18b and a first treatment surface 18a surrou... | 02/18/2010 |
| 20100032410 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD A substrate processing apparatus includes a bath in which a liquid or a gas is fed, and a mechanism which feeds out a liquid or a gas into the bath. The substrate processing apparatus processes a to-be-processed substrate which is disposed in the bath. The mechanism inc... | 02/11/2010 |
| 20090308413 | APPARATUS AND SYSTEM FOR CLEANING A SUBSTRATE An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to t... | 12/17/2009 |
| 20090288688 | NON-CORROSIVE CHEMICAL RINSE SYSTEM A rinse system including providing a chemical rinse including a corrosion inhibitor, and rinsing a wafer with the chemical rinse reducing defects on silicon and a dielectric, and maintaining integrity of a metal.... | 11/26/2009 |
| 20090241998 | Apparatus for foam-assisted wafer cleaning with use of universal fluid supply unit An apparatus for foam-assisted cleaning comprising a closable container with a funnel-shaped working chamber formed between the surface of the semiconductor wafer and the tapered base plate. The apparatus is provided with a fluid supply unit that incorporates a foam gen... | 10/01/2009 |
| 20090241995 | SUBSTRATE CLEANING METHOD AND APPARATUS In a method of removing a film residue from a wafer in a substrate processing system, a surface of the wafer is exposed to a processing liquid to thereby lift a first portion of the film residue off the surface of the wafer. In addition, a continuous or pulsed stream of... | 10/01/2009 |
| 20090229638 | METHOD OF DIELECTRIC FILM TREATMENT A method and system for cleaning a surface of a substrate after an etching operation includes determining a plurality of process parameters associated with the surface of the substrate. The process parameters define characteristics related to the surface of the substrat... | 09/17/2009 |
| 20090180086 | Substrate treating apparatus, exposing apparatus and methods of cleaning a cleaning tool The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning mem... | 07/16/2009 |
| 20090173364 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME A fluid supply pipe is inserted through a motor supporting member, a spin motor, a rotating shaft, and a plate supporting member. A first flange is integrally formed in the vicinity of a curved portion of a straight portion, extending in the vertical direction, of the f... | 07/09/2009 |
| 20090151757 | APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA The embodiments of the present invention provide apparatus for cleaning patterned substrates with fine features with cleaning materials. The apparatus using the cleaning materials has advantages in cleaning patterned substrates with fine features without substantially d... | 06/18/2009 |
| 20090145464 | Proximity head with angled vacuum conduit system, apparatus and method A proximity head including a head surface. The head surface including a first flat region and a plurality of first conduits. Each one of the plurality of first conduits being defined by corresponding one of a plurality of first discrete holes. The plurality of first dis... | 06/11/2009 |
| 20090126760 | SYSTEM FOR CLEANING A SURFACE USING CROGENIC AEROSOL AND FLUID REACTANT An apparatus and method are provided to treat for example a semiconductor wafer substrate wherein a delivery means for heat, a cryogen, and a fluid chemical reactant, is disposed in a chamber in which the substrate is disposed for at least one surface of the substrate t... | 05/21/2009 |
| 20090114248 | Substrate treating apparatus and method for treating substrate using the substrate treating apparatus A substrate treating apparatus includes an injecting nozzle which injects a treating solution to dry a substrate. The injecting nozzle discharges the treating solution to the substrate and injects a treating gas to the treating solution discharged from the injecting noz... | 05/07/2009 |
| 20090090381 | Frontside structure damage protected megasonics clean An apparatus and method for removing contaminants from a workpiece is described. Embodiments of the invention describe placing a workpiece on a holding bracket within a process chamber to hold and rotate the workpiece to be cleaned. A first cleaning fluid is provided to... | 04/09/2009 |
| 20090084409 | Cleaning apparatus, cleaning system using cleaning apparatus, cleaning method of substrate-to-be-cleaned [Object] It is an object of the invention to provide a cleaning apparatus for cleaning a precision substrate capable of preventing a contamination factor from adhering again, to prevent a natural oxide film from being formed, and to prevent a water mark. 04/02/2009 | |
| 20090025750 | Method for removal of a deposition from an optical element, lithographic apparatus, and method for manufacturing a device A method of removing a deposition from an optical element of an apparatus. The method includes providing a hydrogen comprising gas in at least a part of the apparatus, providing nitrogen radicals in the part of the apparatus for generating hydrogen radicals from the hyd... | 01/29/2009 |
| 20080302390 | Cleaning a Mask Substrate This invention relates to a mask cleaning apparatus 101 and a method of cleaning a mask substrate 110. An embodiment according to the invention is a mask cleaning apparatus 101 with a trap comprising a cold trap 120. An additional heater 1... | 12/11/2008 |
| 20080295871 | Chemical Supply System A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing ... | 12/04/2008 |
| 20080283099 | ENERGY-OPTIMIZED CLEANING MACHINE A cleaning machine is provided, in particular a single-chamber dishwashing machine, that includes a washing chamber for accommodating items to be cleaned or washed. At least one wash arm with a number of spray nozzles is located in the washing chamber. A waste-water lin... | 11/20/2008 |
| 20080271762 | ETCHING GAS CONTROL SYSTEM An etching gas control system is provided. The system includes a gas injector, a gas supply pipe, a Flow Ratio Controller (FRC), and a gas supply unit. The gas injector is installed in a chamber and supplies gas inside the chamber. The gas injector includes a top inject... | 11/06/2008 |
| 20080245390 | Method for cleaning semiconductor wafer surfaces by applying periodic shear stress to the cleaning solution Systems and methods for cleaning particulate contaminants adhered to wafer surfaces are provided. A cleaning media including dispersed coupling elements suspended within the cleaning media is applied over a wafer surface. External energy is applied to the cleaning media... | 10/09/2008 |
| 20080223418 | Device for Cleaning and Doping Equipment for Threads A device for cleaning and doping (lubrication) equipment for threads (3b, 4b) of the type used to join pipes (4) to a pipe string (3), especially in connection with petroleum production, where cleaning fluid and dope (lubricant)... | 09/18/2008 |
| 20080216866 | Surface Treatment Process and Applicator A packaged cleaning composition and process for cleaning a surface involves the simultaneous application of two liquids to the surface, such that a self-supporting gel is formed, acting on soil while delaying it from drying out. The gel and entrained soil are subsequent... | 09/11/2008 |
| 20080210269 | REMOVING UNWANTED FILM FROM WAFER EDGE REGION WITH REACTIVE GAS JET Unwanted films can be eliminated by directing a stream of reactive gas(es) at reactive zone in an edge region of the wafer. The action of the reactive gas can be enhanced by heating the gas in a nozzle, immediately prior to the gas impinging on the wafer. The action of ... | 09/04/2008 |
| 20080178911 | APPARATUS FOR EJECTING FLUID ONTO A SUBSTRATE AND SYSTEM AND METHOD INCORPORATING THE SAME A fluid dispenser for use in the processing of substrates. The dispenser has a dome shaped body with a convex upper surface and has a number of conduits designed to supply fluid to the surface of a substrate at predetermined points.... | 07/31/2008 |
| 20080156355 | Systems and Methods for Single Integrated Substrate Cleaning and Rinsing Inventive methods and systems of cleaning patterned integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to each... | 07/03/2008 |
