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An armor with rollers is provided that enables a user to move in all positions by rolling on a hard and smooth surface while constantly varying his bearing points on the ground.
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| Application No. | Application Title | Issue Date |
| 20080149147 | PROXIMITY HEAD WITH CONFIGURABLE DELIVERY An apparatus for processing a substrate is disclosed. The apparatus includes a proximity head having a surface that can be interfaced in proximity to a surface of a substrate. The proximity head has a plurality of dispensing ports capable of dispensing a first process m... | 06/26/2008 |
| 20080092813 | Liquid treatment apparatus, mounting and dismounting method of a cup body, and storage medium A liquid treatment apparatus treating a surface of a substrate held generally horizontally on a stage in a housing by supplying a treating liquid to said surface from a supply nozzle. The liquid treatment apparatus includes a cup body provided so as to surround the subs... | 04/24/2008 |
| 20070209684 | Copper deposition chamber having integrated bevel clean with edge bevel removal detection Embodiments of the invention generally provide apparatus and method for detecting and controlling edge bevel removal of a semiconductor substrate. One embodiment of the present invention provides an apparatus for inspecting a rotating substrate. The apparatus comprises ... | 09/13/2007 |
| 20070039633 | Polymer removing apparatus and method for cleaning inside thereof A rotating-shaft seal section protective plate including a cylindrical section that covers the periphery of part of a rotating shaft, a small-diameter flange-shaped section formed at an end on the rotor side, of the cylindrical section, and a large-diameter flange-shape... | 02/22/2007 |
| 20070028950 | Liquid processing apparatus and method A liquid processing apparatus includes containers 26, 27, 26a, 26b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a processing liquid to the substrates W in orde... | 02/08/2007 |
| 20070000516 | Device and method for cleaning the edges of substrates A device and method for cleaning the edges of substrates, including at least one cleaning head for receiving at least one nozzle element for supplying medium to a substrate. Formed in a main body of the cleaning head are a medium-suctioning port and an adjoining medium-... | 01/04/2007 |
| 20070000527 | Workpiece support for use in a process vessel and system for treating microelectronic workpieces A workpiece support apparatus for use in a process vessel and process system for treating semiconductor workpieces. The process vessel is to be utilized in an integrated tool for wet chemical treatment of a semiconductor workpiece. The workpiece support apparatus includ... | 01/04/2007 |
| 20060283486 | Method and apparatus for cleaning a substrate using non-newtonian fluids A method for cleaning a substrate is provided. In this method, a flow of non-Newtonian fluid is provided where at least a portion of the flow exhibits plug flow. To remove particles from a surface of the substrate, the surface of the substrate is placed in contact with ... | 12/21/2006 |
| 20060283485 | SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD A substrate treating apparatus includes a spin chuck for supporting a substrate to be rotatable in a plane including a principal surface of the substrate, a motor for rotating the spin chuck, a circulating pump for circulating a removal liquid and transmitting the remov... | 12/21/2006 |
| 20060266383 | Systems and methods for removing wafer edge residue and debris using a wafer clean solution A system (500) for removing wafer edge residue from a target wafer (508) is disclosed. A wafer holding mechanism (502) holds and optionally rotates the target wafer (508). A solution dispenser (504) applies a residue remover solution (... | 11/30/2006 |
| 20060266387 | Method and apparatus for wafer cleaning An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer. ... | 11/30/2006 |
| 20060266386 | Method and apparatus for cleaning and drying substrates The present invention provides an apparatus and method for cleaning substrates such as semiconductor wafers by sinking the substrates into cleaning fluids such as cleaning chemicals or rinsing liquids and then drying the substrates. The substrate clean and dry apparatus... | 11/30/2006 |
| 20060266389 | Method and apparatus for wafer cleaning A single wafer cleaning apparatus that includes a rotatable bracket that can hold a wafer, a rinse fluid having a first surface tension, a second fluid having a second surface tension lower than the first surface tension, a first nozzle capable of applying the rinse flu... | 11/30/2006 |
| 20060260660 | Method and apparatus for wafer cleaning An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer. ... | 11/23/2006 |
| 20060260661 | Method and apparatus for wafer cleaning An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer. ... | 11/23/2006 |
| 20060260659 | Method and apparatus for wafer cleaning An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer. ... | 11/23/2006 |
| 20060260662 | Method and apparatus for colloidal particle cleaning Methods and apparatuses for cleaning a surface is provided. In one embodiment, a method includes the step of determining the type and size of the contaminant particles. A solution, which may include a plurality of variable size particles, may be selected such that an ap... | 11/23/2006 |
| 20060237031 | APPARATUS AND METHOD FOR TREATING SUBSTRATE In an embodiment, an apparatus and method for cleaning a wafer include a container containing deionized water, and a cover opening/closing an opened upper portion of the container. A nozzle is installed in the cover to spray the deionized water to a space defined by the... | 10/26/2006 |
| 20060237043 | Method and apparatus for cleaning semiconductor substrates According to one aspect of the present invention, a method and apparatus for cleaning a semiconductor substrate are provided. The apparatus may include a chamber wall defining a processing chamber having a chamber gas therein, a semiconductor substrate support, and a fl... | 10/26/2006 |
| 20060231127 | Spin scrubber apparatus A spin scrubber apparatus has an index unit configured to support one or more cassettes, a processing unit having one or more cleaning stations facing the index unit across a transfer space, and a substrate transfer device disposed in the transfer space for transferring... | 10/19/2006 |
| 20060219257 | Cleaning device and cleaning method The invention provides a cleaning device for cleaning or rinsing a wafer disposed in a cleaning bath by cleaning fluid in the cleaning bath including a front wall that configures the cleaning bath by being in abutment with a device body and is formed with an opening cor... | 10/05/2006 |
| 20060219274 | Substrate processing apparatus A dry-air supplying duct and a dry-air exhaust duct are opposite each other across a processing tank. Inside the dry-air supplying duct, a plurality of ventilation guides are provided that extend horizontally by a predetermined length from an end of the dry-air supplyin... | 10/05/2006 |
| 20060219275 | Device for cleaning wafers after a cmp process An apparatus for cleaning wafers using the CMP process includes a transport device of a feeding station at the beginning of a cleaning line which has a plurality of transport rollers disposed and driven transversely to the direction of transport. The cleaning line trans... | 10/05/2006 |
| 20060213542 | Substrate processing apparatus A plurality of substrates after subjected to a chemical solution processing in a second processing bath is immersed in deionized water stored in a first processing bath. At this time, a holding mechanism is moved down such that the positions in the height direction of t... | 09/28/2006 |
| 20060213538 | Semiconductor cleaning apparatus and semiconductor cleaning method A semiconductor cleaning apparatus according to the present invention comprises: a particle monitor which measures the number of particles in a processing liquid used in a rinse process after a semiconductor wafer is subjected to a cleaning process by means of the proce... | 09/28/2006 |
| 20060207631 | Apparatus and method of cleaning a sustrate A cleaning apparatus is provided with a processing bath to be filled with a cleaning chemical, an ultrasonic oscillator, and a retainer for holding a substrate to be immersed into a cleaning chemical. The front surface of the substrate is cleaned while ultrasonic waves ... | 09/21/2006 |
| 20060207633 | DEVICE AND METHOD FOR CLEANING PHOTOMASK Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing a... | 09/21/2006 |
| 20060207636 | Multi-menisci processing apparatus A substrate preparation apparatus is provided. The apparatus includes a housing configured to be installed in a substrate fabrication facility. The housing includes a manifold for use in preparing a wafer surface. The manifold is configured to include a first process wi... | 09/21/2006 |
| 20060201540 | Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines Stepper and/or scanner machines including cleaning devices and methods for cleaning stepper and/or scanner machines are disclosed herein. In one embodiment, a stepper and/or scanner machine includes a housing, an illuminator, a lens, a workpiece support, a cleaning devi... | 09/14/2006 |
| 20060201541 | Cleaning-drying apparatus and cleaning-drying method It is an object to provide a semiconductor manufacturing apparatus provided with an apparatus performing a cleaning-drying process without a defect due to static electricity or the like, in a manufacturing process of a semiconductor device. One of features is that an io... | 09/14/2006 |
| 20060201539 | Method and apparatus for cleaning and sealing display packages A method and apparatus for cleaning and sealing components of a display utilizes continuous isolation of the components between the cleaning step and the sealing step. This limits exposure of the components to contaminants and isolates the components from oxidizing agen... | 09/14/2006 |
| 20060196530 | Novel semiconductor wafer lifter A novel semiconductor wafer lifter is disclosed for handling wafers during wet bench processing. In particular, the lifter has a plurality of holes formed in its vertical support surface to allow cleaning or rinsing fluid to flow through the vertical support instead of ... | 09/07/2006 |
| 20060196531 | Substrate processing apparatus A substrate processing apparatus includes a substrate processing part 46 for processing a substrate by a processing liquid and a processing-liquid recovery path 137 allowing of a passage of the processing liquid discharged from the substrate processing par... | 09/07/2006 |
| 20060185696 | Substrate cleaning apparatus An inexpensive cleaning apparatus capable of exerting cleaning power on a side surface of a substrate at the same level as on a main surface thereof, and capable of changing an angle of a jetting device during cleaning without so changing a jet distance. The apparatus <... | 08/24/2006 |
| 20060174919 | Apparatus and method for cleaning flat objects in a vertical orientation with pulsed liquid jet An apparatus for cleaning flat objects such as semiconductor wafers with a pulsed liquid jet emitted from a group of nozzles that may be installed on one or on both sides of the wafer installed in a vertically arranged rotating chuck. The apparatus is comprised of a ser... | 08/10/2006 |
| 20060174920 | Method and apparatus for cleaning flat objects with pulsed liquid jet A method and apparatus for pulsed jet cleaning of flat objects based on the principle of enhancing formation of droplets of the cleaning medium by increasing the boundary surface area between the jets emitted though the nozzles of the cleaning unit and the surrounding a... | 08/10/2006 |
| 20060162745 | Substrate processing method and substrate processing device A processing tank 10 is divided into a washing section 15 and a drying section 30, a clearance is formed in the joint between the sections, and the clearance is communicated with by sink 29. In drying a substrate, the substrate is moved from ... | 07/27/2006 |
| 20060162748 | Wafer guide and semiconductor wafer drying apparatus using the same A wafer guide and a semiconductor wafer drying apparatus using the same are disclosed. The wafer guide includes a body and supporters formed on the body. The supporters present a plurality of grooves to engage and support a periphery of a wafer. A discharge structure, e... | 07/27/2006 |
| 20060157091 | Device for treating pieces of a substrate at high pressure with a supercritical or near-critical treatment medium, piece by piece or in batches A device for treating pieces of a substrate at high pressure, piece by piece or in batches, with a treatment medium in the supercritical or near-critical state, includes a first pressure chamber, a pipe system for supplying and discharging the treatment medium, to and f... | 07/20/2006 |
| 20060151013 | Clean assembling module device, produciton system formed with the module, industrial robot, and pollution spred prevention system A clean assembling module device that achieves cleanliness of a work area where assembling, processing, transportation, etc. of a work item are performed and that can be downsized. The invention also includes a production system, an industrial robot, and a pollution spr... | 07/13/2006 |
