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| Application No. | Application Title | Issue Date |
| 20120102778 | METHOD OF PRIMING AND DRYING SUBSTRATES A method of priming and drying substrates having high-aspect ratio trenches. In one aspect, the method comprises: a) supporting at least one substrate having high-aspect ratio trenches in a process chamber having a gaseous atmosphere; b) sealing the process chamber; c) ... | 05/03/2012 |
| 20120080059 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS Provided herein are etching, cleaning and drying methods using a supercritical fluid, and a chamber system for conducting the same. The etching method includes etching the material layer using a supercritical carbon dioxide in which an etching chemical is dissolved, and... | 04/05/2012 |
| 20120048304 | SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING SYSTEM According to an embodiment, a supercritical drying method includes: introducing a semiconductor substrate of which a surface is wet with a supercritical displacement solvent into a chamber; supplying a first supercritical fluid being based on first carbon dioxide to the... | 03/01/2012 |
| 20120006361 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE A substrate rotates, and a liquid nozzle of a gas/liquid supply nozzle moves to a position above the center of the rotating substrate. In this state, a rinse liquid is discharged from the liquid nozzle onto the rotating substrate. The gas/liquid supply nozzle moves towa... | 01/12/2012 |
| 20110315169 | SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM STORING COMPUTER PROGRAM FOR PERFORMING SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING APPARATUS In a substrate processing method according to the present invention, a cleaning liquid nozzle supplies a rinsing liquid to a central portion of a substrate and thereafter moves from a position corresponding to the central portion of the substrate to a position correspon... | 12/29/2011 |
| 20110314689 | SUBSTRATE DRYING METHOD According to one embodiment, a semiconductor substrate whose surface is wet with a chemical solution (solvent) and formed with patterns having an aspect ratio of 10 or more is loaded into a chamber. Then, while the chemical solution (solvent) remains on the semiconducto... | 12/29/2011 |
| 20110289793 | SUPERCRITICAL DRYING METHOD According to one embodiment, a semiconductor substrate having a surface wetted with a chemical solution is introduced into a chamber, and a supercritical fluid is supplied into the chamber. The temperature in the chamber is adjusted to the critical temperature of the ch... | 12/01/2011 |
| 20110265831 | METHODS AND APPARATUS FOR PROVIDING A GAS MIXTURE TO A PAIR OF PROCESS CHAMBERS A method and apparatus for supplying a gas mixture to a load lock chamber is described. In one embodiment, the apparatus supplies a gas mixture to a pair of process chambers, comprising a first ozone generator to provide a first gas mixture to a first process chamber, a... | 11/03/2011 |
| 20110232694 | Reactor cleaning apparatus In a reactor cleaning apparatus 1 which cleans an inner wall surface 72 of a reactor 70 which generates polycrystalline silicon, a bell jar of the reactor 70 has a dual structure, a through hole 11 is formed along a vertical direction ... | 09/29/2011 |
| 20110230054 | SEMICONDUCTOR SUBSTRATE CLEANING METHOD In one embodiment, a semiconductor substrate cleaning method is disclosed. The method can clean a semiconductor substrate by using a chemical of 80° C. or above. The method can rinse the semiconductor substrate by using pure water of 40° C. or above after the cleaning... | 09/22/2011 |
| 20110203611 | MASK CLEANING METHOD, MASK CLEANING APPARATUS, AND PELLICLE Embodiments disclose a method for cleaning a mask having a mask film that is of a surface to which a foreign substance containing silicon oxide adheres. In the method, the mask is retained in a cleaning gas containing diluted hydrofluoric acid vapor at a temperature at ... | 08/25/2011 |
| 20110197929 | PROCESS FOR REMOVING CARBONACEOUS DEPOSITS ON SURFACES OF CATALYSTS AND PLANT PARTS A process for removing carbonaceous deposits on surfaces of catalysts and plant parts by treating the deposits with a superheated stream of steam admixed at least temporarily with an oxygenous gas, which comprises, in each case with monitoring of the CO2 cont... | 08/18/2011 |
| 20110155180 | WAFER CLEANING APPARATUS AND WAFER CLEANING METHOD USING THE SAME A wafer cleaning apparatus and a wafer cleaning method using the same are provided. The wafer cleaning method includes removing an oxide layer, which is formed on a wafer, by performing a dry cleaning process using hydrogen fluoride (HF) gas and ammonia (NH3)... | 06/30/2011 |
| 20110155181 | SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM STORING PROGRAM FOR EXECUTING SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS There is provided a substrate processing method capable of preventing pattern collapse when a rinse solution is removed from a substrate on which a microscopic resist pattern is formed and also capable of reducing cost for processing the substrate by decreasing an amoun... | 06/30/2011 |
| 20110124201 | CHEMICAL VAPORIZER FOR MATERIAL DEPOSITION SYSTEMS AND ASSOCIATED METHODS System and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the va... | 05/26/2011 |
| 20110059600 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, CLEANING METHOD, AND SUBSTRATE PROCESSING APPARATUS It is possible to efficiently remove deposited materials such as a conductive film or insulting film adhered to parts such as the inner wall of a processing chamber and a substrate supporting tool disposed in the processing chamber. There is provided a method of manufac... | 03/10/2011 |
| 20110030736 | PROCESS FOR CLEANING ARTICLES A method of cleaning at least one article having a surface to be cleaned, the method comprising the steps of inserting the article into a cleaning chamber (3), subjecting the surface of the article to treatment with water vapour under conditions such that at leas... | 02/10/2011 |
| 20110023914 | METHOD AND APPARATUS FOR CLEANING PHOTOMASK Provided is a method and apparatus for cleaning a photomask. The photomask including a first region and a second region surrounding the first region, a pattern to be protected disposed on the first region, and a material to be removed exists on the second region. A clea... | 02/03/2011 |
| 20110011425 | SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, RECORDING MEDIUM AND SOFTWARE A substrate processing system 1 comprises: a processing tank 3 for processing substrates W with a processing liquid; a drying unit 6 disposed above the processing tank 3; and a carrying mechanism 8 for carrying the substrates W between... | 01/20/2011 |
| 20100326477 | PROCESS FOR TREATMENT OF SUBSTRATES WITH WATER VAPOR OR STEAM A method of treating a substrate comprises, in one aspect, placing a substrate having material on a surface thereof in a treatment chamber; directing a stream of a liquid treatment composition to impinge the substrate surface; and directing a stream of water vapor to im... | 12/30/2010 |
| 20100288301 | REMOVING CONTAMINANTS FROM AN ELECTROLESS NICKEL PLATED SURFACE Removing contaminants from an electroless nickel (EN) plated surface. A surface of an EN plated object is washed in a first deionized water to remove a first portion of surface contaminants. The surface is immersed into a chemical solution wash for a pre-determined dura... | 11/18/2010 |
| 20100288312 | DEVICE AND PROCESS FOR WET TREATING A PERIPHERAL AREA OF A WAFER-SHAPED ARTICLE A device for wet treating a peripheral area of a wafer-shaped article includes holding elements for holding and rotating the wafer-shaped article at its edge, a first and a second liquid treatment units for supplying liquid towards the peripheral area. The holding eleme... | 11/18/2010 |
| 20100290015 | EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large eno... | 11/18/2010 |
| 20100282271 | METHOD AND APPARATUS FOR IN-LINE PROCESSING AND IMMEDIATELY SEQUENTIAL OR SIMULTANEOUS PROCESSING OF FLAT AND FLEXIBLE SUBSTRATES THROUGH VISCOUS SHEAR IN THIN CROSS SECTION GAPS FOR THE MANUFACTURE OF MICRO-ELECTRONIC CIRCUITS OR DISPLAYS A method and apparatus for cleaning, drying, coating, baking etching and deposition of surfaces on glass substrate as it transitions thru and between small gaps between hydro-static porous media bearings. Due to the non-contact nature of the device extremely high pressu... | 11/11/2010 |
| 20100269865 | LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD Disclosed is a liquid processing apparatus which can more securely prevent convex portions from collapsing and also can increase the processing efficiency of a substrate. The liquid processing apparatus processes the substrate having a main body part, and a plurality of... | 10/28/2010 |
| 20100218791 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD A drying gas is supplied into a drying chamber in a substantially horizontal direction, an obliquely downward direction descendent from the substantially horizontal direction, or a vertically downward direction under a state where a wafer is immersed in a cleaning liqui... | 09/02/2010 |
| 20100206338 | DEVICE AND METHOD FOR REMOVING LIQUID FROM A SURFACE OF A DISC-LIKE ARTICLE A method for removing liquid from a surface of a disc includes, rotating the disc article about an axis perpendicular to the disc's main surface, supplying liquid from a supply port, moved across the substrate towards the edge of the disc, onto the rotated disc, supplyi... | 08/19/2010 |
| 20100200547 | LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD Disclosed is a liquid processing apparatus to perform liquid processing by supplying a processing liquid from a nozzle formed on an irrotational member to a substrate while the substrate is rotated horizontally in a state where a back surface of the substrate faces down... | 08/12/2010 |
| 20100186777 | METHOD OF CLEANING AIR DIFFUSER APPARATUS A method of cleaning an air diffuser apparatus component in a membrane filtration unit in which the air diffuser apparatus includes an air main pipe connected to at least one aeration blower, liquid supply piping that joins in midstream of the air main pipe, a branch co... | 07/29/2010 |
| 20100152093 | SOLVENT COMPOSITIONS COMPRISING UNSATURATED FLUORINATED HYDROCARBONS This invention relates to cleaning compositions comprising unsaturated fluorinated hydrocarbons. The invention further relates to use of said cleaning compositions in methods to clean, degrease, deflux, dewater, and deposit fluorolubricant. The invention further relates... | 06/17/2010 |
| 20100139708 | METHOD OF REMOVING RESIST AND APPARATUS THEREFOR A resist removing device 1 functions to remove a resist from a substrate while preventing occurrence of popping phenomenon and at the same time attains reduction in cost of energy for the resist removing and has a simplified constitution. The resist removing devi... | 06/10/2010 |
| 20100139705 | SOLID DISHMACHINE DETERGENT NOT REQUIRING A SEPARATE RINSE ADDITIVE New solid detergent compositions and methods of forming and using those compositions are provided. The compositions for forming the solid detergents comprise a copolymer, scale inhibiting agent, and non-phosphate builder dispersed or dissolved in a solvent system. Advan... | 06/10/2010 |
| 20100105126 | METHOD AND APPARATUS FOR EXTRACTING CARBON DIOXIDE FROM AIR A method and apparatus for extracting CO2 from air comprising an anion exchange material formed in a matrix exposed to a flow of the air, and for delivering that extracted CO2 to controlled environments. The present invention contemplates the extra... | 04/29/2010 |
| 20100071726 | METHOD AND SYSTEM OF DRYING A MICROELECTRONIC TOPOGRAPHY Drying a microelectronic topography. At least some of the illustrative embodiments are methods that include placing a microelectronic topography inside a process chamber, providing a non-aqueous liquid to the process chamber until at least 90% of the volume of the proce... | 03/25/2010 |
| 20100051055 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD The substrate processing apparatus according to the present invention includes: a substrate rotating mechanism holding a substrate in a horizontal attitude and rotating the substrate around an axis passing through the center of the substrate; a processing liquid supply ... | 03/04/2010 |
| 20100051064 | METHOD OF CLEANING AND AFTER TREATMENT OF OPTICAL SURFACES IN AN IRRADIATION UNIT The present invention relates to a method of cleaning and after treatment of optical surfaces in an irradiation unit, said irradiation unit comprising a radiation source (1, 31) emitting EUV-radiation and/or soft X-rays, a first volume (40) following said ... | 03/04/2010 |
| 20100043837 | METHOD OF CONTROLLING CONTAMINATION OF A SURFACE A method is described of controlling contamination of a surface exposed to a carbonaceous material and ionising radiation, such as EUV radiation, DUV radiation or electrons. The method comprises cyclically supplying to the surface a first gas comprising an oxidising spe... | 02/25/2010 |
| 20100043839 | SUBSTRATE PROCESSING METHOD The present invention provides a substrate processing apparatus having a drying mechanism for removing water from a surface of a substrate which has been cleaned by a wet cleaning process, and a substrate processing apparatus and a substrate processing method which are ... | 02/25/2010 |
| 20100043838 | Method and Apparatus for Cleaning a Mouthguard A device for cleaning and storing a mouthguard, including two main chambers shaped for receiving and holding a mouthguard. One of the main chambers has a sealable lid for retaining disinfecting liquid and the other main chamber has vents to allow water to drain away, an... | 02/25/2010 |
| 20100024842 | GENERATOR FOR FOAM TO CLEAN SUBSTRATE In an example embodiment, a device for generating a cleaning foam includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another component of the cleaning system. The plug includes a premix chamber which receives the fluid... | 02/04/2010 |
