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Dining Table Having Integral Dishwasher
A space-saving dishwasher, which may be installed within a counter top or table, having a dish-carrying rack that is vertically shiftable through the open top of the dishwasher for facilitating loading and unloading of the dishes.
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| Application No. | Application Title | Issue Date |
| 20120080053 | METHOD FOR CLEANING OF SEMICONDUCTOR SUBSTRATE AND ACIDIC SOLUTION Disclosed is a cleaning method which can remove, particularly, all of an organic contaminant, a particle contaminant, and a metal contaminant adhered to a semiconductor substrate at a high cleaning level, and which can realize the reduction in environmental load caused ... | 04/05/2012 |
| 20120048295 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES This disclosure relates to compositions that can be used to remove residues from a semiconductor substrate.... | 03/01/2012 |
| 20120037181 | CLEANING METHODS FOR IMPROVED PHOTOVOLTAIC MODULE EFFICIENCY Embodiments of the present invention generally relate to methods for cleaning a substrate prior to a deposition process. The methods generally include multiple cleaning solutions for removing contaminants from a surface of a substrate. The multiple solutions generally h... | 02/16/2012 |
| 20120000485 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD The present invention provides a cleaning agent for a substrate and a cleaning method thereof, which can effectively remove fine particles (particles) present on a surface of substrate or impurities derived from various kinds of metals (metallic impurities), without cau... | 01/05/2012 |
| 20110303238 | PROCESS FOR DECONTAMINATING RADIOACTIVELY CONTAMINATED SURFACES A process is provided for chemically decontaminating the surface of a metallic component. In a first treatment step, an oxide layer formed on the component by corrosion of the material of the component is detached from the surface of the component with a first aqueous t... | 12/15/2011 |
| 20110268885 | SOLUTION FOR REMOVING ALUMINUM OXIDE FILM AND METHOD FOR SURFACE TREATMENT OF ALUMINUM OR ALUMINUM ALLOY A solution for removing an aluminum oxide film from an aluminum or aluminum alloy surface, which includes a salt or oxide of a metal capable of substituting aluminum, a solubilizing agent for ions of the metal, and an alkali, and which has a pH of 10 to 13.5. | 11/03/2011 |
| 20110259363 | PROCESS FOR REMOVING A COATING FROM SURFACES OF COMPONENTS USING ONLY HYDROCHLORIC ACID The removal of a coating from components after they have been used is often achieved using various acid baths and salt melts. A coating removal process that includes only using hydrochloric acid is provided. The duration of the process in which the coating is treated wi... | 10/27/2011 |
| 20110253169 | SOLUTION FOR REMOVING TITANIUM-CONTAINING COATINGS AND METHOD FOR SAME A solution and method for removing titanium-containing coatings from the surface of substrates using the solution are provided. The solution includes 90-1000 g/L organic or inorganic acid; 70-500 g/L accelerant, the accelerant being acid or salt which contains fluorinio... | 10/20/2011 |
| 20110247650 | COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATES The compositions and methods for the removal of residues and contaminants from metal or dielectric surfaces comprises at least one alkyl diphosphonic acid, at least one second acidic substance at a mole ratio of about 1:1 to about 10:1 in water, and pH is adjusted to fr... | 10/13/2011 |
| 20110232679 | USE OF THIOGLYCOL ETHOXYLATE AS A CORROSION INHIBITOR The present invention relates to an acidic, aqueous composition which comprises a thiodiglycol alkoxylate for treating metallic surfaces. The invention furthermore relates to the use of one or more compound(s) of the general formula (I) as a corrosion inhibitor.... | 09/29/2011 |
| 20110214689 | CLEANING SOLVENT AND CLEANING METHOD FOR METALLIC COMPOUND Disclosed are cleaning solvents and cleaning methods for metallic compounds deposited on the equipment that supplies organometallic compounds to the manufacturing tool in the photovoltaic industry or the semiconductor industry. The cleaning solvents and the cleaning met... | 09/08/2011 |
| 20110203611 | MASK CLEANING METHOD, MASK CLEANING APPARATUS, AND PELLICLE Embodiments disclose a method for cleaning a mask having a mask film that is of a surface to which a foreign substance containing silicon oxide adheres. In the method, the mask is retained in a cleaning gas containing diluted hydrofluoric acid vapor at a temperature at ... | 08/25/2011 |
| 20110094536 | Troika Acid Semiconductor Cleaning Compositions and Methods of Use Semiconductor processing compositions for use with silicon wafers having an insulating layers, and metallization layers on the wafers comprising water and one or more Troika acids which is also referred to as a, α-disubstituted trifunctional oximes or α-(Hydroxyimino)... | 04/28/2011 |
| 20110088720 | METHODS FOR CLEANING SUBSTRATES A method for removing sand particles from a substrate is described. The method includes the step of treating the substrate with an acid solution comprising HxAF6, wherein A is selected from the group consisting of Si, Ge, Ti, Zr, Al, and Ga; and wh... | 04/21/2011 |
| 20110079244 | PICKLING METHOD AND PICKLING SYSTEM OF STEEL SHEET The present invention provides a pickling method of steel sheet and pickling system of steel sheet able to efficiently remove oxide scale from steel sheet. That is, it provides a continuous pickling method of steel sheet having a step A of pickling the steel sheet in a ... | 04/07/2011 |
| 20110056516 | PROCESS FOR SURFACE TREATMENT OF METALS An environmentally acceptable and comparatively safe acid cleaning solution containing sulfuric acid, water and amine containing inhibitors that adequately remove oxidation or contaminants from surfaces without excessively damaging equipment. The sulfuric acid is effect... | 03/10/2011 |
| 20110027995 | CLEANING SOLUTION FOR SUBSTRATE FOR SEMICONDUCTOR DEVICE A cleaning solution of the present invention contains a sodium ion, a potassium ion, an iron ion, an ammonium salt of a sulfuric ester represented by General Formula (1), and water, and each content of the sodium ion, the potassium ion, and the iron ion is 1 ppb to 500 ... | 02/03/2011 |
| 20110023907 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE A method for manufacturing a semiconductor device includes the step of conducting a cleaning process for a wafer formed with copper wiring lines to remove contaminations produced on a back surface of the wafer. The cleaning process is conducted by injecting onto the bac... | 02/03/2011 |
| 20110014793 | Post-dry etching cleaning liquid composition and process for fabricating semiconductor device A post-dry etching cleaning liquid composition for cleaning a substrate after dry etching is provided, the cleaning liquid composition containing at least one type of fluorine compound, glyoxylic acid, at least one type of organic acid salt, and water. With regard to th... | 01/20/2011 |
| 20110005549 | METHOD FOR THE THERMOCHEMICAL CLEANING AND/OR STRIPPING OF TURBINE COMPONENTS The invention relates to a process for the thermochemical cleaning and/or stripping of turbine components, in particular engine components, with the steps: Production of a first gaseous mixture containing HF and H2 in which the part by volume of HF in the mix... | 01/13/2011 |
| 20100326466 | METHOD FOR REGENERATING GAS TURBINE BLADE AND GAS TURBINE BLADE REGENERATING APPARATUS An object is to reduce changes in mechanical properties of a gas turbine blade base material during repair or regeneration of a gas turbine blade. For this purpose, a gas turbine blade after being operated is washed by being immersed into a strong alkaline washing solut... | 12/30/2010 |
| 20100313908 | Use of Alkanesulfonic Acid as Agent for Cleaning Cement, Mortar and Concrete The present invention relates to the use of at least one alkanesulfonic acid of formula R—SO3H, in which R represents a saturated, linear or branched, hydrocarbon chain containing 1 to 4 carbon atoms, as agent for cleaning cement, mortar, concrete, lime, la... | 12/16/2010 |
| 20100294307 | ACIDIC CLEANER FOR METAL SURFACES The invention relates to a acidic composition for cleaning surfaces of metal or alloys which are susceptible to corrosion comprising
| 11/25/2010 |
| 20100275952 | SELECTIVE ETCHING OF REACTOR SURFACES Compositions, methods, and systems permit selectively etching metal oxide from reactor metal parts (e.g., titanium and/or titanium alloys). The etching composition comprises an alkali metal hydroxide and gallic acid. The method is useful for cleaning reaction chambers u... | 11/04/2010 |
| 20100275951 | SEMICONDUCTOR PROCESSING METHOD A process for treating the surface of a substrate in the manufacture of a semiconductor device. The process comprises providing a concentrated acid or base, a peroxide and water, and delivering the acid or base, the peroxide and the water to the surface of the substrate... | 11/04/2010 |
| 20100269854 | Apparatus and Method for the Continuous Pickling of Steel Strip The pickling of a continuously running steel strip and, more particularly, a pickling method, includes centralized control of all of the pickling operations. The invention further includes an apparatus for implementing the pickling process.... | 10/28/2010 |
| 20100261054 | Lithium Primary Cells A method for treating a cathode electrode assembly. The method includes providing an electrode including iron disulfide and contacting the electrode with a solution including acid to remove impurities from the electrode. The electrode may then be dried under various con... | 10/14/2010 |
| 20100255659 | REDUCTION OF WATERMARKS IN HF TREATMENTS OF SEMICONDUCTING SUBSTRATES A process for reducing or suppressing the appearance of watermarks in a hydrophobic surface of a semiconductor substrate prepared as a base substrate for epitaxial growth. The process includes cleaning the hydrophobic surface of the semiconductor substrate with an aqueo... | 10/07/2010 |
| 20100218788 | NON DESTRUCTIVE SELECTIVE DEPOSITION REMOVAL OF NON-METALLIC DEPOSITS FROM ALUMINUM CONTAINING SUBSTRATES Non-metallic deposits are selectively removed from aluminum containing substrates such as aluminum faceplates using a selective deposition removal (SDR) solution. The SDR solution does not substantially etch the faceplate holes, thereby preserving the hole diameter inte... | 09/02/2010 |
| 20100221916 | Methods of Etching Oxide, Reducing Roughness, and Forming Capacitor Constructions The invention includes methods in which one or more components of a carboxylic acid having an aqueous acidic dissociation constant of at least 1×10−6 are utilized during the etch of oxide (such as silicon dioxide or doped silicon dioxide). Two or more carb... | 09/02/2010 |
| 20100180914 | CONDUCTOR CLEANING SYSTEM AND METHOD A conductor cleaning system for cleaning aluminum strands of all aluminum and steel reinforced conductors, such as ACSS, ACSR, ACAR, and AAA. The conductor cleaning system having a container adapted to receive a portion of a conductor to be cleaned, a housing adapted to... | 07/22/2010 |
| 20100175715 | Combinatorial Approach to the Development of Cleaning Formulations For Wet Removal of High Dose Implant Photoresist Embodiments of the current invention describe a cleaning solution for the removal of high dose implanted photoresist, along with methods of applying the cleaning solution to remove the high dose implanted photoresist and combinatorially developing the cleaning solution.... | 07/15/2010 |
| 20100175714 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD A substrate processing apparatus and a substrate processing method, with which a resist can be removed satisfactorily from the substrate and a processing solution used for removing the resist can be recycled, are provided. The substrate processing apparatus includes: a ... | 07/15/2010 |
| 20100170532 | METHOD OF CLEANING FIREARMS AND ORDNANCE A method of removing metallic copper from a steel surface defining a bore or cylinder of a gun is provided. The method involves contacting the surface with a composition comprising a polyphosphonic acid, a hydroxyl-substituted primary amine, and water.... | 07/08/2010 |
| 20100167514 | POST METAL GATE VT ADJUST ETCH CLEAN A method for fabricating a CMOS integrated circuit (IC) includes providing a substrate having a semiconductor surface, wherein the semiconductor surface has PMOS regions for PMOS devices and NMOS regions for NMOS devices. A gate dielectric layer is formed on the semicon... | 07/01/2010 |
| 20100139692 | IMMERSIVE OXIDATION AND ETCHING PROCESS FOR CLEANING SILICON ELECTRODES A process for cleaning a silicon electrode is provided where the silicon electrode is soaked in an agitated aqueous detergent solution and rinsed with water following removal from the aqueous detergent solution. The rinsed silicon electrode is then soaked in an agitated... | 06/10/2010 |
| 20100126524 | SYSTEMS, METHODS AND SOLUTIONS FOR CLEANING CRYSTAL GROWTH VESSELS The disclosure provides mixed acid solutions for cleaning a vessel, such as a vessel used for growing a GaAs crystal, comprising nitric acid, hydrofluoric acid and water. Further, the disclosure also provides exemplary methods for cleaning a vessel for growing a GaAs cr... | 05/27/2010 |
| 20100122712 | Ferric Pickling of Silicon Steel The pickling process designed for pickling electrical steel strip in a continuous fashion comprising immersing the strip in at least one pickling tub. The pickling tub contains a mixture of HCl, Fe2+, and Fe3+ and a low concentration of HF. Upon ex... | 05/20/2010 |
| 20100116288 | METHOD FOR DECONTAMINATING SURFACES OF NUCLEAR PLANTS WHICH HAVE BEEN CONTAMINATED WITH ALPHA EMITTERS A method for decontaminating nuclear plant surfaces, which have been contaminated with alpha emitters, is carried out subsequently to a decontamination process which is aimed at the removal of oxide layers. The surfaces are treated with an aqueous solution which contain... | 05/13/2010 |
| 20100104743 | METHOD OF MANUFACTURING A GLASS SUBSTRATE FOR MAGNETIC DISK In a manufacturing method of a glass substrate for a magnetic disk including a cleaning process of the glass substrate, the cleaning process includes a process of contacting the glass substrate with a cleaning solution containing a compound, such as thioglycolic acid or... | 04/29/2010 |
