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| Application No. | Application Title | Issue Date |
| 20120108488 | Cleaning And/Or Treatment Compositions This invention relates to compositions comprising certain fungal serine proteases and processes for making and using such compositions including the use of such compositions to clean and/or treat a situs.... | 05/03/2012 |
| 20120080058 | Application of Rejection Enhancing Agents (REAs) that do not have Cloud Point Limitations on Desalination Membranes Methods of treating used or degraded reverse osmosis membranes post-production are provided. The membranes can be treated online or offline. The reverse osmosis membranes are cleaned and then contacted with a rejection enhancing agent solution that includes polyvinylpyr... | 04/05/2012 |
| 20120052134 | SULFOPEROXYCARBOXYLIC ACIDS, THEIR PREPARATION AND METHODS OF USE AS BLEACHING AND ANTIMICROBIAL AGENTS The present invention relates to novel sulfoperoxycarboxylic acid compounds, and methods for making and using them. The sulfoperoxycarboxylic compounds of the invention are storage stable, water soluble and have low to no odor. Further, the compounds of the present inve... | 03/01/2012 |
| 20120037191 | CLEANING SEQUENCE FOR OXIDE QUALITY MONITORING SHORT-LOOP SEMICONDUCTOR WAFER Disclosed herein are methods for novel cleaning processes for inline quality monitoring short-loop semiconductor wafers. In one embodiment, an exemplary process may comprise immersing the short-loop wafer in an SC-2 aqueous solution comprising hydrochloric acid and hydr... | 02/16/2012 |
| 20120012134 | METHOD FOR CLEANING ELECTRONIC MATERIAL AND DEVICE FOR CLEANING ELECTRONIC MATERIAL A resist on an electronic material is surely separated and removed in a short time. The electronic material is cleaned with a sulfuric acid solution containing persulfuric acid to separate and clean the resist, and thereafter wet cleaning is performed with gas dissolved... | 01/19/2012 |
| 20120009788 | CLEANING SOLUTION, CLEANING METHOD AND DAMASCENE PROCESS USING THE SAME A cleaning solution is provided. The cleaning solution includes (a) 0.01-0.1 wt % of hydrofluoric acid (HF); (b) 1-5 wt % of a strong acid, wherein the strong acid is an inorganic acid; (c) 0.05-0.5 wt % of ammonium fluoride (NH4F); (d) a chelating agent cont... | 01/12/2012 |
| 20110259367 | METHOD OF CLEANING FOOD AND BEVERAGE MANUFACTURING AND HANDLING EQUIPMENT The present invention is generally directed toward methods of cleaning and descaling surfaces contaminated with food soils, especially clean-in-place systems. More particularly, the methods according to the present invention also provide for sanitizing of surfaces conta... | 10/27/2011 |
| 20110253177 | METHOD OF WASHING POLYCRYSTALLINE SILICON, APPARATUS FOR WASHING POLYCRYSTALLINE SILICON, AND METHOD OF PRODUCING POLYCRYSTALLINE SILICON A method of washing polycrystalline silicon is provided. The method includes a step of acid cleaning in which the polycrystalline silicon is cleaned with an acid solution and a step of a water cleaning in which the polycrystalline silicon is cleaned by pure water after ... | 10/20/2011 |
| 20110230054 | SEMICONDUCTOR SUBSTRATE CLEANING METHOD In one embodiment, a semiconductor substrate cleaning method is disclosed. The method can clean a semiconductor substrate by using a chemical of 80° C. or above. The method can rinse the semiconductor substrate by using pure water of 40° C. or above after the cleaning... | 09/22/2011 |
| 20110214697 | SUBSTRATE CLEAN SOLUTION FOR COPPER CONTAMINATION REMOVAL Embodiments of the invention generally relate to a method for selectively etching or otherwise removing copper or other metallic contaminants from a substrate, such as a gallium arsenide wafer. In one embodiment, a method for selectively removing metallic contaminants f... | 09/08/2011 |
| 20110193196 | Indium Phosphide Substrate Manufacturing Method, Epitaxial Wafer Manufacturing Method, Indium Phosphide Substrate, and Epitaxial Wafer Affords methods of manufacturing InP substrates, methods of manufacturing epitaxial wafers, InP substrates, and eptiaxial wafers whereby deterioration of the electrical characteristics can be kept under control, and at the same time, deterioration of the PL characterist... | 08/11/2011 |
| 20110187010 | SEMICONDUCTOR CLEANING USING SUPERACIDS A method of cleaning a substrate includes contacting a surface of a semiconductor substrate with a composition comprising a superacid. The semiconductor substrate may be a wafer.... | 08/04/2011 |
| 20110186087 | PROCESS FOR PURIFYING POLYCRYSTALLINE SILICON Polysilicon is freed of metallic impurities without the use of HCl or H2O2 by a preliminary cleaning with NHO3, HF, and H2SiF6 and a main cleaning with HNO3 and HF, followed by hydrophilization. The main ... | 08/04/2011 |
| 20110146727 | COMBINATORIAL APPROACH TO THE DEVELOPMENT OF CLEANING FORMULATIONS FOR GLUE REMOVAL IN SEMICONDUCTOR APPLICATIONS Embodiments of the current invention describe cleaning solutions to clean the surface of a photomask, methods of cleaning the photomask using at least one of the cleaning solutions, and combinatorial methods of formulating the cleaning solutions. The cleaning solutions ... | 06/23/2011 |
| 20110146726 | PROCESS FOR CLEANING SEMICONDUCTOR ELEMENT In a wiring formation process for a semiconductor device, the resist residue forming in dry etching with a reactive gas and aching with a plasma gas is removed, not corroding the members of the semiconductor device such as the interlayer insulating material and the wiri... | 06/23/2011 |
| 20110140181 | Removal of Masking Material Methods for removing a masking material, for example, a photoresist, and electronic devices formed by removing a masking material are presented. For example, a method for removing a masking material includes contacting the masking material with a solution comprising cer... | 06/16/2011 |
| 20110088729 | SURFACE PASSIVATION TECHNIQUE FOR REDUCTION OF FOULING The invention provides a method and apparatus for controlling the formation of foulant deposits on petroleum processing equipment. The invention involves a first mixture comprising an acid phosphate ester. The first mixture is applied to the surface of the petroleum pro... | 04/21/2011 |
| 20110079250 | POST-TEXTURING CLEANING METHOD FOR PHOTOVOLTAIC SILICON SUBSTRATES An improved method for post-texturing cleaning, surface conditioning, and rinsing silicon wafers or similar surfaces, with particular, although not exclusive, applicability in photovoltaic applications which includes cleaning the surfaces sequentially with dilute HF/HCl... | 04/07/2011 |
| 20110073139 | METHOD FOR REMOVING A CATALYST INHIBITOR FROM A SUBSTRATE This invention is directed to a process for removing a catalyst inhibitor from a substrate or catalytic converter containing at least one nitrogen oxide (NOx) catalyst using a phosphoric acid composition. The process is particularly suited for removing the ca... | 03/31/2011 |
| 20110034037 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE Disclosed is a method for cleaning a semiconductor substrate that can solve a problem of a conventional cleaning method which should include at least five steps for cleaning a substrate such as a semiconductor substrate. The method for cleaning a semiconductor substrate... | 02/10/2011 |
| 20100330535 | Chemo-mechanical Polishing of Dentures This disclosure relates to a composition and method for cleaning and polishing dentures during denture fabrication.... | 12/30/2010 |
| 20100275951 | SEMICONDUCTOR PROCESSING METHOD A process for treating the surface of a substrate in the manufacture of a semiconductor device. The process comprises providing a concentrated acid or base, a peroxide and water, and delivering the acid or base, the peroxide and the water to the surface of the substrate... | 11/04/2010 |
| 20100229898 | METHOD FOR CLEANING SURFACES OF POLYOLEFIN-BASED MATERIALS SOILED WITH FOOD, PARTICULARLY DAIRY PRODUCTS The invention relates to a method for cleaning surfaces of polyolefin-based materials soiled with food, particularly dairy products. More specifically, the invention relates to a method for cleaning materials based on one or more halogenated or non-halogenated polyolefi... | 09/16/2010 |
| 20100170534 | METHOD FOR REMOVAL OF SURFACE CONTAMINANTS FROM SUBSTRATES A method is disclosed for preparing a substrate for coating. The method uses a step of applying an acidic solution to the substrate to break down visible and non-visible layers of surface material. The method also uses a step of applying a treatment solution to decontam... | 07/08/2010 |
| 20100139706 | Method For The Treatment Of A Semiconductor Wafer Semiconductor wafers are treated in a liquid container filled at least partly with a solution containing hydrogen fluoride, such that surface oxide dissolves, are transported out of the solution along a transport direction and dried, and are then treated with an ozone-c... | 06/10/2010 |
| 20100140746 | IMPROVED PROCESS FOR PREPARING CLEANED SURFACES OF STRAINED SILICON The present invention relates to a method of treating wafers comprising at least one surface layer of silicon-germanium (SiGe) and a layer of strained silicon (sSi) in contact with the SiGe layer, the sSi layer being exposed by etching of the SiGe layer, the method comp... | 06/10/2010 |
| 20100139705 | SOLID DISHMACHINE DETERGENT NOT REQUIRING A SEPARATE RINSE ADDITIVE New solid detergent compositions and methods of forming and using those compositions are provided. The compositions for forming the solid detergents comprise a copolymer, scale inhibiting agent, and non-phosphate builder dispersed or dissolved in a solvent system. Advan... | 06/10/2010 |
| 20100132746 | Apparatus and method for washing polycrystalline silicon Disclosed is a polycrystalline silicon washing apparatus that sequentially immerses polycrystalline silicon into a plurality of acid baths each of which is filled with an acid to wash the polycrystalline silicon. The temperatures of the acids in the acid baths are set s... | 06/03/2010 |
| 20100043836 | Tool cleaning apparatus and method An apparatus and method for cleaning tools such as laminating tools used in the manufacture of glass reinforced plastic. The apparatus includes a bath having two sections, each containing a cleaning fluid such as an ester solvent and an aqueous solvent respectively, and... | 02/25/2010 |
| 20100024847 | SEMICONDUCTOR WAFER CLEANING WITH DILUTE ACIDS In a method for cleaning wafers using ultra-dilute acids, the wafers are placed into a rotor in a process chamber. As the rotor spins, the wafers are with de-ionized water and ultra-dilute hydrofluoric acid. Ozone gas is introduced into the process chamber. The wafers a... | 02/04/2010 |
| 20090283114 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS A substrate processing method includes: supplying a fluid to a resist on a substrate after an ion implantation in which the resist is used as a mask; and supplying a stripping liquid to the resist for stripping the resist after the supplying the fluid. A cured layer is ... | 11/19/2009 |
| 20090277480 | METHOD OF REDUCING SURFACE RESIDUAL DEFECT A method of reducing residual defect on a dielectric surface includes performing a treatment process of the dielectric surface prior to a lithograph process. The treatment process includes at least a first wet chemical treatment step and a second wet chemical treatment ... | 11/12/2009 |
| 20090275785 | Distillation Method For The Purification Of Sevoflurane And The Maintenance Of Certain Equipment That May Be Used In The Distillation Process Processes for preparing commercial quantities of a stable, pharmaceutically acceptable sevoflurane substantially tree of impurities are claimed. In another embodiment, a process for removing reactive metal, salts from the surface of metallic equipment used in the distil... | 11/05/2009 |
| 20090260659 | LIMESCALE AND SOAP SCUM REMOVING COMPOSITION CONTAINING METHANE SULFONIC ACID A cleaning composition including an acid component is provided, along with methods for using the composition to remove soil from hard surfaces. The concentrate cleaning composition includes between about 1 and about 70 wt % of methane sulfonic acid, about 0.1 to about 1... | 10/22/2009 |
| 20090250083 | Method for the Decontamination of an Oxide Layer-containing Surface of a Component or a System of a Nuclear Facility A method of decontaminating an oxide layer-comprising surface of a component or a system of a nuclear facility. An acidic water film is produced on the surface, the film of water is brought into contact with a gaseous acid anhydride, and the oxide layer is treated with ... | 10/08/2009 |
| 20090250431 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD A substrate processing method that processes a substrate on which a plurality of patterns adjacent to each other are formed, has: supplying a first processing liquid to a principal surface of the substrate that is dry and has the patterns formed thereon to make the firs... | 10/08/2009 |
| 20090188533 | COMPOSITION AND METHOD FOR ROAD-FILM REMOVAL A concentrate and a ready-to-use or diluted formulation for an aqueous vehicle cleaner can remove a wide range of different types of traffic film using either low pressure application, hand pressure application, water jet spray apparatus, clean-in-place systems or other... | 07/30/2009 |
| 20090183755 | Cleaning Process A method of machine cleaning dishes in a dishwasher, wherein over the course of a cleaning program, having a pre-rinsing operation and a cleaning operation, two liquid cleansers A and B having the following composition: A: −10 to 75 wt % of builder(s); −0.1 to 10 wt... | 07/23/2009 |
| 20090120458 | HIGH NEGATIVE ZETA POTENTIAL POLYHEDRAL SILSESQUIOXANE COMPOSITION AND METHOD FOR DAMAGE FREE SEMICONDUCTOR WET CLEAN A composition for removing particulate matter from integrated circuit substrates, including (a) one or more metal ion-free base; (b) a water-soluble metal ion-free onium salt of a polyhedral silsesquioxane; (c) an oxidizing agent; and (d) metal ion-free water, and a com... | 05/14/2009 |
| 20090056764 | Liquid processing apparatus, liquid processing method, and storage medium A liquid processing apparatus 1 comprises a casing 5, a substrate holding mechanism 20 that holds a wafer (substrate to be processed) W, a process-liquid supplying mechanism 30 that supplies a process liquid, a draining cup 12 that rec... | 03/05/2009 |
