Quotables
"The horse is here to stay, the automobile is only a novelty - fad."
President of Michigan Savings Bank ; 1903
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Application No. | Application Title | Issue Date |
| 20120125375 | Method and Apparatus for Removing Contaminants from Substrate A cleaning material is applied to a surface of a substrate. The cleaning material includes one or more polymeric materials for entrapping contaminants present on the surface of the substrate. A rinsing fluid is applied to the surface of the substrate at a controlled vel... | 05/24/2012 |
| 20120108488 | Cleaning And/Or Treatment Compositions This invention relates to compositions comprising certain fungal serine proteases and processes for making and using such compositions including the use of such compositions to clean and/or treat a situs.... | 05/03/2012 |
| 20120103371 | METHOD AND APPARATUS FOR DRYING A SEMICONDUCTOR WAFER A method and apparatus for drying semiconductor wafers uses hot isopropyl alcohol in liquid form at temperatures above 60° C. and below 82° C. The use of hot IPA better avoids pattern collapse and permits reduced consumption of IPA. The wafer temperature can be mainta... | 05/03/2012 |
| 20120080051 | Particle Removal Method Using An Aqueous Polyphosphate Solution A method and cleaning solution for cleaning electronic substrates, such as a semiconductor wafers, hard disks, photomasks or imprint molds. The method comprises the steps of contacting a surface of the substrate with a cleaning solution comprised of a polyphosphate, and... | 04/05/2012 |
| 20120067379 | METHOD FOR WASHING DEVICE SUBSTRATE The present invention provides a washing method for a device substrate, capable of sufficiently removing a resist attached to a device substrate, particularly a resist attached to fine pore portions of a pattern having a large aspect ratio. | 03/22/2012 |
| 20120048303 | PROCESS SYSTEM AND CLEANING PROCESS A process system includes a manufacture device, a concentration detector and a compensation device. The manufacture device is used for processing a wafer using a chemical solution. The concentration detector detects a concentration of a key component in the chemical sol... | 03/01/2012 |
| 20120048296 | Cleaning Method for Wafer A cleaning method for a wafer is provided. First, a first cleaning process is performed wherein the first cleaning process includes providing a cleaning solution having a first concentration. Next, a second cleaning process is performed, wherein the second cleaning proc... | 03/01/2012 |
| 20120017946 | CLEANING AND DRYING METHOD AND APPARATUS A cleaning liquid is pressurized and superheated to a condition, in which temperature of the cleaning liquid is above an atmospheric boiling point. A product to be cleaned is interposed between a pair of liquid holding blocks, so that gaps are respectively formed betwee... | 01/26/2012 |
| 20120017945 | Wash Element, Wash Station and Process for Washing Reusable Fluid Manipulators A wash element for washing one or more reusable fluid manipulators is provided comprising at least one nozzle for connection to a fluid pump to generate a fluid jet and at least one deflector surface positioned to deflect the fluid jet towards a washing zone for receivi... | 01/26/2012 |
| 20120017934 | Liquid Chemical for Forming Protecting Film Disclosed is a liquid chemical for forming a water-repellent protecting film at least on a surface of a recessed portion of an uneven pattern at the time of cleaning a wafer having a finely uneven pattern at its surface and containing silicon at least a part of the unev... | 01/26/2012 |
| 20120017947 | DELIVERY PARTICLE The present application relates to delivery particles comprising benefit agents, and products comprising such delivery particles, as well as processes for making and using such delivery particles and products comprising such delivery particles. The process of making suc... | 01/26/2012 |
| 20120009279 | METHOD OF TREATING A SUBSTRATE WITH STABLE BLEACHES WITH COLORING AGENTS The invention provides an aqueous bleaching solution for substrate treatment comprising a source of oxidant and a suspended polymer matrix having a plurality of optically functional particles associated with one or more copolymers present in the polymer matrix. The plur... | 01/12/2012 |
| 20120000492 | SYSTEM FOR TREATING AND/OR PROCESSING LIQUID PRODUCTS AND METHOD FOR CLEANING COMPONENTS OF SUCH SYSTEMS System for treating and/or processing liquid products, in particular beverages, having at least two system components, having a cleaning and rinsing system for cleaning and rinsing of at least product-carrying regions of the system components with at least one liquid cl... | 01/05/2012 |
| 20120003718 | Protease Comprising One Or More Combinable Mutations The present invention provides engineered protease variants. In particular, the protease variants comprise combinable mutations at selected surface positions that affect the charge and/or hydrophobicity of the enzyme to enhance at least one desired property of the resul... | 01/05/2012 |
| 20110315168 | Acid Compositions for Removing Oxalates The present invention relates to the field of cleaning in general, and in particular that of industrial cleaning and of domestic cleaning. More specifically, the invention aims to remove scale, oxalate scale, comprising salts of oxalic acid, and mainly mineral salts of ... | 12/29/2011 |
| 20110309051 | APPARATUS AND METHOD FOR WET TREATMENT OF AN OBJECT AND FLUID DIFFUSION PLATE AND BARREL USED THEREIN An apparatus for wet treatment of an object includes a treatment bath in which an object to be treated is received and treated; a plurality of object supporting rods rotatably installed in the treatment bath and having a plurality of slots formed in surfaces thereof to ... | 12/22/2011 |
| 20110312187 | MANUFACTURING APPARATUS AND METHOD FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD OF MANUFACTURING APPARATUS FOR SEMICONDUCTOR A manufacturing apparatus for a semiconductor device, including: a reaction chamber configured to perform film formation on a wafer; a process gas supplying mechanism provided in an upper part of the reaction chamber and configured to introduce process gas to an interio... | 12/22/2011 |
| 20110308555 | PERFUME SYSTEMS The present application relates to perfume raw materials, perfume delivery systems and consumer products comprising such perfume raw materials and/or such perfume delivery systems, as well as processes for making and using such perfume raw materials, perfume delivery sy... | 12/22/2011 |
| 20110308556 | PERFUME SYSTEMS The present application relates to perfume raw materials, perfume delivery systems and consumer products comprising such perfume raw materials and/or such perfume delivery systems, as well as processes for making and using such perfume raw materials, perfume delivery sy... | 12/22/2011 |
| 20110308554 | Liquid Processing Apparatus, Liquid Processing Method, and Storage Medium Having Computer Program Recorded Therein Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that i... | 12/22/2011 |
| 20110308549 | SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM STORING COMPUTER PROGRAM FOR PERFORMING SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING APPARATUS In a substrate processing method according to the present invention, a substrate is first processed using a chemical liquid. Next, the substrate is rinsed by supplying a rinsing liquid thereto while the substrate is being rotated. Thereafter, the substrate is dried whil... | 12/22/2011 |
| 20110294301 | Method of Preventing Premature Drying A method for processing a substrate includes receiving a substrate and processing the substrate using a first fluid meniscus and a second fluid meniscus. The first fluid meniscus and the second fluid meniscus are applied to a surface of the substrate such that the first... | 12/01/2011 |
| 20110283463 | ORGANIC CATALYST WITH ENHANCED ENZYME COMPATIBILITY This invention relates to cleaning compositions comprising organic catalysts having enhanced enzyme compatibility and processes for making and using such cleaning compositions.... | 11/24/2011 |
| 20110281782 | CARE POLYMERS The present application relates to care polymers and fabric and home care compositions comprising such care polymers, as well as processes for making and using such care polymers and such compositions. The performance of the care polymers that Applicants teach, can be f... | 11/17/2011 |
| 20110277796 | METHOD OF CLEANSING SKIN HAVING AN IMPAIRED BARRIER This invention relates to a method of cleansing skin having an impaired barrier function. The method of this invention utilizes cleansing compositions that have the characteristic of minimally perturbing or interacting with the skin barrier by applying to the skin a cle... | 11/17/2011 |
| 20110281039 | METHOD FOR PREVENTING OR REDUCING CONTAMINATION OF AN IMMERSION TYPE PROJECTION APPARATUS AND AN IMMERSION TYPE LITHOGRAPHIC APPARATUS A method for preventing or reducing contamination of an immersion type projection apparatus is provided. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate.... | 11/17/2011 |
| 20110281328 | Compositions and Methods Comprising A Subtilisin Variant The present invention provides a Bacillus sp. subtilisin variant. In addition, the present invention provides compositions comprising this serine protease variant. In some embodiments, the present invention provides laundry and other non-automatic (i.e., hand) di... | 11/17/2011 |
| 20110271985 | Surface Cleaning with Concurrently Usable Prespray and Rinse Units A soiled surface cleaning system is described for pre spraying soiled surface areas, and for rinsing and extracting the pre sprayed soiled surface areas, wherein the pre spraying of the soiled surface areas does not have to be stopped in order to perform the rinsing and... | 11/10/2011 |
| 20110265695 | Load Transport Structure A load-bearing structure (10) for transporting or storing a load is disclosed. The structure includes at least one load-bearing surface (20) and a plurality of support members (40). Each support member (40) is disposed at least about the peri... | 11/03/2011 |
| 20110265830 | Cleaning compositions for removing organic deposits on surfaces and method of use The present invention is improved cleaning method and composition for cleaning headlight lens using a composition having water, at least one ketone and a surfactant where the ratio of ketone to surfactant is between 1:0.02-1.0.... | 11/03/2011 |
| 20110259361 | DETERGENT COMPOSITIONS UTILIZING HYDROPHOBICALLY MODIFIED POLYMER Embodiments of the invention relate to a detergent composition including a poly(maleic acid/vinyl octyl ether) (PMAOVE) hydrophobically modified polymer; and a heavy duty liquid detergent. In addition, embodiments relate to a method of cleaning a substrate, including co... | 10/27/2011 |
| 20110259372 | SYSTEMS, METHODS AND COMPOSITIONS RELATING TO COMBUSTIBLE BIOMATERIALS A method for washing biomass is described. The method includes: (i) receiving a first discrete amount of biomass; (ii) receiving a second discrete amount of biomass; (iii) washing the first discrete amount of biomass with solvent to produce a first effluent stream enric... | 10/27/2011 |
| 20110253176 | METHOD AND APPARATUS FOR WASHING SUBSTRATE A substrate washing method for supplying a process liquid onto a substrate to wash the substrate includes the steps of (a) supplying a first process liquid of a first temperature onto the substrate having a resist pattern, to cover a surface of the substrate with the fi... | 10/20/2011 |
| 20110247660 | PHOTORESIST STRIPPING SOLUTION The present invention discloses a method of making a photoresist stripper for removing a positive or negative tone photoresist, bonding adhesive, ink mark, and/or post etch residue from a semiconductor substrate, comprising a) an organic sulfonic acid, (b) a halogen-fre... | 10/13/2011 |
| 20110240065 | CARE POLYMERS The present application relates to care agents, for example care polymers, and compositions such as consumer products comprising such care agents, as well as processes for making and using such care agents and such compositions. The performance of the care polymers that... | 10/06/2011 |
| 20110243871 | ORGANOSILICONES The present application relates to organosilicones and compositions such as consumer products comprising such organosilicones, as well as processes for making and using such organosilicones and such compositions. Such compositions comprising such organosilicones are eas... | 10/06/2011 |
| 20110243875 | CARE POLYMERS The present application relates to care agents, for example care polymers, and compositions such as consumer products comprising such care agents, as well as processes for making and using such care agents and such compositions. The performance of the care polymers that... | 10/06/2011 |
| 20110243874 | CARE POLYMERS The present application relates to care agents, for example care polymers, and compositions such as consumer products comprising such care agents, as well as processes for making and using such care agents and such compositions. The performance of the care polymers that... | 10/06/2011 |
| 20110243876 | ORGANOSILICONES The present application relates to organosilicones and compositions such as consumer products comprising such organosilicones, as well as processes for making and using such organosilicones and such compositions. Such compositions comprising such organosilicones are eas... | 10/06/2011 |
| 20110240066 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM Disclosed is a substrate processing apparatus capable of drying a substrate to be processed while suppressing a pattern collapse or occurrence of contamination. In a processing vessel, a substrate is immersed in a liquid in the longitudinal direction, and the liquid is ... | 10/06/2011 |
