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| Application No. | Application Title | Issue Date |
| 20120129747 | POST ION IMPLANT STRIPPER FOR ADVANCED SEMICONDUCTOR APPLICATION The present invention relates to a substantially water-free photoresist stripping composition. Particularly, the present invention relates to a substantially water-free photoresist stripping composition useful in removing the photoresist after ion-implant process, compr... | 05/24/2012 |
| 20120045898 | Ru CAP METAL POST CLEANING METHOD AND CLEANING CHEMICAL According to certain embodiments, Ru is removed from the surface of a semiconductor structure by contact with a cleaning solution comprising one or more selected from permanganate ion, orthoperiodic ion and hypochlorous ion, such that Ru is removed from surfaces of the ... | 02/23/2012 |
| 20120042898 | COMPOSITIONS AND METHOD FOR THE REMOVAL OF PHOTORESIST FOR A WAFER REWORK APPLICATION Compositions useful in reworking microelectronic device wafers, i.e., removing photoresist from rejected wafers, without damaging underlying layers and structures such as cap layers, interlevel dielectric layers, etch stop layers and metal interconnect material. The sem... | 02/23/2012 |
| 20120037181 | CLEANING METHODS FOR IMPROVED PHOTOVOLTAIC MODULE EFFICIENCY Embodiments of the present invention generally relate to methods for cleaning a substrate prior to a deposition process. The methods generally include multiple cleaning solutions for removing contaminants from a surface of a substrate. The multiple solutions generally h... | 02/16/2012 |
| 20120006258 | HYDROGEN RADICAL GENERATOR A method of reducing contamination generated by a hydrogen radical generator and deposited on an optical element of a lithographic apparatus includes passing molecular hydrogen over a first part of a metal filament of the hydrogen radical generator, the first part inclu... | 01/12/2012 |
| 20120000484 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE In a manufacturing method of a semiconductor device, a depression is formed in a semiconductor substrate made of silicon or silicon compound semiconductor, and foreign substances including a protection layer in the depression is removed with a cleaning solution. The cle... | 01/05/2012 |
| 20110214688 | CLEANING SOLUTION FOR SIDEWALL POLYMER OF DAMASCENE PROCESSES An aqueous cleaning solution and a method of use of the cleaning solution are described herein for removing sidewall polymer of a damascene process on a wafer without damaging any low-k material and interconnect material on the wafer.... | 09/08/2011 |
| 20110195279 | METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM, GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM A method for manufacturing a glass substrate for an information recording medium, wherein the abrasive and foreign matters adhered on the glass substrate after the polishing step are surely removed without making the cleaning step complicated. The glass substrate is cle... | 08/11/2011 |
| 20110155170 | USE OF A DEVICE FOR CLEANING METAL FIBERS WITH A VIEW TO RECYCLE AND RECOVER THE SAME The field of the invention is the recovery and recycling of materials, particularly the recycling of tyres. It relates particularly to a device for cleaning metal fibres comprising at least 2 coaxial cones, one fixed and one mobile in rotation, and means of moving said ... | 06/30/2011 |
| 20110146705 | UV LAMP ASSEMBLY OF DEGAS CHAMBER HAVING ROTARY SHUTTERS A UV lamp assembly having rotary shutters. Each rotary shutter has a concave wall with a reflective concave surface. The rotary shutters can be collectively rotated between an open position and an closed position. At the open position, the rotary shutters do not block U... | 06/23/2011 |
| 20110146706 | ECONOMIC SECONDARY DESCALING This process for the secondary descaling of running metal strips, especially made of steel, during the hot-rolling thereof, by spraying water onto the surface thereof using spray rails having nozzles supplied with pressurized water, is characterized in that the nozzles ... | 06/23/2011 |
| 20110117504 | METHOD FOR REMOVING A DEPOSITION ON AN UNCAPPED MULTILAYER MIRROR OF A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H2, D2 and DH, and one or more additional compounds selected from hydrocarbon compounds and/or s... | 05/19/2011 |
| 20110079243 | SCALE CONDITIONING AGENTS AND TREATMENT METHOD An improved scale conditioning composition and method is disclosed that results in improved dissolution and disruption of tube scale, hardened sludge and other deposits composed primarily of highly densified magnetite such as those found in heat exchange vessels, partic... | 04/07/2011 |
| 20110048455 | Rinsing apparatus and rinsing method for polycrystalline silicon lump A rinsing apparatus for polycrystalline silicon lump which is obtained by cutting or breaking a rod of polycrystalline silicon, including: a wash basket having a plurality of through holes, which carries the polycrystalline silicon lump; a wash tank in which the wash ba... | 03/03/2011 |
| 20110048454 | SURFACE TREATMENT METHOD OF METAL MEMBER AND CLEANING NOZZLE A surface treatment method of a metal member according to an embodiment of the invention includes removing an oily substance on the metal member by using gas-liquid two fluids that are obtained by boiling heated and pressured water under ordinary pressure. A surface tre... | 03/03/2011 |
| 20110000505 | METHODS AND COMPOSITION FOR CLEANING A HEAT TRANSFER SYSTEM HAVING AN ALUMINUM COMPONENT Disclosed herein is a method and treatment system for rapid cleaning and protecting of automotive cooling systems containing controlled atmosphere brazed aluminum heat exchangers. The method and treatment system can optionally include a conditioning (passivating) step. ... | 01/06/2011 |
| 20100275951 | SEMICONDUCTOR PROCESSING METHOD A process for treating the surface of a substrate in the manufacture of a semiconductor device. The process comprises providing a concentrated acid or base, a peroxide and water, and delivering the acid or base, the peroxide and the water to the surface of the substrate... | 11/04/2010 |
| 20100252070 | METHOD FOR CLEANING SILICON WAFER AND APPARATUS FOR CLEANING THE SILICON WAFER After a water film is formed on a wafer front surface in a chamber, the water film is supplied sequentially with an oxidizing component of an oxidation gas, an organic acid component of an organic acid mist, an HF component of an HF gas, the organic acid mist, and the o... | 10/07/2010 |
| 20100252069 | METHOD OF RECOVERING IMPREGNATING AGENT COMPOSITIONS The present invention relates to processes for recovering impregnating compositions, the impregnated metal part being brought into contact with a salt-containing cleaning composition which comprises at least 0.7% by weight of at least one salt. 10/07/2010 | |
| 20100242990 | Apparatus and process for the dry removal of the scale found on the surface of the metal products An apparatus and process for the dry removal of the scale from the surface of a metal product comprising at least one heating area that does not reduce the specific surface of the material to be treated and does not cause oxidation, at least one reducing area for perfor... | 09/30/2010 |
| 20100236573 | METHOD AND APPARATUS FOR WASHING SAND A sand washing apparatus may be used for separating organic material from a mixture comprising sand and organic material. The apparatus may comprise: a wash chamber for accepting a mixture comprising sand and organic material, the chamber including a lower portion; and ... | 09/23/2010 |
| 20100218787 | FIC Installation and Method for Operating a FIC Installation in the Pressure Range Above Atmospheric Pressure A method of Fluoride Ion Cleaning (FIC) of a component is provided. A FIC installation includes a reaction chamber and a reactive gas or a reactive gas mixture. A pressure of the reactive gas or the reactive gas mixture in the reaction chamber is set at least occasional... | 09/02/2010 |
| 20100212687 | Process and System for Removing Printing in Metallic Packages Process and system for removing printing in metallic packages used in drinks, food and other applications in general, comprising the removal of ink before the cure thereof, by means of spray with ink remover liquid and non abrasive friction. Preferably, said liquid is a... | 08/26/2010 |
| 20100189885 | SOLVENT COMPOSITIONS COMPRISING UNSATURATED FLUORINATED HYDROCARBONS Disclosed is a method for removing residue from a surface comprising: contacting the surface with a composition comprising at least one unsaturated fluorinated hydrocarbon selected from the group consisting of compounds having the formula E- or Z—R1CH═CHR... | 07/29/2010 |
| 20100180913 | METHODS FOR IN-SITU CHAMBER CLEANING PROCESS FOR HIGH VOLUME MANUFACTURE OF SEMICONDUCTOR MATERIALS The present invention is related to the field of semiconductor processing equipment and methods and provides, in particular, methods and apparatus for in-situ removal of undesired deposits in the interiors of reactor chambers, for example, on chamber walls and elsewhere... | 07/22/2010 |
| 20100140746 | IMPROVED PROCESS FOR PREPARING CLEANED SURFACES OF STRAINED SILICON The present invention relates to a method of treating wafers comprising at least one surface layer of silicon-germanium (SiGe) and a layer of strained silicon (sSi) in contact with the SiGe layer, the sSi layer being exposed by etching of the SiGe layer, the method comp... | 06/10/2010 |
| 20100126489 | IN-SITU WAFER PROCESSING SYSTEM AND METHOD An integrated wafer processing system and a method thereof is disclosed. In one embodiment, a wafer stack of sliced wafers includes a base, and a plurality of sliced wafers extending outwardly from the base, where the plurality of sliced wafers are obtained by slicing a... | 05/27/2010 |
| 20100122711 | WET CLEAN METHOD FOR SEMICONDUCTOR DEVICE FABRICATION PROCESSES A wet clean method for semiconductor device fabrication begins by providing a semiconductor device structure having a substrate and features protruding from the substrate. The features are formed from a dielectric material, such as an ultra-low-k material. The method co... | 05/20/2010 |
| 20100104743 | METHOD OF MANUFACTURING A GLASS SUBSTRATE FOR MAGNETIC DISK In a manufacturing method of a glass substrate for a magnetic disk including a cleaning process of the glass substrate, the cleaning process includes a process of contacting the glass substrate with a cleaning solution containing a compound, such as thioglycolic acid or... | 04/29/2010 |
| 20100095980 | METHOD OF CLEANING STEEL SHEET AND CONTINOUS CLEANING SYSTEM OF STEEL SHEET The present invention provides a method of cleaning steel sheet, said method of cleaning steel sheet feeding a cleaning solution activated by ultrasonic waves of a frequency of 0.8 MHz to 3 MHz to a surface of steel sheet at an angle inclined by 1 to 80° with respect t... | 04/22/2010 |
| 20100078040 | Use of an Aqueous Neutral Cleaning Solution and Method for Removing Rouging from Stainless Steel Surfaces The invention relates to a method for removing films and deposits from stainless surfaces, especially from stainless metallic surfaces such as they are used in process stations and production units in the pharmaceutical, food and biotechnological industries, and to an a... | 04/01/2010 |
| 20100071720 | METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE Inside a vacuum chamber 200 a cleaning unit 204 provides atomic hydrogen or atomic deuterium for cleaning a surface 202 at a pressure of less than 10−4 Torr or of more than 10−3 Torr. The surface 202 is heated by the... | 03/25/2010 |
| 20100051053 | WASHING STORAGE SOLUTION FOR GLASS ELECTRODE AND THE LIKE This invention provides a washing storage solution (22), which can substantially completely remove contaminants such as transition metals and alkali metals deposited on the surface of a glass electrode that comprises a glass comprising lithium and can restore per... | 03/04/2010 |
| 20100046689 | Target Bodies and Uses Thereof in the Production of Radioisotope Materials A system and method are provided for reclaiming an enriched radioisotope starting material (14) from a target body (12). The system and method enable reclaiming the starting material in a relatively short time (e.g., several hours) after the target body's ... | 02/25/2010 |
| 20100024842 | GENERATOR FOR FOAM TO CLEAN SUBSTRATE In an example embodiment, a device for generating a cleaning foam includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another component of the cleaning system. The plug includes a premix chamber which receives the fluid... | 02/04/2010 |
| 20100018550 | CLEANING COMPOSITIONS WITH VERY LOW DIELECTRIC ETCH RATES Aqueous cleaning compositions comprising a tertiary organic amine, an organic acid, a non-metallic fluoride salt, a corrosion inhibitor, e.g., ascorbic acid or its derivatives alone or in combination, balance water, effective to remove plasma processing residues (sidewa... | 01/28/2010 |
| 20100018549 | Method of recovering heat transfer in reactor and regenerator effluent coolers This invention relates to a method for removing fouling from a heat transfer surface, such as a heat exchanger. The method involves conducting a vapor containing a scouring material to the heat transfer surface and contacting the scouring material with the foulant, the ... | 01/28/2010 |
| 20100001106 | METHOD AND DEVICE FOR PRODUCING CLASSIFIED HIGH-PURITY POLYCRYSTALLINE SILICON FRAGMENTS Polysilicon rods from the Siemens process are crushed into fragments and further processed to fragments having very low metal contamination in an economical manner by purposefully fabricating parts contacting the polysilicon from materials which cause high metal contami... | 01/07/2010 |
| 20090325320 | PROCESSES FOR RECONDITIONING MULTI-COMPONENT ELECTRODES A process for reconditioning a multi-component electrode comprising a silicon electrode bonded to an electrically conductive backing plate is provided. The process comprises: (i) removing metal ions from the multi-component electrode by soaking the multi-component elect... | 12/31/2009 |
| 20090320876 | PROCESS AND COMPOSITION FOR REMOVING A SCALE DEPOSIT One exemplary embodiment can be a process for removing one or more scale deposits formed on a surface. The process can include contacting the surface with a composition for a period of time sufficient to remove the scale deposits that comprise coke or metal sulfides or ... | 12/31/2009 |
