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| Application No. | Application Title | Issue Date |
| 20120024233 | Conveyor Assembly with Releasable Drive Coupling A module for a deposition system includes a drive unit mounted on an exterior wall of the module. The drive unit has a drive shaft that extends into the module and engages a conveyor operably disposed within the module for driving the conveyor in a conveying path. A rel... | 02/02/2012 |
| 20120024479 | APPARATUS FOR CONTROLLING THE FLOW OF A GAS IN A PROCESS CHAMBER Apparatus for controlling the flow of a gas in a process chamber is provided herein. In some embodiments, an apparatus for controlling the flow of a gas in a process chamber having a processing volume within the process chamber disposed above a substrate support and a p... | 02/02/2012 |
| 20120028393 | VAPOR DEPOSITION APPARATUS AND PROCESS FOR CONTINUOUS DEPOSITION OF A DOPED THIN FILM LAYER ON A SUBSTRATE An apparatus and related process are provided for vapor deposition of a sublimated source material as a doped thin film on a photovoltaic (PV) module substrate. A receptacle is disposed within a vacuum head chamber and is configured for receipt of a source material supp... | 02/02/2012 |
| 20120017833 | CONVEYOR DEVICE AND SUBSTRATE TREATMENT INSTALLATION Conveyor devices, in particular for use in substrate treatment devices, and configurations of substrate treatment devices, in particular horizontal coating installations for the mass coating of plate-like substrates during the production of solar cells are provided. The... | 01/26/2012 |
| 20120000426 | INTEGRATED GEARBOX AND ROTARY FEEDTHROUGH SYSTEM FOR A VACUUM CHAMBER STRUCTURE A vacuum chamber structure includes a rotary feedthrough configured on a chamber wall to provide rotational drive to the interior of the structure. The rotary feedthrough includes a gearbox having a housing and a shaft rotationally supported by bearings contained within... | 01/05/2012 |
| 20110308463 | CHEMICAL VAPOR DEPOSITION REACTOR WITH ISOLATED SEQUENTIAL PROCESSING ZONES A chemical vapor deposition reactor and system has a housing, a substrate transport apparatus and a plurality of fixed processing zones. The processing zones include one or more chemical vapor deposition zones, each having an independent reactant gas supply. Each chemic... | 12/22/2011 |
| 20110312189 | SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD A substrate treating apparatus is provided. The substrate treating apparatus includes a loading/unloading unit, a process unit in which a substrate treating process is performed, a loadlock unit disposed between the loading/unloading unit and the process unit, and a car... | 12/22/2011 |
| 20110274837 | ALD REACTOR, METHOD FOR LOADING ALD REACTOR, AND PRODUCTION LINE An ALD reactor for treating one or more substrates is provided. The ALD reactor includes at least one reaction chamber which has a front plate including gas connections for introducing starting materials, flushing gases and the like gases into the reaction chamber. In a... | 11/10/2011 |
| 20110262641 | INLINE CHEMICAL VAPOR DEPOSITION SYSTEM An inline CVD system includes a manifold and a continuous transport system. The manifold has a plurality of ports. The ports include a first precursor port, a pair of second precursor ports and a pair of pumping ports. The first precursor port is disposed between the se... | 10/27/2011 |
| 20110212625 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE A substrate processing apparatus which is capable of improving a manufacture yield while processing a substrate with high precision, and a method of manufacturing a semiconductor device. The substrate processing apparatus includes a substrate support part provided withi... | 09/01/2011 |
| 20110174212 | EPITAXIAL CHAMBER WITH CROSS FLOW Methods and apparatus for processing a substrate are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber having a substrate support disposed therein to support a processing surface of a substrate at a desired position... | 07/21/2011 |
| 20110174775 | SURFACE PROCESSING APPARATUS To prevent a processing gas from leaking from a processing tank for processing a surface of a substrate and to stabilize flow of the processing gas in a processing space. A substrate 9 is conveyed into the inside of a processing tank... | 07/21/2011 |
| 20110165326 | AUTOMATIC FEED SYSTEM AND RELATED PROCESS FOR INTRODUCING SOURCE MATERIAL TO A THIN FILM VAPOR DEPOSITION SYSTEM A feed system and related process are configured to continuously feed measured doses of source material to a vapor deposition apparatus wherein the source material is sublimated and deposited as a thin film on a substrate. The system includes a bulk material hopper, and... | 07/07/2011 |
| 20110155063 | Conveyor Assembly with Removable Rollers for a Vapor Deposition System A conveyor assembly for conveying substrates through a vapor deposition system includes a first carriage rail and a second carriage rail disposed at an opposite side of the conveyor assembly. The first and second carriage rails include a plurality of roller positions sp... | 06/30/2011 |
| 20110143479 | VAPOR DEPOSITION APPARATUS AND PROCESS FOR CONTINUOUS DEPOSITION OF A THIN FILM LAYER ON A SUBSTRATE An apparatus and related process are provided for vapor deposition of a sublimated source material as a thin film on a photovoltaic (PV) module substrate. A receptacle is disposed within a vacuum head chamber and is configured for receipt of a source material. A heated ... | 06/16/2011 |
| 20110143481 | MODULAR SYSTEM AND PROCESS FOR CONTINUOUS DEPOSITION OF A THIN FILM LAYER ON A SUBSTRATE A system and associated process for vapor deposition of a thin film layer on a photovoltaic (PV) module substrate is includes establishing a vacuum chamber and introducing the substrates individually into the vacuum chamber. A conveyor system is operably disposed within... | 06/16/2011 |
| 20110139073 | CONVEYOR ASSEMBLY FOR A VAPOR DEPOSITION APPARATUS A conveyor assembly for use in a vapor deposition apparatus includes a housing defining an enclosed interior volume. A conveyor is driven in an endless loop path within the housing. The housing has a top member that defines an open deposition area in an upper conveyance... | 06/16/2011 |
| 20110124199 | APPARATUS AND METHOD FOR HIGH-THROUGHPUT ATOMIC LAYER DEPOSITION Atomic layer deposition apparatus for depositing a film in a continuous fashion. The apparatus includes a process tunnel, extending in a transport direction and bounded by at least a first and a second wall. The walls are mutually parallel and allow a flat substrate to ... | 05/26/2011 |
| 20110111603 | ATOMIC LAYER DEPOSITION APPARATUS A method and apparatus for atomic layer deposition (ALD) is described. The apparatus comprises a deposition chamber and a wafer support. The deposition chamber is divided into two or more deposition regions that are integrally connected one to another. The wafer support... | 05/12/2011 |
| 20110100297 | THIN-FILM SOLAR CELL MANUFACTURING APPARATUS A thin-film solar cell manufacturing apparatus includes a film forming chamber that is evacuated to a reduced pressure and forms a film on a substrate using a CVD method; a loading-ejecting chamber that is connected to the film forming chamber via a first opening-closin... | 05/05/2011 |
| 20110097494 | FLUID CONVEYANCE SYSTEM INCLUDING FLEXIBLE RETAINING MECHANISM A fluid conveyance system for thin film material deposition includes a fluid distribution manifold and a substrate transport mechanism. The fluid distribution manifold includes an output face that includes a plurality of elongated slots. The output face of the fluid dis... | 04/28/2011 |
| 20110097493 | FLUID DISTRIBUTION MANIFOLD INCLUDING NON-PARALLEL NON-PERPENDICULAR SLOTS A fluid conveyance device for thin film material deposition includes a substrate transport mechanism that causes a substrate to travels in a direction. A fluid distribution manifold includes an output face. The output face includes a plurality of elongated slots. At lea... | 04/28/2011 |
| 20110097495 | ORGANIC VAPOR JET PRINTING WITH CHILLER PLATE A device is provided. The device includes a nozzle, a source of carrier gas and a source of organic molecules in fluid communication with the nozzle. The device also includes an active cooling system disposed adjacent to the nozzle. Preferably, the device also includes ... | 04/28/2011 |
| 20110086167 | APPARATUS FOR ATOMIC LAYER DEPOSITION An apparatus for atomic layer deposition of a material on a moving substrate comprises a conveying arrangement for moving a substrate along a predetermined planar or curved path of travel and a coating bar having at least one precursor delivery channel. The precursor de... | 04/14/2011 |
| 20110073042 | Substrate Centering Device and Organic Material Deposition System A substrate centering device for an organic material deposition system comprises: a plurality of substrate support holders configured to be reciprocally movable in a facing direction within an organic material deposition chamber and supporting both side portions of a su... | 03/31/2011 |
| 20110056436 | A DEVICE FOR LAYERED DEPOSITION OF VARIOUS MATERIALS ON A SEMICONDUCTOR SUBSTRATE, AS WELL AS A LIFT PIN FOR USE IN SUCH A DEVICE The invention relates to a deposition device for comprising a processing space with a substrate support disposed therein, as well as several lift pins (50), which can be moved into and out of the plane of the substrate support to assist in introducing a semicondu... | 03/10/2011 |
| 20110017283 | METHOD AND APPARATUS FOR DEPOSITION OF A LAYER OF AN INDIUM CHALCOGENIDE ONTO A SUBSTRATE A method deposits a layer of an indium chalcogenide onto a substrate. The method includes the steps of: providing an indium source in a reaction zone, providing a gaseous source of a chalcogen in the reaction zone, and heating the substrate. Thereby in the reaction zone... | 01/27/2011 |
| 20100326358 | BATCH TYPE ATOMIC LAYER DEPOSITION APPARATUS Provided is a batch-type Atomic Layer Deposition (ALD) apparatus for performing ALD processing collectively for a plurality of substrates, leading to an improved throughput, and achieving perfect uniformity of ALD on the substrates. The batch-type ALD apparatus includes... | 12/30/2010 |
| 20100266766 | GUIDING DEVICES AND METHODS FOR CONTACTLESS GUIDING OF A WEB IN A WEB COATING PROCESS According to embodiments described herein, a guiding device for contactless guiding of a web in a web coating process under vacuum conditions is provided. The guiding device includes a curved surface for facing the web and a group of gas outlets disposed in the curved s... | 10/21/2010 |
| 20100244307 | METHOD AND APPARATUS FOR GROWING NANOTUBE FORESTS, AND GENERATING NANOTUBE STRUCTURES THEREFROM The present invention provides apparatus and methods for growing fullerene nanotube forests, and forming nanotube films, threads and composite structures therefrom. In some embodiments, an interior-flow substrate includes a porous surface and one or more interior passag... | 09/30/2010 |
| 20100247747 | Film Deposition Apparatus, Method for Depositing Film, and Method for Manufacturing Lighting Device A first evaporation source is disposed such that one predetermined film deposition material is deposited on one region of a substrate; a second evaporation source is disposed such that another predetermined film deposition material is deposited on another region of the ... | 09/30/2010 |
| 20100212596 | WEIGHT PLATE OF VACUUM EVAPORATION APPARATUS AND VACUUM EVAPORATION APPARATUS USING THE SAME Provided is a weight plate of a vacuum evaporation apparatus, and a vacuum evaporation apparatus, which may prevent occurrence of displacement due to an impact or the like during a conveyance by a convey mechanism after a shadow mask and a glass substrate are superposed... | 08/26/2010 |
| 20100206235 | WAFER CARRIER TRACK Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper a... | 08/19/2010 |
| 20100184249 | Continuous deposition process and apparatus for manufacturing cadmium telluride photovoltaic devices A continuous deposition process and apparatus for depositing semiconductor layers containing cadmium, tellurium or sulfur as a principal constituent on transparent substrates to form photovoltaic devices as the substrates are continuously conveyed through the deposition... | 07/22/2010 |
| 20100173432 | GAP MAINTENANCE FOR OPENING TO PROCESS CHAMBER A semiconductor processing apparatus includes a reaction chamber, a movable susceptor, a movement element, and a control system. The reaction chamber includes a baseplate. The baseplate includes an opening. The movable susceptor is configured to hold a workpiece. The mo... | 07/08/2010 |
| 20100136773 | Semiconductor Device Manufacturing Method and Substrate Processing Apparatus A semiconductor device manufacturing method comprises the steps of loading a substrate into a processing chamber, mounting the substrate on a support tool in the processing chamber, processing the substrate mounted on the support tool by supplying process gas into the p... | 06/03/2010 |
| 20100098862 | METHOD AND APPARATUS FOR PRECISION SURFACE MODIFICATION IN NANO-IMPRINT LITHOGRAPHY A scalable, high-throughput nanoimprint lithography priming tool includes a dual-reactant chemical vapor deposition reactor chamber, a mandrel configured to hold a plurality of hard disks at an inner diameter of the hard disks, and a transport mechanism to move the plur... | 04/22/2010 |
| 20100081284 | METHODS AND APPARATUS FOR IMPROVING FLOW UNIFORMITY IN A PROCESS CHAMBER Methods and apparatus for processing substrates are provided herein. In some embodiments, an apparatus for processing a substrate includes a flow equalizer configured to control the flow of gases between a process volume and an exhaust port of a process chamber. The flo... | 04/01/2010 |
| 20100071624 | SUBSTRATE SUPPORT FRAME, AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME AND METHOD OF LOADING AND UNLOADING SUBSTRATE USING THE SAME A substrate support frame for loading or unloading a substrate on or from a susceptor in a chamber, wherein the substrate support frame is disposed over the susceptor, comprises a body supporting a boundary portion of the substrate; a first opening through a center port... | 03/25/2010 |
| 20100071625 | SHUTTER DISK HAVING A TUNED COEFFICIENT OF THERMAL EXPANSION A shutter disk having a tuned coefficient of thermal expansion is provided herein. In some embodiments, a shutter disk having a tuned coefficient of thermal expansion may include a body formed from a first material comprising at least two components, wherein a ratio of ... | 03/25/2010 |
