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| Application No. | Application Title | Issue Date |
| 20120125260 | System for Abating the Simultaneous Flow of Silane and Arsine A system for abating a simultaneous flow of silane and arsine contained in an exhaust gas of DRAM processing chamber. The system includes a CVD abatement apparatus and a resin-type adsorber. The CVD abatement apparatus comprises an enclosure that defines a chamber for r... | 05/24/2012 |
| 20120107501 | COATING DEVICE AND COATING METHOD A coating installation containing at least one recipient which can be evacuated and which is provided to receive a substrate, at least one gas supply device which can introduce at least one gaseous precursor into the recipient, and at least one activation device which c... | 05/03/2012 |
| 20120108002 | APPARATUS, METHOD AND SYSTEM FOR DEPOSITING LAYER OF SOLAR CELL The apparatus for thin film deposition for solar cells includes multiple unit chambers divided by a substrate as a boundary, a deposition gas injecting unit injecting deposition gases independently to each of the multiple unit chambers, and a decomposition unit in each ... | 05/03/2012 |
| 20120103260 | APPARATUS FOR MANUFACTURING SEMICONDUCTOR Disclosed is an apparatus for manufacturing semiconductors, to be used for various processes in semiconductor manufacture processing, such as the forming of layers on wafers. A tube has a processing space therein and a discharge hole at a side thereof. A boat can be loa... | 05/03/2012 |
| 20120082778 | VACUUM DEPOSITION SYSTEM AND VACUUM DEPOSITION METHOD The present invention aims to provide a technology, which uses an apparatus having a simple configuration to efficiently form a film with uniform film thickness and film quality when continuously forming a film by vacuum deposition of highly reactive lithium. A vacuum d... | 04/05/2012 |
| 20120079985 | METHOD FOR PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS There is provided a substrate processing method, comprising the steps of: supplying source gas into a processing chamber in which substrates are accommodated; removing the source gas and an intermediate body of the source gas remained in the processing chamber; supplyin... | 04/05/2012 |
| 20120048182 | GALLIUM TRICHLORIDE INJECTION SCHEME The invention relates to a method and system for epitaxial deposition of a Group III-V semiconductor material that includes gallium. The method includes reacting an amount of a gaseous Group III precursor having one or more gaseous gallium precursors as one reactant wit... | 03/01/2012 |
| 20120052657 | METHOD OF FORMING FILM AND SUBSTRATE PROCESSING APPARATUS A method of forming a film and a substrate processing apparatus, which can increase the number of substrates to be processed at once in order to improve productivity, are provided. In order to solve the problems, the method of forming a film includes loading a plurality... | 03/01/2012 |
| 20120052617 | VAPOR DEPOSITION APPARATUS AND PROCESS FOR CONTINUOUS DEPOSITION OF A DOPED THIN FILM LAYER ON A SUBSTRATE An apparatus and related process are provided for vapor deposition of a sublimated source material as a doped thin film on a photovoltaic (PV) module substrate. A receptacle is disposed within a vacuum head chamber and is configured for receipt of a source material supp... | 03/01/2012 |
| 20120040485 | THERMAL MANAGEMENT OF FILM DEPOSITION PROCESSES Thermal management of film deposition processes. In one aspect, a deposition system includes a vacuum chamber defining an evacuated interior volume, a deposition source disposed within the interior volume, a substrate holder disposed within the interior volume and arran... | 02/16/2012 |
| 20120040084 | APPARATUS AND METHODS FOR FORMING MODIFIED METAL COATINGS Methods and systems for forming modified metal coatings on a gas turbine engine component (20). The gas turbine engine component (20) is placed inside a container (50) having a known volume, along with a source material (32) containing a seco... | 02/16/2012 |
| 20120037077 | LARGE AREA DEPOSITION IN HIGH VACUUM WITH HIGH THICKNESS UNIFORMITY The invention relates to an effusing source for film deposition made of a reservoir comprising one hole characterized by the fact that the hole diameter is less than one order of magnitude than the mean free path of the molecules determined by the pressure and its thick... | 02/16/2012 |
| 20120040516 | METHOD AND DEVICE FOR DEPOSITING SEMICONDUCTOR FILM ON SUBSTRATE USING CLOSE-SPACED SUBLIMATION PROCESS A method and device for depositing a semiconductor film. The method includes: a) carrying a semiconductor material by a carrier gas to a crucible installed in a vacuum deposition chamber via a passage; and b) heating the crucible to sublimate the semiconductor material ... | 02/16/2012 |
| 20120030884 | SUPERCRITICAL NOBLE GASES AND COLORING METHODS A coloring system can include a noble gas, colorant, and one or more vessels configured to convert the noble gas into a supercritical fluid, and/or receive and color an article of manufacture with the noble gas in the supercritical fluid state. A coloring process can in... | 02/09/2012 |
| 20120031339 | DEPOSITION HEAD AND FILM FORMING APPARATUS There is provided a deposition head capable of discharging a material gas having a uniform flow rate and equi-thermal property from each component in a large-sized substrate as well as a conventional small-sized one for forming a uniform thin film. A deposition apparatu... | 02/09/2012 |
| 20120031338 | SUSCEPTOR AND APPARATUS FOR CVD WITH THE SUSCEPTOR A susceptor and an apparatus for chemical vapor deposition (CVD) are provided. The susceptor includes a main body configured to include a mounting unit having an uneven plane, and a substrate supporting unit configured to be seated on the mounting unit. A bottom surface... | 02/09/2012 |
| 20120031336 | CHEMICAL VAPOR DEPOSITION DEVICE A chemical vapor deposition device includes a chamber, a gas input assembly, a gas output assembly, a heating device, and a driving module. The chamber includes a first side, a second side and a deposition area defined between the first side and the second side. The sec... | 02/09/2012 |
| 20120021556 | DEPOSITION SYSTEM A selenium deposition system can improve the selenium vapor distribution.... | 01/26/2012 |
| 20120021126 | Vacuum Vapor Coating Device for Coating a Substrate A vacuum vapor coating device for coating a substrate with a coating material, the vacuum vapor coating device comprising a chamber (1) into which vacuum can be created, the chamber (1) comprises: at least one support (3) for receiving the substrate... | 01/26/2012 |
| 20120017983 | BUFFER LAYER FORMATION Manufacturing a photovoltaic device can include a vapor transport deposition process.... | 01/26/2012 |
| 20120009344 | PROCESS AND APPARATUS FOR PRODUCING COMPOSITE MATERIAL A process and an apparatus for producing a composite material utilize a rotatable hollow body that is inclined with an upstream side being higher than a downstream side. A reaction zone is defined within an elongated chamber in the hollow body. Protrusions inwardly exte... | 01/12/2012 |
| 20120009347 | PRECISE TEMPERATURE CONTROL FOR TEOS APPLICATION BY HEAT TRANSFER FLUID Embodiments of the invention generally provide a mixing block for mixing precursors and/or cleaning agent which has the advantage of maintaining the temperature and improving the mixing effect of the precursors, cleaning agent or the mixture thereof to eliminate the sub... | 01/12/2012 |
| 20120000414 | GROWTH OF LARGE ALUMINUM NITRIDE SINGLE CRYSTALS WITH THERMAL-GRADIENT CONTROL In various embodiments, non-zero thermal gradients are formed within a growth chamber both substantially parallel and substantially perpendicular to the growth direction during formation of semiconductor crystals, where the ratio of the two thermal gradients (parallel t... | 01/05/2012 |
| 20120000425 | Apparatus for Processing Substrate A substrate processing apparatus that simultaneously forms thin films on a plurality of substrates and performs heat treatment includes: a plurality of substrate holders, each including a substrate support that supports a substrate and a first gas pipe having one or a p... | 01/05/2012 |
| 20110318490 | METHOD FOR DEPOSITING A COATING A coating apparatus and method for depositing a coating that contains at least one first element on a substrate by an activated vapor deposition, wherein the substrate is introduced into a gas atmosphere that contains at least the first element, and the gas atmosphere i... | 12/29/2011 |
| 20110318909 | SYSTEM AND METHOD OF SEMICONDUCTOR MANUFACTURING WITH ENERGY RECOVERY The invention can provide or facilitate energy recovery operations during semiconductor processing operations by utilizing a bell jar having a radiation shield thereon that is comprised of a mediating layer comprising nickel disposed on an interior surface of the bell j... | 12/29/2011 |
| 20110318937 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE, METHOD OF CLEANING A PROCESS VESSEL, AND SUBSTRATE PROCESSING APPARATUS A method of manufacturing a semiconductor device includes supplying a process gas into a process vessel accommodating a substrate to form a thin film on the substrate and supplying a cleaning gas into the process vessel to clean an inside of the process vessel, after th... | 12/29/2011 |
| 20110312162 | CHEMICAL VAPOUR DEPOSITION SYSTEM AND PROCESS A chemical vapour deposition system, including: a process tube for receiving at least one sample, the process tube being constructed of silicon carbide, impregnated with silicon, and coated with silicon carbide; a pumping system to evacuate the process tube to high vacu... | 12/22/2011 |
| 20110308463 | CHEMICAL VAPOR DEPOSITION REACTOR WITH ISOLATED SEQUENTIAL PROCESSING ZONES A chemical vapor deposition reactor and system has a housing, a substrate transport apparatus and a plurality of fixed processing zones. The processing zones include one or more chemical vapor deposition zones, each having an independent reactant gas supply. Each chemic... | 12/22/2011 |
| 20110308462 | APPARATUS FOR PRODUCING ALIGNED CARBON NANOTUBE AGGREGATES An apparatus of the present invention for producing aligned carbon nanotube aggregates is an apparatus for producing aligned carbon nanotube aggregates, the apparatus being configured to grow the aligned carbon nanotube aggregate by: causing a catalyst formed on a surfa... | 12/22/2011 |
| 20110308456 | COATING APPARATUS A coating apparatus for coating a number of workpieces includes a deposition chamber, a reaction assembly, and a driving assembly. The deposition chamber includes a housing defining a cavity. The reaction assembly is received in the deposition chamber and includes an ou... | 12/22/2011 |
| 20110311717 | VAPOR DEPOSITION METHOD AND VAPOR DEPOSITION SYSTEM Provided is a vapor deposition method of forming one or a plurality of layers on a one surface (7a) side of a glass substrate (7), the one or the plurality of layers including an organic layer (4), the vapor deposition method including: formi... | 12/22/2011 |
| 20110303145 | Apparatus for chemical vapor deposition control A gas heating device and a processing system for use therein are described for depositing a thin film on a substrate using a vapor deposition process. The gas heating device includes a heating element array having a plurality of heating element zones configured to recei... | 12/15/2011 |
| 20110293832 | Method and apparatus for depositing thin layers of polymeric para-xylylene or substituted para-xylylene The invention relates to an apparatus and a method for depositing one or more thin layers of polymeric para-xylylene. Said apparatus comprises a heated evaporator (1) used for evaporating a solid or liquid starting material. A supply pipe (11) for a carrie... | 12/01/2011 |
| 20110293831 | LINEAR BATCH CHEMICAL VAPOR DEPOSITION SYSTEM Described is a linear batch CVD system that includes a deposition chamber, one or more substrate carriers, gas injectors and a heating system. Each substrate carrier is disposed in the deposition chamber and has at least one receptacle configured to receive a substrate.... | 12/01/2011 |
| 20110293829 | COATING METHOD AND APPARATUS, A PERMANENT MAGNET, AND MANUFACTURING METHOD THEREOF The object of the present invention is to improve the productivity of a permanent magnet and to manufacture it at a low cost by effectively coating Dy and Tb on a surface of the magnet of Fe—B-rare earth elements having a predetermined configuration. The permanent mag... | 12/01/2011 |
| 20110290186 | METHOD AND DEVICE FOR PRODUCING AND PROCESSING LAYERS OF SUBSTRATES UNDER A DEFINED PROCESSING ATMOSPHERE A method is provided for producing a processing atmosphere for coating substrates, with this method primarily being used in CVD-processes for precipitating an individual layer or a system of individual layers under defined processing atmospheres, in which processing gas... | 12/01/2011 |
| 20110290185 | SUBSTRATE COOLING DEVICE AND SUBSTRATE TREATMENT SYSTEM A substrate cooling device configured to cool a substrate after a treatment, the device includes: a housing having a space configured to house a substrate internally; a pair of holder sections provided so as to face an inner wall of the housing, and including a groove s... | 12/01/2011 |
| 20110287192 | DEVICE AND METHOD FOR COATING A SUBSTRATE USING CVD The invention relates to a device for coating a substrate (14) using CVD, in particular for coating with diamond or silicon, wherein a heat conductor array comprising a plurality of elongated heat conductors (2) is provided in a housing (10), said h... | 11/24/2011 |
| 20110287194 | DEVICE AND METHOD FOR COATING A SUBSTRATE USING CVD The invention relates to a device for coating a substrate using CVD, in particular for coating with diamond or silicon, wherein a neat conductor array composed of a plurality of elongated heat conductors (2) is provided in a housing (9), said heat conducto... | 11/24/2011 |
