Celebrity Inventors
Glam girl Heddy Lamar may have used her good looks to good effect on the silver screen, but she put her smarts to better use as an inventor. During World War II, she co-patented a frequency-switching system for torpedo guidance that was considered years ahead of its time.
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| Application No. | Application Title | Issue Date |
| 20120258256 | GUIDED NON-LINE OF SIGHT COATING A method for applying a vapor deposition coating onto a substrate with a non line of sight or limited line of sight is disclosed. A vapor stream is provided in a chamber that is below atmospheric pressure. The vapor stream is impinged with a working gas that provides a ... | 10/11/2012 |
| 20120153442 | SILICON NITRIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-READABLE STORAGE MEDIUM, AND PLASMA CVD DEVICE Provided is a process of forming a silicon nitride film having concentration of hydrogen atoms below or equal to 9.9×1020 atoms/cm3 in the silicon nitride film by using a plasma CVD device, which generates plasma by introducing microwaves into a p... | 06/21/2012 |
| 20120100310 | COATING DEVICE AND COATING METHOD A coating installation containing at least one recipient which can be evacuated and which is adapted to accommodate a substrate, at least one gas supply device which is used to introduce at least one gaseous precursor into the recipient and at least one heatable activat... | 04/26/2012 |
| 20120097328 | APPARATUS FOR FABRICATING SEMICONDUCTOR WAFERS AND APPARATUS FOR THE DEPOSITION OF MATERIALS BY EVAPORATION USING A MOLECULAR BEAM Described is equipment for depositing materials by evaporation using a molecular beam and equipment for fabricating semiconductor wafers, including a central conveyor module having a plurality of lateral ports capable of functioning under vacuum pressure conditions abov... | 04/26/2012 |
| 20120088038 | Method and Device for High-Rate Coating by Means of High-Pressure Evaporation The invention relates to a vacuum coating method with very high deposition rates at high layer thickness homogeneity and material yield as well as apparatuses for achieving the coating. In order to overcome the existing conflict between lay... | 04/12/2012 |
| 20110311737 | VAPOR DEPOSITION APPARATUS FOR MINUTE-STRUCTURE AND METHOD THEREFOR A vapor deposition apparatus for a minute-structure includes a surface acoustic wave device 10 that has at least a pair of electrodes 12 and 13 arranged at an interval on a surface of a piezoelectric body 11, a vacuum vapor deposition device ... | 12/22/2011 |
| 20110168330 | SUPPORT STRUCTURE, LOAD LOCK APPARATUS, PROCESSING APPARATUS AND TRANSFER MECHANISM A support structure for supporting a processing target object includes a support main body that supports a weight of the processing target object and recess-shaped supporting body accommodating portions formed on a top surface of the support main body. The support struc... | 07/14/2011 |
| 20110111963 | Apparatus For Fabricating High Temperature Superconducting Film And High Temperature Superconducting Film Fabricated Through Auxiliary Cluster Beam Spraying Disclosed herein is a high temperature superconducting film and an apparatus for fabricating a high temperature superconducting film in a vacuum chamber through auxiliary cluster beam spraying using an evaporation method, wherein a high temperature superconducting mater... | 05/12/2011 |
| 20110111132 | SYSTEM AND METHOD FOR DEPOSITING COATINGS ON INNER SURFACE OF TUBULAR STRUCTURE A system and method for depositing coatings on an inner surface of a tubular structure includes at least one pump for creating and maintaining a vacuum in the tubular structure, a meshed electrode adapted to be positioned in a center of the tubular structure, and a bias... | 05/12/2011 |
| 20110104393 | PLASMA ION IMPLANTATION PROCESS FOR PATTERNED DISC MEDIA APPLICATIONS Processes and apparatus of forming patterns including magnetic and non-magnetic domains on a magnetically susceptible surface on a substrate are provided. In one embodiment, a method of forming a pattern of magnetic domains on a magnetically susceptible material dispose... | 05/05/2011 |
| 20110067631 | ARC ION PLATING APPARATUS An arc ion plating apparatus comprises a vacuum chamber, a rotary table for moving a substrate within the vacuum chamber vertically relative to its height direction, an arc evaporation source for bombardment for cleaning the surface of the substrate with metal ions, and... | 03/24/2011 |
| 20110052832 | FILM FORMING METHOD AND FILM FORMING APPARATUS An object of the present invention is to provide a reflection film formation technology which achieves the simplification of an apparatus structure and the cost reduction thereof. A film forming method of the present invention includes a reflection film formation step (... | 03/03/2011 |
| 20110045617 | THIN FILM DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY DEVICE BY USING THE SAME A thin film deposition apparatus and an organic light-emitting display device by using the same. The thin film deposition apparatus includes an electrostatic chuck, an a plurality of chambers; at least one thin film deposition assembly; a carrier; a first power source p... | 02/24/2011 |
| 20100183879 | PLASMA DEPOSITION APPARATUS Apparatus (10) for coating a surface of an article (14) with a thin film polymer layer by plasma deposition, the apparatus comprising: a plurality of processing chambers (12a, 12b, 12c . . . 12n) into... | 07/22/2010 |
| 20100163186 | Plasma Processing Apparatus A plasma processing apparatus wherein a layer structure consisting of plural layers formed in stack one upon another on a semiconductor wafer placed on the sample holder located in the process chamber, is etched with plasma generated in the process chamber by supplying ... | 07/01/2010 |
| 20100151680 | Substrate carrier with enhanced temperature uniformity A substrate carrier is used in an in-line fabrication such as Plasma Enhanced Chemical Vapor Deposition (PECVD) for application of thin film on substrates. The carrier is in thermal communication with the substrate and thereby provides heat sinking. The carrier further ... | 06/17/2010 |
| 20100144122 | Hybrid chemical vapor deposition process combining hot-wire cvd and plasma-enhanced cvd Hybrid chemical vapor deposition systems for depositing a semiconductor-containing thin film over a substrate comprise a reaction space, a substrate support member configured to permit movement of a substrate in a longitudinal direction and a plasma-generating apparatus... | 06/10/2010 |
| 20100089323 | METHOD FOR COATING INTERNAL MEMBER HAVING HOLES IN VACUUM PROCESSING APPARATUS AND THE INTERNAL MEMBER HAVING HOLES COATED BY USING THE COATING METHOD A coating method for a internal member having holes in a vacuum processing apparatus is provided. The method includes a process (A) of filling small holes 78 of the internal member 81 with padding plugs 20 each of which has a core member 22 m... | 04/15/2010 |
| 20100080928 | Confining Magnets In Sputtering Chamber A vacuum chamber has multiple wafer positions, and the wafers are positioned by a rotating pallet. Above a wafer position in the chamber there may be a sputtering target, a flat inductively coupled plasma (ICP) coil for etching the wafer and/or promoting sputtering, and... | 04/01/2010 |
| 20100024731 | PROCESSING TOOL WITH COMBINED SPUTTER AND EVAPORATION DEPOSITION SOURCES A substrate processing system particularly suitable for fabricating solar cells. The system has a front end module transporting cassettes, each cassette holding a preset number of substrates therein; a loading module coupled to the front end module and having mechanism ... | 02/04/2010 |
| 20100028562 | PLASMA GENERATING APPARATUS, DEPOSITION APPARATUS, DEPOSITION METHOD, AND METHOD OF MANUFACTURING DISPLAY DEVICE A deposition apparatus includes a plasma gun including a hollow cathode which generates a plasma beam into a vacuum chamber including an exhaust system and one or more intermediate electrodes to provide a potential gradient for the plasma beam, a focusing coil which is ... | 02/04/2010 |
| 20090293808 | Light-Emitting Device, Film-Forming Method and Manufacturing Apparatus Thereof, and Cleaning Method of the Manufacturing Apparatus This invention provides a new film forming method in which, on the occasion that pressure is decreased by pressure decreasing means which was connected to a film forming chamber, and a film is formed by evaporating an organic compound material from a deposition source i... | 12/03/2009 |
| 20090285998 | PLASMA PROCESSING APPARATUS, ELECTRODE PLATE FOR PLASMA PROCESSING APPARATUS, AND ELECTRODE PLATE MANUFACTURING METHOD A plasma processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate and to reduce pressure therein. A first electrode is disposed within the process container. A supply system is... | 11/19/2009 |
| 20090279227 | Multi Layer Chip Capacitor, and Method and Apparatus for Manufacturing the Same The present invention carries out the vacuum deposition by setting a deposition angle between a single mask set including a shadow mask having a plurality of slits and a deposition source to form a lower terminal layer, a dielectric layer, an inner electrode layer, and ... | 11/12/2009 |
| 20090236040 | ELECTRODE ASSEMBLY AND PLASMA PROCESSING CHAMBER UTILIZING THERMALLY CONDUCTIVE GASKET The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control... | 09/24/2009 |
| 20090223451 | METHOD AND APPARATUS FOR PRECURSOR DELIVERY SYSTEM FOR IRRADIATION BEAM INSTRUMENTS A precursor delivery system for an irradiation beam instrument having a vacuum chamber includes an injection tube for injecting gasses into the vacuum chamber of the instrument and a main gas line having an inlet and an outlet. The outlet is connected to the injection t... | 09/10/2009 |
| 20090191327 | VACUUM COATING INSTALLATION AND METHOD OF PRODUCING A COATING LAYER ON A SUBSTRATE A strip coating system includes a first pulley carrying a flexible metal or Al substrate wound up on the first pulley. A second, take-up, pulley is provided for taking up the coated substrate. The coating process is a continuous coating process, during which the first p... | 07/30/2009 |
| 20090176036 | Method of organic material vacuum evaporation and apparatus thereof There is provided a method of vacuum evaporation comprising causing evaporated material (5) from vacuum evaporation source (20) furnished with container (1) with its one side open accommodating organic material (2) to form a film on opposed s... | 07/09/2009 |
| 20090145361 | EVAPORATION APPARATUS Thermal electrons emitted the filament 331 are irradiated in the vicinity of the opening of the nozzle 311 of the sealed evaporation source 31. The vapor 242 of an evaporation material (Cu) emitted into the vacuum chamber 32 through th... | 06/11/2009 |
| 20090145553 | Suppressor of hollow cathode discharge in a shower head fluid distribution system A chamber component configured to be coupled to a process chamber and a method of fabricating the chamber component is described. The chamber component comprises a chamber element comprising a first surface on a supply side of the chamber element and a second surface on... | 06/11/2009 |
| 20090133835 | PROCESSING APPARATUS Provided is a structure of an improved processing vessel for a processing apparatus which processes a target object, such as a semiconductor wafer, which is heated in the metal cylindrical shaped processing vessel by using a processing gas. The processing vessel (34<... | 05/28/2009 |
| 20090104353 | Apparatus For Treating A Gas Stream In a method of inhibiting the deposition of aluminium within a vacuum pump during the pumping from a process chamber of a gas stream containing an organoaluminium precursor, chlorine is supplied to the gas stream upstream of the vacuum pump to react with the precursor t... | 04/23/2009 |
| 20090085172 | Deposition Method, Deposition Apparatus, Computer Readable Medium, and Semiconductor Device A deposition method includes steps of placing a substrate on a susceptor in a process chamber; supplying to the process chamber a source gas including an organic compound and a plasma gas for facilitating activation of the source gas into plasma; evacuating the process ... | 04/02/2009 |
| 20090023274 | Hybrid Chemical Vapor Deposition Process Combining Hot-Wire CVD and Plasma-Enhanced CVD Hybrid chemical vapor deposition systems for depositing a semiconductor-containing thin film over a substrate comprise a reaction space, a substrate support member configured to permit movement of a substrate in a longitudinal direction and a plasma-generating apparatus... | 01/22/2009 |
| 20090017217 | Apparatus and method for applying coatings onto the interior surfaces of components and related structures produced therefrom Provided is a methodology and system for applying coatings onto the interior surfaces of components. The approach comprises a vapor creation device (for example an electron beam or laser that evaporates a single or multiplicity of solid or liquid sources), a vacuum cham... | 01/15/2009 |
| 20080305277 | METHOD AND APPARATUS FOR MAKING DIAMOND-LIKE CARBON FILMS Ion-assisted plasma enhanced deposition of diamond-like carbon (DLC) films on the surface of photovoltaic solar cells is accomplished with a method and apparatus for controlling ion energy. The quality of DLC layers is fine-tuned by a properly biased system of special e... | 12/11/2008 |
| 20080292806 | Plasma Immersion Ion Processing For Coating Of Hollow Substrates The present disclosure relates to an apparatus and method for plasma ion deposition and coating formation. A vacuum chamber may be supplied formed by a hollow substrate having a length, diameter and interior surface. A plasma may be formed within the chamber while apply... | 11/27/2008 |
| 20080286495 | SYSTEM AND METHOD FOR POWER FUNCTION RAMPING OF SPLIT ANTENNA PECVD DISCHARGE SOURCES A system and method for depositing films on a substrate is described. One embodiment includes a vacuum chamber; a split conductor housed inside the vacuum chamber; a magnetron configured to generate a power signal that can be applied to at least a portion of the split c... | 11/20/2008 |
| 20080272463 | Method and Apparatus for Growing a Group (III) Metal Nitride Film and a Group (III) Metal Nitride Film A process and apparatus for growing a group (III) metal nitride film by remote plasma enhanced chemical vapour deposition are described. The process comprises heating an object selected from the group consisting of a substrate and a substrate comprising a buffer layer i... | 11/06/2008 |
| 20080257264 | FACILITY FOR DEPOSITING LUBRICANT COATING ON HARD MAGNETIC DISKS A facility for depositing lubricant coatings on hard magnetic disks includes load and unload vacuum locks in which cassettes carrying hard magnetic disks to be coated with a lubricant coating are turned 90°. Lubricant coatings are simultaneously deposited on a pluralit... | 10/23/2008 |
