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| Application No. | Application Title | Issue Date |
| 20120129296 | METHOD FOR FORMING AN ORGANIC MATERIAL LAYER ON A SUBSTRATE A method for forming an organic material layer on a substrate in an in-line deposition system is disclosed. In one aspect, the organic material is deposited with a predetermined non-constant deposition rate profile, which includes a first predetermined deposition rate r... | 05/24/2012 |
| 20120103264 | METHODS AND APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM WITH FLOW GRADIENT DESIGNS Methods and apparatus having a flow gradient created from a gas distribution plate are provided. In one embodiment, the method and apparatus are particularly useful for, but not limited to, depositing a silicon film for solar cell applications. The apparatus for deposit... | 05/03/2012 |
| 20120103249 | SIC SINGLE CRYSTAL SUBLIMATION GROWTH METHOD AND APPARATUS A physical vapor transport growth system includes a growth chamber charged with SiC source material and a SiC seed crystal in spaced relation and an envelope that is at least partially gas-permeable disposed in the growth chamber. The envelope separates the growth chamb... | 05/03/2012 |
| 20120103257 | DEPOSITION RING AND ELECTROSTATIC CHUCK FOR PHYSICAL VAPOR DEPOSITION CHAMBER Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described herein relate to a process kit including a deposition ring and a pedestal... | 05/03/2012 |
| 20120103263 | PRE-HEAT RING DESIGNS TO INCREASE DEPOSITION UNIFORMITY AND SUBSTRATE THROUGHPUT Embodiments of the present invention generally relates to apparatus for use in film depositions. The apparatus generally include pre-heat rings adapted to be positioned in a processing chamber. In one embodiment, a pre-heat ring includes a ring having an inner edge and ... | 05/03/2012 |
| 20120103518 | FILM FORMATION APPARATUS A film formation apparatus includes a gas supply mechanism for supplying an aminosilane-based gas, and a silane-based gas that does not include an amino group. Processes of forming a seed layer on a surface of the insulation film having the opening reaching the conducti... | 05/03/2012 |
| 20120103261 | APPARATUS AND SYSTEMS FOR INTERMIXING CADMIUM SULFIDE LAYERS AND CADMIUM TELLURIDE LAYERS FOR THIN FILM PHOTOVOLTAIC DEVICES An apparatus for sequential deposition of an intermixed thin film layer and a sublimated source material on a photovoltaic (PV) module substrate is provided, along with associated processes. The process can include introducing a substrate into a deposition chamber, wher... | 05/03/2012 |
| 20120083105 | METHOD FOR BORON DOPING SILICON WAFERS A process for P-type boron doping of silicon wafers placed on a support in the chamber of a furnace of whose one end includes a wall in which element for introducing reactive gases and a carrier gas carrying a boron precursor in gaseous form are located, whereby the pro... | 04/05/2012 |
| 20120079985 | METHOD FOR PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS There is provided a substrate processing method, comprising the steps of: supplying source gas into a processing chamber in which substrates are accommodated; removing the source gas and an intermediate body of the source gas remained in the processing chamber; supplyin... | 04/05/2012 |
| 20120079984 | GAS MIXER AND MANIFOLD ASSEMBLY FOR ALD REACTOR A system and method for mixing a plurality of gases for an atomic layer deposition (ALD) reactor. The mixer is configured to mix the plurality of gases while minimizing the potential for re-circulation within the mixer. The mixer is further configured to maintain the fl... | 04/05/2012 |
| 20120070572 | Vapor Delivery System For Use in Imprint Lithography Described are systems and method of using a vapor delivery system for enabling delivery of an adhesion promoter material during an imprint lithography process.... | 03/22/2012 |
| 20120070997 | GAS SWITCHING SECTION INCLUDING VALVES HAVING DIFFERENT FLOW COEFFICIENT'S FOR GAS DISTRIBUTION SYSTEM A gas switching system for a gas distribution system for supplying different gas compositions to a chamber, such as a plasma processing chamber of a plasma processing apparatus, is provided. The chamber can include multiple zones, and the gas switching section can suppl... | 03/22/2012 |
| 20120067283 | Systems and Methods for Forming Metal Oxide Layers A method of forming (and apparatus for forming) a metal oxide layer, preferably a dielectric layer, on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor deposition process and ozone with one or more metal organo-amine precursor com... | 03/22/2012 |
| 20120067286 | VAPOR DEPOSITION REACTOR SYSTEM AND METHODS THEREOF Embodiments of the invention generally relate to apparatuses and methods for chemical vapor deposition (CVD) processes. In one embodiment, a CVD reactor has a reactor lid assembly disposed on a reactor body and containing a first showerhead assembly, an isolator assembl... | 03/22/2012 |
| 20120070581 | VAPOR DEPOSITION SYSTEMS AND METHODS Vapor deposition systems and methods associated with the same are provided. The systems may be designed to include features that can promote high quality deposition; simplify manufacture, modification and use; as well as, reduce the footprint of the system, amongst othe... | 03/22/2012 |
| 20120067282 | REACTOR LID ASSEMBLY FOR VAPOR DEPOSITION Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a reactor lid assembly for vapor deposition is provided which includes a first showerhead assembly and an isolator assembly disposed next to ea... | 03/22/2012 |
| 20120052203 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING SUBSTRATE Provided is a substrate processing apparatus and a substrate processing method, capable of preventing a reactive product from being deposited to the inside of a processing chamber and an exhaust line, and preventing the corrosion caused by hydrogen chloride gas. The met... | 03/01/2012 |
| 20120052189 | VAPOR DEPOSITION SYSTEM A vapor deposition process can be used to create layers within a photovoltaic module.... | 03/01/2012 |
| 20120045572 | CARBON NANOTUBE PRODUCTION PROCESS AND CARBON NANOTUBE PRODUCTION APPARATUS A substrate 10 that selectively allows hydrogen to permeate therethrough is formed with a catalyst thin layer 20 on a first side 11 thereof and is heated in a furnace tube 110, which functions as a reactor, of a heating furnace 100 whi... | 02/23/2012 |
| 20120045588 | DEPOSITION SYSTEM WITH A ROTATING DRUM A deposition method comprises flowing a first gas into a metallization zone maintained at a first pressure. A second gas flows into a reaction zone maintained at a second pressure. The second pressure is less than the first pressure. A rotating drum includes at least on... | 02/23/2012 |
| 20120042828 | SLIT VALVE FOR VACUUM CHAMBER MODULE A slit valve assembly is configured for attachment to a vacuum chamber module to seal a slot opening in a wall of the module in a closed position and to provide access through the slot opening in an open position. The valve assembly includes a rotatable shaft driven by ... | 02/23/2012 |
| 20120040095 | Vapor Deposition of Anti-Stiction Layer for Micromechanical Devices A vapor deposition system includes a filter-diffuser device connected to a vapor inlet within a vacuum chamber for simultaneously filtering inflowing vapor to remove particulate matter while injecting vapor containing perfluordecanoic acid (PFDA) into the chamber throug... | 02/16/2012 |
| 20120030884 | SUPERCRITICAL NOBLE GASES AND COLORING METHODS A coloring system can include a noble gas, colorant, and one or more vessels configured to convert the noble gas into a supercritical fluid, and/or receive and color an article of manufacture with the noble gas in the supercritical fluid state. A coloring process can in... | 02/09/2012 |
| 20120031336 | CHEMICAL VAPOR DEPOSITION DEVICE A chemical vapor deposition device includes a chamber, a gas input assembly, a gas output assembly, a heating device, and a driving module. The chamber includes a first side, a second side and a deposition area defined between the first side and the second side. The sec... | 02/09/2012 |
| 20120031332 | Water cooled gas injector A method and apparatus for oxidizing materials used in semiconductor integrated circuits, for example, for oxidizing silicon to form a dielectric gate. An ozonator is capable of producing a stream of least 70% ozone. The ozone passes into an RTP chamber through a water-... | 02/09/2012 |
| 20120025542 | Fluid Movement Systems Including a Continuously Variable Transmission A system has a pump with a power input, a power source and a continuously variable transmission (CVT) coupled to the power source and to the power input of the pump. The CVT transmits power from the power source to the pump. The CVT comprises a plurality of planetary me... | 02/02/2012 |
| 20120027936 | EXHAUST FOR CVD REACTOR A chemical vapor deposition reactor and a method of wafer processing are provided. The reactor includes a reaction chamber having an interior, a gas inlet manifold communicating with the interior of the chamber, an exhaust system including an exhaust manifold having a p... | 02/02/2012 |
| 20120026574 | Thermochromic smart window and method of manufacturing the same A thermochromic smart window and a method of manufacturing the thermochromic smart window including a glass and a thermochromic layer including a vanadium dioxide material formed on the glass. A thermochromic smart window includes a substrate and a thermochromic layer d... | 02/02/2012 |
| 20120027953 | Rotating Reactor Assembly for Depositing Film on Substrate A rotating reactor assembly includes an injector rotor comprising a channel extending in a direction parallel to a rotational axis of the injector rotor and at least one injection hole connected to the channel; and an intake port through which a material is introduced. ... | 02/02/2012 |
| 20120024227 | VAPOR-PHASE PROCESS APPARATUS, VAPOR-PHASE PROCESS METHOD, AND SUBSTRATE A vapor-phase process apparatus and a vapor-phase process method capable of satisfactorily maintaining quality of processes even when different types of processes are performed are obtained. A vapor-phase process apparatus includes a process chamber, gas supply ports se... | 02/02/2012 |
| 20120027918 | SHOWERHEAD SUPPORT STRUCTURE FOR IMPROVED GAS FLOW Embodiments of the present invention generally provide apparatus and methods for supporting a gas distribution showerhead in a processing chamber. In one embodiment, a gas distribution showerhead for a vacuum chamber is provided. The gas distribution showerhead comprise... | 02/02/2012 |
| 20120021128 | SUBSTRATE TRANSPORT MECHANISM CONTACTING A SINGLE SIDE OF A FLEXIBLE WEB SUBSTRATE FOR ROLL-TO-ROLL THIN FILM DEPOSITION Systems and methods for depositing a thin film on a flexible substrate involve guiding the flexible substrate along a spiral transport path back and forth between spaced-apart first and second precursor zones so that the substrate transits through the first and second p... | 01/26/2012 |
| 20120015502 | p-GaN Fabrication Process Utilizing a Dedicated Chamber and Method of Minimizing Magnesium Redistribution for Sharper Decay Profile Methods and systems for the fabrication of p-GaN, and related, films utilizing a dedicated chamber in a multi-chamber tool are described. Also described are methods of fabricating a magnesium doped group III-V material layer, such as a GaN layer, with a sharp magnesium ... | 01/19/2012 |
| 20120015525 | METHOD OF CLEANING A THIN FILM FORMING APPARATUS, THIN FILM FORMING METHOD, AND THIN FILM FORMING APPARATUS A method of cleaning a thin film forming apparatus, for removing deposits adhering to an inside thereof after supplying a film-forming gas into a reaction chamber to form a amorphous carbon film on a workpiece, includes a heating operation of heating at least one of an ... | 01/19/2012 |
| 20120015106 | METHOD AND APPARATUS FOR COATING The invention relates to a method and an apparatus for coating one or more objects (1) by exposing an object (1) to alternately repeating surface reactions of two or more gaseous precursors. The apparatus comprises a reaction chamber (2, 40), means ... | 01/19/2012 |
| 20120003396 | APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION Apparatus for atomic layer deposition on a surface of a substrate includes a precursor injector head. The precursor injector head includes a precursor supply and a deposition space that in use is bounded by the precursor injector head and the substrate surface. The prec... | 01/05/2012 |
| 20120003388 | METHODS AND APPARATUS FOR THERMAL BASED SUBSTRATE PROCESSING WITH VARIABLE TEMPERATURE CAPABILITY A substrate support may include a body; an inner ring disposed about the body; an outer ring disposed about the inner ring forming a first opening therebetween; a first seal ring disposed above the first opening; a shadow ring disposed above the inner ring, extending in... | 01/05/2012 |
| 20120000422 | APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which includes a chamber lid assembly coupled with a chamber body having a substrate s... | 01/05/2012 |
| 20110311726 | METHOD AND APPARATUS FOR PRECURSOR DELIVERY An improved precursor vaporization device and method for vaporizing liquid and solid precursors having a low vapor pressure at a desired precursor temperature includes elements and operating methods for injecting an inert gas boost pulse into a precursor container prior... | 12/22/2011 |
| 20110303152 | SUPPORT STRUCTURE, PROCESSING CONTAINER STRUCTURE AND PROCESSING APPARATUS A support structure for supporting a plurality of objects to be processed and to be disposed in a processing container structure in which a processing gas flows horizontally from one side to the opposite side, includes a top plate section; a bottom section; and a plural... | 12/15/2011 |
