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| Application No. | Application Title | Issue Date |
| 20120052189 | VAPOR DEPOSITION SYSTEM A vapor deposition process can be used to create layers within a photovoltaic module.... | 03/01/2012 |
| 20110165333 | PLASMA ARC COATING SYSTEM AND METHOD In an embodiment an apparatus for coating a substrate comprises: an array of plasma arcs; a first plurality of reagent manifolds located upstream of the array of plasma arcs and a second plurality of reagent manifolds located downstream of the array of plasma arcs, each... | 07/07/2011 |
| 20110111124 | METHOD AND DEVICE FOR LUBRICATING ROLLERS AND A ROLLED STRIP OF A ROLLING STAND A method for lubricating rolls, especially work rolls (2, 3) of a rolling stand, and rolling stock (6) passed between the rolls during the rolling operation, in which a lubricant-gas mixture, a lubricant-water-gas mixture, a lubricant-water mixture and/or ... | 05/12/2011 |
| 20100163181 | VACUUM PROCESSING APPARATUS There is provided a vacuum processing apparatus including a valve whose opening degree can be set to any size and a control computer which automatically controls a depressurizing rate. The vacuum processing apparatus can reduce the number of foreign particles adhered to... | 07/01/2010 |
| 20100155763 | SYSTEMS AND METHODS FOR APPLICATION OF OPTICAL MATERIALS TO OPTICAL ELEMENTS Methods are disclosed including heating an optical element. An optical material is applied to the heated optical element to provide a conformal layer that is cured via the thermal energy in the heated optical element.... | 06/24/2010 |
| 20100112191 | SYSTEMS AND ASSOCIATED METHODS FOR DEPOSITING MATERIALS Several embodiments of systems for depositing materials and associated methods of operation are disclosed herein. In one embodiment, the system includes a reaction chamber having an inlet and an outlet, a gas source coupled to the inlet of the reaction chamber, and a ne... | 05/06/2010 |
| 20100075037 | Deposition Systems, ALD Systems, CVD Systems, Deposition Methods, ALD Methods and CVD Methods Some embodiments include deposition systems configured for reclaiming unreacted precursor with one or more traps provided downstream of a reaction chamber. Some of the deposition systems may utilize two or more traps that are connected in parallel relative to one anothe... | 03/25/2010 |
| 20100055297 | FILM DEPOSITION APPARATUS, SUBSTRATE PROCESSING APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-READABLE STORAGE MEDIUM FOR FILM DEPOSITION METHOD There is disclosed a film deposition apparatus and a film deposition method for depositing a film on a substrate by carrying out cycles of supplying in turn at least two source gases to the substrate in order to form a layer of a reaction product, and a computer readabl... | 03/04/2010 |
| 20090317547 | CHEMICAL VAPOR DEPOSITION SYSTEMS AND METHODS FOR COATING A SUBSTRATE Chemical vapor deposition systems and methods of coating a substrate are provided. The method includes evacuating a processing chamber to a threshold pressure. The substrate and the processing chamber are heated to a first processing temperature. A first pellet having a... | 12/24/2009 |
| 20090291199 | Apparatus and methods of control for coolant recycling A system and method for cooling and coating optical fiber includes the capability to control the amount of coolant gas that is fed to and recycled through a heat exchanger for cooling the optical fiber. The capability to control the amount of fed and recycled coolant ga... | 11/26/2009 |
| 20090258504 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Provided are a substrate processing apparatus and a method of manufacturing a semiconductor device. The substrate processing apparatus includes a reaction vessel configured to process a substrate, a heater configured to heat an inside of the reaction vessel, a gas suppl... | 10/15/2009 |
| 20090092741 | METHOD FOR FORMING FILM AND FILM FORMING SYSTEM The present claimed invention is a film forming system 1 that forms a film by vaporizing a liquid precursor and then depositing the vaporized liquid precursor on a substrate 2, and comprises a chamber 3 inside of which the substrate 2 is held... | 04/09/2009 |
| 20090017189 | Method and apparatus for forming protective layer An apparatus for forming a protective layer of magnesium oxide on a front glass substrate (11) in an evaporation chamber (201) includes the following: oxygen outlet openings (222) for introducing oxygen into the evaporation chamber (201); wat... | 01/15/2009 |
| 20090004877 | SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD Disclosed is a substrate processing apparatus which includes: a processing chamber to process a substrate; an exhaust path to exhaust the processing chamber; an exhaust device; an exhaust valve to open and close the exhaust path; a raw material gas supply member to supp... | 01/01/2009 |
| 20080282977 | Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus A process gas line (255) for carrying WF6 gas for nucleation, a process gas line (259) for carrying WF6 gas for film deposition after nucleation are joined at a single joint (280) to a carrier gas line (256). A gas line ... | 11/20/2008 |
| 20080248193 | Viscous Fluid Application Device The present invention aims to provide a viscous fluid application device which allows improving manufacturing efficiency of semiconductor packages without deteriorating application position accuracy and decreasing designing flexibility. The device includes: an applicati... | 10/09/2008 |
| 20080241367 | APPARATUS FOR AND METHOD OF APPLYING LUBRICANT COATINGS TO MAGNETIC DISKS VIA A VAPOR FLOW PATH INCLUDING A SELECTIVELY OPENED AND CLOSED SHUTTER Lubricant coatings are applied as lubricant vapor to magnetic disks in a lubricant vapor flow path between the disks and a reservoir for liquid lubricant that is heated to the vapor. The flow path includes a vapor chamber between the reservoir, an apertured diffuser and... | 10/02/2008 |
| 20080160205 | APPARATUS AND METHOD FOR PLASMA ARC COATING A system for coating a side surface of a moving substrate. The system includes an array of plasma sources, a first plurality of orifices located upstream of the array and a second plurality of orifices located downstream of the array. A coating reagent is injected from ... | 07/03/2008 |
| 20080138535 | SUBSTRATE DAMAGE PREVENTION SYSTEM AND METHOD A substrate damage prevention system and method for a plasma treating apparatus are provided. The system may include a lower electrode on which a substrate may be mounted, an inert gas supply unit which may supply an inert gas to an upper surface of the lower electrode ... | 06/12/2008 |
| 20080107796 | APPARATUS FOR AND METHOD OF DISPENSING CHEMICAL SOLUTION IN SPIN-COATING EQUIPMENT A chemical solution is uniformly dispensed from a nozzle by N2 in spin-coating equipment. The dispensing apparatus includes a canister configured to receive a bottle containing the chemical solution, gas supply piping connecting a source of N2 to t... | 05/08/2008 |
| 20080064227 | Apparatus For Chemical Vapor Deposition and Method For Cleaning Injector Included in the Apparatus An apparatus for chemical vapor deposition includes a reaction chamber providing a predetermined sealed space, a reaction gas supply unit for supplying a first reaction gas into the reaction chamber and a reaction gas supply line formed by operatively connecting the rea... | 03/13/2008 |
| 20080011229 | Optical film thickness controlling method, optical film thickness controlling apparatus, dielectric multilayer film manufacturing apparatus, and dielectric multilayer film manufactured using the same controlling apparatus or manufacturing apparatus To provide a method of controlling film thickness of dielectric multilayer film, such as optical thin film, with high precision, an optical film thickness controlling apparatus and a dielectric multilayer film manufacturing apparatus that can control the film thickness ... | 01/17/2008 |
| 20070272152 | Air Valve for a Paint Gun An air valve for a paint gun comprising a closure member (40) configured for fitting in a valve chamber (44) of a paint gun, which valve chamber (44) intersects an air flow chamber (45) of the gun, the closure member (44) having two se... | 11/29/2007 |
| 20070221126 | Chemical Liquid Supply Apparatus As shown in FIG. 3, a primary-side valve 13 and a secondary-side valve 14 are assembled in a nozzle assembly 12 on which a nozzle 11 for dispensing a chemical liquid is formed. The primary-side valve 13 is a valve for opening/cl... | 09/27/2007 |
