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| Application No. | Application Title | Issue Date |
| 20120126376 | SILICON DIOXIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-READABLE STORAGE MEDIUM, AND PLASMA CVD DEVICE To produce a silicon dioxide film having concentration of hydrogen atoms below or equal to 9.9×1020 atoms/cm3 in the silicon dioxide film, as measured by using secondary ion mass spectrometry (SIMS), a plasma CVD, which generate plasma by introduc... | 05/24/2012 |
| 20120129324 | SEMICONDUCTOR STRUCTURE MADE USING IMPROVED MULTIPLE ION IMPLANTATION PROCESS Methods and apparatus provide for: a first source of plasma, wherein the plasma includes a first species of ions; a second source of plasma, wherein the plasma includes a second species of ions; selection of the plasma from the first and second sources; and acceleration... | 05/24/2012 |
| 20120108061 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE A substrate processing apparatus includes a processing chamber configured to process a substrate having a front surface including a dielectric, a substrate support member provided within the processing chamber to support the substrate, a microwave supplying unit configu... | 05/03/2012 |
| 20120080149 | TREATMENT MACHINE FOR TREATING PACKAGING MEANS The invention relates to a device for treating packaging means, particularly in the form of bottles and similar containers, comprising a conveying element that can be used to move the packaging means past at least one treatment module provided on at least one operating ... | 04/05/2012 |
| 20120067281 | SURFACE WAVE PLASMA CVD APPARATUS AND FILM FORMING METHOD A surface wave plasma CVD apparatus includes a waveguide that is connected to a microwave source and formed of a plurality of slot antennae; a dielectric member that introduces microwaves emitted from the plurality of slot antennae into a plasma processing chamber to ge... | 03/22/2012 |
| 20120067280 | ACTIVATOR MEANS FOR PRE-APPLIED ADHESIVES An activator means for use in activating or re-activating adhesive and sealant compositions that have been pre-applied to a bonding surface prior to mating said bonding surface said means having a plurality of features for directly acting upon the pre-applied compositio... | 03/22/2012 |
| 20120048194 | IMAGE FORMING APPARATUS A sound insulation member is detachably attached to a bottom of a printer main body to shield a noise in the printer main body. The sound insulation member is detached from the printer main body when an option sheet feeding apparatus is added. When the sound insulation ... | 03/01/2012 |
| 20120052599 | Wafer Chucking System for Advanced Plasma Ion Energy Processing Systems Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switc... | 03/01/2012 |
| 20120048467 | COMPONENT TEMPERATURE CONTROL BY COOLANT FLOW CONTROL AND HEATER DUTY CYCLE CONTROL Methods and systems for controlling temperatures in plasma processing chamber for a wide range of setpoint temperatures and reduced energy consumption. Temperature control is coordinated between a coolant liquid loop and a heat source by a control algorithm implemented ... | 03/01/2012 |
| 20120040084 | APPARATUS AND METHODS FOR FORMING MODIFIED METAL COATINGS Methods and systems for forming modified metal coatings on a gas turbine engine component (20). The gas turbine engine component (20) is placed inside a container (50) having a known volume, along with a source material (32) containing a seco... | 02/16/2012 |
| 20120031330 | SEMICONDUCTOR SUBSTRATE MANUFACTURING APPARATUS According to this embodiment, a semiconductor substrate manufacturing apparatus for epitaxial growth in which gases are supplied to a wafer placed on a susceptor and in which a heater is provided on the back surface of the susceptor. As a result of this epitaxial growth... | 02/09/2012 |
| 20120034369 | VAPORIZING APPARATUS, SUBSTRATE PROCESSING APPARATUS, COATING AND DEVELOPING APPARATUS, AND SUBSTRATE PROCESSING METHOD A vaporizing apparatus includes a heating plate disposed in a container to heat and vaporize a liquid chemical, a gas supply unit configured to supply a carrier gas carrying the chemical vaporized by the heating plate, into the container, a first detecting unit configur... | 02/09/2012 |
| 20120033223 | Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method for Determining a Property of a Substrate In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, b... | 02/09/2012 |
| 20120017973 | IN-LINE DEPOSITION SYSTEM A deposition system includes a load lock chamber for receiving a substrate and exposing a substrate to a load lock temperature and load lock pressure suitable to prepare a substrate for subsequent low-pressure and high-temperature processing or for ambient temperature a... | 01/26/2012 |
| 20120021536 | METHOD AND SYSTEM FOR APPLICATION OF AN INSULATING DIELECTRIC MATERIAL TO PHOTOVOLTAIC MODULE SUBSTRATES A method and related system are provided for depositing a dielectric material into voids in one or more of the semiconductor material layers of a photovoltaic (PV) module substrate. A first side of the substrate is exposed to a light source such that light is transmitte... | 01/26/2012 |
| 20120015455 | Method and Apparatus for Calibrating Optical Path Degradation Useful for Decoupled Plasma Nitridation Chambers Methods for matching semiconductor processing chambers using a calibrated spectrometer are disclosed. In one embodiment, plasma attributes are measured for a process in a reference chamber and a process in an aged chamber. Using a calibrated light source, an optical pat... | 01/19/2012 |
| 20120009328 | THIN FILM DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY DEVICE BY USING THE SAME A thin film deposition apparatus that may be precisely aligned with a substrate during a deposition process, and a method of manufacturing an organic light-emitting display device using the thin film deposition apparatus.... | 01/12/2012 |
| 20120009694 | APPARATUS AND METHOD FOR MONITORING PRECURSOR FLUX An apparatus and method for monitoring precursor flux is disclosed herein. The apparatus comprises an optical cell configured for electromagnetic radiation spectroscopy and has a precursor reservoir or deposition chamber configured to provide a flow of a vapor depositio... | 01/12/2012 |
| 20120001302 | METHOD FOR FABRICATING SEMICONDUCTOR THIN FILM USING SUBSTRATE IRRADIATED WITH FOCUSED LIGHT, APPARATUS FOR FABRICATING SEMICONDUCTOR THIN FILM USING SUBSTRATE IRRADIATED WITH FOCUSED LIGHT, METHOD FOR SELECTIVELY GROWING SEMICONDUCTOR THIN FILM USING SUBSTRATE IRRADIATED WITH FOCUSED LIGHT, AND SEMICONDUCTOR ELEMENT USING SUBSTRATE IRRADIATED WITH FOCUSED LIGHT An apparatus (100) for fabricating a semiconductor thin film includes: substrate surface pretreatment means (101) for pretreating a surface of a substrate; organic layer coating means (102) for coating, with an organic layer, the substrate thus pret... | 01/05/2012 |
| 20120000420 | SUBSTRATE COATING DEVICE The substrate coating device (10) includes a slit nozzle (1), a first camera (3), a second camera (4), a control section (5), a pump (8), and a pressure control chamber (9). The control section (5) controls the sup... | 01/05/2012 |
| 20110308454 | Device and Method for Sheathing a Ply of Threads A device for continuously sheathing a ply of threads, said ply being formed by an array of approximately mutually parallel threads. The device includes a thread guide, a coating chamber into which a first feed channel and a second feed channel run, which are independent... | 12/22/2011 |
| 20110308453 | CLOSED LOOP MOCVD DEPOSITION CONTROL A method and apparatus are provided for monitoring and controlling substrate processing parameters for a cluster tool that utilizes chemical vapor deposition and/or hydride vapor phase epitaxial (HVPE) deposition. In one embodiment, a metal organic chemical vapor deposi... | 12/22/2011 |
| 20110311726 | METHOD AND APPARATUS FOR PRECURSOR DELIVERY An improved precursor vaporization device and method for vaporizing liquid and solid precursors having a low vapor pressure at a desired precursor temperature includes elements and operating methods for injecting an inert gas boost pulse into a precursor container prior... | 12/22/2011 |
| 20110308455 | METHOD OF FORMING NANO-PARTICLE ARRAY BY CONVECTIVE ASSEMBLY, AND CONVECTIVE ASSEMBLY APPARATUS FOR THE SAME A method of forming a nano-particle array by convective assembly and a convective assembly apparatus for the same are provided. The method of forming nano-particle array comprises: coating a plurality of nano-particles by forming a coating layer; performing a first conv... | 12/22/2011 |
| 20110311716 | Plural Component Coating Application System With a Compressed Gas Flushing System and Spray Tip Flip Mechanism A system for purging a plural component coating application system including: a first pressure regulator for receiving an inert gas, providing the gas at a first pressure; a first valve; a first operator connected to the first valve capable of being controlled by a logi... | 12/22/2011 |
| 20110303146 | PLASMA DOPING APPARATUS There is provided a regulating gas suction device, which forms a regulating gas flow for use in preventing air outside a vacuum container trying to invade into the vacuum container through a sealing member that tightly closes a gap between an upper end surface of the va... | 12/15/2011 |
| 20110297086 | Adhesive Applicator Bookbinding apparatus adhesive applicator accurately, briefly controls adhesive temperature to a set value by selecting, in accordance with adhesive initial temperature, one of a plurality of temperature-controller heating modes defining different supply powers and supp... | 12/08/2011 |
| 20110300290 | Device for fabricating electrode by roll to roll process and method for fabricating electrode There are provided a device for fabricating an electrode by a roll-to-roll process and a method for fabricating an electrode. The device for fabricating an electrode includes an unwinding roll and a winding roll travelling an electrode material; a film forming roll disp... | 12/08/2011 |
| 20110300645 | APPARATUS AND METHOD FOR BATCH NON-CONTACT MATERIAL CHARACTERIZATION An apparatus for performing non-contact material characterization includes a wafer carrier adapted to hold a plurality of substrates and a material characterization device, such as a device for performing photoluminescence spectroscopy. The apparatus is adapted to perfo... | 12/08/2011 |
| 20110284794 | METHOD OF MANUFACTURING POWDER FOR DUST CORE, DUST CORE MADE OF THE POWDER FOR DUST CORE MANUFACTURED BY THE METHOD, AND APPARATUS FOR MANUFACTURING POWDER FOR DUST CORE To provide a method of manufacturing a powder for dust core capable of preventing generation of secondary particles during a siliconizing treatment and improving quality and productivity of the powder for dust core, a dust core made of the powder for dust core manufactu... | 11/24/2011 |
| 20110288484 | METHOD AND ASSOCIATED APPARATUS FOR COATING PROJECTIONS ON A PATCH ASSEMBLY A method of coating projections on a patch, the method including, selecting a coating solution viscosity, the viscosity being selected to reduce the degree of capillary action between the patch and the coating solution and immersing at least part of tips of projections ... | 11/24/2011 |
| 20110287631 | PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE A plasma processing apparatus and a method of manufacturing a semiconductor device which can prevent a discharge from occurring between a substrate such as a semiconductor wafer or the like, and a base material of a lower electrode or a peripheral structure of the base ... | 11/24/2011 |
| 20110274851 | Apparatus for producing polycrystalline silicon An apparatus for producing polycrystalline silicon in which raw gas including silicon compounds is introduced into a reactor, in which electric current is supplied to silicon seed rods in the reactor so as to heat the silicon seed rods, and in which polycrystalline sili... | 11/10/2011 |
| 20110259268 | METHOD FOR MEASURING DOPANT CONCENTRATION DURING PLASMA ION IMPLANTATION Embodiments of the invention generally provide apparatuses for endpoint detection of dopants. In one embodiment, the apparatus has a plasma chamber containing a body having sidewalls, a lid, and a bottom encompassing an interior volume and a substrate support assembly d... | 10/27/2011 |
| 20110239939 | STENT COATING APPARATUS USING FOCUSED ACOUSTIC ENERGY An apparatus for coating a stent includes an optical feedback system used to align a transducer with a stent strut. Once alignment is achieved, the transducer causes a coating to be ejected onto the stent strut and the transducer is moved along the stent strut to coat t... | 10/06/2011 |
| 20110240225 | TREATMENT APPARATUS FOR FLEXIBLE SUBSTRATE A position control device (21, 5) that controls a widthwise position of a flexible substrate 1 includes: a pair of upper nip rollers 21 (24, 25) that nip an upper edge portion of the flexible substrate, rotating shafts of the pair of upper ni... | 10/06/2011 |
| 20110236578 | PASTE APPLICATOR AND PASTE APPLYING METHOD According to one embodiment, a paste applicator includes a discharger, a driver, a detector, and a controller. The discharger discharges paste material toward a surface of an object to be applied. The driver relatively moves the object to be applied and the discharger a... | 09/29/2011 |
| 20110229627 | ELECTROSPRAY COATING OF OBJECTS Electrospray methods and systems for coating of objects (e.g., medical devices such as a stent structure) with selected types of coatings (e.g., open matrix coating and closed film coating)... | 09/22/2011 |
| 20110223346 | SPUTTERING DEVICE AND SPUTTERING METHOD A magnetic film having excellent uniformity in in-plane distribution of film thickness or sheet resistance is formed when the film is formed by forming a magnetic field on a processing surface of a substrate (21) and performing oblique incidence sputtering by usi... | 09/15/2011 |
| 20110209827 | AUTOMATIC MATCHING UNIT AND PLASMA PROCESSING APPARATUS In an automatic matching unit, a controller includes a first and a second matching algorithm. The operating point Zp is moved stepwise toward the matching point Zs with a relatively large pitch by using the first matching algorithm. Further, when t... | 09/01/2011 |
