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| Application No. | Application Title | Issue Date |
| 20110293915 | HIGH-PRESSURE DEVICE The invention relates to a high-pressure device for application of an expandable reaction mixture on a surface, to a method for producing expandable foams, to a device for producing sandwich composite elements, and to a method for producing expanded sandwich composite e... | 12/01/2011 |
| 20110135821 | METHODS OF AND APPARATUS FOR CONTROLLING PRESSURE IN MULTIPLE ZONES OF A PROCESS TOOL A method of and a multiple zone pressure controller system for controlling the pressure of a gas or vapor flowing to at least two zones of a process tool such as a vacuum deposition chamber. The system comprises: at least two channels configured and arranged so as to pr... | 06/09/2011 |
| 20110111136 | PRECURSOR VAPOR GENERATION AND DELIVERY SYSTEM WITH FILTERS AND FILTER MONITORING SYSTEM A vapor delivery system for supplying vapor to a chamber in a plasma-enhanced chemical vapor deposition (PECVD) system includes a vapor supply that supplies vapor by vaporizing at least one liquid precursor in a carrier gas. A first path includes a first filter that fil... | 05/12/2011 |
| 20110097492 | FLUID DISTRIBUTION MANIFOLD OPERATING STATE MANAGEMENT SYSTEM A fluid conveyance system for thin film material deposition is provided. A first fluid distribution manifold includes an output face that includes a plurality of elongated slots. The plurality of elongated slots include a source slot and an exhaust slot. A gas source is... | 04/28/2011 |
| 20110030616 | PRESSURE-ACTUATED MEMBER, IN PARTICULAR PAINT PRESSURE CONTROLLER OR COATING AGENT VALVE A pressure-actuated member, for example a paint pressure controller or a coating agent valve, for influencing a mean coating agent pressure of a coating agent to be applied in a painting system, is disclosed. An exemplary pressure-actuated member may comprise a componen... | 02/10/2011 |
| 20100294431 | EQUIPMENT FOR PRODUCING SEMICONDUCTORS, CORRESPONDING PUMPING DEVICE AND SUBSTRATE HOLDER The invention relates to a piece of equipment for producing semiconductors, comprising a process chamber (2), a substrate holder (5) for holding a substrate (6) for processing within said chamber (2) and a pumping device (4), comprisin... | 11/25/2010 |
| 20100279127 | Highly Viscous Material Coating Applicator The present invention provides a coating apparatus capable of coating an object with a highly viscous material at high precision in the applied amount of the highly viscous material and uniformity in the shape of the applied highly viscous material layer. The present in... | 11/04/2010 |
| 20100264117 | PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING METHOD A plasma processing system includes a plasma processing device for forming or etching the plurality of films and a gas source for supplying all gases required for forming or etching the plurality of films. Furthermore, gases required for forming or etching each of the p... | 10/21/2010 |
| 20100255181 | VAPOUR DELIVERY SYSTEM A delivery system (10) for delivering species (12) to a processing chamber (14), so as to coat the surface of a large item, thereby imparting specific properties thereto, comprises: a species container (16) for containing species supplied fro... | 10/07/2010 |
| 20100192854 | GAS SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTRUING FACILITIES A gas supply system includes a main gas supply line; a vent gas supply line; a plurality of gas supply mechanisms disposed in middle of both gas supply lines; a pressure type flow-rate control system disposed on an inlet side of the main gas supply line so a flow of car... | 08/05/2010 |
| 20100162952 | Substrate processing apparatus Disclosed is a substrate processing apparatus, including a reaction tube to process a substrate therein, wherein the reaction tube includes an outer tube, an inner tube disposed inside the outer tube, and a support section to support the inner tube, the inner tube and t... | 07/01/2010 |
| 20100130024 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS Provided are a method of manufacturing a semiconductor device and a substrate processing apparatus. The method includes: forming a first layer including a first element on a substrate by supplying a gas containing the first element; forming a second layer including firs... | 05/27/2010 |
| 20100086676 | Apparatus for Cleaning Magnetic Disks and Methods for Manufacturing Magnetic Disks A method, according to one embodiment, includes forming a lubricant film on a magnetic disk having at least a magnetic recording film above a substrate, and a protective film above the magnetic recording film, and wiping the lubricant film while rotating the substrate, ... | 04/08/2010 |
| 20100083898 | Substrate processing apparatus There are provided an inner tube in which a substrate is stored; an outer tube surrounding the inner tube; a gas nozzle disposed in the inner tube; a gas ejection hole opened on the gas nozzle; a gas supply unit supplying gas into the inner tube through the gas nozzle; ... | 04/08/2010 |
| 20100062158 | GAS SUPPLY METHOD AND GAS SUPPLY DEVICE A gas supply method supplies a source gas produced by heating and sublimating a solid source material in a source material container to a consuming area. The method includes the steps of: (a) flowing a carrier gas through a processing gas supply line and measuring a gas... | 03/11/2010 |
| 20100062182 | Method for Repairing Display Device and Apparatus for Same An object of the present invention is to provide a method for repairing a display device according to which a wide variety of regions can be repaired in various ways using various materials, as well as an apparatus for the same. The present invention provides a repairin... | 03/11/2010 |
| 20100029092 | Semiconductor Device Producing Method, Substrate Producing Method and Substrate Processing Apparatus A method is provided with a step of supplying a reacting furnace (200) with a plurality of gases which react each other and an inert gas and oxidizing a substrate (20) under an atmospheric pressure, and a step of carrying out the substrate (20) afte... | 02/04/2010 |
| 20100015333 | SPRAY COATING PROCESS WITH REDUCED GAS TURBULENCE A spray coating apparatus in which gas turbulence is reduced to provide a better controlled spray coating process. The spray coating apparatus comprises a coating chamber, a spray nozzle, and an article holder for holding the article to be coated. Waste gaseous material... | 01/21/2010 |
| 20100012027 | Device for injecting liquid precursors into a chamber in pulsed mode with measurement and control of the flowrate A device for injecting into a chamber at least one precursor comprises at least one tank containing the precursor, means for keeping the tank at a higher pressure than that of the chamber, and at least one injector connected to the tank. It also comprises a device for m... | 01/21/2010 |
| 20090142489 | LINEAR DEPOSITION SOURCES FOR DEPOSITION PROCESSES Linear deposition sources are disclosed. In one embodiment, the linear deposition source includes a container accommodating evaporation material and a heater configured to generate heat energy such that vaporized material is discharged uniformly onto a substrate on whic... | 06/04/2009 |
| 20080237919 | Method and apparatus for membrane deposition A method and apparatus for applying a uniform membrane coating to a substrate, such as a honeycomb structure, having a plurality of through-channels, wherein the through-channels have an average diameter of less than or equal to 3 mm. The method includes providing a liq... | 10/02/2008 |
| 20080230005 | Enclosures for and Installations Comprising Curing Means An openable enclosure for use in association with an enclosed work-area defining a workspace provided with application means for applying a curable composition such as a UV curable composition to a workpiece, the enclosure comprising an openable cover which is operable ... | 09/25/2008 |
| 20080149596 | Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber Apparatuses are provided for controlling flow conductance of plasma formed in a plasma processing apparatus that includes an upper electrode opposite a lower electrode to form a gap therebetween. The lower electrode is adapted to support a substrate and coupled to a RF ... | 06/26/2008 |
| 20080087218 | Board processing apparatus and method of fabricating semiconductor apparatus A board processing apparatus and a method of fabricating a semiconductor apparatus for reducing a pressure difference between a preparing chamber and a processing chamber and restraining a rapid flow of a gas caused by the pressure difference to thereby prevent a board ... | 04/17/2008 |
| 20080041305 | COATING DIE WITH EXPANSIBLE CHAMBER DEVICE The disclosure relates to an apparatus including a die having at least one applicator slot for translating an applicator liquid through the die. The slot is in flow communication with a die cavity. An expansible chamber device is disposed within the die cavity and chang... | 02/21/2008 |
| 20070275157 | Apparatus and method for measuring widthwise ejection uniformity of slit nozzle An apparatus for measuring withwise ejection uniformity of a slit nozzle comprises a plurality of oil pressure measuring units that are arranged in parallel in a widthwise direction of the slit nozzle so as to measure ejection pressure of fluid to be ejected from an eje... | 11/29/2007 |
| 20070269983 | Ald Apparatus and Method Improved apparatus and method for SMFD ALD include a method designed to enhance chemical utilization as well as an apparatus that implements lower conductance out of SMFD-ALD process chamber while maintaining full compatibility with standard wafer transport. Improved SM... | 11/22/2007 |
| 20070254092 | Systems and Methods for Detecting Abnormal Dispense of Semiconductor Process Fluids Systems and methods for monitoring a dispense of a semiconductor process liquid are provided. A motor is driven to dispense the semiconductor process liquid in accordance with a liquid delivery plan. The delivery plan corresponds to a reference profile. A signal profile... | 11/01/2007 |
| 20070237887 | Varnishing device and method for the application of varnish A varnishing device and a procedure for the application of varnish with such a varnishing device, wherein the varnishing device has a varnish repository, a dosing pump connected with the varnish repository, a varnish output device which is connected to the dosing pump v... | 10/11/2007 |
| 20070207260 | Coating plant and associated coating process The invention concerns a coating plant for the coating of construction units with a coating medium, in particular a paint system for the lacquer finish of motor vehicle body parts, with a dosing pump, the coating medium supplied with a certain delivery (Fm) p... | 09/06/2007 |
| 20070098901 | Method for forming thin film and film-forming device It is an object to provide a method for forming a thin film which can be uniformly and precisely planarized without a high-loaded process as in a chemical mechanical polishing method and to provide a device used for the method. In a method for forming a thin film on a s... | 05/03/2007 |
| 20070092657 | Spray booth The present application is directed to a spray booth comprising a first enclosure for applying spray material and a second enclosure for drying spray material. An exhaust system is in fluid connection with the first and second enclosures. A fire suppression system is in... | 04/26/2007 |
| 20070029060 | Method and apparatus for applying a material to a wide high-speed web A high-speed apparatus for applying material to cigarette paper during manufacture uses at least two independently operable, moving orifice devices, each positioned to deposit horizontal bands of material on a paper web at the dry end of a Fourdrinier wire. The resultin... | 02/08/2007 |
| 20060288931 | Method and apparatus for protecting innerliner splice of a green tire A method of creating an air barrier on both sides of an innerliner splice on the inside surface of a green tire when a bladder release lubricant is being applied thereto to prevent contamination of the splice. High pressure air is directed through air nozzles on both si... | 12/28/2006 |
| 20060272576 | Piping system structure of semiconductor equipment A piping system structure of semiconductor equipment comprises a vessel, a nozzle and a pneumatic pump. The pneumatic pump drains a fluid material in the vessel and transmits the fluid material to the nozzle to spray on the wafer. The piping system structure further com... | 12/07/2006 |
| 20060263513 | Fluid dispenser with positive displacement pump Fluid dispensing apparatus uses positive displacement of the fluid for accurate metering of the quantity of liquid applied to a surface. Positive displacement includes a metering volume that is filled and emptied so that each cycle corresponds to an accurate volume of m... | 11/23/2006 |
| 20060260541 | DEVICE FOR SPREADING VISCOUS THERMAL MEDIUM ON HEAT DISSIPATION DEVICE FOR ELECTRONIC COMPONENT A spreading device (10) includes an injector (14) and a spreading tube (16) connected with the injector. The injector contains therein a viscous thermal medium material for being spread on a surface of a cooling device for electronic components. The... | 11/23/2006 |
| 20060257581 | Spraying system for progressive spraying of non-rectangular objects A system and method for spray gun or nozzle control wherein the spray gun liquid discharge pattern is dynamically varied to correspond to the dimensions of a moving target object or a portion of the moving target. The spray gun includes inputs for fan air, atomizing air... | 11/16/2006 |
| 20060225648 | USE OF ENHANCED TURBOMOLECULAR PUMP FOR GAPFILL DEPOSITION USING HIGH FLOWS OF LOW-MASS FLUENT GAS High flows of low-mass fluent gases are used in an HDP-CVD process for gapfill deposition of a silicon oxide film. An enhanced turbomolecular pump that provides a large compression ratio for such low-mass fluent gases permits pressures to be maintained at relatively low... | 10/12/2006 |
| 20060177566 | Anodizing system with a coating thickness monitor and an anodized product An intelligent coating system for forming a product on at least a portion of a substrate is disclosed. The intelligent coating system includes a coating applicator, a thickness monitor, a multiple-axis device, and, optionally, at least one controller. The thickness moni... | 08/10/2006 |
