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Vladimir Zworykin, television pioneer ; Talking about an invention in which he played a critical role.
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| Application No. | Application Title | Issue Date |
| 20120040514 | CHEMICAL VAPOR DEPOSITION WITH ELEVATED TEMPERATURE GAS INJECTION A chemical vapor deposition reactor and method. Reactive gases, such as gases including a Group III metal source and a Group V metal source, are introduced into the chamber (10) of a rotating-disc reactor and directed downwardly onto a wafer carrier (32) a... | 02/16/2012 |
| 20110283939 | NON-INTRUSIVE, LOW CHATTER PRESSURE RELIEF VALVE SYSTEM A pressure relief system and a non-intrusive, low chatter pressure relief valve for use with such as system are disclosed. The pressure relief valve allows excess pressure in a pressurized fluid line to flow through a flow return line to a fluid reservoir when the fluid... | 11/24/2011 |
| 20110244115 | Extrusion Application System A machine and a method of applying a non-Newtonian liquid composition onto a surface in a controlled manner. The composition is held in a chamber at a controlled variable pressure and is dispensed through a slit die nozzle as controlled by a valve. Characteristics of th... | 10/06/2011 |
| 20110212256 | DEPOSITION RATE CONTROL An vapor deposition control system includes a multi-level control scheme.... | 09/01/2011 |
| 20110146571 | TEMPERATURE CONTROLLED SHOWERHEAD FOR HIGH TEMPERATURE OPERATIONS A temperature controlled showerhead assembly for chemical vapor deposition (CVD) chambers enhances heat dissipation to provide accurate temperature control of the showerhead face plate and maintain temperatures substantially lower than surrounding components. Heat dissi... | 06/23/2011 |
| 20110120370 | THIN-FILM SOLAR CELL MANUFACTURING APPARATUS A thin-film solar cell manufacturing apparatus includes a film forming chamber which stores a substrate; and an electrode unit which performs film formation using a CVD method on the substrate in the film forming chamber. The electrode unit has an anode and a cathode; a... | 05/26/2011 |
| 20110045195 | RESIST SOLUTION SUPPLY APPARATUS, RESIST SOLUTION SUPPLY METHOD, AND COMPUTER STORAGE MEDIUM A resist solution supply apparatus of the present invention includes: a resist solution supply source storing a resist solution therein; a supply tube for supplying the resist solution from the resist solution supply source to a coating nozzle; a filter provided in the ... | 02/24/2011 |
| 20110023779 | Variable Volume Plasma Processing Chamber and Associated Methods A plasma processing chamber includes a substrate support having a top surface defined to support a substrate in a substantially horizontal orientation within the chamber. The plasma processing chamber also includes a number of telescopic members disposed within the cham... | 02/03/2011 |
| 20110014379 | DEVELOPING APPARATUS, RESIST PATTERN FORMING METHOD AND STORAGE MEDIUM Provided is a developing apparatus configured to slim the resist pattern while reducing the number of developing modules. A room temperature developing liquid and a high temperature developing liquid to modify the surface layer of a resist pattern can be supplied from a... | 01/20/2011 |
| 20100285206 | METHOD AND APPARATUS Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of va... | 11/11/2010 |
| 20100285204 | Coating process for the coating of an interior of a pipework system as well as a sub-distributor and a working equipment for the treatment of a pipework system The invention relates to a coating process for the coating of an interior of a pipework system (1) with a coating material (541), preferably for the coating with an epoxy resin (541), which pipework system (1) includes a part-system (2, 21... | 11/11/2010 |
| 20100206226 | TISSUE PIECE TREATING APPARATUS Provided is a tissue piece treating apparatus comprising an automatic controlling means for feeding back the temperature of the treatment liquid or molten paraffin in the bath inside detected by a temperature sensor to switch a heating mode and a cooling mode alternatel... | 08/19/2010 |
| 20100203230 | Hot Melt Adhesive System And Method Using Machine Readable Information A hot melt adhesive system includes a melting unit configured to liquefy a bulk form of hot melt adhesive and deliver the liquefied hot melt adhesive to an application location. The melting unit includes a controller for establishing and/or verifying at least one system... | 08/12/2010 |
| 20100171198 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, SEMICONDUCTOR MANUFACTURING APPARATUS AND STORAGE MEDIUM A method for manufacturing a semiconductor device includes steps of:(a) forming a thin film containing a phenyl group and silicon on a substrate while obtaining a plasma by activating an organic silane gas containing a phenyl group and silicon and nitrogen as not origin... | 07/08/2010 |
| 20100136232 | CURING OF POLYMER COMPOSITES There is provided an apparatus (2) for the forming or curing of a fibre-reinforced polymer composite material (10). The apparatus (2) comprises a first layer of material (4) positioned to overly the fibre-reinforced polymer (10); a sec... | 06/03/2010 |
| 20100126417 | DEPOSITION SOURCE UNIT, DEPOSITION APPARATUS AND TEMPERATURE CONTROLLER OF DEPOSITION SOURCE UNIT A deposition apparatus includes a deposition source unit, a transport mechanism for transporting a vaporized film forming material and a blowing device for blowing off the transported film forming material. The deposition source unit includes a vapor deposition source a... | 05/27/2010 |
| 20100119710 | Patterning apparatus and method using dip-pen nanolithography An apparatus and a method according to example embodiments is capable of patterning ink on a substrate by using dip-pen nanolithography regardless of the interaction between the ink and the substrate. The patterning apparatus may includes a heat supply control device. T... | 05/13/2010 |
| 20100107977 | FILM FORMING APPARATUS A film-forming apparatus of the invention is a film-forming apparatus that includes: a processing container that defines a chamber, a pedestal arranged in the chamber, on which a substrate to be processed can be placed, a showerhead provided opposite to the pedestal, wh... | 05/06/2010 |
| 20100092665 | EVAPORATING APPARATUS, APPARATUS FOR CONTROLLING EVAPORATING APPARATUS, METHOD FOR CONTROLLING EVAPORATING APPARATUS AND METHOD FOR USING EVAPORATING APPARATUS An evaporating apparatus includes a first processing chamber and a second processing chamber, and a blowing device accommodated in the first processing chamber and a vapor deposition source accommodated in the second processing chamber are connected with each other via ... | 04/15/2010 |
| 20100028534 | EVAPORATION UNIT, EVAPORATION METHOD, CONTROLLER FOR EVAPORATION UNIT AND THE FILM FORMING APPARATUS In order to increase temperature controllability of a material container, an evaporation unit for forming a film includes a material supply mechanism having a material container, an outer case having a hollow interior in which the material supply mechanism is detachably... | 02/04/2010 |
| 20090305509 | Showerhead electrode assemblies for plasma processing apparatuses Showerhead electrode assemblies are disclosed, which include a showerhead electrode adapted to be mounted in an interior of a vacuum chamber; an optional backing plate attached to the showerhead electrode; a thermal control plate attached to the backing plate or to the ... | 12/10/2009 |
| 20090304906 | EVAPORATING APPARATUS, APPARATUS FOR CONTROLLING EVAPORATING APPARATUS, METHOD FOR CONTROLLING EVAPORATING APPARATUS, METHOD FOR USING EVAPORATING APPARATUS AND METHOD FOR MANUFACTURING BLOWING PORT An evaporating apparatus 10 includes a vapor deposition source 210, a transport path 110e21, a blowing vessel 110 and a first processing chamber 100. The transport path 110e21 is connected with the va... | 12/10/2009 |
| 20090293807 | Apparatus for filtration and gas-vapor mixing in thin film deposition An apparatus removes particles from a gas/vapor mixture while at the same time improves the uniformity of gas/vapor mixture to create a more uniformly-mixed mixture stream for thin film deposition and semiconductor device fabrication.... | 12/03/2009 |
| 20090277383 | ADHESIVE DISPENSER WITH TEMPERATURE CONTROLLER An exemplary adhesive dispenser includes a container configured for supplying an adhesive, a plurality of nozzles configured for dispensing the adhesive, and a temperature controller connected between the container and the nozzles. The temperature controller has a chamb... | 11/12/2009 |
| 20090255465 | THERMAL CONTROL OF DEPOSITION IN DIP PEN NANOLITHOGRAPHY The present invention describes an apparatus for nanolithography and a process for thermally controlling the deposition of a solid organic “ink” from the tip of an atomic force microscope to a substrate. The invention may be used to turn deposition of the ink to the... | 10/15/2009 |
| 20090246397 | RESIST SOLUTION SUPPLY APPARATUS, RESIST SOLUTION SUPPLY METHOD, AND COMPUTER STORAGE MEDIUM The present invention is a resist solution supply apparatus for supplying a resist solution to a coating nozzle for discharging the resist solution to a substrate, including: a resist solution supply source storing the resist solution therein; a supply tube for supplyin... | 10/01/2009 |
| 20090183677 | TEMPERATURE CONTROL DEVICE AND PROCESSING APPARATUS USING THE SAME Provided are a temperature control device capable of performing a temperature control of, e.g., a chamber wall of a processing apparatus with a high precision; and a processing apparatus using the same. The temperature control device 50 includes a plurality of he... | 07/23/2009 |
| 20090170252 | Formation method of metallic compound layer, manufacturing method of semiconductor device, and formation apparatus for metallic compound layer A formation method of a metallic compound layer includes preparing, in a chamber, a substrate having a surface on which a semiconductor material of silicon, germanium, or silicon germanium is exposed, and forming a metallic compound layer, includes: supplying a raw mate... | 07/02/2009 |
| 20080206949 | APPARATUS FOR FORMING CONDUCTOR, METHOD FOR FORMING CONDUCTOR, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE A conductor forming apparatus includes a reaction container having housed therein a processing target on a surface of which a recess in which a conductor is to be provided is formed, and a process for providing the conductor in the recess being carried out inside the co... | 08/28/2008 |
| 20080110398 | Thermo-stable coating die design method and apparatus A method of designing and the resulting thermally stable heated coating die apparatus, the die apparatus including a die having a die geometry and a heating system with heaters and temperature sensors. The method and resultant apparatus provides minimized temperature gr... | 05/15/2008 |
| 20080026589 | Electrode for plasma processes and method for manufacture and use thereof A silicon electrode for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out and a method of processing a semiconductor substrate with the electrode. The electrode is a low resistivity electrode having an el... | 01/31/2008 |
| 20070275157 | Apparatus and method for measuring widthwise ejection uniformity of slit nozzle An apparatus for measuring withwise ejection uniformity of a slit nozzle comprises a plurality of oil pressure measuring units that are arranged in parallel in a widthwise direction of the slit nozzle so as to measure ejection pressure of fluid to be ejected from an eje... | 11/29/2007 |
| 20070269983 | Ald Apparatus and Method Improved apparatus and method for SMFD ALD include a method designed to enhance chemical utilization as well as an apparatus that implements lower conductance out of SMFD-ALD process chamber while maintaining full compatibility with standard wafer transport. Improved SM... | 11/22/2007 |
| 20070254092 | Systems and Methods for Detecting Abnormal Dispense of Semiconductor Process Fluids Systems and methods for monitoring a dispense of a semiconductor process liquid are provided. A motor is driven to dispense the semiconductor process liquid in accordance with a liquid delivery plan. The delivery plan corresponds to a reference profile. A signal profile... | 11/01/2007 |
| 20070221127 | Bubbler for Constant Vapor Delivery of a Solid Chemical A bubbler chamber assembly comprising one chamber or two or more chambers connected in series, all chambers being in substantially vertical orientation. A solid or liquid source of the compound is contained in the chamber or chambers. The ratio between the length of the... | 09/27/2007 |
| 20060260543 | Droplet discharge method, droplet discharge apparatus, manufacturing method for liquid crystal device, liquid crystal device, and electronic apparatus A droplet discharge method for discharging a liquid material from a discharge device and arranging the liquid material in a specified quantity on a substrate, the discharge device includes a nozzle for discharging the liquid material in droplets, and the droplet dischar... | 11/23/2006 |
| 20060124853 | NON-CONTACT SURFACE COATING MONITOR AND METHOD OF USE A non-contact surface coating monitor for a surface, including a plurality of temperature sensors coupled to a display. The plurality of temperature sensors arrayed to each sense the temperature of a zone of the surface. An out of range temperature differential between ... | 06/15/2006 |
| 20060040057 | Thermal control of deposition in dip pen nanolithography The present invention describes an apparatus for nanolithography and a process for thermally controlling the deposition of a solid organic “ink” from the tip of an atomic force microscope to a substrate. The invention may be used to turn deposition of the ink to the... | 02/23/2006 |
| 20050158477 | Deposition apparatus and a deposition method using medium in a supercritical state A deposition apparatus for supplying a process medium including a medium in a supercritical state and a precursor to a processed substrate so that the processed substrate is deposited on, includes a process vessel, a support stand which is provided in the process vessel... | 07/21/2005 |
| 20050155546 | Application device An applicator device and method where on the one hand adherence of particles in the dispensing area of the applicator nozzle, and on the other hand a thermal deflection of applicator device components can be prevented, or at least minimized. At least one thermal control... | 07/21/2005 |
