Bizarre Patents
A kissing shield comprised of a thin, flexible membrane and a frame or holder.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Application No. | Application Title | Issue Date |
| 20120128890 | METHOD FOR CURING SUBSTANCES BY UV RADIATION, DEVICE FOR CARRYING OUT SAID METHOD AND INK CURED BY UV RADIATION The proposed method of substance curing by radiation, received from the UV LEDs, the device designed to implement this method, and ink cured by radiation from UV LEDs.... | 05/24/2012 |
| 20110305831 | Method for chemical vapor deposition control A method of depositing a thin film on a substrate in a deposition system is described. The method includes disposing a gas heating device comprising a plurality of heating element zones in a deposition system, and independently controlling a temperature of each of the p... | 12/15/2011 |
| 20110303145 | Apparatus for chemical vapor deposition control A gas heating device and a processing system for use therein are described for depositing a thin film on a substrate using a vapor deposition process. The gas heating device includes a heating element array having a plurality of heating element zones configured to recei... | 12/15/2011 |
| 20110297083 | Laser cladding of tubes The present invention relates to an apparatus for laser cladding of a curved surface comprising: (a) an elongated arm having first and second ends and defining a chamber through the arm from the first end to the second end; (b) a laser delivery source connected to a foc... | 12/08/2011 |
| 20110293831 | LINEAR BATCH CHEMICAL VAPOR DEPOSITION SYSTEM Described is a linear batch CVD system that includes a deposition chamber, one or more substrate carriers, gas injectors and a heating system. Each substrate carrier is disposed in the deposition chamber and has at least one receptacle configured to receive a substrate.... | 12/01/2011 |
| 20110253044 | SHOWERHEAD ASSEMBLY WITH METROLOGY PORT PURGE A method and apparatus that may be utilized for chemical vapor deposition and/or hydride vapor phase epitaxial (HVPE) deposition are provided. In one embodiment, the apparatus is a processing chamber that includes a showerhead with separate inlets and channels for deliv... | 10/20/2011 |
| 20110244136 | Roll Coater A roll coater with a recirculation loop is disclosed. Waste coating material form the roll coater is treated in an agitator unit containing, for example, one or more ultrasonic transducers, and optionally a filtration unit and/or temperature control unit to produce reco... | 10/06/2011 |
| 20110226418 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE In a dry cleaning process, breakage of a gas supply pipe can be prevented, and maintenance efficiency can be increased. There is provided a substrate processing apparatus comprising: a process chamber configured to process a substrate; a heater configured to heat an ins... | 09/22/2011 |
| 20110217486 | METHOD FOR PROCESSING A CHEMICAL VAPOR DEPOSITION (CVD) AND A CVD DEVICE USING THE SAME A method for CVD processing, comprises the steps of: fixing both ends of a silicon substrate to a pair of electrode mounts; lowering a resistance value of the silicon substrate by raising temperature of the silicon substrate with heat from an outer heater provided outsi... | 09/08/2011 |
| 20110195184 | SUBSTRATE PROTECTION DEVICE AND METHOD A protection device is adapted for protecting substrates within a process chamber against deposition material generated by a deposition source. The protection device includes a plate adapted for facing the substrate at a side opposing the deposition source and a mesh di... | 08/11/2011 |
| 20110185969 | DUAL HEATING FOR PRECISE WAFER TEMPERATURE CONTROL An improved method of heating a workpiece positioned on a susceptor is disclosed. The method using both primary heating, such as by resistive or inductive heating elements, and localized secondary heating, such as by heating lamps. The primary heating system is used to ... | 08/04/2011 |
| 20110186545 | FEEDFORWARD TEMPERATURE CONTROL FOR PLASMA PROCESSING APPARATUS Methods and systems for controlling temperatures in plasma processing chamber with reduced controller response times and increased stability. Temperature control is based at least in part on a feedforward control signal derived from a plasma power input into the process... | 08/04/2011 |
| 20110168673 | PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND MECHANISM FOR REGULATING TEMPERATURE OF DIELECTRIC WINDOW Provided are a plasma processing apparatus, a plasma processing method, and a mechanism for regulating a temperature of a dielectric window, which can achieve a better plasma processing characteristic by more precisely controlling the temperature of the dielectric windo... | 07/14/2011 |
| 20110156045 | CRYSTAL MANUFACTURING APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURED USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME A crystal manufacturing apparatus capable of manufacturing a crystal in a desired position on a substrate is provided. A spring has one end fixed to a mount and the other end coupled to a magnetic body. The magnetic body has one end coupled to the spring and the other e... | 06/30/2011 |
| 20110147935 | METHOD AND SYSTEM FOR BINDING HALIDE-BASED CONTAMINANTS A method and apparatus are presented for reducing halide-based contamination within deposited titanium-based thin films. Halide adsorbing materials are utilized within the deposition chamber to remove halides, such as chlorine and chlorides, during the deposition proces... | 06/23/2011 |
| 20110139070 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE A stable and highly reliable device for detecting damage or contact failures of respective parts is provided. The device includes a processing chamber for processing a substrate; a heater for heating the substrate; a substrate support accommodating the heater and instal... | 06/16/2011 |
| 20110135842 | METHOD AND SYSTEM FOR PERFORMING DIFFERENT DEPOSITION PROCESSES WITHIN A SINGLE CHAMBER A method and system for plasma-assisted thin film vapor deposition on a substrate is described. The system includes a process chamber including a first process space having a first volume, a substrate stage coupled to the process chamber and configured to support a subs... | 06/09/2011 |
| 20110091649 | Method and apparatus for counting particles in a gas The present disclosure describes a method and apparatus for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas... | 04/21/2011 |
| 20110065286 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS At a low temperature of 500° C. to 700° C., the concentration of atomic oxygen is controlled in a wafer stacked direction, and the thickness distribution of oxide films is kept uniform in the wafer stacked direction. A semiconductor device manufacturing method include... | 03/17/2011 |
| 20110059248 | COATING METHOD AND COATING APPARATUS A coating method including coating a liquid material including an oxidizable metal on a substrate, and heating the substrate having the liquid material coated thereon in the presence of an inert gas.... | 03/10/2011 |
| 20110030614 | WET COATING SYSTEM HAVING ANNEALING CHAMBER An exemplary wet coating system includes a coating chamber, an annealing chamber, an unloading chamber, and a mechanical arm. The coating chamber is configured for allowing a substrate being wet coated therein. The unloading chamber is configured for allowing the substr... | 02/10/2011 |
| 20110030615 | METHOD AND APPARATUS FOR DRY CLEANING A COOLED SHOWERHEAD The present invention generally provides a method and apparatus for cleaning a showerhead of a deposition chamber, such as a metal organic chemical vapor deposition (MOCVD) chamber. In one embodiment, the showerhead is cleaned without exposing the chamber to the atmosph... | 02/10/2011 |
| 20110023778 | Method and Apparatus for Improving the Efficiency of Purification and Deposition of Polycrystalline Silicon Methods and apparatus for the commercial-scale production of purified polycrystalline silicon granules with one or more tailored levels of n- and p-type impurities from an impure silicon source such as, for example, metallurgical-grade silicon. Purification systems and ... | 02/03/2011 |
| 20110014468 | Polycrystalline silicon producing method, apparatus for producing polycrystalline silicon, and polycrystalline silicon A polycrystalline silicon producing method includes: the first process and the second process. In the first process, a surface temperature is maintained at a predetermined range by adjusting the current value to the silicon seed rod, and the raw material gas is supplied... | 01/20/2011 |
| 20110008540 | CANISTER FOR DEPOSITION APPARATUS, AND DEPOSITION APPARATUS AND METHOD USING THE SAME A deposition apparatus, and a canister for the deposition apparatus capable of maintaining a predetermined amount of source material contained in a reactive gas supplied to a deposition chamber when the source material is deposited on a substrate by atomic layer deposit... | 01/13/2011 |
| 20100330709 | WAFER TEMPERATURE CORRECTION SYSTEM FOR ION IMPLANTATION DEVICE To provide an ion implantation device capable of correcting the temperature of the wafer. The ion implantation device of the present invention has: an irradiation means that radiates ions; a retention means that includes a disk 112 that retains at least one wafer... | 12/30/2010 |
| 20100330298 | Fabrication Of Ferroelectric Ceramic Films Using Rapid Thermal Processing With Ultra-Violet Rays A method for fabricating a ferroelectric ceramic film. The method includes coating a gel film on a substrate. The gel film has at least one ferroelectric material and at least one ultra-violet (UV) sensitive material. The method further includes simultaneously heating t... | 12/30/2010 |
| 20100316800 | MULTI-STATION DEPOSITION APPARATUS AND METHOD A multi-station deposition apparatus capable of simultaneous processing multiple substrates using a plurality of stations, where a gas curtain separates the stations. The apparatus further comprises a multi-station platen that supports a plurality of wafers and rotates ... | 12/16/2010 |
| 20100282163 | THERMOCOUPLE ASSEMBLY WITH GUARDED THERMOCOUPLE JUNCTION An improved thermocouple assembly for providing a temperature measurement is provided. The thermocouple assembly includes a sheath having a measuring tip, a support member received within the sheath, and first and second wires disposed within the support member. An end ... | 11/11/2010 |
| 20100283032 | METHOD FOR FORMING A SEMIDCONDUCTOR STRUCTURE Method for Forming a Semiconductor Structure A method and apparatus for applying a carrier fluid (101,602,1101) to a substrate (102), the carrier fluid carrying nanoparticles (201,202), manipulating the positions of a plurality of the nanoparticles ... | 11/11/2010 |
| 20100255182 | MARKING APPARATUS HAVING OPERATIONAL SENSORS FOR UNDERGROUND FACILITY MARKING OPERATIONS, AND ASSOCIATED METHODS AND SYSTEMS Methods, apparatus and systems for performing a marking operation to mark a presence or absence of at least one underground facility using a marking device. Marking material is dispensed onto a target surface via actuation of an actuation system of the marking device. A... | 10/07/2010 |
| 20100245086 | MARKING APPARATUS CONFIGURED TO DETECT OUT-OF-TOLERANCE CONDITIONS IN CONNECTION WITH UNDERGROUND FACILITY MARKING OPERATIONS, AND ASSOCIATED METHODS AND SYSTEMS Methods, apparatus, and systems for facilitating a marking operation to indicate a presence or an absence of at least one underground facility. Marking information, including one or both of environmental information representative of at least one environmental condition... | 09/30/2010 |
| 20100247754 | METHODS AND APPARATUS FOR DISPENSING MARKING MATERIAL IN CONNECTION WITH UNDERGROUND FACILITY MARKING OPERATIONS BASED ON ENVIRONMENTAL INFORMATION AND/OR OPERATIONAL INFORMATION Methods, apparatus, and systems for facilitating a marking operation to indicate a presence or an absence of at least one underground facility. Marking information relating to the marking operations, including one or both of environmental information representative of a... | 09/30/2010 |
| 20100248396 | HEAT TREATMENT APPARATUS AND CONTROL METHOD THEREFOR A heat treatment apparatus includes a processing chamber having a gate valve at a sidewall and a cover at a ceiling via a sealing member; a gate valve heating unit provided at the gate valve; a processing chamber heating unit provided at a sidewall of the processing cha... | 09/30/2010 |
| 20100247759 | COATING METHOD, COATER, AND METHOD FOR MANUFACTURING PLANOGRAPHIC PRINTING PLATE A coating method of forming a plurality of layers on a belt-like support continuously traveling, comprising:
| 09/30/2010 |
| 20100240223 | METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE A method for manufacturing a semiconductor device, comprising: loading a wafer to be subjected to film formation to a chamber; supporting the wafer to be spaced from a film formation position of the wafer; preliminarily heating the wafer while rotating a rotating member... | 09/23/2010 |
| 20100209852 | TRACK NOZZLE SYSTEM FOR SEMICONDUCTOR FABRICATION The present disclosure provides a method for fabricating a semiconductor device using a track pipeline system. The method includes storing a plurality of chemicals in a plurality of storage units of the system, wherein each storage unit is operable to store one of the c... | 08/19/2010 |
| 20100189897 | HIGH TEMPERATURE EVAPORATOR CELL HAVING PARALLEL-CONNECTED HEATING ZONES An evaporator cell (100), which is adapted for evaporating, in particular, a high-melting evaporant, includes a crucible (10) for receiving the evaporant, said crucible including a crucible bottom (11), a side wall (12) which extends in an ax... | 07/29/2010 |
| 20100170435 | DEVICE FOR THE TEMPERATURE CONTROL OF THE SURFACE TEMPERATURES OF SUBSTRATES IN A CVD REACTOR The invention relates to a CVD reactor having a plurality of rotary tables (2) supported on a rotationally driven susceptor (1) on dynamic gas cushions (3), wherein each gas cushion (3) is formed by an individually controlled gas flow and eac... | 07/08/2010 |
| 20100144161 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING APPARATUS A semiconductor device manufacturing method and a substrate processing apparatus are provided to reduce contaminants generating due to striping of an oxide film formed on a silicon carbide member. The manufacturing method includes: loading a substrate into a silicon car... | 06/10/2010 |
