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Patent No. 5678617

Method and apparatus for making a drink hop along a bar or counter

A method for generating a drink which appears to hop from a remote spot on the bar or counter and take one or more leaps, before landing in a patron's glass.

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Class 106/3 - Polishes


Subclass of Class 106 - Compositions: coating or plastic
Definition: Coating or plastic compositions, known as polishes, specially
No. of applications: 62
Last issue date: 03/01/2012


1    
Application No.Application TitleIssue Date
20120052195ANTI-CORROSIVE PACKAGE
The invention provides an anti-corrosive package which can be added to release agents used in preparing textiles and molded articles from lignocellulosic materials, concrete and polyurethane foam.... 		03/01/2012
20120053252FLUORINATED ETHOXYLATED POLYURETHANES
The present invention comprises fluorinated ethoxylated polyurethanes of formula [Rf—(X)n—(CH2CHR1—O)m—CH2CH2—O—C(O)—NH]p-A, wherein Rf is a C1 to... 		03/01/2012
20110257068ULTRASONIC TREATMENT CHAMBER FOR PREPARING EMULSIONS
An ultrasonic mixing system having a treatment chamber in which at least two separate phases can be mixed to prepare an emulsion is disclosed. Specifically, at least one phase is a dispersed phase and one phase in a continuous phase. The treatment chamber has an elongat... 		10/20/2011
20110201505MIXTURES COMPRISING HYDROLYSIS RESISTANT ORGANOMODIFIED DISILOXANE IONIC SURFACTANTS
An asymmetric organomodified disiloxane surfactant having the formula: MM′ wherein M comprises branched hydrocarbon substituents and M′ comprises a cationic, anionic or zwitterionic substituent and a polyether substituent that may be combined as one moiety, wherein ... 		08/18/2011
20100267843MIXED FLUOROALKYL-ALKYL SURFACTANTS
A surfactant of formula 1


(Rf-A)a-Q-([B]k—R)b  Formula 1

wherein

  • 10/21/2010
20100152077Process for Solvent Shifting a Nanoparticle Dispersion
A process for replacing the continuous phase of a nanoparticle dispersion with a less polar phase, includes filtering the dispersion through a semi-permeable membrane filter to remove the continuous phase, and introducing a less polar phase.... 		06/17/2010
20100069279HOME CARE COMPOSITIONS COMPRISING HYDROLYSIS RESISTANT ORGANOMODIFIED DISILOXANE SURFACTANTS
Compositions comprising disiloxane surfactant compositions comprising a silicone composition comprising a silicone having the formula:


MM′


03/18/2010
20100047189AZEOTROPE-LIKE COMPOSITIONS OF 1,1,1,2-TETRAFLUOROPROPENE AND 1,1,1,2-TETRAFLUOROETHANE
Provided are azeotrope-like compositions consisting essentially of 1,1,1,2-tetrafluoropropene and 1,1,1,2-tetrafluoroethane and uses thereof, including use in refrigerant compositions, refrigeration systems, blowing agent compositions, and aerosol propellants.... 		02/25/2010
20090286885Ethylene-tetrafluoroethylene phosphate composition
A composition comprising a compound of formula (I) or (II):


(A)w-P(O)(O−M+)3-w   (I) or

w...

11/19/2009
20090274757PHARMACEUTICAL POLISH FORMULATIONS
Polish compositions for coating pharmaceutical solid dosage forms such as tablets are disclosed. The polish composition comprises water, coating agent, and a film forming agent. Polished pharmaceutical solid dosage forms such as tablets comprising a polished exterior su... 		11/05/2009
20090211486Use of solvents derived from renewable resources, paints and coating including them, method for preparing them
The invention relates to application of solvent(s) to a product including at least one binder, wherein the product is a paint or coating formulation and the solvent is a compound of renewable vegetable origin, notably agricultural origin. It also relates to a paint or c... 		08/27/2009
20090209103BARRIER SLURRY COMPOSITIONS AND BARRIER CMP METHODS
A new barrier slurry composition enables metal and barrier layer material (as well as cap layer material, if necessary) to be removed at a practical rate whilst eliminating, or significantly reducing, the removal of underlying low-k or ultra-low-k dielectric material. T... 		08/20/2009
20090191325SURFACE ACTIVE INGREDIENT COMPOSITION
The invention provides a surface active ingredient composition, which includes a base liquid including water which has dispersed therein in percentages by volume:

07/30/2009
20090176685CORROSION INHIBITING COMPOSITIONS
Corrosion inhibiting composition for use in aqueous or semi-aqueous stripping, cleaning, abrasive lapping and abrasive slurry compositions that form 5, 6, 7, or 8-membered chelating rings with a base metal together with a film forming polymeric chelation agent. Optional... 		07/09/2009
20090162308USE OF 2,4'-DIMETHYLPROPIOPHENONE AS A FRAGRANCE SUBSTANCE
The use of 2,4′-dimethylpropiophenone as a fragrance substance is described, preferably as a fragrance substance for imparting, modifying and/or reinforcing one, two, three or all the odor notes floral, rosy, rose oxide-like and herbal-like, preferably both of the odo... 		06/25/2009
20090114117Leveling agent and water-based floor-polishing composition comprising the leveling agent
A leveling agent for water-based floor polishes which contains a nonionic surfactant, characterized in that the nonionic surfactant is at least one member selected from the group consisting of compounds represented by the general formula (1): R1—C(R2		05/07/2009
20090092556AZEOTROPE-LIKE COMPOSITIONS OF DIFLUOROMETHANE AND TRIFLUOROIODOMETHANE
Provided are azeotrope-like compositions comprising difluoromethane and trifluoroiodomethane and uses thereof, including use in refrigerant compositions, refrigeration systems, blowing agent compositions, and aerosol propellants.... 		04/09/2009
20090042996Mixed fluoroalkyl-alkyl surfactants
A surfactant of formula 1


(Rf-A)a-Q-([B]k—R)b  Formula 1

wherein

  • 02/12/2009
20090042997FLUOROALKYL ACID AMIDE SURFACTANTS
Compounds of formula (I) and formula (III):

wherein

    • A is ...
02/12/2009
20090038504POLISHING SLURRY FOR IONIC MATERIALS
A polishing slurry is disclosed, which is to be used for polishing an ionic material, the polishing slurry including a dispersant which is to form a nonionic adsorbing layer on a surface of the ionic material. The dispersant may be selected by separately preparing first... 		02/12/2009
20080032505POLISHING COMPOSITION AND POLISHING PROCESS
To provide a polishing composition particularly useful for an application to polish a conductor layer made of copper in a semiconductor wiring process, and a polishing process employing it.

A polishing composition comprising an anionic sur...

02/07/2008
20070289481Leveling Agent for Floor Polish and Aqueous Floor Polish Composition
A floor-polish leveling agent containing an ester compound obtained by reacting a hydroxycarboxylic acid with at least one glycol ether so that substantially all of the carboxyl groups are esterified. The ester compound may be an acetylated ester compound in which one o... 		12/20/2007
20070277697PRODUCT FOR TREATING VEHICLE SURFACES
A product for treating the surfaces of vehicles comprising a silanol-containing composition used to enhance gloss and aid in protecting substrates. More particularly, a product for treating vehicles comprising silanols and catalysts that cure to form a durable coating w... 		12/06/2007
20070248821Enameling Varnish Composition, in Particular for Magnet Wire
The present invention relates to an enameling varnish composition, in particular for magnet wire. The invention is remarkable in that the enameling varnish composition comprises a polymer resin and an alkyl lactate, and in that the polymer resin is selected from the gro... 		10/25/2007
20070186486POLISHING COMPOSITION AND RINSE COMPOSITION
A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide. ... 		08/16/2007
20070163463Interior protectant/cleaner composition
The present invention provides a liquid protectant composition composed of a cationic microemulsion of a natural wax (camauba wax) nanometer sized particles and zinc oxide nanometer sized particles in combination with a quaternary siloxane compound. The protectant compo... 		07/19/2007
20070056465Rapid generation of nanoparticles from bulk solids at room temperature
A plurality of nanoparticles are provided. The nanoparticles may have a metal oxide or a semiconductor oxide surface region and a metal or semiconductor core region and/or the nanoparticles may be uniformly doped. The nanoparticles are formed by grinding a bulk material... 		03/15/2007
20070039926Abrasive-free polishing system
The invention provides a chemical-mechanical polishing system comprising a water-soluble silicate compound, an oxidizing agent that oxidizes at least a part of a substrate, water, and a polishing pad, wherein the polishing system is substantially free of abrasive partic... 		02/22/2007
20060283094Polishing compound
A cleaning and polishing composition contains mineral spirits, a first abrasive component of particles having a median size in a range of 1-4 microns, a second abrasive component of particles having a median size in a range of 15-30 microns and a fatty acid. The composi... 		12/21/2006
20060236615Compositions and methods for removing scratches from plastic surfaces
A composition including an abrasive, a suspension agent, a surfactant, and a lubricant, is provided for removing scratches, hazing, discoloration, and other defects from plastic surfaces. The composition is applied to a plastic surface and used to polish the surface. Th... 		10/26/2006
20060201378Multi-formulated composition and method for pretreatment, resurfacing, and restoration of plastic material
A multi-component kit and method is provided to restore a plastic material, and in particular, the plastic lens covers over the headlights and taillights of an automobile. The multi-component kit includes a pretreatment formulation, a resurfacing formulation, and a rest... 		09/14/2006
20060150526Cerium oxide particles and process for the production therefor
The production method for cerium oxide particles of the present invention is a method of producing a cerium oxide particle by heating a cerium compound from a normal temperature to a temperature range of 400° C. to 1200° C., and comprises at least a temperature raisin... 		07/13/2006
20060150860Alkali-resistant cocoon-shaped colloidal silica particle and process for producing the same
The invention provides a highly alkali resistant colloidal silica while retaining an excellent cocoon-shape and excellent performance as abrasive particles, and a process for the manufacture thereof. It is a cocoon-shaped colloidal silica prepared by hydrolyzing and con... 		07/13/2006
20060143993Slurry compositions for use in chemical mechanical polishing and method of manufacturing semiconductor device using the same
Slurry compositions and method used in a chemical-mechanical polishing process for manufacturing a semiconductor device may include a surfactant and a positive-ionic high molecular compound. The surfactant and the positive-ionic high molecular compound may form first an... 		07/06/2006
20060124592Chemical mechanical polish slurry
Relatively large oxide particles formed during the CMP process can scratch a conductive material being polished. An interference agent is added the polishing slurry, which results in significant reduction in scratching of the conductive material by interfering with the ... 		06/15/2006
20060123709Abrasive enhancing composition
An abrasive enhancing composition that contains water, a polymeric thickening ingredient, and neutralizing agent, as well as a method for its manufacture. Additionally, the composition can also include color, fragrances, lubricants, preservatives, and/or bactericides. I... 		06/15/2006
20060124026Polishing solutions
A polishing solution containing two different organic acids is described. The first organic acid is a multifunctional amino acid. The second organic acid is selected from a simple carboxylic acid, a hydroxy-carboxylic acid, and combinations thereof. The simple carboxyli... 		06/15/2006
20060124594Chemical mechanical polishing (CMP) slurries and CMP methods using and making the same
In one aspect, a chemical-mechanical-polishing (CMP) slurry composition is provided which includes ceria abrasive contained in a solution, where the solution includes a viscosity increasing agent which includes a non-ionic polymer compound, and where a viscosity of the ... 		06/15/2006
20060124593Colloidal silica based chemical mechanical polishing slurry
A composition for chemical mechanical polishing a surface of a substrate having a plurality of ultra high purity sol gel processed colloidal silica particles for chemical mechanical polishing having alkali metals Li, Na, K, Rb, Cs, Fr and a combination thereof, at a tot... 		06/15/2006
20060096496CMP composition comprising surfactant
The invention provides a polishing composition comprising fumed alumina, alpha alumina, silica, a nonionic surfactant, a metal chelating organic acid, and a liquid carrier. The invention further provides a method of chemically-mechanically polishing a substrate comprisi... 		05/11/2006
 
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