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| Number | Title | Issue Date |
| 7418734 | Method and system for detecting privilege escalation vulnerabilities in source code A method and system of detecting vulnerabilities in source code. Source code is parsed into an intermediate representation. Models are derived for the code and the models are then analyzed in conjunction with pre-specified rules about the routines to determine if th... | 08/26/2008 |
| 7356377 | System, method, and medium for monitoring performance of an advanced process control system A method for monitoring performance of an advanced process control system for at least one process output includes calculating a variance of a prediction error for a processing performance and/or a probability for violating specification limits of the processing per... | 04/08/2008 |
| 7349753 | Adjusting manufacturing process control parameter using updated process threshold derived from uncontrollable error A method, system and medium are provided for enabling improved feedback and feedforward control. An error, or deviation from target result, is observed during manufacture of semi conductor chips. The error within standard deviation is caused by two components: a whi... | 03/25/2008 |
| 7160739 | Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles A method of controlling surface non-uniformity of a wafer in a polishing operation includes (a) providing a model for a wafer polishing that defines a plurality of regions on a wafer and identifies a wafer material removal rate in a polishing step of a polishing pro... | 01/09/2007 |
| 7151881 | Impurity-based waveguide detectors An optical circuit including a semiconductor substrate; an optical waveguide formed in or on the substrate; and an optical detector formed in or on the semiconductor substrate, wherein the optical detector is aligned with the optical waveguide so as to receive an op... | 12/19/2006 |
| 7112961 | Method and apparatus for dynamically measuring the thickness of an object A method and apparatus are provided for measuring the thickness of a test object. The apparatus includes an eddy current sensor having first and second sensor heads. The sensor heads are positioned to have a predetermined gap therebetween for passage by at least a p... | 09/26/2006 |
| 7101725 | Solution to thermal budget A method of fabricating on optical detector, the method including providing a substrate that includes an optical waveguide formed therein and having a surface for fabricating microelectronic circuitry thereon; fabricating microelectronic circuitry on the substrate, ... | 09/05/2006 |
| 7096085 | Process control by distinguishing a white noise component of a process variance A method, system and medium is provided for enabling improved control systems. An error, or deviation from a target result, is observed for example during manufacture of semiconductor chips. The error within standard deviation is caused by two components: a white no... | 08/22/2006 |
| 7075165 | Embedded waveguide detectors A method of fabricating a detector that involves: forming a trench in a substrate, the substrate having an upper surface; forming a first doped semiconductor layer on the substrate and in the trench; forming a second semiconductor layer on the first doped semiconduc... | 07/11/2006 |
| 7072534 | Optical ready substrates An article of manufacture comprising an optical ready substrate made of a first semiconductor layer, an insulating layer on top of the first semiconductor layer, and a second semiconductor layer on top of the insulating layer, wherein the second semiconductor layer ... | 07/04/2006 |
| 7040956 | Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life A method, apparatus and medium of conditioning a planarizing surface includes installing a wafer to be polished in a chemical mechanical polishing (CMP) apparatus having a polishing pad and a conditioning disk, polishing the wafer under a first set of pad conditioni... | 05/09/2006 |
| 6961626 | Dynamic offset and feedback threshold A method, system and medium are provided for enabling improved feedback and feedforward control. An error, or deviation from target result, is observed during manufacture of semi conductor chips. The error within standard deviation is caused by two components: a whi... | 11/01/2005 |
| 6950716 | Dynamic control of wafer processing paths in semiconductor manufacturing processes A semiconductor fabrication system, method and medium are disclosed. The system includes a semiconductor fabrication tool and a software application, in communication with the semiconductor fabrication tool. The semiconductor fabrication tool includes a chamber conf... | 09/27/2005 |
| 6913938 | Feedback control of plasma-enhanced chemical vapor deposition processes A method of film deposition in a chemical vapor deposition (CVD) process includes (a) providing a model for CVD deposition of a film that defines a plurality of regions on a wafer and identifies one or more film properties for at least two regions of the wafer and a... | 07/05/2005 |
| 6852739 | Methods using proton pump inhibitors and nitric oxide donors The present invention describes novel nitrosated and/or nitrosylated proton pump inhibitor compounds, and novel compositions comprising at least one proton pump inhibitor compound that is optionally substituted with at least one NO and/or N02 group, and, ... | 02/08/2005 |
