Did You Know...
...that Robert Adler has the dubious distinction of being the Father of the Couch Potato? Back in 1955 Adler was employed by what was then Zenith Radio Corp., where he was charged to invent something that would allow viewers to turn down the TV volume without leaving their chairs. After a series of flops (such as a wired contraption that people tripped over), Adler hit on the idea of using sound waves. Thus the Remote Control was born...
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| Number | Title | Issue Date |
| 7620470 | Method and apparatus for impasse detection and resolution A method, apparatus and a system, for provided for performing an automated process flow adjustment. A semiconductor wafer is processed based upon a routing plan and a predetermined schedule. A fault detection relating to the processing of the semiconductor wafer is ... | 11/17/2009 |
| 6728163 | Controlling a delay lock loop circuit A method and apparatus is provided for performing a filter control of a delay lock loop circuit. A coarse delay and/or a fine delay are implemented upon a reference signal based upon a phase shift between the reference signal and a feedback signal. A synchronized ou... | 04/27/2004 |
| 6645780 | Method and apparatus for combining integrated and offline metrology for process control A method and an apparatus for combining integrated and offline metrology data for process control. A process operation on a first semiconductor wafer within a first lot of semiconductor wafers is performed. Integrated metrology data from the first semicon... | 11/11/2003 |
| 6643557 | Method and apparatus for using scatterometry to perform feedback and feed-forward control The present invention provides for a method and an apparatus for using scatterometry to perform feedback and feed-forward control. A processing run of semiconductor devices is performed. Metrology data from the processed semiconductor devices is acquired.... | 11/04/2003 |
| 6263590 | Method and apparatus for controlling byproduct induced defect density A method and apparatus for reducing byproduct induced defects in a processing tool is provided. A purge gas is introduced into a vessel of the processing tool. The vessel is heated to a temperature above a vaporization temperature of the byproduct. The te... | 07/24/2001 |
