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| Number | Title | Issue Date |
| 7207862 | Polishing apparatus and method for detecting foreign matter on polishing surface A polishing apparatus comprises a polishing tool having a polishing surface, and a holder device (top ring) for holding a semiconductor wafer (a substrate). The polishing apparatus further comprises a color CCD camera for taking a color image of a region on the poli... | 04/24/2007 |
