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Attorney: Tung and Associates


Number of patents: 4
Last date: August 05, 2008

NumberTitleIssue Date
7407601Polymeric particle slurry system and method to reduce feature sidewall erosion
A slurry system for a chemical mechanical polishing (CMP) process and a method for using the same wherein the slurry system includes an aqueous dispersion comprising at least abrasive polymer containing particles in an alkaline solution having a pH of less than abou...
08/05/2008
7394155Top and sidewall bridged interconnect structure and method
An interconnect structure and its method for fabrication each employ an interconnect formed over and adjacent an active region of a semiconductor substrate. A gate electrode is also formed over the active region. Spacer layers are formed adjoining the interconnect a...
07/01/2008
7387961Dual damascene with via liner
A dual damascene structure with improved profiles and reduced defects and method of forming the same, the method including forming a first dielectric over a conductive area; forming a first dielectric insulator over the first dielectric; forming a first opening in t...
06/17/2008
6358844Tungsten deposition process with dual-step nucleation
A tungsten plug deposition process that incorporates a dual-step nucleation method and the semiconductor structure formed by such method are disclosed. In the tungsten plug deposition process, a first nucleation layer is formed in the via openings in the ...
03/19/2002
 
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