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| Number | Title | Issue Date |
| 7910491 | Gapfill improvement with low etch rate dielectric liners A method of filling a trench is described and includes depositing a dielectric liner with a high ratio of silicon oxide to dielectric liner etch rate in fluorine-containing etch chemistries. Silicon oxide is deposited within the trench and etched to reopen or widen ... | 03/22/2011 |
| 7909595 | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment compr... | 03/22/2011 |
| 7902080 | Deposition-plasma cure cycle process to enhance film quality of silicon dioxide Methods of filling a gap on a substrate with silicon oxide are described. The methods may include the steps of introducing an organo-silicon precursor and an oxygen precursor to a deposition chamber, reacting the precursors to form a first silicon oxide layer in the... | 03/08/2011 |
| 7901783 | Low κ dielectric inorganic/organic hybrid films and method of making A method of depositing a dielectric film exhibiting a low dielectric constant in a semiconductor and/or integrated circuit by chemical vapor deposition (CVD) is provided. The film is deposited using an organosilicon precursor in a manner such that the film is compri... | 03/08/2011 |
| 7871926 | Methods and systems for forming at least one dielectric layer A method for forming a structure includes forming at least one feature across a surface of a substrate. A nitrogen-containing dielectric layer is formed over the at least one feature. A first portion of the nitrogen-containing layer on at least one sidewall of the a... | 01/18/2011 |
| 7867923 | High quality silicon oxide films by remote plasma CVD from disilane precursors A method of depositing a silicon and nitrogen containing film on a substrate. The method includes introducing silicon-containing precursor to a deposition chamber that contains the substrate, wherein the silicon-containing precursor comprises at least two silicon at... | 01/11/2011 |
| 7867921 | Reduction of etch-rate drift in HDP processes A processing chamber is seasoned by providing a flow of season precursors to the processing chamber. A high-density plasma is formed from the season precursors by applying at least 7500 W of source power distributed with greater than 70% of the source power at a top... | 01/11/2011 |
| 7841582 | Variable seal pressure slit valve doors for semiconductor manufacturing equipment Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. A sealing member seals the opening when a door is in a closed position. To selectively open and close the opening, an actuator moves the door... | 11/30/2010 |
| 7825044 | Curing methods for silicon dioxide multi-layers Methods of curing a silicon oxide layer on a substrate are provided. The methods may include the processes of providing a semiconductor processing chamber and a substrate and forming an silicon oxide layer filling a portion of a trench on the substrate, the silicon ... | 11/02/2010 |
| 7825038 | Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen Methods of depositing a silicon oxide layer on a substrate are described. The methods may include the steps of providing a substrate to a deposition chamber, generating an atomic oxygen precursor outside the deposition chamber, and introducing the atomic oxygen prec... | 11/02/2010 |
| 7815868 | Microfluidic reaction apparatus for high throughput screening An SBS-formatted microfluidic device where the geometry of the plate defines an array of interrogation areas, and where each interrogation area encompasses at least one reaction site. ... | 10/19/2010 |
| 7813832 | Method for on the fly positioning and continuous monitoring of a substrate in a chamber A method and apparatus for positioning a substrate in a substrate processing chamber. The method includes placing the substrate on a substrate transfer blade, moving the substrate transfer blade to a first position located in a transfer chamber, and capturing at lea... | 10/12/2010 |
| 7811411 | Thermal management of inductively coupled plasma reactors An RF coil assembly provides a source to generate a plasma inductively in a process chamber. The RF coil assembly includes an RF coil disposed about a perimeter of the processing chamber and a frame disposed about a perimeter of the processing chamber. The frame is ... | 10/12/2010 |
| 7808739 | Disk drive device and servo control method thereof Embodiments of the present invention help to perform appropriate servo control in response to detected vibration in a disk drive device having a vibration sensor. In an embodiment of the present invention, an HDD switches a correction servo mode to perform vibration... | 10/05/2010 |
| 7808737 | Magnetic disk drive Embodiments of the present invention provide a magnetic disk drive capable of controlling write/read positions by a method that takes the disturbance in the circumferential direction of a magnetic disk into consideration, thereby making it possible to improve the po... | 10/05/2010 |
| 7808139 | Magnetic disk drive with improved vibration characteristics Embodiments of the invention provide a magnetic disk drive having improved vibration characteristics and a reduced size. In one embodiment, a magnetic disk drive comprises: a motor shaft for rotating a magnetic disk; a sleeve for rotatably supporting the motor shaft... | 10/05/2010 |
| 7806338 | Real time card printing systems and methods A method for personalizing a presentation instrument for an account holder while the account holder is present is described. The method includes transmitting to a server computer a request to personalize a presentation instrument for an account holder who has a fina... | 10/05/2010 |
| 7805827 | Method of producing a magnetic head slider In one embodiment of the present invention, a method of producing a magnetic head slider comprises the steps of forming, on the air bearing surface of the slider, an air bearing surface overcoat, removing the surface region from a hard amorphous carbon film by the i... | 10/05/2010 |
| 7802538 | Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors A method of forming a graded dielectric layer on an underlying layer including flowing a mixture of a silicon-carbon containing gas, an oxygen containing gas and a carrier gas through a showerhead comprising a blocking plate and a faceplate to form an oxide rich por... | 09/28/2010 |
| 7799704 | Gas baffle and distributor for semiconductor processing chamber Apparatus and methods for distributing gas in a semiconductor process chamber are provided. In an embodiment, a gas distributor for use in a gas processing chamber comprises a body. The body includes a baffle with a gas deflection surface to divert the flow of a gas... | 09/21/2010 |
| 7799698 | Deposition-selective etch-deposition process for dielectric film gapfill A deposition/etching/deposition process is provided for filling a gap in a surface of a substrate. A liner is formed over the substrate so that distinctive reaction products are formed when it is exposed to a chemical etchant. The detection of such reaction products... | 09/21/2010 |
| 7799555 | Apparatus for high-throughput electroporation An electroporator for high-throughput electroporation is constructed with a well plate in which each well has internal electrodes that extend beyond the opening of the well to form contact areas, either as horizontal platforms extending laterally from the well rims ... | 09/21/2010 |
| 7798412 | Interchangeable fob casing for RF core An apparatus for contactless transactions is disclosed. In one embodiment, a transaction fob assembly includes a standardized fob core and an outer shell adapted to secure the core within the outer shell. Various embodiments provide for the fob core to include circu... | 09/21/2010 |
| 7790634 | Method for depositing and curing low-k films for gapfill and conformal film applications Methods of making a silicon oxide layer on a substrate are described. The methods may include forming the silicon oxide layer on the substrate in a reaction chamber by reacting an atomic oxygen precursor and a silicon precursor and depositing reaction products on th... | 09/07/2010 |
| 7790229 | High resolution substrate holder leveling device and method A method for adjusting a spacing of a leveling plate from a chamber body comprises attaching a mounting stud that includes a stud threaded surface to the chamber body. An adjustment screw is provided that has a first threaded surface threadingly engaged with the stu... | 09/07/2010 |
| 7789993 | Internal balanced coil for inductively coupled high density plasma processing chamber A coil is provided for use in a semiconductor processing system to generate a plasma with a magnetic field in a chamber. The coil comprises a first coil segment, a second coil segment and an internal balance capacitor. The first coils segment has a first end and a s... | 09/07/2010 |
| 7788795 | Method for manufacturing a magnetic head A method for manufacturing a magnetic head that is effective for the suppression of thermal protrusion. The magnetic head includes SiO2, Si nitride, or Si oxide as a coil insulator having a low coefficient of thermal expansion and high workability. The co... | 09/07/2010 |
| 7786167 | Compositions containing prodrugs of florfenicol and methods of use The present invention provides compositions and methods for administering florfenicol to mammals. The compositions contain a prodrug of florfenicol in a pharmaceutically acceptable carrier. In one embodiment the prodrug is an esterized form of florfenicol. Examples ... | 08/31/2010 |
| 7782568 | Compact thin-film magnetic head and magnetic disk drive using the same Embodiments of the invention provide a compact thin-film magnetic head capable of being increased in the number of terminals, and a magnetic disk drive that uses the thin-film magnetic head. In one embodiment, a thin-film magnetic head is constructed that has a magn... | 08/24/2010 |
| 7777990 | Magnetic disk unit and magnetic head slider In a magnetic disk unit, the flying height margin of a magnetic recording element part during recording is reduced, whereby improvement in recording density and increase in capacity or decrease in size of the unit is realized. In one embodiment, a magnetic disk unit... | 08/17/2010 |
| 7777198 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment compr... | 08/17/2010 |
| 7776156 | Side RF coil and side heater for plasma processing apparatus A RF plasma generation and temperature control system for an inductively coupled plasma process chamber. The plasma generation system includes a heater that includes an elongated upper heating element substantially parallel to an elongated lower heating element, whe... | 08/17/2010 |
| 7775660 | Electro-active ophthalmic lens having an optical power blending region The present invention generally relates to an electro-active optic incorporating a blend region between two regions each having different optical properties. ... | 08/17/2010 |
| 7758698 | Dual top gas feed through distributor for high density plasma chamber A gas distributor for use in a semiconductor process chamber comprises a body. The body includes a first channel formed within the body and adapted to pass a first fluid from a first fluid supply line through the first channel to a first opening. A second channel is... | 07/20/2010 |
| 7758697 | Silicon-containing layer deposition with silicon compounds Methods for depositing a silicon-containing film are described. The methods may include delivering a silicon compound to a surface or a substrate, and reacting the silicon compound to grow the silicon-containing film. The silicon compound may be one or more compound... | 07/20/2010 |
| 7754282 | Adjusting a spacing between a gas distribution member and a substrate support A method of adjusting a spacing between a gas distribution member and a substrate support includes forming a layer on a substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between... | 07/13/2010 |
| 7747525 | Systems and methods for customizing mortgage characteristics The present invention provides systems and methods for customizing fixed rate and variable rate mortgages. In some cases, the methods include accessing mortgage information and identifying at least a first characteristic of the mortgage to be modified. In addition, ... | 06/29/2010 |
| 7745352 | Curing methods for silicon dioxide thin films deposited from alkoxysilane precursor with harp II process Methods of curing a silicon oxide layer on a substrate are provided. The methods may include the processes of providing a semiconductor processing chamber and a substrate and forming an silicon oxide layer overlying at least a portion of the substrate, the silicon o... | 06/29/2010 |
| 7745351 | Post deposition plasma treatment to increase tensile stress of HDP-CVD SIO Methods of forming a dielectric layer where the tensile stress of the layer is increased by a plasma treatment at an elevated position are described. In one embodiment, oxide and nitride layers are deposited on a substrate and patterned to form an opening. A trench ... | 06/29/2010 |
| 7745350 | Impurity control in HDP-CVD DEP/ETCH/DEP processes Methods are disclosed of depositing a silicon oxide film on a substrate disposed in a substrate processing chamber. The substrate has a gap formed between adjacent raised surfaces. A first portion of the silicon oxide film is deposited over the substrate and within ... | 06/29/2010 |
