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"I watched his countenance closely, to see if he was not deranged ... and I was assured by other senators after he left the room that they had no confidence in it."
U.S. Senator Smith of Indiana ; After seeing Samuel Morse demonstrate the telegraph.
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| Number | Title | Issue Date |
| 7622138 | Pharmaceutical compositions for drug delivery and methods of treating or preventing conditions using same The present invention relates to pharmaceutical compositions in the form of a gel for controlled- or sustained-release of a pharmaceutically active agent and to methods for treating or preventing or preventing a condition in an animal by administering to an animal i... | 11/24/2009 |
| 7618651 | Pharmaceutical compositions for drug delivery and methods of treating or preventing conditions using same The present invention relates to pharmaceutical compositions in the form of a gel for controlled- or sustained-release of a pharmaceutically active agent and to methods for treating or preventing or preventing a condition in an animal by administering to an animal i... | 11/17/2009 |
| 7550625 | Esters of florfenicol The invention relates to compounds of formula (I): wherein R is —C(O)CH2OCH2CH2OCH3 or —C(O)CH2N(CH3)2. The invention also relates to pharmace... | 06/23/2009 |
| 7439268 | Compositions containing prodrugs of florfenicol and methods of use The present invention provides compositions and methods for administering florfenicol to mammals. The compositions contain a prodrug of florfenicol in a pharmaceutically acceptable carrier. In one embodiment the prodrug is an esterized form of florfenicol. Examples ... | 10/21/2008 |
| 7369822 | Segmented switching power amplifier A novel transmitter circuit is disclosed for receiving of an input signal and for providing of an amplitude increased RF output signal. Pluralities of switching power amplifiers are disposed along two signal propagating circuit branches and utilized for increasing a... | 05/06/2008 |
| 7266568 | Techniques for storing multimedia information with source documents A method of storing information for recorded information and a source document is provided. The method comprises: determining a first piece of information included in the recorded information; determining at least a first source document from one or more source docu... | 09/04/2007 |
| 7256171 | Use of core 2 G1cNAc transferase inhibitors in treating inflammation This invention provides compounds and methods for treating inflammation. The compounds modulate the core 2 oligosaccharide-mediated binding of inflammatory cells, such as neutrophils, to endothelial cells and other myeloid cells. Significantly, the of the inv... | 08/14/2007 |
| 7070657 | Method and apparatus for depositing antireflective coating This invention provides a stable process for depositing an antireflective layer. Helium gas is used to lower the deposition rate of plasma-enhanced silane oxide, silane oxynitride, and silane nitride processes. Helium is also used to stabilize the process, so that d... | 07/04/2006 |
| 7070780 | Treatment of demyelinating autoimmune disease with ordered peptides Compositions and methods are provided for the treatment of demyelinating autoimmune disease. Therapeutic doses are administered of an ordered peptide comprising a repeated motif {SEQ ID NO: 1} [1E2Y3Y4K]n, where... | 07/04/2006 |
| 7049200 | Method for forming a low thermal budget spacer A method of forming a sidewall spacer on a gate electrode of a metal oxide semiconductor device that includes striking a first plasma to form an oxide layer on a side of the gate electrode, where the first plasma is generated from a oxide gas that includes O3 | 05/23/2006 |
| 7036453 | Apparatus for reducing plasma charge damage for plasma processes A method is provided for depositing a thin film on a substrate in a process chamber with reduced incidence of plasma charge damage. A process gas containing a precursor gases suitable for forming a plasma is flowed into a process chamber, and a plasma is generated f... | 05/02/2006 |
| 7004107 | Method and apparatus for monitoring and adjusting chamber impedance A substrate processing system that includes a deposition chamber having a reaction zone, a substrate holder that positions a substrate in the reaction zone, a gas distribution system that includes a gas inlet manifold for supplying one or more process gases to said ... | 02/28/2006 |
| 6956105 | Chandra: a Th1-specific protein The present invention provides nucleic acid and protein sequences for a novel Th-1 cell-specific protein, Chandra. The herein-disclosed sequences can be used for any of a number of purposes, including for the specific detection of Th1 lymphocytes, for the identifica... | 10/18/2005 |
| 6951972 | Transposon tagging and gene delivery in small grain cereals The disclosed discovery relates to the functioning of the Ac-Ds transposon system in small grain cereals such as barley, wheat, and oat. Methods and compositions for using this system for introducing recombinant expression cassettes and transposon tagging of genes i... | 10/04/2005 |
| 6946368 | Reduction of native oxide at germanium interface using hydrogen-based plasma A germanium substrate is positioned in a process chamber. A plasma is generated from a treatment gas that includes a flow of a hydrogen-containing gas. The plasma is provided to the process chamber to react with GeO2 in the germanium substrate. ... | 09/20/2005 |
| 6943091 | Sequential deposition process for gap filling A deposition method for filling recesses in a substrate is described. In the method, the substrate is exposed to an energized deposition gas comprising first and second components, to deposit a first layer of a material in the recess, and thereafter, the ratio of th... | 09/13/2005 |
| 6939808 | Undoped and fluorinated amorphous carbon film as pattern mask for metal etch A method for etching a metal layer formed on a substrate to form a metal line, using an amorphous carbon layer as a pattern mask. One embodiment of the method of the invention etches a metal layer formed on a substrate, for forming a metal line, by depositing an amo... | 09/06/2005 |
| 6936042 | Surgical tools for use in minimally invasive telesurgical applications This invention provides surgical tools or instruments for use in minimally invasive telesurgical applications. The instruments typically include a base whereby the instrument is removably mountable on a robotically controlled articulated arm. An elongate shaft exten... | 08/30/2005 |
| 6933695 | Ceiling and floor mounted surgical robot set-up arms The present invention generally relates to surgical devices, systems, and methods, especially for minimally invasive surgery, and more particularly provides structures and techniques for aligning a robotic surgery system with a desired surgical site. The present inv... | 08/23/2005 |
| 6913652 | Gas flow division in a wafer processing system having multiple chambers A system for processing substrates includes a first process chamber configured to perform a given process on a first substrate. A second process chamber is configured to perform the same process as the first chamber on a second substrate. A gas source system is conf... | 07/05/2005 |
| 6908862 | HDP-CVD dep/etch/dep process for improved deposition into high aspect ratio features A method of depositing a film on a substrate disposed in a substrate processing chamber. The method includes depositing a first portion of the film by forming a high density plasma from a first gaseous mixture flown into the process chamber. The deposition processes... | 06/21/2005 |
| 6903246 | Dehydroascorbate reductase (“DHAR”) genes from Triticum aestivum and their use to modulate ascorbic acid levels in plants The invention is directed to a new dehydroascorbate reductase (“DHAR”) genes from Triticum aestivum, which is useful in modulating ascorbic acid levels in plants. ... | 06/07/2005 |
| 6895776 | Anti-stratification-solution delivery system for spin-on dielectrics An anti-stratification-delivery system comprises a multi-zone-refrigeration unit having at least first and second zone temperature controllers, the first and second zone temperature controllers are capable of being set at different temperatures to establish a temper... | 05/24/2005 |
| 6896955 | Ionic additives for extreme low dielectric constant chemical formulations A process for depositing porous silicon oxide-based films using a sol-gel approach utilizing a precursor solution formulation which includes a purified nonionic surfactant and an additive among other components, where the additive is either an ionic additive or an a... | 05/24/2005 |
| 6895293 | Fault detection and virtual sensor methods for tool fault monitoring Fault detection of a semiconductor processing tool employs several techniques to improve accuracy. One technique is sensor grouping, wherein a fault detection index is calculated from a group of tool operational parameters that correlate with one another. Another te... | 05/17/2005 |
| 6878644 | Multistep cure technique for spin-on-glass films A method of filling a plurality of trenches etched in a substrate. In one embodiment the method includes depositing a layer of spin-on glass material over the substrate and into the plurality of trenches; curing the layer of spin-on glass material by exposing the sp... | 04/12/2005 |
| 6872329 | Chemical mechanical polishing composition and process A method and composition for planarizing a substrate surface is provided. The polishing composition includes an oxidizer capable of oxidizing a metal undergoing planarization and yielding a complexing agent which complexes with the oxidized metal and a stabilizer su... | 03/29/2005 |
| 6858923 | Post-deposition treatment to enhance properties of Si-O-C low films A method for providing a dielectric film having enhanced adhesion and stability. The method includes a post deposition treatment that densifies the film in a reducing atmosphere to enhance stability if the film is to be cured ex-situ. The densification generally tak... | 02/22/2005 |
| 6853043 | Nitrogen-free antireflective coating for use with photolithographic patterning A layer of antireflective coating (ARC) material for use in photolithographic processing. In one embodiment the ARC material has the formula SiwOxHy:Cz, where w, x, y and z represent the atomic percentage of silicon, oxyge... | 02/08/2005 |
| 6846742 | Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput Embodiments of the present invention include a method of depositing an improved seasoning film. In one embodiment the method includes, prior to performing a substrate processing operation, forming a layer of silicon over an interior surface of the substrate processi... | 01/25/2005 |
| 6846669 | Methods for improving seeds The invention provides methods of modulating seed mass and other traits in plants. The methods involve producing transgenic plants comprising a recombinant expression cassette containing an ADC nucleic acid linked to a plant promoter. ... | 01/25/2005 |
| 6843882 | Gas flow control in a wafer processing system having multiple chambers for performing same process A system for processing substrates comprises a plurality of process chambers. Each process chamber includes an inlet gas distribution member connected to an inlet gas line to distribute gas from the inlet gas line into the process chamber, and a gas outlet. The inle... | 01/18/2005 |
| 6843858 | Method of cleaning a semiconductor processing chamber A method of operating a substrate processing chamber. In one embodiment the method includes processing one or more substrates in the substrate processing chamber and subsequently cleaning the chamber using a dry cleaning process. This substrate processing and dry cl... | 01/18/2005 |
| 6841006 | Atmospheric substrate processing apparatus for depositing multiple layers on a substrate A substrate processing apparatus is disclosed. In one embodiment, the apparatus includes a first atmospheric deposition station and a second atmospheric deposition station. The second atmospheric deposition station comprises an atmospheric pressure vapor deposition ... | 01/11/2005 |
| 6834777 | Closed loop control over delivery of liquid material to semiconductor processing tool Liquid material is precisely dispensed to a semiconductor processing tool utilizing closed loop control. In one embodiment, CMP slurry material of known density is supplied from a reservoir/mixing vessel to a dispense module. The dispense module also receives a flow... | 12/28/2004 |
| 6833052 | Deposition chamber and method for depositing low dielectric constant films An improved deposition chamber (2) includes a housing (4) defining a chamber (18) which houses a substrate support (14). A mixture of oxygen and SiF4 is delivered through a set of first nozzles (34) and silane is deliver... | 12/21/2004 |
| 6830624 | Blocker plate by-pass for remote plasma clean A flow of a remotely-generated plasma to a processing chamber by-passes a blocker plate and thereby avoids unwanted recombination of active species. By-passing the blocker plate according to embodiments of the present invention avoids the high pressures arising upst... | 12/14/2004 |
| 6825448 | Low residual-stress brazed terminal for heater Embodiments of the present invention are directed to relieving the stresses caused by a mismatch in the coefficients of thermal expansion in the components forming the connections at the terminals of a heater. In one embodiment, a heater comprises a heater body havi... | 11/30/2004 |
| 6822185 | Temperature controlled dome-coil system for high power inductively coupled plasma systems The temperature of a plasma chamber of a semiconductor fabrication tool is maintained substantially constant utilizing a variety of techniques, separately or in combination. One technique is to provide the exterior surface of the plasma chamber dome with a plurality... | 11/23/2004 |
| 6821577 | Staggered in-situ deposition and etching of a dielectric layer for HDP CVD A method for depositing a conformal dielectric layer employing a dep-etch technique features selectively decreasing the deposition gas present in a process chamber where a substrate to be covered by the conformal dielectric layer is disposed. By selectively decreasi... | 11/23/2004 |
