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| Number | Title | Issue Date |
| 8185860 | Method for matching timing on high fanout signal paths using routing guides A method, algorithm, software, architecture and/or system for routing signal paths or connections between circuit blocks in a circuit design is disclosed. In one embodiment, a method of routing can include: (i) determining a signal path between at least three circui... | 05/22/2012 |
| 8178441 | Semiconductor device and method for manufacturing the same A method for manufacturing a semiconductor device includes forming a gate insulating layer, a gate and a protective layer on a semiconductor substrate, forming a spacer on lateral sides of the protective layer and the gate, forming one or more junction regions in th... | 05/15/2012 |
| 8178432 | Semiconductor device and method for fabricating the same Semiconductor devices and methods for fabricating the same are disclosed. The semiconductor device includes gate electrodes having sidewall spacers on a semiconductor substrate, double diffusion drain regions in the semiconductor substrate adjacent to the sidewall s... | 05/15/2012 |
| 8173457 | Method and apparatus for manufacturing thin-film transistor array substrate A method and apparatus of fabricating a thin film transistor array substrate is disclosed, which is capable of reducing fabrication time owing to a simplified fabrication process, wherein at least one of steps for forming a gate pattern, forming a semiconductor patt... | 05/08/2012 |
| 8169038 | Semiconductor device and method of manufacturing the same A semiconductor device and a method of manufacturing the same are disclosed. The method includes forming ion impurity regions of a first conductivity type by forming a trench in a semiconductor substrate and implanting impurity ions into a lower portion of the trenc... | 05/01/2012 |
| 8159077 | Pad in semicondcutor device and fabricating method thereof A pad in a semiconductor device and fabricating method thereof are disclosed. The pad includes an uppermost metal layer first to Nth intermediate metal layers, wherein capacitors configured or formed by the uppermost metal layer and the first to Nth ... | 04/17/2012 |
| 8153508 | Method for fabricating image sensor A method for fabricating an image sensor is provided. In the image sensor fabrication method, an interconnection and a dielectric interlayer are formed on a semiconductor substrate including a readout circuit. An image sensing unit is formed on a carrier substrate o... | 04/10/2012 |
| 8138921 | Reliable tag deactivation A method for reliable deactivation of a security (EAS) tag, and an apparatus for accomplishing the same. The method generally includes placing a security tag a first distance from a deactivation apparatus; determining whether a deactivation confirmation signal has o... | 03/20/2012 |
| 8138565 | Lateral double diffused metal oxide semiconductor device and method of making the same An LDMOS device and method for making the same are disclosed. The LDMOS device comprises a first well, a second well, a third well, a first ion implantation region, and a second ion implantation region. The first well is in a semiconductor substrate. The second well... | 03/20/2012 |
| 8134213 | Static random access memory and method for manufacturing the same Disclosed is a static random access memory (SRAM), which includes first and second access transistors composed of metal oxide semiconductor (MOS) transistors, first and second drive transistors composed of MOS transistors, and first and second p-channel thin film tr... | 03/13/2012 |
| 8124040 | Methods of making silane compositions A method of making hydrogenated Group IVA compounds having reduced metal-based impurities, compositions and inks including such Group IVA compounds, and methods for forming a semiconductor thin film. Thin semiconducting films prepared according to the present invent... | 02/28/2012 |
| 8120129 | Image sensor and method of manufacturing the same An image sensor and a method of manufacturing the same are disclosed. The image sensor includes a plurality of photodiodes on a substrate, an dielectric layer on the plurality of the photodiodes, a metal line layer in the dielectric layer corresponding to a border r... | 02/21/2012 |
| 8119487 | Semiconductor device and method for fabricating the same A Semiconductor device and method for fabricating the same are disclosed. The method includes implanting first conduction type impurities into a semiconductor substrate to form a first well, implanting second conduction type impurities into the first well to form a ... | 02/21/2012 |
| 8119443 | Method of manufacturing image sensor having ions implanted into photodiode layer to control contact hole shape Provided is a method in which a photodiode layer is formed on a metal interconnection layer, and a hard mask layer is formed on the photodiode layer. Then, a photoresist pattern is formed on the hard mask layer to define a contact hole region, and a first hole is fo... | 02/21/2012 |
| 8117582 | Method for placing dummy patterns in a semiconductor device layout Disclosed is a method for placing dummy patterns in a semiconductor device layout. More specifically, the method places the dummy patterns densely between main patterns in accordance with a sequence and configuration. The method includes placing vertical dummies hav... | 02/14/2012 |
| 8110786 | Multi-element concentrator system A novel concentrator system is described, which increases the efficiency of collecting and concentrating sunlight energy onto a target. This method uses an array of small movable reflective or refractive concentrator components that can move via a feedback mechanism... | 02/07/2012 |
| 8108185 | Electrostatic discharge voltage resistive current modeling method of electrostatic discharge protection device Provided is a method for modeling an ESD breakdown current. According to one variation, a first proportional constant is based on a circumference of the ESD protection device and a second proportional constant based on an area of the ESD protection device. A dual fi... | 01/31/2012 |
| 8106429 | Image sensor and manufacturing method thereof Disclosed is an image sensor. The image sensor includes a semiconductor substrate including a lower interconnection, a plurality of upper interconnection sections protruding upward from the semiconductor substrate, a first trench disposed between the upper interconn... | 01/31/2012 |
| 8105939 | LDMOS transistor and method for manufacturing the same A LDMOS transistor and a method for manufacturing the same are disclosed. A lateral double diffused metal oxide semiconductor (LDMOS) transistor includes a first dielectric layer formed on a top surface of a substrate; a plurality of second dielectric layers on a to... | 01/31/2012 |
| 8102017 | Image sensor and method for manufacturing the same An image sensor may comprise circuitry, a first lower electrode, a photodiode, an upper electrode, a second lower electrode, and an upper interconnection. The circuitry may comprise a first lower interconnection and a second lower interconnection over a dielectric o... | 01/24/2012 |
| 8099707 | Field configured electronic circuits and methods of making the same Semiconductor devices and/or structures, and methods for fabricating the same are disclosed. Embodiments of the present invention allow for production of customized products, while also minimizing production steps, avoiding some or all photolithography steps, and re... | 01/17/2012 |
| 8093132 | Method of manufacturing a bipolar junction transistor A bipolar junction transistor and a method of manufacturing a bipolar junction transistor are disclosed. An exemplary bipolar junction transistor includes a second conductivity type base region in a first conductivity type substrate, step-shaped recesses in the base... | 01/10/2012 |
| 8092986 | Exposure methods The present disclosure provides an exposure method for a semiconductor device, in which whether a specific pattern corresponds to a sparse area or a dense area is decided to employ a specific phase-shift mask and by which critical dimension uniformity and resolution... | 01/10/2012 |
| 8092867 | Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers Compositions and methods for controlled polymerization and/or oligomerization of hydrosilanes compounds including those of the general formulae SinH2n and SinH2n+2 as well as alkyl- and arylsilanes, to produce soluble sili... | 01/10/2012 |
| 8085068 | Combined static and dynamic frequency divider chains using thin film transistors Frequency divider circuits and architectures, and methods of implementing and using the same, are disclosed. In one embodiment, the frequency divider circuit includes a dynamic section that receives an input signal and outputs an intermediate signal that has a frequ... | 12/27/2011 |
| 8084317 | Semiconductor device and method of manufacturing the same Provided are a semiconductor device and a method of manufacturing the same. The semiconductor device comprises a gate electrode on a semiconductor substrate having a device isolation region, a first drain spacer on one side of the gate electrode, a second drain spac... | 12/27/2011 |
| 8079474 | Stackable container and method for making the same A stackable container and blanks for forming a stackable container are disclosed. In one embodiment, a stackable container has (a) a base having two pairs of opposed base edges, (b) two first sidewall structures foldably attached to the first base edges at an angle ... | 12/20/2011 |
| 8072038 | Image sensor An image sensor having greatly improved physical and electrical bonding forces between a photodiode and a substrate, and a manufacturing method thereof. The image sensor includes a semiconductor substrate and readout circuitry, a dielectric layer on the semiconducto... | 12/06/2011 |
| 8067293 | Power semiconductor device and method of manufacturing the same A semiconductor device and a method of manufacturing the same. The method includes preparing a semiconductor substrate having high-voltage and low-voltage device regions, forming a field insulating layer in the high-voltage device region, forming a first gate oxide ... | 11/29/2011 |
| 8066805 | Metal inks, methods of making the same, and methods for printing and/or forming metal films Printable metal formulations, methods of making the formulations, and methods of coating or printing thin films from metal ink precursors are disclosed. The metal formulation generally includes one or more Group 4, 5, 6, 7, 8, 9, 10, 11, or 12 metal salts or metal c... | 11/29/2011 |
| 8066340 | Organizer/storage system that mounts on top of a computer workstation An organizer/storage system that mounts on top of a computer workstation for storage of office supplies, devices, or files that makes efficient use of the available space above, or on one or both sides of the computer workstation. The organizer/storage system includ... | 11/29/2011 |
| 8063431 | EEPROM and method for manufacturing EEPROM An electrically erasable programmable read only memory (EEPROM) is disclosed. The EEPROM includes a tunneling region in a semiconductor substrate, a control gate region in the semiconductor substrate and separated from the tunneling region by a device isolating laye... | 11/22/2011 |
| 8059478 | Low cost testing and sorting for integrated circuits Methods of testing and sorting integrated circuits in clusters are disclosed. Each cluster has power and data terminals connected to common power and data busses providing a common power supply. Each integrated circuit has a first non-volatile memory storing an acti... | 11/15/2011 |
| 8057865 | Polysilane compositions, methods for their synthesis and films formed therefrom Polysilanes, inks containing the same, and methods for their preparation are disclosed. The polysilane generally has the formula H—[(AHR)n(c—AmHpm−2)q]—H, where each instance of A is independently Si or Ge; R is H,... | 11/15/2011 |
| 8050329 | Method and apparatus for generic scalable shape coding A generic spatially-scalable shape encoding apparatus and method for handling different mask decomposition methods, while maximizing coding efficiency of the encoder, is disclosed. The present generic spatially-scalable shape encoding applies three encoding steps to... | 11/01/2011 |
| 8049289 | Image sensor and method for manufacturing the same Disclosed are an image sensor and a method for manufacturing the same. The image sensor includes a semiconductor substrate including a unit pixel, first to third color filters provided on the semiconductor substrate, a first micro-lens provided on each of the first ... | 11/01/2011 |
| 8049265 | Semiconductor device and method of fabricating the same Provided are semiconductor devices and methods of fabricating the same. The semiconductor device comprises: a floating gate pattern formed in a cell area of a semiconductor substrate; a dummy floating gate pattern extending from the floating gate pattern into an int... | 11/01/2011 |
| 8049257 | CMOS image sensor Provided are a CMOS image sensor in which microlenses are formed in a remaining space in a patterned light shielding layer to improve image sensor characteristics and to protect the microlenses during packaging. The CMOS image sensor may include: a semiconductor sub... | 11/01/2011 |
| 8048744 | Semiconductor device and fabricating method thereof A semiconductor device and fabricating method thereof are disclosed. The method includes forming a polysilicon layer on a semiconductor substrate including a high-voltage area and a low-voltage area, partially etching the polysilicon layer in the low-voltage area, f... | 11/01/2011 |
| 8048307 | Dynamic filtration device using centrifugal force The present invention generally relates to a filtration system having one or more apparatuses for filtering gases, liquids, or fluids (e.g., water) to remove particulate matter, and methods of making and using the apparatus. More particularly, embodiments relate to ... | 11/01/2011 |
