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| Number | Title | Issue Date |
| 8174400 | Frequency monitoring to detect plasma process abnormality Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are es... | 05/08/2012 |
| 7915114 | Low temperature process for TFT fabrication Method of fabricating a thin-film transistor (TFT) in which a gate metal is deposited onto a substrate in order to form the gate of the thin-film transistor. The substrate may be an insulative substrate or a color filter. In a first method, the gate metal is subject... | 03/29/2011 |
| 7902991 | Frequency monitoring to detect plasma process abnormality Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are es... | 03/08/2011 |
| 7776178 | Suspension for showerhead in process chamber Stress within a suspension wall for suspending a showerhead in a process chamber is ameliorated by one or more of: (1) Openings in the suspension wall that reduce exposure of the suspension wall to process gas or ambient atmosphere when the chamber lid is opened. (2... | 08/17/2010 |
| 7641762 | Gas sealing skirt for suspended showerhead in process chamber Stress within a suspension wall for suspending a showerhead in a process chamber is ameliorated by one or more of: (1) A gas sealing skirt that helps protect the suspension wall from direct contact with process gas. The gas sealing skirt is connected to either the c... | 01/05/2010 |
| 7514936 | Detection and suppression of electrical arcing Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductor... | 04/07/2009 |
| 7484473 | Suspended gas distribution manifold for plasma chamber A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by a side wall comprising one or more sheets. The sheets preferably provide flexibility to alleviate stress in the gas distribution plate due to thermal expansion and cont... | 02/03/2009 |
| 7300829 | Low temperature process for TFT fabrication Method of fabricating a thin-film transistor (TFT) in which a gate metal is deposited onto a substrate in order to form the gate of the thin-film transistor. The substrate may be an insulative substrate or a color filter. In a first method, the gate metal is subject... | 11/27/2007 |
| 7292045 | Detection and suppression of electrical arcing Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductor... | 11/06/2007 |
| 7147719 | Double slit-valve doors for plasma processing In a substrate vacuum processing chamber, a second inner slit passage door apparatus and method to supplement the normal slit valve and its door at the outside of the chamber. The inner slit passage door, blocks the slit passage at or adjacent the substrate processi... | 12/12/2006 |
| 7017269 | Suspended gas distribution plate A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by flexible side walls. The flexible suspension minimizes mechanical stress due to thermal expansion of the gas distribution plate. In another aspect, the suspension provi... | 03/28/2006 |
| 6965895 | Method and apparatus for analyzing manufacturing data A method for data mining information obtained in an integrated circuit fabrication factory (“fab”) that includes steps of: (a) gathering data from the fab from one or more of systems, tools, and databases that produce data in the fab or collect data from the fab... | 11/15/2005 |
| 6962732 | Process for controlling thin film uniformity and products produced thereby Processes for controlling thickness uniformity of thin organosilicate films as they are deposited on a substrate, and as they finally result. During deposition of the film, which may be accomplished by CVD, PECVD, rapid thermal processing or the like, the substrate ... | 11/08/2005 |
| 6897146 | System architecture of semiconductor manufacturing equipment A semiconductor manufacturing equipment wherein degas chamber(s) are integrated to the conventional pass-through chamber location. A preferred embodiment for depositing Cu barrier and seed layers on a semiconductor wafer comprises a front opening unified pod(s), a s... | 05/24/2005 |
| 6881276 | Detecting the endpoint of a chamber cleaning A method and apparatus for cleaning a CVD chamber including optoelectronic detection of the completion or endpoint of the cleaning procedure once a ratio of emission lines reaches a threshold value. The method comprises the steps of: providing a plasma of a cleaning... | 04/19/2005 |
| 6878214 | Process endpoint detection in processing chambers Method and apparatus for determining an endpoint of a cleaning process running in a chamber. In particular, one embodiment of the present invention is a method that includes steps of: (a) directing radiation absorbed by a byproduct of the cleaning process into an ex... | 04/12/2005 |
| 6863835 | Magnetic barrier for plasma in chamber exhaust A plasma chamber apparatus and method employing a magnet system to block the plasma within the chamber interior from reaching the exhaust pump. An exhaust channel between the chamber interior and the pump includes a magnet and at least one deflector that creates tur... | 03/08/2005 |
| 6857387 | Multiple frequency plasma chamber with grounding capacitor at cathode An apparatus and method for fabricating an electronic workpiece in which first and second electrodes within a plasma chamber are respectively connected to low frequency and high frequency RF power supplies. At least one capacitor is connected between the first elect... | 02/22/2005 |
| 6842121 | RF identification system for determining whether object has reached destination An RFID system for verifying whether an object that has been transported to a first destination has reached its intended destination. An RFID transceiver tag is mounted on the object. The intended destination is stored in a memory within the tag. An interrogator at ... | 01/11/2005 |
| 6823589 | Flexibly suspended gas distribution manifold for plasma chamber A method of flexibly mounting a gas distribution plate to the back wall of a gas inlet manifold for a plasma chamber. A perforated gas distribution plate is suspended from the back wall by flexible side walls. The flexible suspension minimizes mechanical stress due ... | 11/30/2004 |
| 6772827 | Suspended gas distribution manifold for plasma chamber A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by a side wall comprising one or more sheets. The sheets preferably provide flexibility to alleviate stress in the gas distribution plate due to thermal expansion and cont... | 08/10/2004 |
| 6771249 | Producing walking one pattern in shift register A circuit and method for producing a walking one pattern in a shift register. The circuit comprises a shift register and a NOR gate. The NOR gate output is connected to the data input of the shift register, and the data output of each of said register stages is conn... | 08/03/2004 |
| 6760578 | Wake up device for a communications system The present invention teaches a communications system comprising a first communications device for receiving data and a wake up signal. The first communications device comprises an active mode of operation and a sleep mode of operation for reducing power consumption... | 07/06/2004 |
| 6741178 | Electrically powered postage stamp or mailing or shipping label operative with radio frequency (RF) communication The present application describes an electronically powered postage stamp or mailing label and including a radio frequency identification (RFID) device and system mounted between the opposing and facing major surfaces thereof. The RFID device and system includes an ... | 05/25/2004 |
| 6610374 | Method of annealing large area glass substrates A thin film layer can be formed on a glass substrate by preheating the substrate, depositing an amorphous silicon precursor layer on the substrate at a first temperature, and annealing the substrate in a thermal processing chamber at a second temperature ... | 08/26/2003 |
| 6602770 | Silicon layer to improve plug filling by CVD A method of forming an electrically conductive plug in an opening in a dielectric layer of a substrate. Silane is thermally decomposed so as to deposit a layer of material on the walls of an opening. Subsequently, electrically conductive material is depos... | 08/05/2003 |
| 6599368 | System architecture of semiconductor manufacturing equipment A semiconductor manufacturing equipment wherein degas chamber(s) are integrated to the conventional pass-through chamber location. A preferred embodiment for depositing Cu barrier and seed layers on a semiconductor wafer comprises a front opening unified ... | 07/29/2003 |
| 6589890 | Precleaning process for metal plug that minimizes damage to low-.kappa. dielectric The invention is a precleaning process suitable for fabricating metal plugs in a low-.kappa., carbon-containing dielectric. More specifically, the invention is a process for cleaning a contact area of a metal conductor on a semiconductor workpiece so as t... | 07/08/2003 |
| 6554954 | Conductive collar surrounding semiconductor workpiece in plasma chamber A plasma chamber apparatus and method having a process kit capable of reducing or eliminating electrical arcing from exposed metal at the perimeter of a workpiece. The plasma chamber includes a cathode electrode adjacent the workpiece. A process kit encir... | 04/29/2003 |
| 6534007 | Method and apparatus for detecting the endpoint of a chamber cleaning A method and apparatus for cleaning a CVD chamber including optoelectronic detection of the completion or endpoint of the cleaning procedure once a ratio of emission lines reaches a threshold value. The method comprises the steps of: providing a plasma of... | 03/18/2003 |
| 6507328 | Thermoelectric control for field emission display An active matrix display that does not require a transistor or similar current switching device at each pixel. Instead, the display employs in each pixel a temperature-controlled current source that provides to the field emitters of the pixel an amount of... | 01/14/2003 |
| 6500356 | Selectively etching silicon using fluorine without plasma A process for selectively etching silicon from a workpiece without etching silicon oxide or silicon nitride. The principal etchant gas is molecular fluorine gas (F2) that is not excited to a plasma state.... | 12/31/2002 |
| 6477980 | Flexibly suspended gas distribution manifold for plasma chamber A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by flexible side walls. The flexible suspension minimizes mechanical stress due to thermal expansion of the gas distribution plate. In another aspect, the suspe... | 11/12/2002 |
| 6472329 | Etching aluminum over refractory metal with successive plasmas A process and apparatus for etching an exposed region of a multi-layer metal having at least two layers: a layer of aluminum or aluminum alloy, and an underlying layer of refractory metal. The etching process includes at least two steps. In a first step, ... | 10/29/2002 |
| 6454332 | Apparatus and methods for handling a substrate Substrate handling apparatus and methods are described. In one aspect, the substrate handling apparatus includes a clamping member having an extended condition wherein substrate movement relative to the transfer arm is substantially restricted and a retra... | 09/24/2002 |
| 6455921 | Fabricating plug and near-zero overlap interconnect line An electrically conductive plug on a semiconductor workpiece. A dielectric layer is deposited on the workpiece, and a cavity is etched in the dielectric. An etchant-resistant material is deposited on the wall of the cavity adjacent the cavity mouth so as ... | 09/24/2002 |
| 6359264 | Thermal cycling module A thermal cycling module for thermally processing a substrate has a thermally-conductive support structure with a planar first side and a second side with a plurality of recesses. A heater is disposed on the first side of the support structure and a fluid... | 03/19/2002 |
| 6346489 | Precleaning process for metal plug that minimizes damage to low-.kappa. dielectric The invention is a precleaning process suitable for fabricating metal plugs in a low-.kappa., carbon-containing dielectric. More specifically, the invention is a process for cleaning a contact area of a metal conductor on a semiconductor workpiece so as t... | 02/12/2002 |
| 6303480 | Silicon layer to improve plug filling by CVD A method of forming an electrically conductive plug in an opening in a dielectric layer of a substrate. A layer of silicon is deposited on the walls of an opening. In one aspect, the opening is filled by depositing electrically conductive material directl... | 10/16/2001 |
| 6294219 | Method of annealing large area glass substrates A thin film layer can be formed on a glass substrate by preheating the substrate, depositing an amorphous silicon precursor layer on the substrate at a first temperature, and annealing the substrate in a thermal processing chamber at a second temperature ... | 09/25/2001 |
