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"There is practically no chance communications space satellites will be used to provide better telephone, telegraph, television, or radio service inside the United States."
T. Craven, FCC Commissioner ; 1961
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| Number | Title | Issue Date |
| 5607542 | Inductively enhanced reactive ion etching A method and apparatus for generating a medium density plasma in a reactive ion etching chamber. A conventional reactive ion etching technique, using multiple electrodes for capacitive coupling of power into the chamber to establish and sustain a plasma, ... | 03/04/1997 |
| 5605637 | Adjustable dc bias control in a plasma reactor A plasma chamber, and a related method for its use, in which the direct current (dc) bias on a wafer-supporting cathode is reduced by including a plasma shield that blocks plasma from reaching a region of the chamber and thereby reduces the effective surf... | 02/25/1997 |
| 5585012 | Self-cleaning polymer-free top electrode for parallel electrode etch operation A plasma etch reactor and a related method of its operation to provide self-cleaning of its top electrode, which is subject to being coated by polymer deposits during normal operation. In one form of the invention, radio-frequency (rf) power is applied to... | 12/17/1996 |
| 5567909 | Method for supporting a wafer in a combined wafer support and temperature monitoring device A combined wafer support and thermocouple assembly comprising a wafer support basket having a plurality of wafer support fingers, one of which includes a low mass, low heat constant support for supporting a thermocouple against the backside of a wafer pos... | 10/22/1996 |
| 5543688 | Plasma generation apparatus with interleaved electrodes and corresponding method A plasma generator having two groups of interleaved electrodes to which power is allied at high or radio frequency, to form a plasma in a region sufficiently removed from a substrate to avoid damage and unwanted exposure of the substrate to the plasma. In... | 08/06/1996 |
