Did You Know...
...that several people are credited with the invention of the flush toilet? Most people have heard of Thomas Crapper (1837-1910), the sanitary engineer who invented the valve-and-siphon arrangement that made the modern toilet possible. Another claimant to "the throne" was British inventor Alexander Cumming who patented a toilet in 1775. Then there's a nameless Minoan (a native of ancient Crete) who lived 4,000 years ago who supposedly was ahead of his time and created the first flush toilet!
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| Number | Title | Issue Date |
| 8153831 | Organometallic compounds, processes for the preparation thereof and methods of use thereof This invention relates to organometallic compounds represented by the formula (L1)yM(L2)z-y wherein M is a Group 5 metal or a Group 6 metal, L1 is a substituted or unsubstituted anionic 6 electron donor ligand, ... | 04/10/2012 |
| 8123107 | Method for forming sputter target assemblies The method forms a sputter target assembly by attaching a sputter target to an insert and applying a bond metal layer between the insert and a backing plate. Then pressing the insert and backing plate together forms a solid state bond with the bond metal layer, atta... | 02/28/2012 |
| 8105534 | Process and system for purifying gases A process and system for purifying an impure gas to produce a purified gas in a gas purification system and protecting the system from damage by a) passing a portion of a first gas stream into a reactor vessel, which exits as a second purified gas stream; b) combini... | 01/31/2012 |
| 8097100 | Ternary aluminum alloy films and targets for manufacturing flat panel displays A physical vapor deposition target for the manufacturing of flat panel displays is provided. The target includes a ternary alloy system having, by atom percent, a first component in an amount of about 90 to 99.98, wherein the first component is aluminum, a second co... | 01/17/2012 |
| 8055365 | Method for configuring gas supply for electronics fabrication facilities A system for supplying a reagent to multiple tools in an electronics fabrication facility is configured using a demand probability distribution. In specific examples the reagent is a non-atmospheric or a specialty gas and the demand probability distribution is devel... | 11/08/2011 |
| 8053072 | Method of reducing porosity in thermal spray coated and sintered articles This invention relates to an article having a reduced porosity and a method for sealing porosity of at least a portion of an outer porous surface of an article, said method comprising (i) applying a sealant solution on the outer porous surface of said article, (ii) ... | 11/08/2011 |
| 8025749 | Ultrafine-grain-copper-base sputter targets The sputter target has a composition selected from the group consisting of high-purity copper and copper-base alloys. The sputter target's grain structure is at least about 99 percent recrystallized; and the sputter target's face has a grain orientation ratio of at ... | 09/27/2011 |
| 7973188 | Processes for the production of organometallic compounds This invention relates to processes for the production of organometallic compounds represented by the formula M(L)3 wherein M is a Group VIII metal, e.g., ruthenium, and L is the same or different and represents a substituted or unsubstituted amidinato gr... | 07/05/2011 |
| 7960565 | Organometallic compounds and processes for preparation thereof This invention relates to organometallic compounds represented by the formula LML′ wherein M is a metal or metalloid, L is a substituted or unsubstituted cyclopentadienyl group or cyclopentadienyl-like group, a substituted or unsubstituted pentadienyl group or pen... | 06/14/2011 |
| 7959994 | Diptube apparatus and delivery method This invention relates to a vapor or liquid phase reagent dispensing apparatus having a diptube and also a metal seal aligned and in contact with hardened opposing flat surfaces of a top wall member and a protuberance on a side wall member, wherein the hardened oppo... | 06/14/2011 |
| 7959986 | Organometallic compounds, processes for the preparation thereof and methods of use thereof This invention relates to organometallic precursor compounds represented by the formula (Cp(R′)x)yM(H)z-y, a process for producing the organometallic precursor compounds, and a method for depositing a metal and/or metal carbide lay... | 06/14/2011 |
| 7956207 | Heteroleptic organometallic compounds This invention relates to organometallic compounds represented by the formula (L1)xM(L2)y wherein M is a metal or metalloid, L1 and L2 are different and are each a hydrocarbon group or a heteroatom-co... | 06/07/2011 |
| 7956168 | Organometallic compounds having sterically hindered amides This invention relates to organometallic compounds represented by the formula M(NR1R2)x wherein M is a metal or metalloid, R1 is the same or different and is a hydrocarbon group or a heteroatom-containing group, R2 | 06/07/2011 |
| 7927658 | Deposition processes using group 8 (VIII) metallocene precursors Disclosed herein is a process for producing a film, coating or powder employing a metallocene or metallocene-like precursor having the general formula CpMCp′, where M is a metal selected from the group consisting of Ru, Os and Fe; Cp is a first substituted cyclope... | 04/19/2011 |
| 7905247 | Vacuum actuated valve for high capacity storage and delivery systems The invention relates to a re-configured valve design to accommodate a high volume of product in the delivery system and the dispensation of product upon the application of a predetermined vacuum condition on the downstream side of the valve. ... | 03/15/2011 |
| 7891537 | Sputter target and backing plate assembly A method for aligning the sputter target onto a backing plate having a peripheral arcuate-shaped flange on its bonding surface to provide an aligned and uniform solder bonded interface; and the sputter target/backing plate assembly so produced. ... | 02/22/2011 |
| 7816550 | Processes for the production of organometallic compounds This invention relates to processes for the production of organometallic compounds represented by the formula M(L)3 wherein M is a Group VIII metal, e.g., ruthenium, and L is the same or different and represents a substituted or unsubstituted amidinato gr... | 10/19/2010 |
| 7813627 | Low vapor pressure high purity gas delivery system Systems, apparatuses and methods for vapor phase fluid delivery to a desired end use are provided, wherein the conditions of the system are monitored to determine when the water concentration or supply vessel surface temperature exceeds a specified value or when the... | 10/12/2010 |
| 7799384 | Method of reducing porosity in thermal spray coated and sintered articles This invention relates to a method for sealing porosity of at least a portion of an outer porous surface of an article, said method comprising (i) applying a sealant solution on the outer porous surface of said article, (ii) infiltrating at least a portion of the ou... | 09/21/2010 |
| 7778530 | Energy delivery system for a gas transport vessel containing low vapor pressure gas A system for delivering vapor phase fluid at an elevated pressure from a transport vessel containing liquefied or two-phase fluid is provided. The system includes: (a) a transport vessel positioned in a substantially horizontal position; (b) one or more energy deliv... | 08/17/2010 |
| 7776166 | Texture and grain size controlled hollow cathode magnetron targets and method of manufacture The present invention relates to methods for improving deposited film uniformity and controlling the erosion of sputter targets. Improved methods for achieving predetermined microstructure orientation in copper hollow cathode magnetron (HCM) sputter targets and targ... | 08/17/2010 |
| 7740723 | Controlled-grain-precious metal sputter targets A precious metal sputter target has a composition selected from the group consisting of platinum, palladium, rhodium, iridium, ruthenium, osmium and single-phase alloys thereof. The sputter target's grain structure is at least about 99 percent recrystallized and has... | 06/22/2010 |
| 7740690 | Methods and systems for purifying gases The present invention relates to methods and systems for purifying gases, such as for example semiconductor process gases. The invention more particularly relates to fluid purification methods and systems having improved heat transfer capabilities and controls such ... | 06/22/2010 |
| 7723535 | Organometallic precursor compounds This invention relates to organometallic precursor compounds represented by the formula i-PrN═Ta(NR1R2)3 wherein R1 and R2 are the same or different and are alkyl having from 1 to 3 carbon atoms, provided that... | 05/25/2010 |
| 7722702 | Adsorbent and catalyst mixtures The present invention relates to the use of expensive and highly selective adsorbents and catalysts for trace contaminant gas removal to generate products of high and ultra-high purity. Mixing such highly selective materials with other less expensive, less selective... | 05/25/2010 |
| 7721939 | Sputter target and backing plate assembly A method for aligning the sputter target onto a backing plate having a peripheral arcuate-shaped flange on its bonding surface to provide an aligned and uniform solder bonded interface; and the sputter target/backing plate assembly so produced. ... | 05/25/2010 |
| 7718102 | Froth and method of producing froth Foam for making pads and belts with controlled, reproducible microcellular structure and method of making such foam in a fast and efficient manner. Under constant pressure and temperature, a prepolymer is mixed with the nucleation surfactant in a tank in the presenc... | 05/18/2010 |
| 7708028 | Fail-safe vacuum actuated valve for high pressure delivery systems A high pressure storage and delivery system having a fail-safe vacuum actuated valve is provided. In particular, through the innovative design of the vacuum actuated check valve, the system can accommodate up to three times the volume of product in similar size cyli... | 05/04/2010 |
| 7667944 | Polyceramic e-chuck The present invention discloses an electrostatic chuck for clamping work substrates, said chuck comprising three layers, where the dielectric constant of included non-conductive layers is selected to provide overall lower capacitance to the chuck. In the chuck assem... | 02/23/2010 |
| 7667065 | High nucleation density organometallic compounds This invention relates to high nucleation density organometallic ruthenium compounds. This invention also relates to a process for producing a high nucleation density organometallic ruthenium compound comprising reacting a bis(substituted-pentadienyl)ruthenium compo... | 02/23/2010 |
| 7662213 | Silver-exchanged zeolites and methods of manufacture therefor The present invention relates generally to zeolites having a silica/alumina ratio of less than or equal to 10 (Si/Al≦10) that are exchanged with Ag+ and thermally treated in such a way to favor adsorption over alternative catalytic and chemically reacti... | 02/16/2010 |
| 7655601 | Enhanced melt-textured growth A method for the enhanced melt-textured growth of superconducting crystals is disclosed for a sample having a first material capable of exhibiting superconducting properties. The sample is heated above a peritectic temperature of the first material, cooled below the... | 02/02/2010 |
| 7619093 | Organometallic compounds and mixtures thereof This invention relates to organometallic compounds represented by the formula LML′ wherein M is a metal or metalloid, L is a substituted or unsubstituted cyclopentadienyl group or cyclopentadienyl-like group, a substituted or unsubstituted pentadienyl group or pen... | 11/17/2009 |
| 7615250 | Organoaluminum precursor compounds This invention relates to organoaluminum precursor compounds represented by the formula: wherein R1, R2, R3 and R4 are the same or different and each represents hydrogen or an alk... | 11/10/2009 |
| 7608172 | High-purity ferromagnetic sputter targets and method of manufacture The method manufactures high-purity ferromagnetic sputter targets by cryogenic working the sputter target blank at a temperature below at least −50° C. to impart at least about 5 percent strain into the sputter target blank to increase PTF uniformity of the targe... | 10/27/2009 |
| 7566384 | System and apparatus for real-time monitoring and control of sputter target erosion The present invention relates to a method and apparatus for real-time monitoring and controlling surface area erosion of a sputter target assembly utilized in a physical vapor deposition process. ... | 07/28/2009 |
| 7547796 | Organometallic compounds, processes for the preparation thereof and methods of use thereof This invention relates to organometallic precursor compounds represented by the formula (Cp(R′)x)yM(H)z-y, a process for producing the organometallic precursor compounds, and a method for depositing a metal and/or metal carbide lay... | 06/16/2009 |
| 7547464 | Organometallic precursor compounds This invention relates to organometallic precursor compounds represented by the formula (L)M(L′)2(NO) wherein M is a Group 6 metal, L is a substituted or unsubstituted anionic ligand and L′ is the same or different and is a π acceptor ligand, a proce... | 06/16/2009 |
| 7527670 | Method and apparatus for gas purification This invention comprises an adsorption process for the removal of at least N2O from a feed gas stream that also contains nitrogen and possibly CO2 and water. In the process the feed stream is passed over adsorbents to remove impurities such as ... | 05/05/2009 |
| 7524358 | Production of high purity and ultra-high purity gas Trace amounts of carbon monoxide and optionally hydrogen are removed from gaseous feed streams by passing the feed stream through a carbon monoxide adsorbent (33) prior to passing it through a supported metal catalyst (34). The invention saves signific... | 04/28/2009 |
