Did You Know...
...that Robert Adler has the dubious distinction of being the Father of the Couch Potato? Back in 1955 Adler was employed by what was then Zenith Radio Corp., where he was charged to invent something that would allow viewers to turn down the TV volume without leaving their chairs. After a series of flops (such as a wired contraption that people tripped over), Adler hit on the idea of using sound waves. Thus the Remote Control was born...
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| Number | Title | Issue Date |
| 8173213 | Process stability of NBDE using substituted phenol stabilizers A stabilized cyclic alkene composition comprising one or more cyclic alkenes, and at least one stabilizer compound having the Formula (I), R1,R2,R3,R4,R5(C6)OH Formula (I) ... | 05/08/2012 |
| 8142675 | Compositions for chemical-mechanical planarization of noble-metal-featured substrates, associated methods, and substrates produced by such methods A composition for chemical-mechanical planarization comprises periodic acid and an abrasive present in a combined amount sufficient to planarize a substrate surface having a feature thereon comprising a noble metal, noble metal alloy, noble metal oxide, or any combi... | 03/27/2012 |
| 8137764 | Mechanical enhancer additives for low dielectric films A chemical vapor deposition process for preparing a low dielectric constant organosilicate (OSG) having enhanced mechanical properties by adjusting the amount of organic groups, such as methyl groups, within the mixture is disclosed herein. In one embodiment of the ... | 03/20/2012 |
| 8129577 | Process and system for providing acetylene A system and a process for providing acetylene, preferably at a high purity level (e.g., comprising 100 parts per million (“ppm”), or 10 ppm, or 1 ppm, or 100 parts per billion (“ppb”), or 10 ppb, or 1 ppb or less of solvent), to a point of use, such as a se... | 03/06/2012 |
| 8110535 | Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using same The present invention relates to semi-aqueous formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, as well as contaminations. The formulation comprises: an alkanolamine, a water miscible organic co-solvent, a quar... | 02/07/2012 |
| 8092870 | Preparation of metal oxide thin film via cyclic CVD or ALD A cyclic deposition process to make a metal oxide film on a substrate, which comprises the steps: introducing a metal ketoiminate into a deposition chamber and depositing the metal ketoiminate on a heated substrate; purging the deposition chamber to remove unreacted... | 01/10/2012 |
| 7971497 | Devices and methods for performing inspections, repairs, and/or other operations within vessels Devices and methods facilitate inspections, repairs, and other operations within vessels without human entry into the vessels, and without introducing contaminants that could reduce the purity of materials held in the vessels below predetermined minimum levels. ... | 07/05/2011 |
| 7943195 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants A porous organosilica glass (OSG) film consists of a single phase of a material represented by the formula SivOwCxHyFz, where v+w+x+y+z=100%, v is from 10 to 35 atomic %, w is from 10 to 65 atomic %, x is from 5... | 05/17/2011 |
| 7932188 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. In one aspect of the present invention, an organosilicate glass film is ex... | 04/26/2011 |
| 7807613 | Aqueous buffered fluoride-containing etch residue removers and cleaners The invention relates to aqueous, buffered, fluoride containing compositions having a pH of greater than 7.0 to about 11.0. In certain embodiments, the buffered compositions have an extended worklife because pH dependent attributes such as oxide and metal etch rates... | 10/05/2010 |
| 7700533 | Composition for removal of residue comprising cationic salts and methods using same The present invention relates to an aqueous cleaning composition used to remove unwanted organic and inorganic residues and contaminants from a substrate such as, for example, a semiconductor substrate. The cleaning composition comprises from about 0.01% to about 40... | 04/20/2010 |
| 7500397 | Activated chemical process for enhancing material properties of dielectric films A method for restoring a dielectric constant of a layer of a silicon-containing dielectric material having a first dielectric constant and at least one surface, wherein the first dielectric constant of the layer of silicon-containing dielectric material has increase... | 03/10/2009 |
| 7488159 | Zero-clearance ultra-high-pressure gas compressor Gas compression system comprising a compression cylinder having a gas inlet, a compressed gas outlet, and one or more liquid transfer ports; a pump having a suction and a discharge; and a compressor liquid. The system also includes any of the following: a pressure i... | 02/10/2009 |
| 7485580 | Method for removing organic electroluminescent residues from a substrate A process for removing organic electroluminescent residues from a substrate is described herein. The process includes the steps of providing a process gas comprising a fluorine-containing gas, optionally an oxygen-containing gas, and optionally an additive gas; acti... | 02/03/2009 |
| 7470454 | Non-thermal process for forming porous low dielectric constant films Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. In certain embodiments of the invention, there is provided a low-temperatu... | 12/30/2008 |
| 7468290 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. In one aspect of the present invention, an organosilicate glass film is ex... | 12/23/2008 |
| 7456374 | Component heater A heater for fluid flow components. The heater has heat transfer surfaces that engage the component. The transfer surfaces are mounted on jaws that are movable to engage the component. The jaws have massive portions that act as heat reservoirs to maintain a constant... | 11/25/2008 |
| 7446078 | Adsorbent for water removal from ammonia The present invention provides an adsorbent for removing water and/or other oxygen-containing impurities from a fluid comprising ammonia to the ppb level and methods for making and using same. The adsorbent preferably comprises a substrate having a plurality of pore... | 11/04/2008 |
| 7404990 | Non-thermal process for forming porous low dielectric constant films Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. In certain embodiments of the invention, there is provided a low-temperatu... | 07/29/2008 |
| 7387738 | Removal of surface oxides by electron attachment for wafer bumping applications The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprisin... | 06/17/2008 |
| 7384471 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants A porous organosilica glass (OSG) film consists of a single phase of a material represented by the formula SivOwCxHyFz, where v+w+x+y+z=100%, v is from 10 to 35 atomic %, w is from 10 to 65 atomic %, x is from 5... | 06/10/2008 |
| 7371688 | Removal of transition metal ternary and/or quaternary barrier materials from a substrate A process for the selective removal of a substance from a substrate for etching and/or cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a substance from a substrate comprising: providing the substrate having the ... | 05/13/2008 |
| 7361631 | Compositions for the removal of organic and inorganic residues A composition and method using same for removing photoresist and/or processing residue from a substrate are described herein. In one aspect, there is provided a composition for removing residue consisting essentially of: an acidic buffer solution having an acid sele... | 04/22/2008 |
| 7348300 | Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their manufacture Disclosed herein are process solutions, which may be aqueous-based, non-aqueous-based, and combinations thereof, that contain at least one alkoxylated acetylenic diol surfactant. In one aspect, the process solution comprises water and an alkoxylated acetylenic diol ... | 03/25/2008 |
| 7342068 | Aqueous polyurethane dispersion and method for making and using same Aqueous polyurethane dispersions comprising polyurethane polymer and methods for making and using same are disclosed herein. In one aspect of the present invention, aqueous polyurethane dispersions, comprising a polyurethane polymer having a weight average molecular... | 03/11/2008 |
| 7332445 | Porous low dielectric constant compositions and methods for making and using same A porous organosilicate glass (OSG) film: SivOwCxHyFz, where v+w+x+y+z=100%, v is 10 to 35 atomic %, w is 10 to 65 atomic %, x is 5 to 30 atomic %, y is 10 to 50 atomic % and z is 0 to 15 atomic %, has a silicat... | 02/19/2008 |
| 7317124 | Ortho-substituted pentafluorosulfanylbenzenes, process for their preparation and their use as valuable synthetic intermediates Pentafluorosulfanyl-benzenes according to Formula (I): a process for their preparation and their use as valuable synthetic intermediates for preparing, for example, medicaments, diagnostic aids, liquid crystals, ... | 01/08/2008 |
| 7311946 | Methods for depositing metal films on diffusion barrier layers by CVD or ALD processes A process is described for depositing a metal film on a substrate surface having a diffusion barrier layer deposited thereupon. In one embodiment of the present invention, the process includes: providing a surface of the diffusion barrier layer that is substantially... | 12/25/2007 |
| 7307826 | Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation The present invention provides a method and apparatus for the dry fluxing of at least one component and/or solder surface via electron attachment. In one embodiment, there is provided a method for removing oxides from the surface of a component comprising: providing... | 12/11/2007 |
| 7300995 | Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing... | 11/27/2007 |
| 7294585 | Compositions for preparing low dielectric materials Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention... | 11/13/2007 |
| 7288145 | Precursors for depositing silicon containing films A precursor composition is disclosed for use in the chemical vapor deposition of a material selected from the group consisiting of silicon oxynitride, silicon nitride, and silicon oxide. The composition comprises a hydrazinosilane of the formula: [R1 | 10/30/2007 |
| 7285560 | Indole derivatives or benzimidazole derivatives for modulating IκB kinase The present invention relates to indole derivatives or benzimidazole derivatives, to processes for preparing such compounds, to pharmaceutical compositions comprising such compounds, and methods for the prophylaxis and therapy of a disease associated with an increas... | 10/23/2007 |
| 7267842 | Method for removing titanium dioxide deposits from a reactor A process for the selective removal of a TiO2-containing substance from an article for cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a TiO2-containing substance from an article comprising... | 09/11/2007 |
| 7261118 | Method and vessel for the delivery of precursor materials Vessel and method for the production and delivery of a precursor-containing fluid stream comprising the gaseous phase of a precursor material are disclosed herein. In one aspect, there is provided an vessel comprising: an interior volume wherein the interior volume ... | 08/28/2007 |
| 7223780 | Triazole-derivatives as blood clotting enzyme factor Xa inhibitors The present invention is directed to the compound of formula I which is useful for inhibiting the activity of blood clotting enzyme Factor Xa. The present invention is also directed to compositions containing said compounds, processes for their preparation, their us... | 05/29/2007 |
| 7220553 | Use of Russell's viper venom-induced plasma factor Xa activity to monitor the activity of factor Xa inhibitors The invention relates to a method of monitoring the effect of a direct of indirect Factor Xa inhibitors comprising the steps of collecting a plasma sample from a patient, adding a solution of Russell's viper venom to the plasma sample and measuring the clotting time... | 05/22/2007 |
| 7211553 | Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols A dense cleaning fluid for removing contaminants from a substrate and a method comprising same is disclosed herein. In one embodiment of the present invention, the dense cleaning fluid comprises a dense fluid and at least one acetylenic diol or acetylenic alcohol su... | 05/01/2007 |
| 7208049 | Process solutions containing surfactants used as post-chemical mechanical planarization treatment Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects when employed as a rinse sol... | 04/24/2007 |
| 7205422 | Volatile metal β-ketoiminate and metal β-diiminate complexes Metal ketoiminate or diiminate complexes, containing copper, silver, gold, cobalt, ruthenium, rhodium, platinum, palladium, nickel, osmium, or indium, and methods for making and using same are described herein. In certain embodiments, the metal complexes described h... | 04/17/2007 |
