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| Number | Title | Issue Date |
| 7882456 | Optical lithography correction process A apparatus and method for correcting a process critical layout includes characterizing the influence of individual ones of a set of worst case process variations on a simulated nano-circuit layout design and then correcting layout geometries in the simulated nano-c... | 02/01/2011 |
| 7401922 | Method and apparatus for reducing or eliminating the progression of myopia Apparatus and methods are provided for reducing or eliminating the progression of myopia, including a lens having an intentionally created aberration pattern for reducing or eliminating the progression of myopia. The aberration pattern may comprise a positive spheri... | 07/22/2008 |
| 7392502 | Method for real time monitoring and verifying optical proximity correction model and method This invention relates to a method for real time monitoring and verifying optical proximity correction (OPC) models and methods in production. Prior to OPC is performed on the integrated circuit layout, a model describing the optical, physical and chemical processes... | 06/24/2008 |
| 7390509 | Compositions and methods for nutrition supplementation The present invention relates to compositions comprising various vitamins and minerals and methods for using these compositions for nutritional supplementation in, for example, pregnant or lactating subjects. ... | 06/24/2008 |
| D556386 | Helmet with mouth guard | 11/27/2007 |
