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A vest or belt is integrally formed with tubular, pet receiving passageways which extend around the wearer's body and terminate in pocket-like chambers for feeding and retrieval.
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| Number | Title | Issue Date |
| 7544064 | Cyclindrical impedance matching connector standoff with optional common mode ferrite The present invention generally relates to providing a controlled impedance connection between two PCBs. A connector may connect a first PCB to a second PCB. The connector may comprise of a body made from a dielectric material and a plurality of conductive lines def... | 06/09/2009 |
| 7529876 | Tag allocation method Embodiments of the present invention provide methods and systems for allocating multiple tags to multiple requesters in back to back clock cycles. A tag pool may be divided into a predetermined number of sections. Each requester may be associated with at least one o... | 05/05/2009 |
| 7522000 | Design structure for a serial link output stage differential amplifier A design structure embodied in a machine readable storage medium for designing, manufacturing, and/or testing a design for protection for the transmission of higher amplitude outputs required of differential amplifiers formed by thin oxide transistors with limited m... | 04/21/2009 |
| 7519779 | Dumping using limited system address space Method and apparatus for reading the internal address space of an adapter in a system during a dump are described. The adapter includes a control port and a data port used as channels for exchanging control messages and dump data between the adapter and the system. ... | 04/14/2009 |
| 7467277 | Memory controller operating in a system with a variable system clock The present invention generally relates to memory controllers operating in a system containing a variable system clock. The memory controller may exchange data with a processor operating at a variable processor clock frequency. However the memory controller may perf... | 12/16/2008 |
| 7466562 | Toolless method for alignment, retention, connection, termination and test on printed circuit boards Embodiments of the present invention provide a system for testing and mounting a PCB in a device. A PCB may be placed on one or more standoffs so that a head portion of the standoff protrudes from one or more apertures of the PCB. A push-pin type standoff cap may th... | 12/16/2008 |
| 6080312 | Downhole cyclonic separator assembly Downhole apparatus for separation of oil from oily water or water from oil having an internal chamber continuously flooded with production fluids from a well, one or more hydrocyclonic separators for separating the production fluid into a stream enriched ... | 06/27/2000 |
| 6001420 | Semi-selective chemical vapor deposition The present invention is a method for semi-selectively depositing a material on a substrate by chemical vapor deposition to form continuous, void-free contact holes or vias in sub-half micron applications. An insulating layer is preferentially deposited o... | 12/14/1999 |
| 5988601 | Portable water aerator and circulation system The present invention generally provides a portable system for maintaining aquatic life that require oxygenated water, such as fish, shrimp, other marine animals, microbial populations, plant life and combinations thereof. The system generally includes a ... | 11/23/1999 |
| 5961269 | Three chamber load lock apparatus A functional load lock apparatus having two or more load lock chambers mounted on a central chamber which can be mounted on a single opening in a vacuum chamber such as a substrate processing platform for making integrated circuits on silicon wafers. Each... | 10/05/1999 |
| 5955858 | Mechanically clamping robot wrist The present invention generally provides a robot that can transfer a workpiece, such as a silicon wafer, at increased speeds and accelerations/decelerations. More particularly, the present invention provides a robot wrist for mechanically clamping a workp... | 09/21/1999 |
| 5951775 | Apparatus for full wafer deposition A readily removable deposition shield for processing chambers such as chemical vapor deposition (CVD), ion implantation, or physical vapor deposition (PVD) or sputtering chambers, is disclosed. The deposition shield includes a shield of cylindrical config... | 09/14/1999 |
| 5944902 | Plasma source for HDP-CVD chamber A plasma system is disclosed for processing a substrate and includes a chamber body defining a plasma cavity therein and having a centrally located gas inlet, and a top antenna configured in position relative to the plasma cavity to produce a center-peake... | 08/31/1999 |
| 5944899 | Inductively coupled plasma processing chamber An apparatus and method are provided for an inductively coupled plasma within a reactor for processing semiconductor wafers or workpieces. A gas distribution system having an annular passage formed between the chamber walls and quartz dome uniformly inlet... | 08/31/1999 |
| 5938981 | Water aerator and circulation system The present invention generally provides a system for maintaining aquatic life that require oxygenated water, such as fish, shrimp, other marine animals, microbial populations, plant life and combinations thereof. The system generally includes a container... | 08/17/1999 |
| 5935338 | Chemical vapor deposition chamber Vacuum CVD chambers are disclosed which provide a more uniformly deposited thin film on a substrate. The chamber susceptor mount for the substrate is heated resistively with a single coil firmly contacting the metal of the susceptor on all sides, providin... | 08/10/1999 |
| 5929373 | High voltage feed through A high voltage feed through supplies power to a device through a passage in a wall of a vacuum chamber. The feed through includes a ceramic body comprising a first brazing surface, a second brazing surface, and a central passage for a conductor, a power s... | 07/27/1999 |
| 5921291 | Process and apparatus for filling acetylene cylinders containing a porous packing materials An method and apparatus for filling packed cylinders with acetylene. The apparatus includes a variable speed compressor which delivers the gas to a manifold. The compressor is operated continuously to maintain a continuous flow of acetylene to the manifol... | 07/13/1999 |
| 5919345 | Uniform film thickness deposition of sputtered materials A sputtering chamber includes a substrate support member, for positioning a substrate thereon, and a sputtering target therein. At least a portion of the sputtering surface of the target is located non-parallel to the substrate. In one aspect of the inven... | 07/06/1999 |
| 5914018 | Sputter target for eliminating redeposition on the target sidewall An improved sputter target and shield eliminate redeposition of sputtered material onto the target and prevents the formation of deposits on the electrically insulative member between the target and enclosure wall. The sputter target is designed to allow ... | 06/22/1999 |
| 5911834 | Gas delivery system The present invention provides a method and apparatus for delivering one or more process gases and one or more cleaning gases into one or more processing regions. The gas distribution system includes a gas inlet and a gas conduit, each disposed to deliver... | 06/15/1999 |
| 5909994 | Vertical dual loadlock chamber A vacuum loadlock is provided for housing a pair of wafers in proper alignment for concurrent processing. In one embodiment, a single chamber loadlock is provided with a gas diffuser disposed therein to decrease venting times within the loadlock. In anoth... | 06/08/1999 |
| 5909984 | Pile forming system and method of using the same A pile forming system and method for forming a pile. The pile forming system comprises a top pile forming member, a bottom pile forming member, and an end plate assembled together to provide a complete pile form which can then be filled with concrete to f... | 06/08/1999 |
| 5905302 | Loadlock cassette with wafer support rails The present invention provides a wafer cassette generally comprising one or more wafer support plates defining two or more coplanar wafer seats, a movable stem supporting the wafer support plates, and an actuating member connected to the stem to move the ... | 05/18/1999 |
| 5902088 | Single loadlock chamber with wafer cooling function A vacuum loadlock is provided for housing a pair of wafers in proper alignment for concurrent processing. In one embodiment, a single chamber loadlock is provided with a gas diffuser disposed therein to decrease venting times within the loadlock. In anoth... | 05/11/1999 |
| 5902404 | Resonant chamber applicator for remote plasma source A remote source of partially ionized plasma gas having ions and excited neutral atom species therein is provided. A chamber having a metallic outer shell and an inner insulative tube, is operated as a microwave resonant cavity, preferably having a diamete... | 05/11/1999 |
| 5902403 | Method and apparatus for cleaning a chamber The present invention provides a method and apparatus for cleaning deposits in a chemical vapor deposition ("CVD") chamber equipped for generating a plasma. A gas supplying line is connected to the CVD chamber to deliver a cleaning gas that reacts with th... | 05/11/1999 |
| 5899653 | Two-stage vacuum bellows An apparatus for lifting an object in a sealed chamber and transferring an object from a robot to an operating member has a pair of concentrically mounted support members. A lower support member positioned within the chamber extends through an opening in ... | 05/04/1999 |
| 5890753 | Lock mechanism A lock mechanism is provided which may actuate both a deadbolt and flush bolts in response to a single lock movement. The mechanism includes a dual element bolt throw and flush bolt actuator, which locks in place in the extended position if the end of the... | 04/06/1999 |
| 5886864 | Substrate support member for uniform heating of a substrate The present invention provides a heating member that can be molded inside cavities, between individual members or encapsulating components to provide efficient and uniform heat transfer. The invention may be used to advantage around pipes or vessels for h... | 03/23/1999 |
| 5882414 | Method and apparatus for self-cleaning a blocker plate The present invention provides a method and apparatus for introducing gases into a processing chamber and cleaning isolated surfaces thereof. In one embodiment, the apparatus provides a gas distribution system which comprises a face plate and a blocker pl... | 03/16/1999 |
| 5882419 | Chemical vapor deposition chamber An improved deposition chamber deposits useful layers on substrates. The improved chamber includes a substrate edge protection system which, in combination with a purge gas, protects selected portions of the edge and underside of the substrate from the de... | 03/16/1999 |
| 5879467 | Cycle purging a vacuum chamber during bakeout process A vacuum system bakeout process is performed by cycling the system between two pressures, pumping the system down to a lower pressure, and holding the system at that lower pressure for a period of time. A gas, such as argon gas, is introduced into the sys... | 03/09/1999 |
| 5879176 | Interlocked connector An interlocked connector having integral interlock components such as a spring biased pin in a female connector which actuates an interlocked switch whenever the female connector is mated with a male connector. The interlocked switch interrupts a power so... | 03/09/1999 |
| 5879947 | Apparatus and method for detecting DMAH using particle sensing detector A method for detecting dimethylaluminumhydride (DMAH) comprises sensing the aluminum oxide particles produced by the reaction of the DMAH with air (or with a small amount of oxygen). This is accomplished using a particle-sensing device, such as those comm... | 03/09/1999 |
| 5875560 | Method and apparatus for aligning surfaces in close proximity Apparatus and method are disclosed for adjusting the alignment of surfaces in close proximity. The apparatus includes at least three travel sensitive switches fixed in a non-linear configuration, each switch having a known actuating distance, and a displa... | 03/02/1999 |
| 5877086 | Metal planarization using a CVD wetting film The present invention is a process for planarization of substrate layers comprising apertures to form continuous, void-free contacts or vias in sub-half micron applications. A CVD silicon or metal silicide wetting layer is deposited onto the substrate lay... | 03/02/1999 |
| 5876119 | In-situ substrate temperature measurement scheme in plasma reactor A method and apparatus for noncontact temperature measurement of a substrate insitu by measuring the temperature of a substrate support member and an intermediate member located between the substrate and the substrate support member. The intermediate memb... | 03/02/1999 |
| 5860640 | Semiconductor wafer alignment member and clamp ring A semiconductor processing chamber includes a substrate support member on which a substrate and a clamp ring are aligned during processing in the chamber. To align the substrate on the support member, a frustoconical substrate alignment member extends abo... | 01/19/1999 |
| 5856240 | Chemical vapor deposition of a thin film onto a substrate Vacuum CVD chambers are disclosed which provide a more uniformly deposited thin film on a substrate. The chamber susceptor mount for the substrate is heated resistively with a single coil firmly contacting the metal of the susceptor on all sides, providin... | 01/05/1999 |
