Did You Know...
...Chester Carlson was a patent agent who tired of having to make multiple copies of patent applications using the only duplication method available at the time: carbon paper. In 1959 he came up with a new copying system and took it to IBM for evaluation. The "experts" at IBM determined potential sales to be only 5,000 units because people wouldn't want to use a bulky machine when they had carbon paper. Carlson's invention was the xerography process, the company founded on the system is Xerox.
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| Number | Title | Issue Date |
| 8162296 | Splashguard for high flow vacuum bubbler vessel The present invention is a container having a diptube inlet, at least one baffle disc positioned between the outlet of the diptube and the outlet of the container to provide a narrow annular space between the baffle disc and the sidewall of the container to prevent ... | 04/24/2012 |
| 8137764 | Mechanical enhancer additives for low dielectric films A chemical vapor deposition process for preparing a low dielectric constant organosilicate (OSG) having enhanced mechanical properties by adjusting the amount of organic groups, such as methyl groups, within the mixture is disclosed herein. In one embodiment of the ... | 03/20/2012 |
| 8129577 | Process and system for providing acetylene A system and a process for providing acetylene, preferably at a high purity level (e.g., comprising 100 parts per million (“ppm”), or 10 ppm, or 1 ppm, or 100 parts per billion (“ppb”), or 10 ppb, or 1 ppb or less of solvent), to a point of use, such as a se... | 03/06/2012 |
| 8129555 | Precursors for depositing silicon-containing films and methods for making and using same Aminosilane precursors for depositing silicon-containing films, and methods for depositing silicon-containing films from these aminosilane precursors, are described herein. In one embodiment, there is provided an aminosilane precursor for depositing silicon-containi... | 03/06/2012 |
| 8119016 | Removal of surface oxides by electron attachment for wafer bumping applications The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprisin... | 02/21/2012 |
| 8030263 | Composition for stripping and cleaning and use thereof A composition comprising one or more water soluble organic solvents comprising a glycol ether; water; a fluoride containing compound provided that if the fluoride containing compound is ammonium fluoride than no additional fluoride containing compound is added to th... | 10/04/2011 |
| 8026318 | Mixed polycycloaliphatic amines (MPCA) and MPCA alkylates Mixed polycycloaliphatic amines (MPCA) and alkylates thereof (MPCA alkylates), methods for making mixed polycycloaliphatic MPCA amines and MPCA alkylates thereof, as well as polymeric compositions, such as spray-applied polyurea coating compositions, comprising said... | 09/27/2011 |
| 8007986 | Immersion lithography fluids Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least o... | 08/30/2011 |
| 7985449 | Methods for depositing metal films onto diffusion barrier layers by CVD or ALD processes A process is described for depositing a metal film on a substrate surface having a diffusion barrier layer deposited thereupon. In one embodiment of the present invention, the process includes: providing a surface of the diffusion barrier layer that is substantially... | 07/26/2011 |
| 7977598 | Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation The present invention provides a method and apparatus for the dry fluxing of at least one component and/or solder surface via electron attachment. In one embodiment, there is provided a method for removing oxides from the surface of a component comprising: providing... | 07/12/2011 |
| 7932413 | Precursors for CVD silicon carbo-nitride films Classes of liquid aminosilanes have been found which allow for the production of silicon-containing films. These aminosilanes, in contrast, to some of the precursors employed heretofore, are liquid at room temperature and pressure allowing for convenient handling. I... | 04/26/2011 |
| 7897029 | Removal of surface oxides by electron attachment The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprisin... | 03/01/2011 |
| 7888302 | Aqueous based residue removers comprising fluoride A composition and method comprising same for selectively removing residues such as, for example, ashed photoresist and/or processing residues are disclosed herein. In one aspect, there is provided a composition for removing residue wherein the composition has a pH r... | 02/15/2011 |
| RE42128 | Compositions for removing residue from a substrate and use thereof Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue. ... | 02/08/2011 |
| 7879783 | Cleaning composition for semiconductor substrates The present invention relates to a semi-aqueous cleaning composition used to remove unwanted organic and inorganic residues and contaminants from semiconductor substrates. The cleaning composition comprises a buffering system comprising a polyprotic acid having at l... | 02/01/2011 |
| 7879782 | Aqueous cleaning composition and method for using same An aqueous-based composition and method comprising same for removing residues such as without limitation post-ashed and/or post-etched photoresist from a substrate is described herein. In one aspect, there is provided a composition for removing residues comprising: ... | 02/01/2011 |
| 7879531 | Immersion lithography fluids Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least o... | 02/01/2011 |
| 7875556 | Precursors for CVD silicon carbo-nitride and silicon nitride films Classes of liquid aminosilanes have been found which allow for the production of silicon carbo-nitride films of the general formula SixCyNz. These aminosilanes, in contrast, to some of the precursors employed heretofore, are liquid a... | 01/25/2011 |
| 7875312 | Process for producing silicon oxide films for organoaminosilane precursors The present invention is directed to a method for depositing a silicon oxide layer on a substrate by CVD. The reaction of an organoaminosilane precursor where the alkyl group has at least two carbon atoms in the presence of an oxidizing agent allows for the formatio... | 01/25/2011 |
| 7867779 | System and method comprising same for measurement and/or analysis of particles in gas stream A system and method for measuring and analyzing particles within a gas feed stream. In one aspect, the system includes a particle counter and a particle capture filter that are arranged in parallel. In another aspect, the system includes a purifying device to remove... | 01/11/2011 |
| 7807613 | Aqueous buffered fluoride-containing etch residue removers and cleaners The invention relates to aqueous, buffered, fluoride containing compositions having a pH of greater than 7.0 to about 11.0. In certain embodiments, the buffered compositions have an extended worklife because pH dependent attributes such as oxide and metal etch rates... | 10/05/2010 |
| 7727401 | Selective purification of mono-terpenes for removal of oxygen containing species A process for purifying monoterpenes, including the steps of: providing a monoterpene comprising alpha terpinene of about 90% or greater purity and comprising an oxygen-containing impurity compound selected from the group consisting of 1,8-cineole, ... | 06/01/2010 |
| 7682458 | Aqueous based residue removers comprising fluoride A composition and method comprising same for selectively removing residues such as, for example, ashed photoresist and/or processing residues are disclosed herein. In one aspect, there is provided a composition for removing residue wherein the composition has a pH r... | 03/23/2010 |
| 7608322 | Impact resistive composite materials and methods for making same A composite material that is suitable for the protection of personnel and/or property from impact due to ballistic projectiles and method for making same are disclosed herein. In one embodiment, there is provided composite for resisting impact from an oncoming proje... | 10/27/2009 |
| 7591270 | Process solutions containing surfactants Process solutions comprising one or more surfactants are used to reduce the number of pattern collapse defects on a plurality of photoresist coated substrates during the manufacture of semiconductor devices. ... | 09/22/2009 |
| 7581549 | Method for removing carbon-containing residues from a substrate A process for removing carbon-containing residues from a substrate is described herein. In one aspect, there is provided a process for removing carbon-containing residue from at least a portion of a surface of a substrate comprising: providing a process gas comprisi... | 09/01/2009 |
| 7563308 | Ionic liquid based mixtures for gas storage and delivery A mixture and method for the storage and delivery of a gas are disclosed herein. In one aspect, there is provided a mixture comprising: an ionic liquid comprising an anion and a cation, at least a portion of the gas that is disposed within and reversibly chemically ... | 07/21/2009 |
| 7547798 | Process for preparing aminobenzoate esters The present invention herein provides a process for making an aminobenzoate ester of an alcoholic organic compound. In one aspect, there is provided a process for making an aminobenzoate ester comprising the steps of: (a) providing a reaction mixture comprising an a... | 06/16/2009 |
| 7524533 | Diffusion barrier layers and processes for depositing metal films thereupon by CVD or ALD processes A process is described for depositing a metal film on a substrate surface having a diffusion barrier layer deposited thereupon. In one embodiment, the process includes: providing a surface of the diffusion barrier layer that is substantially free of an elemental met... | 04/28/2009 |
| 7521405 | Process solutions containing surfactants Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain embodiments, the process solution may reduce post-development defects such as pattern collapse or line width roughne... | 04/21/2009 |
| 7482676 | Compositions for preparing low dielectric materials Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention... | 01/27/2009 |
| 7468290 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. In one aspect of the present invention, an organosilicate glass film is ex... | 12/23/2008 |
| 7465833 | Hydrogenation of aromatic amines to alicyclic amines using a lithium aluminate-based catalyst The present invention relates to processes for the catalytic hydrogenation of aromatic amines to their acyclic counterparts using a ruthenium catalyst on a lithium aluminate support. The hydrogenation process comprises contacting an aromatic amine with hydrogen in t... | 12/16/2008 |
| 7452426 | Process solutions containing surfactants used as post-chemical mechanical planarization treatment Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects when employed as a rinse sol... | 11/18/2008 |
| 7421885 | Method for characterizing porous low dielectric constant films A method and apparatus for determining pore size distribution and/or the presence of at least one killer pore in at least a portion of a porous film deposited upon a substrate are disclosed herein. In one embodiment, there is provided a method for determining pore s... | 09/09/2008 |
| 7416717 | Synthesis of pentahalosulfur peroxides and monoxides Provided are methods for producing pentahalosulfur peroxides and monoxides, such as bis-(pentafluorosulfur) peroxide, that involve exposing a composition comprising a pentahalosulfur hypohalite, and optionally a sulfur hexahalide or trihalomethyl hypohalite, to a ha... | 08/26/2008 |
| 7404845 | Ionic liquid based mixtures for gas storage and delivery A mixture and method for the storage and delivery of at least one gas are disclosed herein. In one aspect, there is provided a mixture for the storage and delivery of at least one gas comprising: an ionic liquid comprising an anion and a cation; and at least one gas... | 07/29/2008 |
| 7387738 | Removal of surface oxides by electron attachment for wafer bumping applications The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprisin... | 06/17/2008 |
| 7361631 | Compositions for the removal of organic and inorganic residues A composition and method using same for removing photoresist and/or processing residue from a substrate are described herein. In one aspect, there is provided a composition for removing residue consisting essentially of: an acidic buffer solution having an acid sele... | 04/22/2008 |
| 7361316 | Process for recovery, purification, and recycle of argon A system for the purification and recycle of impure argon is disclosed herein. The system of the present invention can produce very high purity argon, i.e., about 1 ppb or less of impurities. In one embodiment, a cryogenic separation apparatus is used to remove the ... | 04/22/2008 |
