Kidd; William W. - US Patent Attorneys and Agents

Attorney: Kidd; William W.

Number of patents: 37
Last date: February 09, 2010

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Number	Title	Issue Date
7660372	Efficient header acquisition In an integrated satellite receiver, improved header acquisition techniques are described for quickly locating a header symbol sequence in a data stream substantially implemented on a single CMOS integrated circuit. To identify the location of a header symbol sequen...	02/09/2010
7278119	Battery-optimized system-on-a-chip and applications thereof A battery-optimized system-on-a-chip includes multimedia module, a high-speed interface, a processing module, on-chip memory, and an on-chip DC-to-DC converter. The multimedia module operably coupled to produce rendered output data from input data received via the h...	10/02/2007
6292911	Error detection scheme for a high-speed data channel A technique for detecting error when transferring data on a data channel between components disposed on the data channel. A test pattern is generated by a controller on the data channel and sent to a data storage component on the channel. The data storage...	09/18/2001
5783497	Forced-flow wafer polisher A forced-flow polishing technique forcibly flows slurry across the surface of a wafer. The slurry and the wafer are contained in a confined space so that the slurry flow is between a fixed upper and lower boundaries. The slurry flow places selective stres...	07/21/1998
5695810	Use of cobalt tungsten phosphide as a barrier material for copper metallization A technique for electrolessly depositing a CoWP barrier material on to copper and electrolessly depositing copper onto a CoWP barrier material to prevent copper diffusion when forming layers and/or structures on a semiconductor wafer....	12/09/1997
5572398	Tri-polar electrostatic chuck A tri-polar electrostatic chuck has both positive and negative electrodes housed on a non-polarized base housing. A non-polarized guard ring surrounds the outer periphery of the chuck and enclosing the electrodes. A wafer is placed atop the chuck with its...	11/05/1996
5562530	Pulsed-force chemical mechanical polishing A pulsed-force CMP scheme allows for the down force holding a wafer onto a pad to cycle periodically between minimum and maximum values. When the force is near its minimum value, slurry flows into the space between the wafer and the pad. When the force is...	10/08/1996
5555902	Submicron particle removal using liquid nitrogen Liquid nitrogen is introduced onto a surface of a semiconductor wafer to remove submicron particles from its surface. LN2 flows across the wafer surface wherein the surface tension of the liquid collects contaminant particles and removes them o...	09/17/1996
5480747	Attenuated phase shifting mask with buried absorbers An attenuated phase shifting mask has absorbers embedded (buried) in the mask substrate, instead of on the surface of the substrate. The buried absorbers allow for controlling attenuation and phase shifting parameters. The material composition and the thi...	01/02/1996
5479340	Real time control of plasma etch utilizing multivariate statistical analysis Hotelling's T2 statistical analysis and control is used to provide multivariate analysis of components of an RF spectra for real time, in-situ control of an ongoing semiconductor process. An algorithm calculates the T2 value which is...	12/26/1995
5478435	Point of use slurry dispensing system A point of use slurry dispensing system with controls for dilution, temperature and oxidizer/etchant/additive infusion. A slurry in unmixed form and a diluting agent are independently pumped to a pad on a CMP tool. Liquid heaters are used to heat the slur...	12/26/1995
5474865	Globally planarized binary optical mask using buried absorbers A globally planarized binary optical mask has absorbers embedded (buried) in the mask substrate, instead of on the surface of the mask. Light scattering at rough vertical edges of absorbers of prior art masks are reduced or eliminated. Also, due to the bu...	12/12/1995
5472561	Radio frequency monitor for semiconductor process control A RF sensor for monitoring voltage, current and phase angle of a RF signal being coupled to a plasma reactor. Outputs from the sensor are used to calculate various properties of the plasma. These values are then utilized to characterize the process and/or...	12/05/1995
5472811	Phase shifting mask structure with multilayer optical coating for improved transmission A multi-layer PSM structure with multi-layer optical coating disposed between a quartz substrate and a surrounding medium, which typically is air. The multi-layer coating is comprised of a high index of refraction material overlying the quartz and a lower...	12/05/1995
5466991	Optimized ECR plasma apparatus with varied microwave window thickness The present invention describes a technique to control the radial profile of microwave power in an ECR plasma discharge. In order to provide for a uniform plasma density to a specimen, uniform energy absorption by the plasma is desired. By controlling the...	11/14/1995
5467013	Radio frequency monitor for semiconductor process control A RF sensor for monitoring voltage, current and phase angle of a RF signal being coupled to a plasma reactor. Outputs from the sensor are used to calculate various properties of the plasma. These values are then utilized to characterize the process and/or...	11/14/1995
5456758	Submicron particle removal using liquid nitrogen Liquid nitrogen is introduced onto a surface of a semiconductor wafer to remove submicron particles from its surface. LN2 flows across the wafer surface wherein the surface tension of the liquid collects contaminant particles and removes them o...	10/10/1995
5439569	Concentration measurement and control of hydrogen peroxide and acid/base component in a semiconductor bath A feedback control system for providing automated control of multi-component chemical concentrations in a hydrogen peroxide/ammonia (SC-1) aqueous bath or in a hydrogen peroxide/hydrochloric (SC-2) aqueous bath used for semiconductor processing. A sample ...	08/08/1995
5418095	Method of fabricating phase shifters with absorbing/attenuating sidewalls using an additive process A method of fabricating phase shifters with absorbing or attenuating sidewalls in order to inhibit or prevent light scattering at quartz-air interfaces. A quartz substrate is patterned and trenches are formed to provide "shifters". A metal film layer is f...	05/23/1995
5411824	Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging A phase shifting mask has phase shifters in which the sidewalls of the shifters are coated with a light absorbing or attenuating material. The light absorption at the sidewalls reduces the edges scattering and improves the resolution by obtaining similar ...	05/02/1995
5410256	Dissipation factor as a predictor of anodic coating performance A dissipation factor measurement is used to predict as-anodized fixture performance prior to actual use of the fixture in an etching environment. A dissipation factor measurement of the anodic coating determines its dielectric characteristics and correlat...	04/25/1995
5364510	Scheme for bath chemistry measurement and control for improved semiconductor wet processing A feedback control system for providing automated and in-situ control of multi-component chemical concentrations in a liquid bath used for semiconductor processing. A sample from the liquid bath is injected into a carrier stream and routed to a conductivi...	11/15/1994
5344365	Integrated building and conveying structure for manufacturing under ultraclean conditions A building houses a semiconductor manufacturing facility, which is circular in shape and is of a multi-story structure. A silo is located at the center for use in storing and transferring wafers to clean rooms disposed radially around the silo at each flo...	09/06/1994
5306985	ECR apparatus with magnetic coil for plasma refractive index control The present invention describes a technique to control the radial profile of microwave power in an ECR plasma discharge. In order to provide for a uniform plasma density to a specimen, uniform energy absorption by the plasma is desired. By controlling the...	04/26/1994
5302882	Low pass filter for plasma discharge An isolator is disposed between a plasma reactor and its electrical energy source in order to isolate the reactor from the electrical energy source. The isolator operates as a filter to attenuate the transmission of harmonics of a fundamental frequency of...	04/12/1994
5264040	Rapid-switching rotating disk reactor A rapid switching rotating disk reactor has an elongated injector for injecting an inert gas into the chamber of a rotating disk reactor. The nozzle of the injector is proximate to the center of the rotating wafer for the purpose of providing an inert gas...	11/23/1993
5237878	Apparatus and method for sampling ultra-pure chemical An ultra-pure chemical sampling apparatus has an elongated sampling tube which is lowered into the liquid to obtain samples of the chemical. The sampling tube extends the depth of the liquid and holes arranged along the tube provides for a representative ...	08/24/1993
5211729	Baffle/settling chamber for a chemical vapor deposition equipment A baffle/settling chamber removes solid particulates from the exhaust of a semiconductor deposition equipment while reducing pressure fluctuation in the exhaust to provide a more uniform deposition of chemicals. A container having an inlet baffle plate, a...	05/18/1993
5186597	Apparatus for servicing of semiconductor manufacturing equipment A mobile container cart includes a pivoting mechanism for pivoting the container from a horizontal position to approximately 85-90 degree vertical position. The container rests atop the cart and has removable side and top plates. A semiconductor processin...	02/16/1993
5178840	Single wafer regrowth of silicon A wafer chuck is used to support a circular silicon wafer, which was formed from a single wafer casting process, in order to perform monocrystalline silicon regrowth. The cast wafer, having a monocrystalline silicon seed, located at its center, rests atop...	01/12/1993
5161717	Spin casting of silicon wafers An apparatus for casting a single silicon wafer. A quartz drum having a slotted opening pours measured amounts of granulated or powdered silicon into a crucible. Heaters then melt the solid silicon to provide a molten silicon in the crucible. Utilizing co...	11/10/1992
5159267	Pneumatic energy fluxmeter A fluxmeter which provides for a pneumatic apparatus for measuring an amount of plasma energy flux flowing into a semiconductor wafer provides for a non-electrical apparatus of measuring energy flux. A bulb has one end exposed to the plasma while the oppo...	10/27/1992
5159264	Pneumatic energy fluxmeter A fluxmeter pneumatically measures the amount of plasma energy impinging onto a semiconductor wafer. The fluxmeter is comprised of two hollow bulbs filled with gas. One bulb has one end exposed to the plasma while the opposite base end is supported by a s...	10/27/1992
5133829	Single wafer regrowth of silicon A wafer chuck is used to support a circular silicon wafer, which has formed from a single wafer casting process, in order to perform monocrystalline silicon regrowth. The cast wafer, having a monocrystalline silicon seed, located at its center, rests atop...	07/28/1992
5102816	Staircase sidewall spacer for improved source/drain architecture Selective etching of a conformal nitride layer overlying a conformal oxide layer and a subsequent etching of the oxide layer provide for a staircase shaped sidewall spacer which is used to align source and drain regions during implantation. Extent of the ...	04/07/1992
5074421	Quartz tube storage device A quartz tube carousel device for vertically storing quartz tubes used in semiconductor fabrication. The carousel stores the quartz tubes in an upright position to conserve floor space and, further, provides for 360 degree rotation for ease of access. Lam...	12/24/1991
5062446	Intelligent mass flow controller An intelligent mass flow controller for controlling the mass flow of gas to a semiconductor processing chamber. A sensing circuit measures a difference in temperature across a sensing tube and translates this difference to adjust a valve for controlling t...	11/05/1991

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Attorney: Kidd; William W.