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| Number | Title | Issue Date |
| 8088564 | Base soluble polymers for photoresist compositions Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are describe... | 01/03/2012 |
| 8088548 | Bottom antireflective coating compositions Developable bottom antireflective coating compositions are provided. ... | 01/03/2012 |
| 8026201 | Stripper for coating layer The invention relates to compositions and methods of removing silicon-based anti-reflective coatings/hardmask layers. ... | 09/27/2011 |
| 8026040 | Silicone coating composition The present invention relates to a composition comprising: (a) a polymer having at least one repeating unit of formula where R1 is a non-hydrolysable group and n is an integer ranging fro... | 09/27/2011 |
| 7867559 | Photoresist coating liquid supplying apparatus, and photoresist coating liquid supplying method and photoresist coating apparatus using such photoresist coating liquid supplying apparatus This invention provides a photoresist coating liquid supplying apparatus and a photoresist coating liquid supplying method, for supplying a photoresist coating liquid having a low particle content to a photoresist coating apparatus, and a photoresist coating apparat... | 01/11/2011 |
| 7799513 | Process for preventing development defect and composition for use in the same The composition for preventing development-defects containing (1) an ammonium salt, a tetraalkylammonium salt or a C1 to C4 alkanolamine salt of C4 to C15 perfluoroalkylcarboxylic acid, C4 to C10 perf... | 09/21/2010 |
| 7704670 | High silicon-content thin film thermosets High silicon-content resin composition that can be used to form thin film thermosets, useful in forming low k dielectric constant materials and as well as hard mask materials with anti-reflective properties for the photolithography industry are disclosed. ... | 04/27/2010 |
| 7651719 | Process for the preparation of aqueous suspensions of anionic colloidal silica having a neutral pH and applications thereof The instant invention relates to a process for the preparation of an aqueous suspension of anionic colloidal silica having a neutral pH which is stable over time and comprises individualized particles of colloidal silica which are not bound to one another by siloxan... | 01/26/2010 |
| 7629391 | Process for the preparation of aqueous suspensions of anionic colloidal silica having a neutral pH and applications thereof The instant invention relates to a process for the preparation of an aqueous suspension of anionic colloidal silica having a neutral pH which is stable over time and comprises individualized particles of colloidal silica which are not bound to one another by siloxan... | 12/08/2009 |
| 7601480 | Photoactive compounds The present application relates to a compound of formula where X is selected from the group CF3SO3, C4F9SO3, N(SO2C2F5)2, N(... | 10/13/2009 |
| 7553905 | Anti-reflective coatings Novel self-crosslinking polymers are provided and which are useful in antireflective coatings to reduce outgassing. ... | 06/30/2009 |
| 7550249 | Base soluble polymers for photoresist compositions Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are describe... | 06/23/2009 |
| 7547501 | Photoactive compounds The present application relates to photoactive materials having the formula wherein C1+ is a cation; each of R30, R31, R32, R33, R34, R35, R3... | 06/16/2009 |
| 7521170 | Photoactive compounds The present application relates to a compound of formula A-X—B, where (i)A-X—B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R500—SO3− or (ii)A... | 04/21/2009 |
| 7491482 | Photoactive compounds The present application relates to a compound of formula AiXi where Ai is an organic onium cation; and Xi is an anion of the formula X—CF2CF2OCF2CF2—SO3−. The compounds are useful as photoactive... | 02/17/2009 |
| 7470500 | Organic bottom antireflective polymer compositions The present invention relates to bottom antireflective coating compositions, polymers useful in making such compositions, and their use in image processing by forming a thin layer between a reflective substrate and a photoresist coating. ... | 12/30/2008 |
| 7431858 | Nanoimprint resist The invention relates to a method for microstructuring electronic components, which yields high resolutions (≦200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods. The inventive method comprises the following steps... | 10/07/2008 |
| 7390613 | Photoactive compounds The present application relates to a compound of formula Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula −O3S—CF2CF2OCF2CF2—SO3 | 06/24/2008 |
| 7371433 | Composition of silicon-containing copolymer, solvent-soluble crosslinked silicon-containing copolymer, and cured articles obtained therefrom A composition comprising a silicon-containing copolymer having a number-average molecular weight of 500 to 1,000,000, having SiO bond in the polymer and containing at least the structural units represented by the following general formulae (I) and (II) and, if neces... | 05/13/2008 |
| 7368491 | Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor device An objective of the present invention is to provide a phosphorous-containing siliceous material having a specific permittivity of not more than 3.5. The phosphorus-containing silazane composition according to the present invention is characterized by comprising a po... | 05/06/2008 |
| 7358408 | Photoactive compounds The present invention relates to a novel photoactive compounds that can be used in formulating photoresist compositions. ... | 04/15/2008 |
| 7344603 | Solvent for treating polysilazane and method of treating polysilazane with the solvent Polysilazane is treated with a single or mixed solvent comprising one or more members selected from the group consisting of xylene, anisole, decalin, cyclohexane, cyclohexene, methylcyclohexane, ethylcyclohexane, limonene, hexane, octane, nonane, decane, a C8-C11 al... | 03/18/2008 |
| 7247419 | Nanocomposite photosensitive composition and use thereof The present invention relates to a photoresist composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater th... | 07/24/2007 |
| 7226726 | Aqueous surfactant solution for developing coating film layer The developer of the present invention is used in a method where a water-soluble resin coating layer is applied on a resist pattern formed by the conventional method, and the coating layer is crosslinked by an acid supplied from the resist, and the uncrosslinked are... | 06/05/2007 |
| 7141177 | Etching method and composition for forming etching protective layer This invention offers a method to improve-etching resistance of etching mask upon etching comprising steps of forming a pattern on a substrate by using photoresist, applying a composition for forming an etching protection layer containing water-soluble or water-disp... | 11/28/2006 |
| 7122291 | Photoresist compositions The present invention provides for a photoresist composition comprising a mixture of two different copolymers. ... | 10/17/2006 |
| 7081511 | Process for making polyesters The present invention relates to a process for making a polyester where a dianhydride is reacted with a diol. The resulting polyester can be further reacted with a compound selected from aromatic oxides, aliphatic oxides, alkylene carbonates, alcohols, and mixtures ... | 07/25/2006 |
| 7077727 | Process for chemical-mechanical polishing of metal substrates Abrasive composition for the chemical-mechanical polishing in one stage of substrates used in the microelectronics semiconductors industry containing at least one metal layer and one insulator layer, comprising an acid aqueous suspension of individualized particles ... | 07/18/2006 |
| 7078157 | Photosensitive composition and use thereof A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoi... | 07/18/2006 |
| 7045471 | Method for forming resist pattern in reverse-tapered shape A negative-working radiation sensitive resin composition with good heat resistance and low water absorption, which is useful for formation of a resist pattern in the lift-off method or as an insulating member in a organic EL panel and is able to form a reverse taper... | 05/16/2006 |
| 7033728 | Photoresist composition The present invention relates to a photosensitive composition useful at wavelengths between 300 nm and 10 nm which comprises a polymer containing a substituted or unsubstituted higher adamantane. ... | 04/25/2006 |
| 7030201 | Bottom antireflective coatings The present invention relates to bottom antireflective coating compositions and polymers useful in making such compositions. ... | 04/18/2006 |
| 7018785 | Method for forming pattern and treating agent for use therein A method of forming resist patterns comprises the steps of (a) applying and forming a chemically amplified photoresist film, (b) applying a treating agent with a pH value of 1.3 to 4.5 onto said chemically amplified photoresist film, (c) baking said chemically ampli... | 03/28/2006 |
| 7008476 | Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof Modified alginic acid or alginic acid derivatives and anti-reflective coatings based on thereon are described. ... | 03/07/2006 |
| 6991888 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel ph... | 01/31/2006 |
| 6958176 | Liquid crystal mixture Liquid crystal mixture comprising compounds of formula (I) wherein R1: is H or a linear or branched alkyl group or branched alkenyl group R2: stands for a) H... | 10/25/2005 |
| 6946536 | Silicon-containing copolymer and process for producing the same A silicon-containing copolymer which comprises units represented by the general formulae (I) and (II) as essential units and ones represented by the general formulae (III) to (VII) as optional units and has a number average molecular weight of 500 to 1,000,000, ... | 09/20/2005 |
| 6939661 | Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom A composition for forming a radiation absorbing coating which comprises an organic solvent, a radiation absorbing polymer or a radiation absorbing material dissolved therein and a crosslinking agent having blocked isocyanate groups. Since the isocyanate groups of th... | 09/06/2005 |
| 6924016 | Assembly system for stationing semiconductor wafer suitable for processing and process for manufacturing semiconductor wafer Disclosed is an assembly system for stationing a semiconductor wafer suitable for processing said wafer, said system comprising: (a) a holding block; (b) a semiconductor wafer; and (c) an aqueous adhesive composition interposed between the holding block and the semi... | 08/02/2005 |
| 6911293 | Photoresist compositions comprising acetals and ketals as solvents Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising ... | 06/28/2005 |
